JPWO2021060182A1 - - Google Patents

Info

Publication number
JPWO2021060182A1
JPWO2021060182A1 JP2020551436A JP2020551436A JPWO2021060182A1 JP WO2021060182 A1 JPWO2021060182 A1 JP WO2021060182A1 JP 2020551436 A JP2020551436 A JP 2020551436A JP 2020551436 A JP2020551436 A JP 2020551436A JP WO2021060182 A1 JPWO2021060182 A1 JP WO2021060182A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2020551436A
Other languages
Japanese (ja)
Other versions
JPWO2021060182A5 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2021060182A1 publication Critical patent/JPWO2021060182A1/ja
Publication of JPWO2021060182A5 publication Critical patent/JPWO2021060182A5/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • H01L21/225Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Photovoltaic Devices (AREA)
JP2020551436A 2019-09-26 2020-09-18 Pending JPWO2021060182A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019175316 2019-09-26
PCT/JP2020/035439 WO2021060182A1 (en) 2019-09-26 2020-09-18 Impurity diffusion composition, method for manufacturing semiconductor element using same, and method for manufacturing solar cell

Publications (2)

Publication Number Publication Date
JPWO2021060182A1 true JPWO2021060182A1 (en) 2021-04-01
JPWO2021060182A5 JPWO2021060182A5 (en) 2023-06-12

Family

ID=75165758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020551436A Pending JPWO2021060182A1 (en) 2019-09-26 2020-09-18

Country Status (4)

Country Link
JP (1) JPWO2021060182A1 (en)
CN (1) CN114342101A (en)
TW (1) TW202112950A (en)
WO (1) WO2021060182A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115148848A (en) * 2022-06-27 2022-10-04 常州时创能源股份有限公司 Chain type phosphorus source for impurity absorption and preparation method and application thereof
WO2024057722A1 (en) * 2022-09-16 2024-03-21 東レ株式会社 Impurity diffusion composition, method for producing semiconductor element using same, and method for producing solar cell

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4481869B2 (en) * 2005-04-26 2010-06-16 信越半導体株式会社 SOLAR CELL MANUFACTURING METHOD, SOLAR CELL, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
WO2012161107A1 (en) * 2011-05-20 2012-11-29 日本合成化学工業株式会社 Coating liquid for diffusing impurity
JP2016195203A (en) * 2015-04-01 2016-11-17 東レ株式会社 P-type impurity diffusion composition, method of manufacturing semiconductor element using the same, and solar cell
JP2017103379A (en) * 2015-12-03 2017-06-08 東レ株式会社 Impurity diffusing composition and manufacturing method of semiconductor device using the same
JP7172994B2 (en) * 2018-03-16 2022-11-16 東レ株式会社 Impurity diffusion composition, method for producing semiconductor device using same, and method for producing solar cell
JP7459511B2 (en) * 2018-12-07 2024-04-02 東レ株式会社 Method for manufacturing semiconductor device and method for manufacturing solar cell

Also Published As

Publication number Publication date
CN114342101A (en) 2022-04-12
WO2021060182A1 (en) 2021-04-01
TW202112950A (en) 2021-04-01

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Legal Events

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