JPWO2020218600A1 - - Google Patents

Info

Publication number
JPWO2020218600A1
JPWO2020218600A1 JP2021516320A JP2021516320A JPWO2020218600A1 JP WO2020218600 A1 JPWO2020218600 A1 JP WO2020218600A1 JP 2021516320 A JP2021516320 A JP 2021516320A JP 2021516320 A JP2021516320 A JP 2021516320A JP WO2020218600 A1 JPWO2020218600 A1 JP WO2020218600A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021516320A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020218600A1 publication Critical patent/JPWO2020218600A1/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/96—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings spiro-condensed with carbocyclic rings or ring systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/02—Condensation polymers of aldehydes or ketones with phenols only of ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/16—Condensation polymers of aldehydes or ketones with phenols only of ketones with phenols
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
JP2021516320A 2019-04-26 2020-04-27 Pending JPWO2020218600A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019085938 2019-04-26
PCT/JP2020/017901 WO2020218600A1 (ja) 2019-04-26 2020-04-27 光学部品形成用組成物

Publications (1)

Publication Number Publication Date
JPWO2020218600A1 true JPWO2020218600A1 (de) 2020-10-29

Family

ID=72942645

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021516320A Pending JPWO2020218600A1 (de) 2019-04-26 2020-04-27

Country Status (3)

Country Link
JP (1) JPWO2020218600A1 (de)
TW (1) TW202104202A (de)
WO (1) WO2020218600A1 (de)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5556773B2 (ja) * 2010-09-10 2014-07-23 信越化学工業株式会社 ナフタレン誘導体及びその製造方法、レジスト下層膜材料、レジスト下層膜形成方法及びパターン形成方法
US9598392B2 (en) * 2011-08-12 2017-03-21 Mitsubishi Gas Chemical Company, Inc. Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom
EP2743770B1 (de) * 2011-08-12 2015-12-30 Mitsubishi Gas Chemical Company, Inc. Unterschichtfilmbildendes material für die lithografie, unterschichtfilm für die lithografie und verfahren zur strukturformung
JP6094947B2 (ja) * 2011-09-30 2017-03-15 三菱瓦斯化学株式会社 フルオレン構造を有する樹脂及びリソグラフィー用下層膜形成材料
KR101855506B1 (ko) * 2011-10-13 2018-05-08 주식회사 동진쎄미켐 방향족 고리 함유 고분자 및 이를 포함하는 레지스트 하층막 조성물
KR101873018B1 (ko) * 2011-11-02 2018-07-03 주식회사 동진쎄미켐 페놀계 단량체, 이를 포함하는 레지스트 하층막 형성용 고분자 및 이를 포함하는 레지스트 하층막 조성물
KR102066229B1 (ko) * 2013-03-26 2020-01-15 주식회사 동진쎄미켐 레지스트 하층막 조성물 및 이를 이용한 패턴 형성 방법
US9274426B2 (en) * 2014-04-29 2016-03-01 Az Electronic Materials (Luxembourg) S.A.R.L. Antireflective coating compositions and processes thereof
CN106462074B (zh) * 2014-06-16 2020-06-09 日产化学工业株式会社 抗蚀剂下层膜形成用组合物
US9958781B2 (en) * 2015-04-24 2018-05-01 Jsr Corporation Method for film formation, and pattern-forming method

Also Published As

Publication number Publication date
WO2020218600A1 (ja) 2020-10-29
TW202104202A (zh) 2021-02-01

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