JPWO2021004963A5 - - Google Patents

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Publication number
JPWO2021004963A5
JPWO2021004963A5 JP2021571950A JP2021571950A JPWO2021004963A5 JP WO2021004963 A5 JPWO2021004963 A5 JP WO2021004963A5 JP 2021571950 A JP2021571950 A JP 2021571950A JP 2021571950 A JP2021571950 A JP 2021571950A JP WO2021004963 A5 JPWO2021004963 A5 JP WO2021004963A5
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Japan
Prior art keywords
sensing
air chamber
segments
combined
contamination
Prior art date
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Pending
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JP2021571950A
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Japanese (ja)
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JP2022537651A (en
Publication date
Priority claimed from EP19197165.4A external-priority patent/EP3791934A1/en
Application filed filed Critical
Priority claimed from PCT/EP2020/068881 external-priority patent/WO2021004963A1/en
Publication of JP2022537651A publication Critical patent/JP2022537651A/en
Publication of JPWO2021004963A5 publication Critical patent/JPWO2021004963A5/ja
Pending legal-status Critical Current

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Claims (15)

マスクが着用されるとき、外壁とユーザの顔との間に空気チャンバを画定するための前記外壁、
前記空気チャンバと、前記空気チャンバの外側の周囲環境との間に境界を形成するフィルタ、
前記ユーザの呼吸サイクルの吸気及び呼気部分を検出するための検出回路、
前記空気チャンバ内で検知し、検知結果を提供するための粒子又は汚染用センサ、
タイマー、及び
制御器
を有する汚染用マスクにおいて、前記制御器は、
前記タイマーを使用して、複数の吸気部分の組み合わせた持続時間を測定し、個別の吸気部分に関する吸気検知結果を得ることなく、目標とする組み合わせた持続時間の単一の組み合わせた吸気検知結果を得るのに十分なデータを取得するために、前記検出回路から、前記複数の吸気部分に関して検知結果を組み合わせ及び/又は
前記タイマーを使用して、複数の呼気部分の組み合わせた持続時間を測定し、個別の呼気部分に関する呼気検知結果を得ることなく、目標とする組み合わせた持続時間の単一の組み合わせた呼気検知結果を得るのに十分なデータを取得するために、前記検出回路から、前記複数の呼気部分に関して検知結果を組み合わせ
ように適応する、汚染用マスク。
said outer wall for defining an air chamber between the outer wall and the user's face when the mask is worn;
a filter forming a boundary between the air chamber and the ambient environment outside the air chamber;
detection circuitry for detecting the inspiratory and expiratory portions of the user's breathing cycle;
a particle or contamination sensor for sensing within said air chamber and providing a sensing result;
A contamination mask comprising a timer and a controller, the controller comprising:
The timer is used to measure the combined duration of multiple inspiratory segments to obtain a single combined inspiratory sensing result of a target combined duration without obtaining inspiratory sensing results for individual inspiratory segments. combining the sensing results for the plurality of inhalation segments from the sensing circuit and /or using the timer to measure the combined duration of the plurality of exhalation segments to obtain sufficient data to obtain , the plurality of Combining detection results for the expiratory portion of
A mask for contamination, adapted to
前記空気チャンバの外側から前記空気チャンバ内に空気を吸い込む、及び/又は前記空気チャンバ内から前記空気チャンバの外側に空気を吸い出すためのファンをさらに有する、請求項1に記載の汚染用マスク。 2. A contamination mask according to claim 1, further comprising a fan for drawing air from outside the air chamber into the air chamber and/or for drawing air from inside the air chamber to the outside of the air chamber. 前記検出回路は、前記空気チャンバ内の圧力に基づいて、吸気及び呼気部分を検出するための回路である請求項1又は2に記載の汚染用マスク。 3. A pollution mask according to claim 1 or 2, wherein the detection circuit is a circuit for detecting inspiratory and expiratory portions based on the pressure within the air chamber. 前記検出回路は、
圧力センサ、又は
ファンの速度が圧力測定の代理として使用されるように、前記ファンの回転速度を決定する手段、及び前記ファンの回転速度から前記空気チャンバと前記周囲環境との間の圧力を得るように適応する制御器
を有する、請求項3に記載の汚染用マスク。
The detection circuit is
a pressure sensor or means for determining the rotational speed of the fan so that the speed of the fan is used as a proxy for the pressure measurement, and from the rotational speed of the fan the pressure between the air chamber and the ambient environment is obtained. 4. A pollution mask according to claim 3, having a controller adapted to:
前記制御器は、
複数の呼吸サイクル中、連続的に検知結果を収集し、並びに
前記複数の吸気部分に関する検知結果のサブセットを作成し、組み合わせた吸気検知結果を得る、及び/又は
前記複数の呼気部分に関する検知結果のサブセットを作成し、組み合わせた呼気検知結果を得る
ように適応する、請求項1乃至4の何れか一項に記載の汚染用マスク。
The controller is
collecting sensing results continuously during a plurality of respiratory cycles; and creating subsets of sensing results for the plurality of inspiratory segments to obtain combined inspiratory sensing results; 5. A pollution mask according to any one of claims 1 to 4 adapted to create subsets and obtain combined breath detection results.
前記制御器は、
前記複数の吸気部分に対応する選択された時間に検知を行い、組み合わせた吸気検知結果を得る、及び/又は
前記複数の呼気部分に対応する選択された時間に検知を行い、組み合わせた呼気検知結果を得る
ように適応する、請求項1乃至4の何れか一項に記載の汚染用マスク。
The controller is
performing sensing at selected times corresponding to the plurality of inhalation segments to obtain a combined inhalation sensing result; and/or performing sensing at selected times corresponding to the plurality of exhalation segments to obtain a combined exhalation sensing result. 5. A contamination mask according to any one of the preceding claims, adapted to obtain a
前記制御器は、
下方圧力しきい値を実施し、前記下方圧力しきい値より下の吸気部分が識別される、及び/又は
上方圧力しきい値を実施し、前記上方圧力しきい値より上の呼気部分が識別される
ように適応する、請求項1乃至6の何れか一項に記載の汚染用マスク。
The controller is
performing a lower pressure threshold, wherein an inspiratory portion below said lower pressure threshold is identified; and/or performing an upper pressure threshold, wherein an expiratory portion above said upper pressure threshold is identified. 7. A contamination mask according to any one of claims 1 to 6, adapted to be worn.
前記下方及び/又は上方圧力しきい値は、呼吸速度に応じて設定される、又は
前記下方及び/又は上方圧力しきい値は、先行する吸気及び/又は呼気部分中の前記空気チャンバ内の圧力に基づいて動的に適応する、
請求項7に記載の汚染用マスク。
said lower and/or upper pressure threshold is set depending on breathing rate, or said lower and/or upper pressure threshold is the pressure in said air chamber during preceding inspiration and/or expiration portions dynamically adapt based on the
A contamination mask according to claim 7 .
前記粒子又は汚染用センサは、光散乱に基づくセンサを有する、請求項1乃至8の何れか一項に記載の汚染用マスク。 9. A contamination mask according to any preceding claim, wherein the particle or contamination sensor comprises a sensor based on light scattering. 前記フィルタは、前記空気チャンバの外壁を有する、請求項1乃至9の何れか一項に記載の汚染用マスク。 10. A contamination mask according to any preceding claim, wherein the filter comprises an outer wall of the air chamber. 汚染用マスクの空気チャンバ内の粒子又は汚染レベルを測定する方法において、
ユーザの呼吸サイクルの吸気及び呼気部分を検出するステップ、
前記マスクの空気チャンバ内の粒子又は汚染レベルを検知するステップ、並びに
複数の吸気部分の組み合わせた持続時間を測定し、個別の吸気部分に関する吸気検知結果を得ることなく、目標とする組み合わせた持続時間の単一の組み合わせた吸気検知結果を得るのに十分なデータを取得するために、前記複数の吸気部分に関して検知結果を組み合わせステップ、及び/又は
複数の呼気部分の組み合わせた持続時間を測定し、個別の呼気部分に関する呼気検知結果を得ることなく、目標とする組み合わせた持続時間の単一の組み合わせた呼気検知結果を得るのに十分なデータを取得するために、前記複数の呼気部分に関して検知結果を組み合わせステップ
を有する方法。
A method for measuring particle or contamination levels in an air chamber of a contamination mask comprising the steps of:
detecting the inspiratory and expiratory portions of the user's breathing cycle;
sensing the level of particles or contamination in the air chamber of the mask; and measuring the combined duration of multiple inspiration segments to achieve a target combined duration without obtaining an inspiration sensing result for each individual inspiration segment. and/or measuring the combined duration of the multiple exhalation segments to obtain sufficient data to obtain a single combined inspiration sensing result of , sensing for the plurality of exhalation segments to obtain sufficient data to obtain a single combined exhalation detection result of a target combined duration without obtaining exhalation detection results for individual exhalation segments. A method comprising the step of combining results.
複数の呼吸サイクル中、連続的に検知結果を収集するステップ、並びに
前記複数の吸気部分に関する検知結果のサブセットを作成し、組み合わせた吸気検知結果を得るステップ、及び/又は、
前記複数の呼気部分に関する検知結果のサブセットを作成し、組み合わせた呼気検知結果を得るステップ
を有する請求項11に記載の方法。
continuously collecting sensing results during a plurality of respiratory cycles; and creating a subset of sensing results for the plurality of inspiration segments to obtain a combined inspiration sensing result; and/or
12. The method of claim 11, comprising creating a subset of detection results for the plurality of breath portions to obtain a combined breath detection result.
前記複数の吸気部分に対応する選択された時間に検知を行い、組み合わせた吸気検知結果を得るステップ、及び/又は
前記複数の呼気部分に対応する選択された時間に検知を行い、組み合わせた呼気検知結果を得るステップ
を有する、請求項11に記載の方法。
performing sensing at selected times corresponding to said plurality of inspiratory segments and obtaining combined inspiration sensing results; and/or performing sensing at selected times corresponding to said plurality of exhalation segments and obtaining combined exhalation sensing. 12. The method of claim 11, comprising obtaining a result.
下方圧力しきい値を実施し、前記下方圧力しきい値より下の吸気部分が識別されるステップ、及び/又は
上方圧力しきい値を実施し、前記上方圧力しきい値より上の呼気部分が識別されるステップ
を有する、請求項11乃至13の何れか一項に記載の方法。
performing a lower pressure threshold, wherein an inspiration portion below said lower pressure threshold is identified; and/or performing an upper pressure threshold, wherein an expiration portion above said upper pressure threshold is identified. 14. A method according to any one of claims 11 to 13, comprising identified steps.
前記下方及び/又は上方圧力しきい値は、呼吸速度に応じて設定される、又は
前記下方及び/又は上方圧力しきい値は、先行する吸気及び/又は呼気部分中の前記空気チャンバ内の圧力に基づいて動的に適応する、
請求項14に記載の方法。
said lower and/or upper pressure threshold is set depending on breathing rate, or said lower and/or upper pressure threshold is the pressure in said air chamber during preceding inspiration and/or expiration portions dynamically adapt based on the
15. The method of claim 14.
JP2021571950A 2019-07-05 2020-07-03 Contamination mask with contamination detection Pending JP2022537651A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
CNPCT/CN2019/094920 2019-07-05
CN2019094920 2019-07-05
EP19197165.4A EP3791934A1 (en) 2019-09-13 2019-09-13 A pollution mask with pollution sensing
EP19197165.4 2019-09-13
PCT/EP2020/068881 WO2021004963A1 (en) 2019-07-05 2020-07-03 A pollution mask with pollution sensing

Publications (2)

Publication Number Publication Date
JP2022537651A JP2022537651A (en) 2022-08-29
JPWO2021004963A5 true JPWO2021004963A5 (en) 2023-05-19

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Application Number Title Priority Date Filing Date
JP2021571950A Pending JP2022537651A (en) 2019-07-05 2020-07-03 Contamination mask with contamination detection

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EP (1) EP3993877A1 (en)
JP (1) JP2022537651A (en)
CN (1) CN114080257B (en)
WO (1) WO2021004963A1 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7118323B1 (en) * 2022-02-07 2022-08-15 三菱電機株式会社 RESPIRATORY SENSOR AND EXPIRATION INSPIRATION DETECTION METHOD

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016157159A1 (en) * 2015-04-03 2016-10-06 Microsfere Pte. Ltd. Respiratory masks, systems and methods
CN104922822A (en) * 2015-04-08 2015-09-23 杨海丹 Mask
BR112018015701A2 (en) * 2016-02-01 2019-02-19 Advanced Ventilation Applications, Inc. systems and methods for respiratory health management
EP3503977A1 (en) * 2016-08-24 2019-07-03 Koninklijke Philips N.V. Breathing mask with increased user comfort
US10065471B2 (en) * 2017-01-31 2018-09-04 Nhk Spring Co., Ltd. Coil spring for vehicle suspension
EP3406301A1 (en) * 2017-05-22 2018-11-28 Koninklijke Philips N.V. A mask-based breathing apparatus and control method
EP3630247B1 (en) 2017-05-22 2020-12-09 Koninklijke Philips N.V. A pollution mask and control method

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