JPWO2021106535A1 - - Google Patents

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Publication number
JPWO2021106535A1
JPWO2021106535A1 JP2021561265A JP2021561265A JPWO2021106535A1 JP WO2021106535 A1 JPWO2021106535 A1 JP WO2021106535A1 JP 2021561265 A JP2021561265 A JP 2021561265A JP 2021561265 A JP2021561265 A JP 2021561265A JP WO2021106535 A1 JPWO2021106535 A1 JP WO2021106535A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021561265A
Other versions
JP7309907B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2021106535A1 publication Critical patent/JPWO2021106535A1/ja
Application granted granted Critical
Publication of JP7309907B2 publication Critical patent/JP7309907B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00—Ethers; Compounds having groups, groups or groups
    • C07C43/02—Ethers
    • C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04—Saturated ethers
    • C07C43/13—Saturated ethers containing hydroxy or O-metal groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/02—Esters of acyclic saturated monocarboxylic acids having the carboxyl group bound to an acyclic carbon atom or to hydrogen
    • C07C69/12—Acetic acid esters
    • C07C69/14—Acetic acid esters of monohydroxylic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
JP2021561265A 2019-11-29 2020-11-09 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び、電子デバイスの製造方法 Active JP7309907B2 (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
JP2019217606 2019-11-29
JP2019217606 2019-11-29
JP2020054955 2020-03-25
JP2020054955 2020-03-25
JP2020107200 2020-06-22
JP2020107200 2020-06-22
JP2020145919 2020-08-31
JP2020145919 2020-08-31
PCT/JP2020/041714 WO2021106535A1 (ja) 2019-11-29 2020-11-09 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び、電子デバイスの製造方法

Publications (2)

Publication Number Publication Date
JPWO2021106535A1 true JPWO2021106535A1 (ja) 2021-06-03
JP7309907B2 JP7309907B2 (ja) 2023-07-18

Family

ID=76130172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021561265A Active JP7309907B2 (ja) 2019-11-29 2020-11-09 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、及び、電子デバイスの製造方法

Country Status (3)

Country Link
JP (1) JP7309907B2 (ja)
TW (1) TW202131099A (ja)
WO (1) WO2021106535A1 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021199841A1 (ja) * 2020-03-30 2021-10-07 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、パターン形成方法、レジスト膜、電子デバイスの製造方法
IL311594A (en) * 2021-09-29 2024-05-01 Fujifilm Corp A resin composition sensitive to radiation or an actinic beam and a method for producing a durable sample

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06324483A (ja) * 1993-05-11 1994-11-25 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JP2011022348A (ja) * 2009-07-15 2011-02-03 Jsr Corp 感放射線性樹脂組成物及びそれに用いられる重合体
JP2016135756A (ja) * 2014-12-15 2016-07-28 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 精製方法
WO2017175856A1 (ja) * 2016-04-08 2017-10-12 富士フイルム株式会社 処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法
WO2018003808A1 (ja) * 2016-06-30 2018-01-04 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子、素子を具備する表示装置、及び有機ｅｌディスプレイ

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06324483A (ja) * 1993-05-11 1994-11-25 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JP2011022348A (ja) * 2009-07-15 2011-02-03 Jsr Corp 感放射線性樹脂組成物及びそれに用いられる重合体
JP2016135756A (ja) * 2014-12-15 2016-07-28 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーＲｏｈｍ ａｎｄ Ｈａａｓ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ ＬＬＣ 精製方法
WO2017175856A1 (ja) * 2016-04-08 2017-10-12 富士フイルム株式会社 処理液、その製造方法、パターン形成方法及び電子デバイスの製造方法
WO2018003808A1 (ja) * 2016-06-30 2018-01-04 東レ株式会社 ネガ型感光性樹脂組成物、硬化膜、硬化膜を具備する素子、素子を具備する表示装置、及び有機ｅｌディスプレイ

Also Published As

Publication number Publication date
JP7309907B2 (ja) 2023-07-18
TW202131099A (zh) 2021-08-16
WO2021106535A1 (ja) 2021-06-03

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