JPWO2021204720A5 - - Google Patents
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- JPWO2021204720A5 JPWO2021204720A5 JP2022561084A JP2022561084A JPWO2021204720A5 JP WO2021204720 A5 JPWO2021204720 A5 JP WO2021204720A5 JP 2022561084 A JP2022561084 A JP 2022561084A JP 2022561084 A JP2022561084 A JP 2022561084A JP WO2021204720 A5 JPWO2021204720 A5 JP WO2021204720A5
- Authority
- JP
- Japan
- Prior art keywords
- formula
- diisocyanate
- polysiloxane
- block copolymer
- polyurea
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000000034 method Methods 0.000 claims 19
- 229920001296 polysiloxane Polymers 0.000 claims 19
- 239000003054 catalyst Substances 0.000 claims 11
- 125000005442 diisocyanate group Chemical group 0.000 claims 11
- -1 polysiloxanes Polymers 0.000 claims 10
- 229920001400 block copolymer Polymers 0.000 claims 8
- 239000004970 Chain extender Substances 0.000 claims 7
- 239000006085 branching agent Substances 0.000 claims 7
- 229920000162 poly(ureaurethane) Polymers 0.000 claims 7
- 229920002635 polyurethane Polymers 0.000 claims 7
- 239000004814 polyurethane Substances 0.000 claims 7
- 150000001875 compounds Chemical class 0.000 claims 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims 5
- 238000010438 heat treatment Methods 0.000 claims 4
- 125000002947 alkylene group Chemical group 0.000 claims 3
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims 2
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 125000000732 arylene group Chemical group 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000008018 melting Effects 0.000 claims 2
- 238000002844 melting Methods 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- 125000006832 (C1-C10) alkylene group Chemical group 0.000 claims 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 230000000996 additive effect Effects 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 238000001125 extrusion Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000000155 melt Substances 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 125000005375 organosiloxane group Chemical group 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 238000000110 selective laser sintering Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 239000010936 titanium Substances 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Claims (23)
1) 以下の化合物:
a) 式(A):
b) 式(B):
c) 式(C):
d) 任意に式(D):
e) 及び触媒(E)、
を提供する工程、
2) Nbモルの式(B)の鎖延長剤、Ncモルの式(C)の少なくとも1つのジイソシアネート、及び任意にNdモルの式(D)の分岐剤を、Naモルの式(A)の長鎖ヒドロキシル又はアミノ二官能化ポリシロキサンに加える工程
を含み、
式中、
- -Q-、-T-及び-X-は、同一又は異なり、そして最終的にはそのうちの1つ以上の-CH2-が-O-で置換される(C1~C20)アルキレン基を表し、又は(C6~C22)アリーレン基を表し、
- -M、-W及び-Zは、同一又は異なり、そして-OH又は-NHR’を表し、-R’は-H、(C1~C10)アルキル基、又は(C6~22)アリール基を表し、
- -Uは、最終的にはそのうちの1つ以上の-CH2-が-O-で置換される(C1~C20)アルキル基であり、又は(C6~C22)アリール基を表し、
- -Y-は、(C1~C36)アルキレン基、(C6~C13)アリーレン基、又はオルガノポリシロキサンを表し、
- -R1、-R2及び-R3は、同一又は異なり、そして最終的に1つ以上の-F及び/又は-Clで置換される(C1~C20)アルキル基を表し、
- aは、30~1000の範囲の整数であり、
- bは、2~15の範囲の整数であり、
- cは、10~200の範囲の整数であり、
- dは、10~200の範囲の整数であり、
- 比率a/bは、2~200の範囲であり、
- モル比Nb/(Na+Nb+Nd)は、5%~60%の範囲であり、
- モル比Nc/(Na+Nb+Nc+Nd)は、45~55%の範囲であり、
- モル比Nd/(Na+Nd)は、0~20%の範囲であり、そして
- 硬質セグメント比は、1~94%の範囲であり、硬質セグメント比は、HS=(Nb*Mb+Nc*Mc)/(Na*Ma+Nb*Mb+Nc*Mc+Nd*Md)で定義され、Ma、Mb、Mc及びMdは、それぞれ式(A)、(B)、(C)及び(D)の化合物の分子量を表す、
方法。 1. A process for the preparation of a polyurea or polyurethane organopolysiloxane block copolymer (I) having a silicone content of at least 90% by weight, based on the total weight of the organosiloxane block copolymer, comprising the steps of:
1) The following compound:
a) Formula (A):
b) Formula (B):
c) Formula (C):
d) optionally a compound of formula (D):
e) and a catalyst (E),
Providing
2) adding Nb moles of a chain extender of formula (B), Nc moles of at least one diisocyanate of formula (C), and optionally Nd moles of a branching agent of formula (D) to Na moles of a long chain hydroxyl or amino difunctionalized polysiloxane of formula (A);
In the formula,
-Q-, -T- and -X- are the same or different and finally represent a (C1-C20) alkylene group in which one or more -CH 2 - are replaced by -O-, or a (C6-C22) arylene group;
-M, -W and -Z are the same or different and represent -OH or -NHR', where -R' represents -H, a (C1-C10) alkyl group, or a (C6-22) aryl group;
-U represents a (C1-C20) alkyl group, in which one or more -CH 2 - are ultimately replaced by -O-, or a (C6-C22) aryl group;
--Y-- represents a (C1 to C36) alkylene group, a (C6 to C13) arylene group, or an organopolysiloxane;
-R1, -R2 and -R3 are the same or different and represent a (C1-C20) alkyl group which is ultimately substituted with one or more -F and/or -Cl groups;
a is an integer ranging from 30 to 1000,
b is an integer ranging from 2 to 15,
c is an integer ranging from 10 to 200,
d is an integer ranging from 10 to 200,
the ratio a/b ranges from 2 to 200;
the molar ratio Nb/(Na+Nb+Nd) is in the range of 5% to 60%;
the molar ratio Nc/(Na+Nb+Nc+Nd) is in the range of 45-55%;
the molar ratio Nd/(Na+Nd) is in the range of 0 to 20%, and the hard segment ratio is in the range of 1 to 94%, the hard segment ratio being defined as HS=(Nb*Mb+Nc*Mc)/(Na*Ma+Nb*Mb+Nc*Mc+Nd*Md), Ma, Mb, Mc and Md respectively represent the molecular weights of the compounds of formulae (A), (B), (C) and (D),
Method.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20315123 | 2020-04-06 | ||
EP20315123.8 | 2020-04-06 | ||
PCT/EP2021/058789 WO2021204720A1 (en) | 2020-04-06 | 2021-04-02 | Silicone-based thermoplastic materials for 3d-printing |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2023521354A JP2023521354A (en) | 2023-05-24 |
JPWO2021204720A5 true JPWO2021204720A5 (en) | 2024-04-12 |
Family
ID=70861389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022561084A Pending JP2023521354A (en) | 2020-04-06 | 2021-04-02 | Silicone-based thermoplastic materials for 3D printing |
Country Status (6)
Country | Link |
---|---|
US (1) | US20230151158A1 (en) |
EP (1) | EP4132994A1 (en) |
JP (1) | JP2023521354A (en) |
KR (1) | KR20220164728A (en) |
CN (1) | CN115397893B (en) |
WO (1) | WO2021204720A1 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114437548B (en) * | 2022-01-21 | 2022-12-27 | 芯体素(杭州)科技发展有限公司 | Moisture-heat dual-curing direct-writing type 3D printing medium, preparation method and application |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BR9608028A (en) * | 1995-04-25 | 1999-02-17 | Minnesota Mining & Mfg | Segmented copolymers of polyurea polydiorganosiloxane and processes for obtaining them and a release film |
US6441118B2 (en) * | 1996-04-25 | 2002-08-27 | 3M Innovative Properties Company | Polydiorganosiloxane oligourea segmented copolymers and a process for making same |
US6355759B1 (en) | 1996-04-25 | 2002-03-12 | 3M Innovative Properties Company | Polydiorganosiloxane polyurea segmented copolymers and a process for making same |
DE10313938A1 (en) * | 2003-03-27 | 2004-10-14 | Consortium für elektrochemische Industrie GmbH | Process for the preparation of organopolysiloxane copolymers and their use |
DE10313936A1 (en) * | 2003-03-27 | 2004-10-14 | Consortium für elektrochemische Industrie GmbH | Organopolysiloxane / polyurea / polyurethane block copolymers |
DE10326575A1 (en) * | 2003-06-12 | 2005-01-20 | Wacker-Chemie Gmbh | Organopolysiloxane / polyurea / polyurethane block copolymers |
ATE540065T1 (en) * | 2006-04-18 | 2012-01-15 | Henkel Ag & Co Kgaa | ORGANOSILICONE POLYUREA BASED POLYMERS, ELASTOMERS PRODUCED THEREOF AND THEIR USE |
CN102093702B (en) * | 2010-12-13 | 2012-10-17 | 成都大成塑胶有限公司 | Preparation method of thermoplastic polyurethane-polysiloxane block copolymer |
CN108137925B (en) * | 2015-09-10 | 2022-02-25 | 美国陶氏有机硅公司 | 3D printing method using thermoplastic silicone composition |
WO2017216034A1 (en) | 2016-06-17 | 2017-12-21 | Henkel Ag & Co. Kgaa | Polysiloxane based aerogels |
CN111621158B (en) * | 2019-12-23 | 2023-09-12 | 江苏集萃先进高分子材料研究所有限公司 | Piezoelectric silicon rubber material for selective laser sintering 3D printing and preparation method thereof |
-
2021
- 2021-04-02 WO PCT/EP2021/058789 patent/WO2021204720A1/en unknown
- 2021-04-02 EP EP21716416.9A patent/EP4132994A1/en active Pending
- 2021-04-02 KR KR1020227035591A patent/KR20220164728A/en active Search and Examination
- 2021-04-02 CN CN202180026663.9A patent/CN115397893B/en active Active
- 2021-04-02 US US17/917,077 patent/US20230151158A1/en active Pending
- 2021-04-02 JP JP2022561084A patent/JP2023521354A/en active Pending
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