JPWO2021235439A1 - - Google Patents

Info

Publication number
JPWO2021235439A1
JPWO2021235439A1 JP2022524490A JP2022524490A JPWO2021235439A1 JP WO2021235439 A1 JPWO2021235439 A1 JP WO2021235439A1 JP 2022524490 A JP2022524490 A JP 2022524490A JP 2022524490 A JP2022524490 A JP 2022524490A JP WO2021235439 A1 JPWO2021235439 A1 JP WO2021235439A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2022524490A
Other languages
Japanese (ja)
Other versions
JPWO2021235439A5 (en
JP7384283B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021235439A1 publication Critical patent/JPWO2021235439A1/ja
Publication of JPWO2021235439A5 publication Critical patent/JPWO2021235439A5/ja
Priority to JP2023191770A priority Critical patent/JP2024012562A/en
Application granted granted Critical
Publication of JP7384283B2 publication Critical patent/JP7384283B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2022524490A 2020-05-19 2021-05-18 pattern forming device Active JP7384283B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2023191770A JP2024012562A (en) 2020-05-19 2023-11-09 Pattern formation device

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020087094 2020-05-19
JP2020087094 2020-05-19
PCT/JP2021/018802 WO2021235439A1 (en) 2020-05-19 2021-05-18 Pattern forming device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2023191770A Division JP2024012562A (en) 2020-05-19 2023-11-09 Pattern formation device

Publications (3)

Publication Number Publication Date
JPWO2021235439A1 true JPWO2021235439A1 (en) 2021-11-25
JPWO2021235439A5 JPWO2021235439A5 (en) 2022-11-15
JP7384283B2 JP7384283B2 (en) 2023-11-21

Family

ID=78708549

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2022524490A Active JP7384283B2 (en) 2020-05-19 2021-05-18 pattern forming device
JP2023191770A Pending JP2024012562A (en) 2020-05-19 2023-11-09 Pattern formation device

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2023191770A Pending JP2024012562A (en) 2020-05-19 2023-11-09 Pattern formation device

Country Status (4)

Country Link
JP (2) JP7384283B2 (en)
KR (1) KR20230004748A (en)
CN (1) CN115668066A (en)
WO (1) WO2021235439A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04348018A (en) * 1991-01-14 1992-12-03 Topcon Corp Alignment optical device
JPH07161611A (en) * 1993-12-07 1995-06-23 Nikon Corp Position detecting apparatus
JP2004356193A (en) * 2003-05-27 2004-12-16 Canon Inc Aligner and exposure method
JP2015152649A (en) * 2014-02-12 2015-08-24 株式会社ニコン phase-contrast microscope

Also Published As

Publication number Publication date
CN115668066A (en) 2023-01-31
JP2024012562A (en) 2024-01-30
JP7384283B2 (en) 2023-11-21
KR20230004748A (en) 2023-01-06
WO2021235439A1 (en) 2021-11-25

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