JPWO2021070491A1 - - Google Patents
Info
- Publication number
- JPWO2021070491A1 JPWO2021070491A1 JP2021550423A JP2021550423A JPWO2021070491A1 JP WO2021070491 A1 JPWO2021070491 A1 JP WO2021070491A1 JP 2021550423 A JP2021550423 A JP 2021550423A JP 2021550423 A JP2021550423 A JP 2021550423A JP WO2021070491 A1 JPWO2021070491 A1 JP WO2021070491A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019184217 | 2019-10-07 | ||
JP2019184217 | 2019-10-07 | ||
PCT/JP2020/031938 WO2021070491A1 (ja) | 2019-10-07 | 2020-08-25 | ナノインプリント用光硬化性組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2021070491A1 true JPWO2021070491A1 (ja) | 2021-04-15 |
JP7369786B2 JP7369786B2 (ja) | 2023-10-26 |
Family
ID=75437817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021550423A Active JP7369786B2 (ja) | 2019-10-07 | 2020-08-25 | ナノインプリント用光硬化性組成物 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP7369786B2 (ja) |
WO (1) | WO2021070491A1 (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008019292A (ja) * | 2006-07-10 | 2008-01-31 | Fujifilm Corp | 光硬化性組成物およびそれを用いたパターン形成方法 |
JP2011162471A (ja) * | 2010-02-09 | 2011-08-25 | San Apro Kk | スルホニウム塩,光酸発生剤,硬化性組成物及びポジ型フォトレジスト組成物 |
JP2014205624A (ja) * | 2013-04-11 | 2014-10-30 | サンアプロ株式会社 | オニウムボレート塩系酸発生剤 |
JP2018056273A (ja) * | 2016-09-28 | 2018-04-05 | サンアプロ株式会社 | 光ナノインプリント用硬化性組成物 |
-
2020
- 2020-08-25 JP JP2021550423A patent/JP7369786B2/ja active Active
- 2020-08-25 WO PCT/JP2020/031938 patent/WO2021070491A1/ja active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008019292A (ja) * | 2006-07-10 | 2008-01-31 | Fujifilm Corp | 光硬化性組成物およびそれを用いたパターン形成方法 |
JP2011162471A (ja) * | 2010-02-09 | 2011-08-25 | San Apro Kk | スルホニウム塩,光酸発生剤,硬化性組成物及びポジ型フォトレジスト組成物 |
JP2014205624A (ja) * | 2013-04-11 | 2014-10-30 | サンアプロ株式会社 | オニウムボレート塩系酸発生剤 |
JP2018056273A (ja) * | 2016-09-28 | 2018-04-05 | サンアプロ株式会社 | 光ナノインプリント用硬化性組成物 |
Also Published As
Publication number | Publication date |
---|---|
WO2021070491A1 (ja) | 2021-04-15 |
JP7369786B2 (ja) | 2023-10-26 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20230308 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20230815 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230912 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20231010 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20231016 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7369786 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |