JPWO2022049968A1 - - Google Patents

Info

Publication number
JPWO2022049968A1
JPWO2022049968A1 JP2022546176A JP2022546176A JPWO2022049968A1 JP WO2022049968 A1 JPWO2022049968 A1 JP WO2022049968A1 JP 2022546176 A JP2022546176 A JP 2022546176A JP 2022546176 A JP2022546176 A JP 2022546176A JP WO2022049968 A1 JPWO2022049968 A1 JP WO2022049968A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022546176A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2022049968A1 publication Critical patent/JPWO2022049968A1/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/10—Esters; Ether-esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
JP2022546176A 2020-09-01 2021-08-03 Pending JPWO2022049968A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020146794 2020-09-01
PCT/JP2021/028767 WO2022049968A1 (ja) 2020-09-01 2021-08-03 自己組織化膜形成用組成物及びパターン形成方法

Publications (1)

Publication Number Publication Date
JPWO2022049968A1 true JPWO2022049968A1 (ja) 2022-03-10

Family

ID=80491996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022546176A Pending JPWO2022049968A1 (ja) 2020-09-01 2021-08-03

Country Status (2)

Country Link
JP (1) JPWO2022049968A1 (ja)
WO (1) WO2022049968A1 (ja)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9299381B2 (en) * 2011-02-07 2016-03-29 Wisconsin Alumni Research Foundation Solvent annealing block copolymers on patterned substrates
JP2015170723A (ja) * 2014-03-06 2015-09-28 Jsr株式会社 パターン形成方法及び自己組織化組成物
JP2016107211A (ja) * 2014-12-05 2016-06-20 Jsr株式会社 自己組織化膜の形成方法、パターン形成方法及び自己組織化膜形成用組成物
JP6928599B2 (ja) * 2016-02-22 2021-09-01 株式会社カネカ ポリオール組成物および熱硬化性樹脂

Also Published As

Publication number Publication date
WO2022049968A1 (ja) 2022-03-10

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Legal Events

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A621 Written request for application examination

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Effective date: 20231207