JPWO2021001757A5 - - Google Patents

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Publication number
JPWO2021001757A5
JPWO2021001757A5 JP2021577578A JP2021577578A JPWO2021001757A5 JP WO2021001757 A5 JPWO2021001757 A5 JP WO2021001757A5 JP 2021577578 A JP2021577578 A JP 2021577578A JP 2021577578 A JP2021577578 A JP 2021577578A JP WO2021001757 A5 JPWO2021001757 A5 JP WO2021001757A5
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JP
Japan
Prior art keywords
circuit board
circuit
rigid substrate
contact pads
flexible base
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Pending
Application number
JP2021577578A
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Japanese (ja)
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JP2022540796A (en
Publication date
Priority claimed from GB1909557.9A external-priority patent/GB2585219A/en
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Publication of JP2022540796A publication Critical patent/JP2022540796A/en
Publication of JPWO2021001757A5 publication Critical patent/JPWO2021001757A5/ja
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Claims (14)

複数の接点を有する回路構成要素を実装及び冷却する方法であって、以下のステップ、すなわち、
(i)熱伝導性でかつ電気絶縁性の材料でできている硬質基板を準備するステップと、
(ii)電気絶縁性の可撓性基部と、前記可撓性基部上にあり前記回路構成要素を制御回路及びドライバ回路に接続する電気伝導性のトレースと、を有する回路基板を準備するステップであって、前記トレースはそれぞれ、前記回路構成要素のそれぞれの接点と位置合わせするように配置されるそれぞれのコンタクトパッドで終端する、ステップと、
(iii)前記回路基板の前記可撓性基部に止まり穴を形成するステップであって、それぞれの止まり穴は、前記回路基板において前記硬質基板に対面する側にある、前記可撓性基部上における前記コンタクトパッドのそれぞれ1つで終端する、ステップと、
(iv)前記コンタクトパッドにおいて前記止まり穴によって露出している側にめっきを施し、少なくとも1つの金属材料を大きくして、前記回路基板の前記可撓性基部における前記止まり穴を充填し、それによって、前記可撓性基部の両面間で延在する電気的及び熱的に伝導性のビアを形成するステップと、
(v)前記回路基板上の前記コンタクトパッドの少なくとも一部を、前記回路基板において前記硬質基板に対面する側に配置して、前記回路基板を前記硬質基板に固定するステップと、
(vi)前記回路基板において前記硬質基板に対面する側にある前記コンタクトパッドの少なくとも一部を前記硬質基板に接合し、接合された前記コンタクトパッドと前記硬質基板との間で熱接触を確立するステップと、
(vii)前記可撓性基部を有する前記回路基板が前記回路構成要素と前記硬質基板の間に存在するように、前記回路構成要素を前記回路基板に配置するステップと、
(viii)前記回路構成要素の前記接点を前記ビアにはんだ付けして、前記回路構成要素の前記接点と前記回路基板上の前記トレースとの間に電気的接続を、前記回路構成要素の前記接点の少なくとも一部と前記硬質基板との間に熱的接続を確立するステップと、
を含む、方法。
A method of mounting and cooling a circuit component having multiple contacts, comprising the steps of:
(i) providing a rigid substrate made of a thermally conductive and electrically insulating material;
(ii) providing a circuit board having an electrically insulating flexible base and electrically conductive traces on the flexible base connecting the circuit components to control and driver circuits; each of said traces terminating in a respective contact pad positioned to align with a respective contact of said circuit component;
(iii) forming blind holes in the flexible base of the circuit board, each blind hole on the flexible base on the side of the circuit board facing the rigid substrate; terminating at each one of said contact pads;
(iv) plating the side of the contact pad exposed by the blind hole and enlarging at least one metallic material to fill the blind hole in the flexible base of the circuit board, thereby forming an electrically and thermally conductive via extending between opposite sides of the flexible base;
( v ) positioning at least a portion of the contact pads on the circuit board on the side of the circuit board facing the rigid board to secure the circuit board to the rigid board;
( vi ) bonding at least a portion of the contact pads on the side of the circuit board facing the rigid substrate to the rigid substrate to establish thermal contact between the bonded contact pads and the rigid substrate; a step;
(vii) placing the circuit component on the circuit board such that the circuit board with the flexible base resides between the circuit component and the rigid substrate;
(viii) soldering the contacts of the circuit component to the vias to provide electrical connections between the contacts of the circuit component and the traces on the circuit board; establishing a thermal connection between at least a portion of and the rigid substrate;
A method, including
前記回路基板の前記コンタクトパッドは、拡散接合又は低温焼結によって前記硬質基板に直接接続される、請求項1に記載の方法。 2. The method of claim 1, wherein the contact pads of the circuit board are directly connected to the rigid substrate by diffusion bonding or low temperature sintering. 前記回路基板において前記硬質基板に対面する側にある前記コンタクトパッドは、前記回路基板上の前記コンタクトパッドと位置合わせするように金属製のコンタクトパッドを前記硬質基板に形成すること、及び前記回路基板上の位置合わせされている前記コンタクトパッドと前記硬質基板を互いに接合することによって、前記硬質基板に接合される、請求項1又は2に記載の方法。 forming metal contact pads on the rigid substrate such that the contact pads on the side of the circuit substrate facing the rigid substrate are aligned with the contact pads on the circuit substrate; and 3. A method according to claim 1 or 2, wherein the rigid substrate is bonded by bonding the aligned contact pads thereon and the rigid substrate together. 前記回路基板の前記コンタクトパッドは、拡散接合によって前記硬質基板上の前記コンタクトパッドに接続される、請求項3に記載の方法。 4. The method of claim 3, wherein the contact pads of the circuit board are connected to the contact pads on the rigid substrate by diffusion bonding. 前記ビアを形成する前記めっきは、無電解ニッケル浸漬金(ENIG)めっきである、請求項1~4のいずれか1項に記載の方法。 The method of any one of claims 1-4, wherein the plating forming the via is electroless nickel immersion gold (ENIG) plating. 回路サブアセンブリであって、
a)電気絶縁性だが熱伝導性の材料で形成される硬質基板(16)と、
b)前記基板(16)に実装される回路基板(12)であって、前記回路基板(12)は、基部(122)と、制御回路及びドライバ回路に接続可能な複数のトレース(121)とを有し、前記トレース(121)はそれぞれ、各コンタクトパッド(123)で終端する、回路基板(12)と、
c)前記回路基板(12)において前記硬質基板(16)とは反対側に実装され、前記コンタクトパッド(123)を介して前記回路基板の前記トレース(121)と電気的に接続される回路構成要素(10)と、及び
d)前記回路基板(122)に形成され、電気的及び熱的に伝導性のビア(124)で充填されて、前記回路構成要素(10)から前記硬質基板(16)に熱を伝導させ、かつ前記回路基板上の前記トレース(121)を前記回路構成要素に接続する、穴(125)と、
を備える回路サブアセンブリにおいて、
e)前記回路基板(12)の前記基部(122)が可撓性であり、
f)前記回路基板(12)の前記コンタクトパッド(123)の少なくとも一部が、前記回路基板において前記硬質基板(16)に対面する側に配置され、かつ前記硬質基板(16)に接合され、
g)前記回路基板の可撓性基部における穴(125)の少なくとも一部が、前記硬質基板(16)に接合された各コンタクトパッド(123)で終端するが、前記各コンタクトパッド(123)を貫通せず、及び
h)前記回路基板の前記可撓性基部における穴を充填するそれぞれのビア(124)が、それぞれのコンタクトパッドにおいて前記硬質基板(16)とは反対側を向く側のめっきとして形成され、前記それぞれのコンタクトパッドは、前記回路構成要素(10)のそれぞれの接点(101)にはんだ付けされる、
ことを特徴とする、回路サブアセンブリ。
A circuit subassembly,
a) a rigid substrate (16) made of an electrically insulating but thermally conductive material;
b) a circuit board (12) mounted to said substrate (16) , said circuit board (12) comprising a base (122) and a plurality of traces (121) connectable to control and driver circuits; a circuit board (12) having: each of said traces (121) terminating in a respective contact pad (123 ) ;
c) a circuit mounted on the circuit board (12) on the opposite side of the rigid board (16) and electrically connected to the traces (121) of the circuit board through the contact pads (123); a component (10) , and
d) filled with electrically and thermally conductive vias (124 ) formed in said circuit board (122) to conduct heat from said circuit component (10) to said rigid substrate (16) ; and a hole (125 ) connecting said trace (121) on said circuit board to said circuit component;
In a circuit subassembly comprising
e) said base (122) of said circuit board (12) is flexible;
f) at least part of the contact pads (123 ) of the circuit board (12) are arranged on the side of the circuit board facing the rigid substrate (16) and bonded to the rigid substrate (16) ;
g) at least a portion of the holes (125) in the flexible base of said circuit board terminating in respective contact pads (123) bonded to said rigid substrate (16) , said contact pads (123) being does not penetrate, and
h) respective vias (124) filling holes in said flexible base of said circuit board are formed as plating on the side of each contact pad facing away from said rigid substrate (16) ; are soldered to respective contacts (101) of said circuit component (10) ,
A circuit subassembly, characterized by:
前記回路基板(12)の可撓性基部(122)は、1μm~125μm、2μm~75μm、2μm~50μm、2μm~25μm、2μm~10μm、又は2μm~5μmの範囲の厚さを有する、請求項6に記載の回路サブアセンブリ。 The flexible base (122) of the circuit board (12) has a thickness in the range of 1 μm to 125 μm, 2 μm to 75 μm, 2 μm to 50 μm, 2 μm to 25 μm, 2 μm to 10 μm, or 2 μm to 5 μm. 7. The circuit subassembly of 6. 前記硬質基板(16)は、前記回路基板(12)のそれぞれの接点(123)と実質的に位置合わせしているコンタクトパッド(161)をさらに含む、請求項6又は7に記載の回路サブアセンブリ。 A circuit subassembly according to claim 6 or 7, wherein said rigid substrate (16) further comprises contact pads (161) substantially aligned with respective contacts (123) of said circuit board (12). . 前記回路基板(12)のトレース(121)と前記回路構成要素(10)の接点(101)との間の全ての金属接続部が、前記硬質基板(16)と接合するパッド(161)にさらに接続される、請求項6~8のいずれか1項に記載の回路サブアセンブリ。 All metal connections between traces (121) of said circuit board (12) and contacts (101 ) of said circuit component (10) are further to pads (161) that join said rigid substrate (16 ). A circuit subassembly according to any one of claims 6 to 8, connected. 前記ビア(124)は、ニッケルのある層と金の別の層を含む2つ以上の層から形成される、請求項6~9のいずれか1項に記載の回路サブアセンブリ。 The circuit subassembly of any one of claims 6 to 9, wherein said via (124) is formed from two or more layers including one layer of nickel and another layer of gold. 前記回路基板(12)の前記可撓性基部(122)は、1種以上のプラスチック材料から作製される、請求項6~10のいずれか1項に記載の回路サブアセンブリ。 A circuit subassembly according to any one of claims 6 to 10, wherein said flexible base (122) of said circuit board (12 ) is made from one or more plastic materials. 前記硬質基板(16)は、250μm以下、200μm以下、150μm以下、100μm以下、又は50μm以下の厚さを有する、請求項6~11のいずれか1項に記載の回路サブアセンブリ。 A circuit subassembly according to any one of claims 6 to 11, wherein the rigid substrate (16) has a thickness of 250 µm or less, 200 µm or less, 150 µm or less, 100 µm or less, or 50 µm or less. 前記硬質基板(16)は、5μm以上、10μm以上、又は25μm以上の厚さを有する、請求項6~12のいずれか1項に記載の回路サブアセンブリ。 A circuit subassembly according to any one of claims 6 to 12, wherein said rigid substrate (16) has a thickness of 5 µm or more, 10 µm or more, or 25 µm or more. 前記硬質基板(16)は導電性トレースを欠いている、請求項6~13のいずれか1項に記載の回路サブアセンブリ。

A circuit subassembly according to any one of claims 6 to 13, wherein said rigid substrate (16) lacks conductive traces.

JP2021577578A 2019-07-03 2020-06-30 Method and apparatus for mounting and cooling circuit components Pending JP2022540796A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB1909557.9 2019-07-03
GB1909557.9A GB2585219A (en) 2019-07-03 2019-07-03 Method and apparatus for mounting and cooling a circuit component
PCT/IB2020/056184 WO2021001757A1 (en) 2019-07-03 2020-06-30 Method and apparatus for mounting and cooling a circuit component

Publications (2)

Publication Number Publication Date
JP2022540796A JP2022540796A (en) 2022-09-20
JPWO2021001757A5 true JPWO2021001757A5 (en) 2023-07-03

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Country Status (7)

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US (2) US11764540B2 (en)
EP (1) EP3994726A1 (en)
JP (1) JP2022540796A (en)
KR (1) KR20220026597A (en)
CN (1) CN114008753A (en)
GB (1) GB2585219A (en)
WO (1) WO2021001757A1 (en)

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TWI824277B (en) * 2021-08-06 2023-12-01 友達光電股份有限公司 Display device and manufacturing method thereof

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TW462121B (en) 2000-09-19 2001-11-01 Siliconware Precision Industries Co Ltd Heat sink type ball grid array package
US6816385B1 (en) * 2000-11-16 2004-11-09 International Business Machines Corporation Compliant laminate connector
US6903929B2 (en) * 2003-03-31 2005-06-07 Intel Corporation Two-phase cooling utilizing microchannel heat exchangers and channeled heat sink
US7269017B2 (en) * 2004-11-19 2007-09-11 Delphi Technologies, Inc. Thermal management of surface-mount circuit devices on laminate ceramic substrate
TWM381175U (en) * 2009-12-22 2010-05-21 Li-Yu Lin Improved ceramic radiator structure
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