JPWO2022172917A1 - - Google Patents
Info
- Publication number
- JPWO2022172917A1 JPWO2022172917A1 JP2022580633A JP2022580633A JPWO2022172917A1 JP WO2022172917 A1 JPWO2022172917 A1 JP WO2022172917A1 JP 2022580633 A JP2022580633 A JP 2022580633A JP 2022580633 A JP2022580633 A JP 2022580633A JP WO2022172917 A1 JPWO2022172917 A1 JP WO2022172917A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G63/00—Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
- C08G63/02—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
- C08G63/12—Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
- C08G63/40—Polyesters derived from ester-forming derivatives of polycarboxylic acids or of polyhydroxy compounds, other than from esters thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021018756 | 2021-02-09 | ||
| PCT/JP2022/004922 WO2022172917A1 (en) | 2021-02-09 | 2022-02-08 | Resist underlayer film-forming composition containing polymer that has side chain blocked with aryl group |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022172917A1 true JPWO2022172917A1 (en) | 2022-08-18 |
Family
ID=82837880
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022580633A Pending JPWO2022172917A1 (en) | 2021-02-09 | 2022-02-08 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2022172917A1 (en) |
| TW (1) | TW202246372A (en) |
| WO (1) | WO2022172917A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024024490A1 (en) * | 2022-07-29 | 2024-02-01 | 日産化学株式会社 | Composition for forming resist underlayer film |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8435721B2 (en) * | 2008-02-21 | 2013-05-07 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition and forming method of resist pattern using the same |
| US8551686B2 (en) * | 2009-10-30 | 2013-10-08 | Az Electronic Materials Usa Corp. | Antireflective composition for photoresists |
| JP6083537B2 (en) * | 2012-03-23 | 2017-02-22 | 日産化学工業株式会社 | Composition for forming resist underlayer film for EUV lithography |
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2022
- 2022-02-08 WO PCT/JP2022/004922 patent/WO2022172917A1/en active Application Filing
- 2022-02-08 JP JP2022580633A patent/JPWO2022172917A1/ja active Pending
- 2022-02-09 TW TW111104762A patent/TW202246372A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022172917A1 (en) | 2022-08-18 |
| TW202246372A (en) | 2022-12-01 |