JPWO2021070491A1 - - Google Patents

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Publication number
JPWO2021070491A1
JPWO2021070491A1 JP2021550423A JP2021550423A JPWO2021070491A1 JP WO2021070491 A1 JPWO2021070491 A1 JP WO2021070491A1 JP 2021550423 A JP2021550423 A JP 2021550423A JP 2021550423 A JP2021550423 A JP 2021550423A JP WO2021070491 A1 JPWO2021070491 A1 JP WO2021070491A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021550423A
Other versions
JP7369786B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication of JPWO2021070491A1 publication Critical patent/JPWO2021070491A1/ja
Application granted granted Critical
Publication of JP7369786B2 publication Critical patent/JP7369786B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Polymerisation Methods In General (AREA)
JP2021550423A 2019-10-07 2020-08-25 ナノインプリント用光硬化性組成物 Active JP7369786B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019184217 2019-10-07
JP2019184217 2019-10-07
PCT/JP2020/031938 WO2021070491A1 (ja) 2019-10-07 2020-08-25 ナノインプリント用光硬化性組成物

Publications (2)

Publication Number Publication Date
JPWO2021070491A1 true JPWO2021070491A1 (ja) 2021-04-15
JP7369786B2 JP7369786B2 (ja) 2023-10-26

Family

ID=75437817

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021550423A Active JP7369786B2 (ja) 2019-10-07 2020-08-25 ナノインプリント用光硬化性組成物

Country Status (2)

Country Link
JP (1) JP7369786B2 (ja)
WO (1) WO2021070491A1 (ja)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008019292A (ja) * 2006-07-10 2008-01-31 Fujifilm Corp 光硬化性組成物およびそれを用いたパターン形成方法
JP2011162471A (ja) * 2010-02-09 2011-08-25 San Apro Kk スルホニウム塩,光酸発生剤,硬化性組成物及びポジ型フォトレジスト組成物
JP2014205624A (ja) * 2013-04-11 2014-10-30 サンアプロ株式会社 オニウムボレート塩系酸発生剤
JP2018056273A (ja) * 2016-09-28 2018-04-05 サンアプロ株式会社 光ナノインプリント用硬化性組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008019292A (ja) * 2006-07-10 2008-01-31 Fujifilm Corp 光硬化性組成物およびそれを用いたパターン形成方法
JP2011162471A (ja) * 2010-02-09 2011-08-25 San Apro Kk スルホニウム塩,光酸発生剤,硬化性組成物及びポジ型フォトレジスト組成物
JP2014205624A (ja) * 2013-04-11 2014-10-30 サンアプロ株式会社 オニウムボレート塩系酸発生剤
JP2018056273A (ja) * 2016-09-28 2018-04-05 サンアプロ株式会社 光ナノインプリント用硬化性組成物

Also Published As

Publication number Publication date
WO2021070491A1 (ja) 2021-04-15
JP7369786B2 (ja) 2023-10-26

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