JPWO2021229968A1 - - Google Patents
Info
- Publication number
- JPWO2021229968A1 JPWO2021229968A1 JP2022522564A JP2022522564A JPWO2021229968A1 JP WO2021229968 A1 JPWO2021229968 A1 JP WO2021229968A1 JP 2022522564 A JP2022522564 A JP 2022522564A JP 2022522564 A JP2022522564 A JP 2022522564A JP WO2021229968 A1 JPWO2021229968 A1 JP WO2021229968A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020084728 | 2020-05-13 | ||
| PCT/JP2021/015071 WO2021229968A1 (en) | 2020-05-13 | 2021-04-09 | Processing method and processing device for glass substrates, and production method for euvl mask blanks |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2021229968A1 true JPWO2021229968A1 (en) | 2021-11-18 |
Family
ID=78525778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022522564A Pending JPWO2021229968A1 (en) | 2020-05-13 | 2021-04-09 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2021229968A1 (en) |
| WO (1) | WO2021229968A1 (en) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5169163B2 (en) * | 2006-12-01 | 2013-03-27 | 旭硝子株式会社 | Method for finishing a pre-polished glass substrate surface |
| SG184104A1 (en) * | 2010-03-16 | 2012-10-30 | Asahi Glass Co Ltd | Optical member base material for euv lithography, and method for producing same |
| KR20150097484A (en) * | 2012-12-27 | 2015-08-26 | 호야 가부시키가이샤 | Mask blank substrate processing device, mask blank substrate processing method, mask blank substrate fabrication method, mask blank fabrication method, and transfer mask fabrication method |
| JP6048817B2 (en) * | 2012-12-27 | 2016-12-21 | 日本電気硝子株式会社 | Sheet glass surface treatment apparatus and surface treatment method |
| JP6256422B2 (en) * | 2014-08-07 | 2018-01-10 | 旭硝子株式会社 | Mask blank glass substrate |
| JP2018052804A (en) * | 2016-09-21 | 2018-04-05 | 旭硝子株式会社 | Glass sheet and manufacturing method of glass substrate |
-
2021
- 2021-04-09 WO PCT/JP2021/015071 patent/WO2021229968A1/en active Application Filing
- 2021-04-09 JP JP2022522564A patent/JPWO2021229968A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2021229968A1 (en) | 2021-11-18 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240209 |