JPWO2021013853A5 - - Google Patents
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- JPWO2021013853A5 JPWO2021013853A5 JP2022503933A JP2022503933A JPWO2021013853A5 JP WO2021013853 A5 JPWO2021013853 A5 JP WO2021013853A5 JP 2022503933 A JP2022503933 A JP 2022503933A JP 2022503933 A JP2022503933 A JP 2022503933A JP WO2021013853 A5 JPWO2021013853 A5 JP WO2021013853A5
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- ray
- tube voltage
- electron beam
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- electrons
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Claims (15)
電子ビームを放出するためのカソードと、
前記電子ビームを少なくとも部分的に放射X線に変換するためのアノードと、
前記電子ビームの電子が前記アノード上に衝突する衝突角度を制御する電子光学系と、
前記カソードと前記アノードとの間に第1の管電圧及び第2の管電圧を印加する電源であって、前記第2の管電圧は前記第1の管電圧よりも高い、電源と、
前記電子光学系に動作可能に結合された制御回路と、
を含み、
前記制御回路は、前記第1の管電圧が印加されるときに、前記第1のエネルギースペクトルの放射X線を生成するために、前記電子ビームの前記電子が、第1の平均衝突角度で前記アノード上に衝突し、前記第2の管電圧が印加されるときに、前記第2のエネルギースペクトルの放射X線を生成するために、前記電子ビームの前記電子が、第2の平均衝突角度で前記アノード上に衝突するように前記電子光学系を制御し、
前記第2の平均衝突角度は、前記第1の平均衝突角度よりも小さい、X線源。 An X-ray source for producing X-ray radiation of a first energy spectrum and a second energy spectrum, comprising:
a cathode for emitting an electron beam;
an anode for at least partially converting the electron beam into X-ray radiation;
an electron optical system for controlling a collision angle at which electrons of the electron beam impinge on the anode;
a power supply that applies a first tube voltage and a second tube voltage between the cathode and the anode, wherein the second tube voltage is higher than the first tube voltage;
a control circuit operably coupled to the electron optical system;
including
The control circuit is configured to cause the electrons of the electron beam to generate radiation X-rays of the first energy spectrum when the first tube voltage is applied, so that the electrons of the electron beam collide at the first average impingement angle. said electrons of said electron beam at a second average impingement angle to produce emitted x-rays of said second energy spectrum when impinging on an anode and said second tube voltage being applied; controlling the electron optics to impinge on the anode;
The X-ray source, wherein the second average impingement angle is less than the first average impingement angle.
前記第1の表面セクションは、前記第2の表面セクションに重なる、請求項1又は2に記載のX線源。 The electrons of the electron beam impinge on a first surface section of the anode when the first tube voltage is applied, and of the anode when the second tube voltage is applied. impinging on the second surface section;
3. An X-ray source according to claim 1 or 2, wherein the first surface section overlaps the second surface section.
前記制御回路は、前記電源を前記第1の管電圧から前記第2の管電圧へ切り替えることに応じて、前記第1の偏向デバイスを前記第1の状態から前記第2の状態に切り替え、
前記第1の偏向デバイスが前記第2の状態にあるときに、前記第1の偏向デバイス及び前記第2の偏向デバイスは、前記電子ビームの偏向を提供する、請求項1から4のいずれか一項に記載のX線源。 the electro-optical system includes a first deflection device and a second deflection device, the first deflection device switchable between a first state and a second state;
the control circuit switches the first deflection device from the first state to the second state in response to switching the power supply from the first tube voltage to the second tube voltage;
5. Any one of claims 1 to 4, wherein the first deflection device and the second deflection device provide deflection of the electron beam when the first deflection device is in the second state. X-ray source according to paragraph.
前記制御回路は、前記電源を前記第1の管電圧から前記第2の管電圧へ切り替えることに応じて、前記電子光学系を前記第3の状態から前記第4の状態に切り替え、
前記第4の状態では、前記デフォーカスデバイスが最初に前記電子ビームの広がりを提供し、その後前記フォーカスデバイスが前記広げられた電子ビームの集束を提供する、請求項1から5のいずれか一項に記載のX線源。 The electron optical system includes a focus device and a defocus device, the electron optical system is switchable between a third state and a fourth state,
The control circuit switches the electron optical system from the third state to the fourth state in response to switching the power supply from the first tube voltage to the second tube voltage,
6. Any one of claims 1 to 5, wherein in said fourth state said defocusing device first provides divergence of said electron beam and thereafter said focusing device provides focusing of said diverged electron beam. X-ray source according to .
前記基板は、放射X線を生成する第1の材料を含み、
前記第1のコーティング層は、放射X線及び前記電子ビームの前記電子を透過させる第2の材料を含み、
前記第2のコーティング層は、放射X線を生成する第3の材料を含み、
前記第2のコーティング層内で生成された放射X線をフィルタリングするために、前記第2のコーティング層にX線フィルタが取り付けられている、請求項1から7のいずれか一項に記載のX線源。 The anode includes a substrate at least partially coated with a first coating layer and a second coating layer, the first coating layer disposed between the second coating layer and the substrate. ,
the substrate comprises a first material that produces X-ray radiation;
wherein the first coating layer comprises a second material transparent to radiation X-rays and the electrons of the electron beam;
the second coating layer comprises a third material that produces X-ray radiation;
X according to any one of claims 1 to 7, wherein an X-ray filter is attached to said second coating layer for filtering X-ray radiation generated in said second coating layer. source.
前記第1のコーティング層の前記第2の材料は、ダイヤモンドであり、
前記第2のコーティング層の前記第3の材料は、タングステンであり、
前記X線フィルタは、モリブデンを含む、請求項8に記載のX線源。 the first material of the substrate is rhenium;
the second material of the first coating layer is diamond;
the third material of the second coating layer is tungsten;
9. The x-ray source of claim 8, wherein the x-ray filter comprises molybdenum.
X線検出器と、
を含み、
前記X線検出器は、前記X線源から放出される放射X線を受け取るように配置されている、X線イメージングシステム。 an X-ray source according to any one of claims 1 to 10;
an X-ray detector;
including
An X-ray imaging system, wherein the X-ray detector is arranged to receive X-ray radiation emitted from the X-ray source.
前記検出器制御回路は、前記X線検出器を制御して、前記X線源の前記カソードと前記アノードとの間に前記第1の管電圧が印加されるときに第1の画像データを生成させ、前記第2の管電圧が印加されるときに第2の画像データを生成させ、
前記第1の画像データを生成するための積分期間が、前記第2の画像データを生成するための積分期間と比較して、同じ時間間隔を有する、請求項11に記載のX線イメージングシステム。 further comprising a detector control circuit;
The detector control circuit controls the X-ray detector to generate first image data when the first tube voltage is applied between the cathode and the anode of the X-ray source. to generate second image data when the second tube voltage is applied;
12. The X-ray imaging system of claim 11, wherein an integration period for generating said first image data has the same time interval as compared to an integration period for generating said second image data.
前記第1のエネルギースペクトルの放射X線を生成するステップは、
前記電源によって、第1の管電圧を印加するステップと、
前記制御回路によって、前記第1のエネルギースペクトルの放射X線を生成するために、前記電子ビームの前記電子が第1の平均衝突角度で前記アノード上に衝突するように前記電子光学系を制御するステップと、
を含み、
前記第2のエネルギースペクトルの放射X線を生成するステップは、
前記電源によって、第2の管電圧を印加するステップであって、前記第2の管電圧は前記第1の管電圧よりも高い、印加するステップと、
前記制御回路によって、前記第2のエネルギースペクトルの放射X線を生成するために、前記電子ビームの前記電子が第2の平均衝突角度で前記アノード上に衝突するように前記電子光学系を制御するステップであって、前記第2の平均衝突角度は、前記第1の平均衝突角度よりも小さい、制御するステップと、
を含む、方法。 a cathode for emitting an electron beam, an anode for at least partially converting said electron beam into X-ray radiation, a power supply for applying a tube voltage between said cathode and said anode, said electrons a first energy spectrum using an x-ray source including electron optics for controlling the impingement angle at which electrons of a beam impinge on said anode; and control circuitry operatively coupled to said electron optics. and a method for producing radiation x-rays of a second energy spectrum, comprising:
generating x-ray radiation of the first energy spectrum,
applying a first tube voltage with the power source;
The control circuit controls the electron optics such that the electrons of the electron beam impinge on the anode at a first average impingement angle to produce x-ray radiation of the first energy spectrum. a step;
including
generating x-ray radiation of the second energy spectrum,
applying a second tube voltage by the power supply, wherein the second tube voltage is higher than the first tube voltage;
The control circuit controls the electron optics such that the electrons of the electron beam impinge on the anode at a second average impingement angle to produce radiation x-rays of the second energy spectrum. the step of controlling, wherein the second average impact angle is less than the first average impact angle;
A method, including
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP19187558.2A EP3770943A1 (en) | 2019-07-22 | 2019-07-22 | Balancing x-ray output for dual energy x-ray imaging systems |
EP19187558.2 | 2019-07-22 | ||
PCT/EP2020/070591 WO2021013853A1 (en) | 2019-07-22 | 2020-07-21 | Balancing x-ray output for dual energy x-ray imaging systems |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2022541912A JP2022541912A (en) | 2022-09-28 |
JPWO2021013853A5 true JPWO2021013853A5 (en) | 2023-07-28 |
Family
ID=67438370
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2022503933A Pending JP2022541912A (en) | 2019-07-22 | 2020-07-21 | X-ray output balancing for dual-energy X-ray imaging systems |
Country Status (5)
Country | Link |
---|---|
US (1) | US20220277919A1 (en) |
EP (2) | EP3770943A1 (en) |
JP (1) | JP2022541912A (en) |
CN (1) | CN114402411A (en) |
WO (1) | WO2021013853A1 (en) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4685118A (en) * | 1983-11-10 | 1987-08-04 | Picker International, Inc. | X-ray tube electron beam switching and biasing method and apparatus |
US6421420B1 (en) * | 1998-12-01 | 2002-07-16 | American Science & Engineering, Inc. | Method and apparatus for generating sequential beams of penetrating radiation |
US7197116B2 (en) * | 2004-11-16 | 2007-03-27 | General Electric Company | Wide scanning x-ray source |
JP2013509684A (en) * | 2009-10-28 | 2013-03-14 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | Switching of anode potential of X-ray generator |
JP5951624B2 (en) * | 2010-11-08 | 2016-07-13 | コーニンクレッカ フィリップス エヌ ヴェKoninklijke Philips N.V. | Judgment of change in X-ray emission yield of X-ray light source |
US8483361B2 (en) * | 2010-12-22 | 2013-07-09 | General Electric Company | Anode target for an x-ray tube and method for controlling the x-ray tube |
-
2019
- 2019-07-22 EP EP19187558.2A patent/EP3770943A1/en not_active Withdrawn
-
2020
- 2020-07-21 US US17/628,615 patent/US20220277919A1/en active Pending
- 2020-07-21 EP EP20740352.8A patent/EP4004960A1/en active Pending
- 2020-07-21 JP JP2022503933A patent/JP2022541912A/en active Pending
- 2020-07-21 WO PCT/EP2020/070591 patent/WO2021013853A1/en unknown
- 2020-07-21 CN CN202080052855.2A patent/CN114402411A/en active Pending
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