JPWO2020203670A1 - - Google Patents
Info
- Publication number
- JPWO2020203670A1 JPWO2020203670A1 JP2021511939A JP2021511939A JPWO2020203670A1 JP WO2020203670 A1 JPWO2020203670 A1 JP WO2020203670A1 JP 2021511939 A JP2021511939 A JP 2021511939A JP 2021511939 A JP2021511939 A JP 2021511939A JP WO2020203670 A1 JPWO2020203670 A1 JP WO2020203670A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019068595 | 2019-03-29 | ||
JP2019068595 | 2019-03-29 | ||
PCT/JP2020/013751 WO2020203670A1 (en) | 2019-03-29 | 2020-03-26 | Process solution and pattern-forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2020203670A1 true JPWO2020203670A1 (en) | 2020-10-08 |
JP7292378B2 JP7292378B2 (en) | 2023-06-16 |
Family
ID=72667775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2021511939A Active JP7292378B2 (en) | 2019-03-29 | 2020-03-26 | Treatment liquid, pattern forming method |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7292378B2 (en) |
TW (1) | TW202041614A (en) |
WO (1) | WO2020203670A1 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016136476A1 (en) * | 2015-02-27 | 2016-09-01 | 富士フイルム株式会社 | Pattern forming method, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, method for manufacturing electronic device, and electronic device |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016017232A1 (en) * | 2014-07-31 | 2016-02-04 | 富士フイルム株式会社 | Pattern forming method, resist pattern, method for manufacturing electronic device, and electronic device |
JP6457640B2 (en) * | 2015-06-24 | 2019-01-23 | 富士フイルム株式会社 | Pattern forming method, laminate, and resist composition for organic solvent development |
JP6582053B2 (en) * | 2015-09-30 | 2019-09-25 | 富士フイルム株式会社 | Actinic ray or radiation sensitive composition, and resist film, pattern forming method and electronic device manufacturing method using the same |
-
2020
- 2020-03-26 WO PCT/JP2020/013751 patent/WO2020203670A1/en active Application Filing
- 2020-03-26 JP JP2021511939A patent/JP7292378B2/en active Active
- 2020-03-27 TW TW109110365A patent/TW202041614A/en unknown
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016136476A1 (en) * | 2015-02-27 | 2016-09-01 | 富士フイルム株式会社 | Pattern forming method, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, method for manufacturing electronic device, and electronic device |
Also Published As
Publication number | Publication date |
---|---|
JP7292378B2 (en) | 2023-06-16 |
WO2020203670A1 (en) | 2020-10-08 |
TW202041614A (en) | 2020-11-16 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210915 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20221018 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20221216 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230206 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230509 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230606 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7292378 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |