JPWO2021213087A5 - - Google Patents
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- JPWO2021213087A5 JPWO2021213087A5 JP2022563920A JP2022563920A JPWO2021213087A5 JP WO2021213087 A5 JPWO2021213087 A5 JP WO2021213087A5 JP 2022563920 A JP2022563920 A JP 2022563920A JP 2022563920 A JP2022563920 A JP 2022563920A JP WO2021213087 A5 JPWO2021213087 A5 JP WO2021213087A5
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- propoxy
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- meth
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- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 12
- 125000003342 alkenyl group Chemical group 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 239000001257 hydrogen Substances 0.000 claims description 9
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims description 6
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 claims description 6
- 125000002883 imidazolyl group Chemical group 0.000 claims description 6
- 125000001041 indolyl group Chemical group 0.000 claims description 6
- 125000001624 naphthyl group Chemical group 0.000 claims description 6
- 125000000168 pyrrolyl group Chemical group 0.000 claims description 6
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 5
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims description 3
- 125000005119 alkyl cycloalkyl group Chemical group 0.000 claims description 3
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 3
- 125000001485 cycloalkadienyl group Chemical group 0.000 claims description 3
- 125000001316 cycloalkyl alkyl group Chemical group 0.000 claims description 3
- 125000001072 heteroaryl group Chemical group 0.000 claims description 3
- 125000006376 (C3-C10) cycloalkyl group Chemical group 0.000 claims description 2
- -1 ethoxy/propoxy-modified pyrazoline compound Chemical class 0.000 claims 12
- 150000001875 compounds Chemical class 0.000 claims 6
- 150000002431 hydrogen Chemical class 0.000 claims 5
- 229920000642 polymer Polymers 0.000 claims 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims 3
- 229920000058 polyacrylate Polymers 0.000 claims 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims 2
- 150000001408 amides Chemical class 0.000 claims 2
- 239000012752 auxiliary agent Substances 0.000 claims 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims 2
- 229920005989 resin Polymers 0.000 claims 2
- 239000011347 resin Substances 0.000 claims 2
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 claims 2
- 239000004593 Epoxy Substances 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000007513 acids Chemical class 0.000 claims 1
- 125000003647 acryloyl group Chemical group O=C([*])C([H])=C([H])[H] 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 229920000180 alkyd Polymers 0.000 claims 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 239000003822 epoxy resin Substances 0.000 claims 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims 1
- 239000000945 filler Substances 0.000 claims 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims 1
- 239000000852 hydrogen donor Substances 0.000 claims 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000005011 phenolic resin Substances 0.000 claims 1
- 229920001568 phenolic resin Polymers 0.000 claims 1
- 238000000016 photochemical curing Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 claims 1
- 239000000049 pigment Substances 0.000 claims 1
- 239000004014 plasticizer Substances 0.000 claims 1
- 229920000647 polyepoxide Polymers 0.000 claims 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims 1
- 239000003381 stabilizer Substances 0.000 claims 1
- 125000005017 substituted alkenyl group Chemical group 0.000 claims 1
- 150000005846 sugar alcohols Polymers 0.000 claims 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 claims 1
- 239000011368 organic material Substances 0.000 description 2
- 150000003219 pyrazolines Chemical class 0.000 description 2
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 description 1
- 125000006374 C2-C10 alkenyl group Chemical group 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 230000021615 conjugation Effects 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- GBXQPDCOMJJCMJ-UHFFFAOYSA-M trimethyl-[6-(trimethylazaniumyl)hexyl]azanium;bromide Chemical compound [Br-].C[N+](C)(C)CCCCCC[N+](C)(C)C GBXQPDCOMJJCMJ-UHFFFAOYSA-M 0.000 description 1
Description
更なる態様として、R1は、フェニル基、ナフチル基、ピロリル基、イミダゾリル基、カルバゾリル基、インドリル基、C2~C10のアルケニル基、C4~C8のシクロアルカジエニル基から選ばれるか、あるいは、基における水素原子は、それぞれ独立にC1~C10の直鎖又は分岐鎖のアルキル基、C4~C10のアルキルシクロアルキル基又はシクロアルキルアルキル基、C3~C10のシクロアルキル基、C6~C15のアリール基、C6~C12のアルキルアリール基、C6~C12のアリールアルキル基、C2~C20のヘテロアリールにより置換される。R2は、水素、C1~C6の直鎖又は分岐鎖のアルキル基から選ばれる。R3は、水素、C1~C6の直鎖又は分岐鎖のアルキル基、ベンジル基から選ばれる。 In a further embodiment, R 1 is selected from a phenyl group, a naphthyl group, a pyrrolyl group, an imidazolyl group, a carbazolyl group, an indolyl group, a C 2 -C 10 alkenyl group, a C 4 -C 8 cycloalkadienyl group. , or the hydrogen atoms in the group each independently represent a C 1 to C 10 linear or branched alkyl group, a C 4 to C 10 alkylcycloalkyl group or a cycloalkylalkyl group, a C 3 to C 10 cyclo Substituted by an alkyl group, a C 6 -C 15 aryl group, a C 6 -C 12 alkylaryl group, a C 6 -C 12 arylalkyl group, a C 2 -C 20 heteroaryl group. R 2 is selected from hydrogen, C 1 to C 6 straight chain or branched alkyl groups. R 3 is selected from hydrogen, a C 1 to C 6 straight or branched alkyl group, and a benzyl group.
更なる態様として、R1は、フェニル基、ナフチル基、ピロリル基、イミダゾリル基、カルバゾリル基、インドリル基、C2~C6のアルケニル基、C4~C6のシクロアルカジエニル基、C1~C5のアルキル基で置換されたフェニル基、C3~C6のシクロアルキル基で置換されたフェニル基、C6~C10のアリール基で置換されたアルケニル基、C6~C10のアルキルアリール基で置換されたアルケニル基、C6~C10のアリールアルキル基で置換されたアルケニル基から選ばれる。 In a further embodiment, R 1 is a phenyl group, a naphthyl group, a pyrrolyl group, an imidazolyl group, a carbazolyl group, an indolyl group, a C 2 to C 6 alkenyl group, a C 4 to C 6 cycloalkadienyl group, a C 1 to Phenyl group substituted with C 5 alkyl group, phenyl group substituted with C 3 to C 6 cycloalkyl group, alkenyl group substituted with C 6 to C 10 aryl group, C 6 to C 10 alkyl group It is selected from an alkenyl group substituted with an aryl group, and an alkenyl group substituted with a C 6 to C 10 arylalkyl group.
EO/PO変性ピラゾリン類有機物の総合性能をさらに向上させるために、1つの好適な実施形態において、R1は、フェニル基、ナフチル基、ピロリル基、イミダゾリル基、カルバゾリル基、インドリル基、C2~C10のアルケニル基、C4~C8のシクロアルカジエニル基から選ばれるか、あるいは、前記基における水素原子は、それぞれ独立にC1~C10の直鎖又は分岐鎖のアルキル基、C4~C10のアルキルシクロアルキル基又はシクロアルキルアルキル基、C3~C10のシクロアルキル基、C6~C15のアリール基、C6~C12のアルキルアリール基、C6~C12のアリールアルキル基、C2~C20のヘテロアリールにより置換される。R2は、水素、C1~C6の直鎖又は分岐鎖のアルキル基から選ばれる。R3は、水素、C1~C6の直鎖又は分岐鎖のアルキル基、ベンジル基から選ばれる。 In order to further improve the overall performance of the EO/PO-modified pyrazoline organic material, in one preferred embodiment, R 1 is a phenyl group, a naphthyl group, a pyrrolyl group, an imidazolyl group, a carbazolyl group, an indolyl group, a C 2 - selected from a C 10 alkenyl group, a C 4 to C 8 cycloalkadienyl group, or the hydrogen atoms in the group are each independently selected from a C 1 to C 10 straight or branched alkyl group, a C 4 ~C 10 alkylcycloalkyl group or cycloalkylalkyl group, C 3 to C 10 cycloalkyl group, C 6 to C 15 aryl group, C 6 to C 12 alkylaryl group, C 6 to C 12 aryl Alkyl group, substituted by C 2 -C 20 heteroaryl. R 2 is selected from hydrogen, C 1 to C 6 straight chain or branched alkyl groups. R 3 is selected from hydrogen, a C1 to C6 straight or branched alkyl group, and a benzyl group.
R1と式(I)で示される増感剤との共役性を向上させて、その光感度を向上させるために、好ましくは、R1は、フェニル基、ナフチル基、ピロリル基、イミダゾリル基、カルバゾリル基、インドリル基、C2~C6のアルケニル基、C4~C6のシクロアルカジエニル基、C1~C5のアルキル基で置換されたフェニル基、C3~C6のシクロアルキル基で置換されたフェニル基、C6~C10のアリール基で置換されたアルケニル基、C6~C10のアルキルアリール基で置換されたアルケニル基、C6~C10のアリールアルキル基で置換されたアルケニル基から選ばれる。EO/PO変性ピラゾリン類有機物の合成難度をさらに低下させるために、より好ましくは、R1は、下記の基から選ばれる1種である。
In order to improve the conjugation between R 1 and the sensitizer represented by formula (I) and improve the photosensitivity, R 1 is preferably a phenyl group, a naphthyl group, a pyrrolyl group, an imidazolyl group, Carbazolyl group, indolyl group, C 2 to C 6 alkenyl group, C 4 to C 6 cycloalkadienyl group, phenyl group substituted with C 1 to C 5 alkyl group, C 3 to C 6 cycloalkyl group a phenyl group substituted with a C 6 to C 10 aryl group, an alkenyl group substituted with a C 6 to C 10 alkylaryl group, an alkenyl group substituted with a C 6 to C 10 arylalkyl group, selected from alkenyl groups. In order to further reduce the difficulty in synthesizing the EO/PO-modified pyrazoline organic material, R 1 is more preferably one selected from the following groups.
Claims (14)
[式中、前記X及びYは、それぞれ独立に-CH2-CH2-又は-CH(CH3)-CH2-を表す。
p及びqは、それぞれ独立に0~9の整数を表し、かつ、両者は同時に0ではない。
R1は、フェニル基、ナフチル基、ピロリル基、イミダゾリル基、カルバゾリル基、インドリル基、C 2 ~C 10 のアルケニル基、C 4 ~C 8 のシクロアルカジエニル基から選ばれ、これらの基における水素原子は、それぞれ独立にC 1 ~C 10 の直鎖又は分岐鎖のアルキル基、C 3 ~C 10 のシクロアルキル基、C 6 ~C 15 のアリール基、C 6 ~C 12 のアルキルアリール基、C 6 ~C 12 のアリールアルキル基、C 2 ~ 20 のヘテロアリール基により置換されていてもよい。
R2は、水素、C1~C10の直鎖又は分岐鎖のアルキル基、C4~C10のアルキルシクロアルキル基又はシクロアルキルアルキル基を表す。
R3は、水素、C1~C 6 の直鎖又は分岐鎖のアルキル基、又はC6~C20のアリールアルキル基を表す。] An ethoxy/propoxy-modified pyrazoline compound characterized by having a structure represented by the following formula (I).
[In the formula, X and Y each independently represent -CH 2 -CH 2 - or -CH(CH 3 )-CH 2 -.
p and q each independently represent an integer from 0 to 9, and both are not 0 at the same time.
R 1 is selected from a phenyl group, a naphthyl group, a pyrrolyl group, an imidazolyl group, a carbazolyl group, an indolyl group, a C 2 to C 10 alkenyl group, and a C 4 to C 8 cycloalkadienyl group; Hydrogen atoms each independently represent a C 1 to C 10 linear or branched alkyl group, a C 3 to C 10 cycloalkyl group, a C 6 to C 15 aryl group, or a C 6 to C 12 alkylaryl group. , a C 6 to C 12 arylalkyl group, or a C 2 to 20 heteroaryl group.
R 2 represents hydrogen, a C 1 to C 10 linear or branched alkyl group, a C 4 to C 10 alkylcycloalkyl group, or a cycloalkylalkyl group.
R 3 represents hydrogen, a C 1 to C 6 linear or branched alkyl group , or a C 6 to C 20 arylalkyl group. ]
前記R3は、水素、C1~C6の直鎖又は分岐鎖のアルキル基、ベンジル基から選ばれることを特徴とする請求項1に記載のエトキシ/プロポキシ変性ピラゾリン化合物。 The R 2 is selected from hydrogen, a C 1 to C 6 straight chain or branched alkyl group,
The ethoxy/propoxy-modified pyrazoline compound according to claim 1 , wherein R 3 is selected from hydrogen, a C 1 to C 6 linear or branched alkyl group, and a benzyl group.
から選ばれることを特徴とする請求項1に記載のエトキシ/プロポキシ変性ピラゾリン化合物。 Said R 1 is
The ethoxy/propoxy-modified pyrazoline compound according to claim 1 , characterized in that it is selected from the following.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010323287.7A CN113527207B (en) | 2020-04-22 | 2020-04-22 | Ethoxy/propoxy modified pyrazoline organic matter, application thereof, photo-curing composition and photoresist |
CN202010323287.7 | 2020-04-22 | ||
PCT/CN2021/081187 WO2021213087A1 (en) | 2020-04-22 | 2021-03-16 | Ethoxy/propoxy modified pyrazoline organic matter, application thereof, photocurable composition, and photoresist |
Publications (3)
Publication Number | Publication Date |
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JP2023522232A JP2023522232A (en) | 2023-05-29 |
JPWO2021213087A5 true JPWO2021213087A5 (en) | 2024-01-30 |
JP7465998B2 JP7465998B2 (en) | 2024-04-11 |
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Application Number | Title | Priority Date | Filing Date |
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JP2022563920A Active JP7465998B2 (en) | 2020-04-22 | 2021-03-16 | Ethoxy/propoxy modified pyrazoline organics, their use, photocurable compositions and photoresists |
Country Status (6)
Country | Link |
---|---|
US (1) | US20230167066A1 (en) |
EP (1) | EP4140983A4 (en) |
JP (1) | JP7465998B2 (en) |
CN (1) | CN113527207B (en) |
TW (1) | TWI766645B (en) |
WO (1) | WO2021213087A1 (en) |
Families Citing this family (1)
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CN115322086B (en) * | 2022-08-03 | 2024-02-23 | 温州医科大学 | Beta-ionone derivative and application thereof in preparation of antioxidant and anti-aging drugs |
Family Cites Families (17)
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JPH087427B2 (en) * | 1987-11-26 | 1996-01-29 | 富士写真フイルム株式会社 | Thermal development color photosensitive material |
CN1195042C (en) * | 2003-05-08 | 2005-03-30 | 四川大学 | Organic electroluminescent calixarene material |
CN1219772C (en) | 2003-06-30 | 2005-09-21 | 浙江大学 | 1,3-aryl group substituted pyrazoline whose 5 position contains ester gruop and its liquid phase synthesis method |
NZ565536A (en) * | 2005-08-31 | 2011-03-31 | Hoffmann La Roche | Pyrazolone derivatives as 11-beta HSD1 inhibitors |
JP2008116751A (en) * | 2006-11-06 | 2008-05-22 | Asahi Kasei Electronics Co Ltd | Photosensitive resin composition and laminate |
JP4941182B2 (en) * | 2007-08-29 | 2012-05-30 | 日立化成工業株式会社 | Photosensitive resin composition, photosensitive element using the same, resist pattern forming method, and printed wiring board manufacturing method |
GB0722067D0 (en) | 2007-11-09 | 2007-12-19 | Lambson Fine Chemicals Ltd | Photoinitiators |
JP5117233B2 (en) * | 2008-03-21 | 2013-01-16 | 旭化成イーマテリアルズ株式会社 | Photosensitive resin composition and laminate |
JP2012215787A (en) * | 2011-04-01 | 2012-11-08 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element, method for manufacturing resist pattern, and printed wiring board and method for manufacturing the same |
JP5416256B2 (en) * | 2012-07-19 | 2014-02-12 | 旭化成イーマテリアルズ株式会社 | Photosensitive resin laminate |
US20150293443A1 (en) * | 2012-11-20 | 2015-10-15 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board |
WO2016104585A1 (en) * | 2014-12-25 | 2016-06-30 | 日立化成株式会社 | Photosensitive resin composition, and photosensitive element using same, as well as method for forming resist pattern and method for producing printed circuit board |
CN104892512B (en) * | 2015-05-21 | 2018-01-05 | 常州强力先端电子材料有限公司 | A kind of pyrazolines sensitizer and its preparation method and application |
CN104892513B (en) * | 2015-05-21 | 2017-05-03 | 常州强力先端电子材料有限公司 | Alkenyl-containing pyrazoline sensitizer as well as preparation method and application thereof |
JP6774430B2 (en) | 2015-05-21 | 2020-10-21 | 常州強力先端電子材料有限公司Changzhou Tronly Advanced Electronic Materials Co.,Ltd. | Pyrazoline sensitizers and their manufacturing methods and uses |
CN105085718B (en) * | 2015-08-21 | 2017-05-03 | 常州强力电子新材料股份有限公司 | Pyrazoline oxime ester photoinitiator, method for preparing same and application of pyrazoline oxime ester photoinitiator |
KR102236533B1 (en) * | 2018-01-23 | 2021-04-06 | 주식회사 엘지화학 | Pressure-sensitive adhesive composition and the use thereof |
-
2020
- 2020-04-22 CN CN202010323287.7A patent/CN113527207B/en active Active
-
2021
- 2021-03-16 US US17/996,773 patent/US20230167066A1/en active Pending
- 2021-03-16 JP JP2022563920A patent/JP7465998B2/en active Active
- 2021-03-16 EP EP21793446.2A patent/EP4140983A4/en active Pending
- 2021-03-16 WO PCT/CN2021/081187 patent/WO2021213087A1/en unknown
- 2021-04-15 TW TW110113585A patent/TWI766645B/en active
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