JPWO2021065280A1 - - Google Patents

Info

Publication number
JPWO2021065280A1
JPWO2021065280A1 JP2021550446A JP2021550446A JPWO2021065280A1 JP WO2021065280 A1 JPWO2021065280 A1 JP WO2021065280A1 JP 2021550446 A JP2021550446 A JP 2021550446A JP 2021550446 A JP2021550446 A JP 2021550446A JP WO2021065280 A1 JPWO2021065280 A1 JP WO2021065280A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021550446A
Other languages
Japanese (ja)
Other versions
JP7413394B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021065280A1 publication Critical patent/JPWO2021065280A1/ja
Application granted granted Critical
Publication of JP7413394B2 publication Critical patent/JP7413394B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • B41N1/14—Lithographic printing foils
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Materials For Photolithography (AREA)
JP2021550446A 2019-09-30 2020-08-28 On-press development type printing original plate, printing plate manufacturing method, and structure Active JP7413394B2 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2019180346 2019-09-30
JP2019180346 2019-09-30
JP2020107318 2020-06-22
JP2020107318 2020-06-22
PCT/JP2020/032788 WO2021065280A1 (en) 2019-09-30 2020-08-28 Original plate for on-press development type printing, fabrication method for printing plate, and structure

Publications (2)

Publication Number Publication Date
JPWO2021065280A1 true JPWO2021065280A1 (en) 2021-04-08
JP7413394B2 JP7413394B2 (en) 2024-01-15

Family

ID=75337946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021550446A Active JP7413394B2 (en) 2019-09-30 2020-08-28 On-press development type printing original plate, printing plate manufacturing method, and structure

Country Status (2)

Country Link
JP (1) JP7413394B2 (en)
WO (1) WO2021065280A1 (en)

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005112382A (en) * 2003-10-06 2005-04-28 Fuji Photo Film Co Ltd Method for packaging lithographic printing plate
CN104742557A (en) * 2013-12-30 2015-07-01 乐凯华光印刷科技有限公司 Water-developable chemistry-free thermosensitive board and preparation method thereof
WO2018181993A1 (en) * 2017-03-31 2018-10-04 富士フイルム株式会社 Planographic printing plate precursor and production method therefor, planographic printing plate precursor laminate, planographic printing plate-making method, and planographic printing method
JP6461447B1 (en) * 2017-09-29 2019-01-30 富士フイルム株式会社 Planographic printing plate precursor, lithographic printing plate preparation method and lithographic printing method
WO2019044431A1 (en) * 2017-08-31 2019-03-07 富士フイルム株式会社 Method for producing lithographic printing plate
WO2019045084A1 (en) * 2017-08-31 2019-03-07 富士フイルム株式会社 Printing plate and printing plate laminate body
WO2019044700A1 (en) * 2017-08-30 2019-03-07 富士フイルム株式会社 On-press developing type lithographic printing plate precursor and method for making lithographic printing plate

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005112382A (en) * 2003-10-06 2005-04-28 Fuji Photo Film Co Ltd Method for packaging lithographic printing plate
CN104742557A (en) * 2013-12-30 2015-07-01 乐凯华光印刷科技有限公司 Water-developable chemistry-free thermosensitive board and preparation method thereof
WO2018181993A1 (en) * 2017-03-31 2018-10-04 富士フイルム株式会社 Planographic printing plate precursor and production method therefor, planographic printing plate precursor laminate, planographic printing plate-making method, and planographic printing method
WO2019044700A1 (en) * 2017-08-30 2019-03-07 富士フイルム株式会社 On-press developing type lithographic printing plate precursor and method for making lithographic printing plate
WO2019044431A1 (en) * 2017-08-31 2019-03-07 富士フイルム株式会社 Method for producing lithographic printing plate
WO2019045084A1 (en) * 2017-08-31 2019-03-07 富士フイルム株式会社 Printing plate and printing plate laminate body
JP6461447B1 (en) * 2017-09-29 2019-01-30 富士フイルム株式会社 Planographic printing plate precursor, lithographic printing plate preparation method and lithographic printing method

Also Published As

Publication number Publication date
WO2021065280A1 (en) 2021-04-08
JP7413394B2 (en) 2024-01-15

Similar Documents

Publication Publication Date Title
BR112021017339A2 (en)
BR112021018450A2 (en)
BR112021017939A2 (en)
BR112021017738A2 (en)
BR112021017892A2 (en)
BR112021017782A2 (en)
BR112021017637A2 (en)
BR112019016138A2 (en)
BR112021017728A2 (en)
BR112021018452A2 (en)
BR112021017355A2 (en)
BR112021017703A2 (en)
BR112021018102A2 (en)
BR112021017173A2 (en)
BR112021018584A2 (en)
BR112021017083A2 (en)
BR112021018250A2 (en)
BR112021017234A2 (en)
BR112021018084A2 (en)
BR112021018093A2 (en)
BR112021018484A2 (en)
BR112021017732A2 (en)
BR112021017949A2 (en)
BR112021017983A2 (en)
BR112021017310A2 (en)

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220225

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230221

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230424

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230801

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20230928

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20231212

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20231227

R150 Certificate of patent or registration of utility model

Ref document number: 7413394

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150