JPWO2021100415A1 - - Google Patents

Info

Publication number
JPWO2021100415A1
JPWO2021100415A1 JP2021558243A JP2021558243A JPWO2021100415A1 JP WO2021100415 A1 JPWO2021100415 A1 JP WO2021100415A1 JP 2021558243 A JP2021558243 A JP 2021558243A JP 2021558243 A JP2021558243 A JP 2021558243A JP WO2021100415 A1 JPWO2021100415 A1 JP WO2021100415A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021558243A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021100415A1 publication Critical patent/JPWO2021100415A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K5/00—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary
    • F16K5/06—Plug valves; Taps or cocks comprising only cut-off apparatus having at least one of the sealing faces shaped as a more or less complete surface of a solid of revolution, the opening and closing movement being predominantly rotary with plugs having spherical surfaces; Packings therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
JP2021558243A 2019-11-21 2020-10-27 Pending JPWO2021100415A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019210568 2019-11-21
PCT/JP2020/040170 WO2021100415A1 (en) 2019-11-21 2020-10-27 Polycrystalline silicon production device and polycrystalline silicon production method

Publications (1)

Publication Number Publication Date
JPWO2021100415A1 true JPWO2021100415A1 (en) 2021-05-27

Family

ID=75981185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021558243A Pending JPWO2021100415A1 (en) 2019-11-21 2020-10-27

Country Status (3)

Country Link
JP (1) JPWO2021100415A1 (en)
TW (1) TW202134177A (en)
WO (1) WO2021100415A1 (en)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009123795A (en) * 2007-11-13 2009-06-04 Hitachi Kokusai Electric Inc Manufacturing method of semiconductor device and substrate treatment apparatus
JP5616029B2 (en) * 2009-03-17 2014-10-29 株式会社フジキン Regulating valve device
JP5699145B2 (en) * 2010-06-16 2015-04-08 信越化学工業株式会社 Belger cleaning method, method for producing polycrystalline silicon, and drying apparatus for bell jar
CN102120577A (en) * 2011-03-24 2011-07-13 天津大学 Pre-warming system and pre-warming method of polycrystalline silicon reduction furnace
CN203360011U (en) * 2013-07-15 2013-12-25 青海黄河上游水电开发有限责任公司新能源分公司 Device for conveying tail gas of hydrogen reduction furnaces
CN104999732A (en) * 2015-06-17 2015-10-28 苏州市大力电器有限公司 Antioxidant alloy material for sealing valve

Also Published As

Publication number Publication date
WO2021100415A1 (en) 2021-05-27
TW202134177A (en) 2021-09-16

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Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20230808