JPWO2020100976A1 - Object surface processing method, laminate, and method for manufacturing laminate - Google Patents

Object surface processing method, laminate, and method for manufacturing laminate Download PDF

Info

Publication number
JPWO2020100976A1
JPWO2020100976A1 JP2020556164A JP2020556164A JPWO2020100976A1 JP WO2020100976 A1 JPWO2020100976 A1 JP WO2020100976A1 JP 2020556164 A JP2020556164 A JP 2020556164A JP 2020556164 A JP2020556164 A JP 2020556164A JP WO2020100976 A1 JPWO2020100976 A1 JP WO2020100976A1
Authority
JP
Japan
Prior art keywords
resin layer
flat surface
light
resin
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2020556164A
Other languages
Japanese (ja)
Other versions
JP7410572B2 (en
Inventor
孝明 鈴木
孝明 鈴木
秀貴 上野
秀貴 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gunma University NUC
Original Assignee
Gunma University NUC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gunma University NUC filed Critical Gunma University NUC
Publication of JPWO2020100976A1 publication Critical patent/JPWO2020100976A1/en
Application granted granted Critical
Publication of JP7410572B2 publication Critical patent/JP7410572B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/36Materials for grafts or prostheses or for coating grafts or prostheses containing ingredients of undetermined constitution or reaction products thereof, e.g. transplant tissue, natural bone, extracellular matrix
    • A61L27/38Materials for grafts or prostheses or for coating grafts or prostheses containing ingredients of undetermined constitution or reaction products thereof, e.g. transplant tissue, natural bone, extracellular matrix containing added animal cells
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/40Composite materials, i.e. containing one material dispersed in a matrix of the same or different material
    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61LMETHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L27/00Materials for grafts or prostheses or for coating grafts or prostheses
    • A61L27/50Materials characterised by their function or physical properties, e.g. injectable or lubricating compositions, shape-memory materials, surface modified materials
    • A61L27/56Porous materials, e.g. foams or sponges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/16Surface shaping of articles, e.g. embossing; Apparatus therefor by wave energy or particle radiation, e.g. infrared heating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B3/00Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
    • B32B3/26Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer
    • B32B3/30Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a particular shape of the outline of the cross-section of a continuous layer; characterised by a layer with cavities or internal voids ; characterised by an apertured layer characterised by a layer formed with recesses or projections, e.g. hollows, grooves, protuberances, ribs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B5/00Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
    • B32B5/18Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer of foamed material
    • CCHEMISTRY; METALLURGY
    • C12BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
    • C12MAPPARATUS FOR ENZYMOLOGY OR MICROBIOLOGY; APPARATUS FOR CULTURING MICROORGANISMS FOR PRODUCING BIOMASS, FOR GROWING CELLS OR FOR OBTAINING FERMENTATION OR METABOLIC PRODUCTS, i.e. BIOREACTORS OR FERMENTERS
    • C12M3/00Tissue, human, animal or plant cell, or virus culture apparatus

Landscapes

  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Transplantation (AREA)
  • Public Health (AREA)
  • Medicinal Chemistry (AREA)
  • Veterinary Medicine (AREA)
  • Dermatology (AREA)
  • Epidemiology (AREA)
  • Zoology (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • Bioinformatics & Cheminformatics (AREA)
  • Cell Biology (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Microbiology (AREA)
  • Biotechnology (AREA)
  • Composite Materials (AREA)
  • Genetics & Genomics (AREA)
  • General Engineering & Computer Science (AREA)
  • Biochemistry (AREA)
  • Sustainable Development (AREA)
  • Materials Engineering (AREA)
  • Virology (AREA)
  • Botany (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Dispersion Chemistry (AREA)
  • Toxicology (AREA)
  • Laminated Bodies (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)

Abstract

(a)基板上に感光性樹脂を含む樹脂層を形成する樹脂層形成工程と、(b)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対して光を照射する一次照射工程と、(c)前記光を照射された樹脂層の上に、非平坦な表面を有する物体を配置する物体配置工程と、(d)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対してさらに光を照射する二次照射工程とを備え、 前記一次照射工程は、前記樹脂層の一部が硬化しない条件で行われ、前記物体配置工程は、前記物体の非平坦な表面が前記樹脂層に対向するように行われる、物体の表面加工方法。From (a) a resin layer forming step of forming a resin layer containing a photosensitive resin on a substrate and (b) a surface of the substrate opposite to the side on which the resin layer is formed, light is emitted from the resin layer. (C) An object placement step of arranging an object having a non-flat surface on the resin layer irradiated with the light, and (d) the resin layer of the substrate are formed. A secondary irradiation step of further irradiating the resin layer with light from the surface opposite to the side facing the resin layer is provided, and the primary irradiation step is performed under a condition that a part of the resin layer is not cured, and the object. The arranging step is a method for processing the surface of an object, in which the non-flat surface of the object faces the resin layer.

Description

本開示は、物体の表面加工方法、積層体、及び積層体の製造方法に関する。 The present disclosure relates to a method for processing the surface of an object, a laminated body, and a method for manufacturing the laminated body.

生体外での細胞培養技術において、従来の平面的な環境ではなく立体的な環境で細胞を培養する手法の検討が近年進められている。立体的な環境で細胞を培養することで、生体内により近い環境を模した実験が可能になる。また、自己の細胞を培養して生体組織を形成した後に体内に移植する再生医療分野での利用も期待されている。 In the in vitro cell culture technology, studies on a method of culturing cells in a three-dimensional environment instead of the conventional two-dimensional environment have been studied in recent years. By culturing cells in a three-dimensional environment, it is possible to carry out experiments that imitate an environment closer to the living body. It is also expected to be used in the field of regenerative medicine in which self-cells are cultured to form biological tissues and then transplanted into the body.

立体的な環境で細胞培養を行うための材料(足場材)として、生体適合性に優れる多孔質体が提案されている(例えば、特許文献1参照)。一方、フォトリソグラフィ技術を用いて複雑な立体形状の微細構造体を作製する方法が提案されている(例えば、特許文献2参照)。 As a material (scaffolding material) for culturing cells in a three-dimensional environment, a porous body having excellent biocompatibility has been proposed (see, for example, Patent Document 1). On the other hand, a method of producing a fine structure having a complicated three-dimensional shape by using a photolithography technique has been proposed (see, for example, Patent Document 2).

特開2009−160302号公報JP-A-2009-160302 国際公開第2011/046169号International Publication No. 2011/046169

多孔質体に何らかの機能を付与する目的で、半導体加工、MEMS(Micro Electro Mechanical Systems)作製等の分野で培われてきたフォトリソグラフィの手法を適用してその表面構造を改変することは有効な手段と考えられる。しかしながら、多孔質体の表面は半導体基板のように平坦でないため、これらの手法を多孔質体の表面加工に適用するには改善すべき点がある。 It is an effective means to modify the surface structure by applying the photolithography method cultivated in the fields of semiconductor processing, MEMS (Micro Electro Mechanical Systems) fabrication, etc. for the purpose of imparting some function to the porous body. it is conceivable that. However, since the surface of the porous body is not flat like the semiconductor substrate, there are some points to be improved in order to apply these methods to the surface processing of the porous body.

上記事情に鑑み、本発明の一実施形態が解決しようとする課題は、非平坦な表面に高精細な表面構造を形成可能な物体の表面加工方法、物体の非平坦な表面に高精細な表面構造を有する積層体、及び物体の非平坦な表面に形成される高精細な表面構造を有する積層体の製造方法を提供することである。 In view of the above circumstances, the problem to be solved by one embodiment of the present invention is a method of surface processing an object capable of forming a high-definition surface structure on a non-flat surface, a high-definition surface on a non-flat surface of an object. It is an object of the present invention to provide a laminated body having a structure and a method for producing a laminated body having a high-definition surface structure formed on a non-flat surface of an object.

前記課題を解決するための手段には、以下の実施態様が含まれる。
<1>(a)基板上に感光性樹脂を含む樹脂層を形成する樹脂層形成工程と、
(b)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対して光を照射する一次照射工程と、
(c)前記光を照射された樹脂層の上に、非平坦な表面を有する物体を配置する物体配置工程と、
(d)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対してさらに光を照射する二次照射工程とを備え、
前記一次照射工程は、前記樹脂層の一部が硬化しない条件で行われ、前記物体配置工程は、前記物体の非平坦な表面が前記樹脂層に対向するように行われる、物体の表面加工方法。
<2>前記物体は多孔質体である、<1>に記載の物体の表面加工方法。
<3>前記感光性樹脂は光硬化性樹脂である、<1>又は<2>に記載の表面加工方法。
<4>非平坦な表面を有する物体と、前記物体の非平坦な表面上に配置される樹脂層を備え、前記樹脂層は感光性樹脂の硬化物であり、前記樹脂層の少なくとも一部が前記物体の非平坦な表面に入り込んでいる、積層体。
<5>前記物体は多孔質体である、<4>に記載の積層体。
<6>前記感光性樹脂は光硬化性樹脂である、<4>又は<5>に記載の積層体。
<7>前記樹脂層が前記物体の非平坦な表面に入り込んでいる部分は前記樹脂層の縁部である、<4>〜<6>のいずれ1項に記載の積層体。
<8>前記樹脂層が前記物体の非平坦な表面に入り込んでいる部分は前記樹脂層の総面積の50%以下である、<4>〜<7>のいずれ1項に記載の積層体。
<9>前記樹脂層が前記物体の非平坦な表面に入り込んでいる部分と、前記物体の非平坦な表面に入り込んでいない部分とを有し、前記物体の非平坦な表面に入り込んでいる部分は前記物体に固着した状態であり、前記物体の非平坦な表面に入り込んでいない部分は前記物体に固着していない状態である、<4>〜<8>のいずれ1項に記載の積層体。
<10>(a)基板上に感光性樹脂を含む樹脂層を形成する樹脂層形成工程と、
(b)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対して光を照射する一次照射工程と、
(c)前記光を照射された樹脂層の上に、非平坦な表面を有する物体を配置する物体配置工程と、
(d)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対してさらに光を照射する二次照射工程とを備え、
前記一次照射工程は、前記樹脂層の一部が硬化しない条件で行われ、前記物体配置工程は、前記物体の非平坦な表面が前記樹脂層に対向するように行われる、<4>〜<9>のいずれか1項に記載の積層体の製造方法。
Means for solving the above problems include the following embodiments.
<1> (a) A resin layer forming step of forming a resin layer containing a photosensitive resin on a substrate, and
(B) A primary irradiation step of irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed.
(C) An object arranging step of arranging an object having a non-flat surface on the resin layer irradiated with light.
(D) A secondary irradiation step of further irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed is provided.
The primary irradiation step is performed under a condition that a part of the resin layer is not cured, and the object placement step is performed so that the non-flat surface of the object faces the resin layer. ..
<2> The method for surface processing an object according to <1>, wherein the object is a porous body.
<3> The surface processing method according to <1> or <2>, wherein the photosensitive resin is a photocurable resin.
<4> An object having a non-flat surface and a resin layer arranged on the non-flat surface of the object are provided, the resin layer is a cured product of a photosensitive resin, and at least a part of the resin layer is A laminate that penetrates the non-flat surface of the object.
<5> The laminate according to <4>, wherein the object is a porous body.
<6> The laminate according to <4> or <5>, wherein the photosensitive resin is a photocurable resin.
<7> The laminate according to any one of <4> to <6>, wherein the portion where the resin layer penetrates into the non-flat surface of the object is an edge portion of the resin layer.
<8> The laminate according to any one of <4> to <7>, wherein the portion where the resin layer penetrates into the non-flat surface of the object is 50% or less of the total area of the resin layer.
<9> A portion in which the resin layer has a portion that has entered the non-flat surface of the object and a portion that has not entered the non-flat surface of the object, and has entered the non-flat surface of the object. The laminated body according to any one of <4> to <8>, wherein is in a state of being fixed to the object, and a portion not entering the non-flat surface of the object is in a state of not being fixed to the object. ..
<10> (a) A resin layer forming step of forming a resin layer containing a photosensitive resin on a substrate, and
(B) A primary irradiation step of irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed.
(C) An object arranging step of arranging an object having a non-flat surface on the resin layer irradiated with light.
(D) A secondary irradiation step of further irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed is provided.
The primary irradiation step is performed under a condition that a part of the resin layer is not cured, and the object placement step is performed so that the non-flat surface of the object faces the resin layer. <4> to < The method for producing a laminate according to any one of 9>.

本発明の一実施形態によれば、非平坦な表面に高精細な表面構造を形成可能な物体の表面加工方法、物体の非平坦な表面に高精細な表面構造を有する積層体、及び物体の非平坦な表面に形成される高精細な表面構造を有する積層体の製造方法が提供される。 According to one embodiment of the present invention, a method for surface processing an object capable of forming a high-definition surface structure on a non-flat surface, a laminate having a high-definition surface structure on the non-flat surface of the object, and an object. A method for producing a laminate having a high-definition surface structure formed on a non-flat surface is provided.

本開示の表面加工方法の一例を示す工程図である。It is a process drawing which shows an example of the surface processing method of this disclosure. 実施例で樹脂層を形成した細胞培養基材の表面の電子顕微鏡画像である。It is an electron microscope image of the surface of the cell culture base material which formed the resin layer in an Example. 図2に示す細胞培養機材のメッシュ部の拡大画像である。It is an enlarged image of the mesh part of the cell culture equipment shown in FIG.

以下、本発明を実施するための形態について詳細に説明する。ただし、本発明は以下の実施形態に限定されるものではない。
本明細書において、「工程」との用語は、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の目的が達成されれば、本用語に含まれる。
さらに、本明細書において組成物中の各成分の量は組成物中に各成分に該当する物質が複数存在する場合、特に断らない限り、組成物中に存在する当該複数の物質の合計量を意味する。
Hereinafter, embodiments for carrying out the present invention will be described in detail. However, the present invention is not limited to the following embodiments.
In the present specification, the term "process" is included in this term not only as an independent process but also as long as the intended purpose of the process is achieved even if it cannot be clearly distinguished from other processes. Is done.
Further, in the present specification, the amount of each component in the composition is the total amount of the plurality of substances present in the composition unless otherwise specified, when a plurality of substances corresponding to each component are present in the composition. means.

<物体の表面加工方法>
本開示の物体の表面加工方法は、
(a)基板上に感光性樹脂を含む樹脂層を形成する樹脂層形成工程と、
(b)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対して光を照射する一次照射工程と、
(c)前記光を照射された樹脂層の上に、非平坦な表面を有する物体を配置する物体配置工程と、
(d)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対してさらに光を照射する二次照射工程とを備え、
前記一次照射工程は、前記樹脂層の一部が硬化しない条件で行われ、前記物体配置工程は、前記物体の非平坦な表面が前記樹脂層に対向するように行われる、物体の表面加工方法である。
<Method of surface processing of objects>
The surface processing method of the object of the present disclosure is described.
(A) A resin layer forming step of forming a resin layer containing a photosensitive resin on a substrate, and
(B) A primary irradiation step of irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed.
(C) An object arranging step of arranging an object having a non-flat surface on the resin layer irradiated with light.
(D) A secondary irradiation step of further irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed is provided.
The primary irradiation step is performed under a condition that a part of the resin layer is not cured, and the object placement step is performed so that the non-flat surface of the object faces the resin layer. Is.

本開示の方法によれば、表面が平坦でない物体に対しても高精細な表面加工を施すことができる。
さらに本開示の方法では、物体の表面に樹脂からなる表面構造を、樹脂の接着力を利用して形成する。このため、高温、高真空、プラズマ等を用いる接着接合技術よりも簡便かつ安価な方法で実施することができる。また、使用する材料をより広い範囲から選択することができる。
According to the method of the present disclosure, high-definition surface processing can be applied to an object whose surface is not flat.
Further, in the method of the present disclosure, a surface structure made of resin is formed on the surface of an object by utilizing the adhesive force of the resin. Therefore, it can be carried out by a simpler and cheaper method than the adhesive bonding technique using high temperature, high vacuum, plasma, or the like. In addition, the material to be used can be selected from a wider range.

(a)樹脂層形成工程
樹脂層形成工程では、基板上に感光性樹脂を含む樹脂層を形成する。
本開示の方法で使用する基板は、光照射工程で照射される光を透過しうるものであれば特に制限されない。例えば、ガラス等の無機材料からなる基板であっても、樹脂等の有機材料からなる基板であってもよい。
(A) Resin layer forming step In the resin layer forming step, a resin layer containing a photosensitive resin is formed on the substrate.
The substrate used in the method of the present disclosure is not particularly limited as long as it can transmit the light irradiated in the light irradiation step. For example, it may be a substrate made of an inorganic material such as glass or a substrate made of an organic material such as resin.

樹脂層に含まれる感光性樹脂は、光照射工程で照射される光に反応しうるものであれば特に制限されない。例えば、フォトリソグラフィ技術においてフォトレジストとして利用される感光性樹脂から選択してもよい。感光性樹脂は、光照射により現像液への溶解性が低下するタイプ(ネガ型、光硬化性)の感光性樹脂であっても、光照射により現像液への溶解性が増大するタイプ(ポジ型、光分解性)の感光性樹脂であってもよい。 The photosensitive resin contained in the resin layer is not particularly limited as long as it can react with the light irradiated in the light irradiation step. For example, it may be selected from photosensitive resins used as photoresists in photolithography technology. The photosensitive resin is a type of photosensitive resin whose solubility in a developing solution is reduced by light irradiation (negative type, photocurable), but its solubility in a developing solution is increased by light irradiation (positive). It may be a type, photodegradable) photosensitive resin.

感光性樹脂として具体的には、エポキシ樹脂、アクリル樹脂、ポリエステルアクリレート樹脂、ウレタンアクリレート樹脂、オキセタン樹脂等が挙げられる。 Specific examples of the photosensitive resin include epoxy resin, acrylic resin, polyester acrylate resin, urethane acrylate resin, and oxetane resin.

基板上に樹脂層を形成する方法は、特に制限されない。例えば、スピンコータ、ロールコータ、スクリーン印刷、転写等の公知の手法で形成することができる。樹脂層は、パターン状に形成されても、一様に(パターンなしで)形成されてもよい。 The method of forming the resin layer on the substrate is not particularly limited. For example, it can be formed by a known method such as a spin coater, a roll coater, screen printing, and transfer. The resin layer may be formed in a pattern or uniformly (without a pattern).

基板上に形成される樹脂層の厚みは、特に制限されない。例えば、0.1μm〜100μmの範囲から選択してもよい。均等な厚みの樹脂層を形成する観点からは、樹脂層を形成する樹脂は、樹脂層形成の際に流動性を有していることが好ましく、液状又はペースト状であることがより好ましい。 The thickness of the resin layer formed on the substrate is not particularly limited. For example, it may be selected from the range of 0.1 μm to 100 μm. From the viewpoint of forming the resin layer having a uniform thickness, the resin forming the resin layer preferably has fluidity at the time of forming the resin layer, and more preferably liquid or paste.

(b)一次照射工程
一次照射工程では、基板の樹脂層が形成された側と逆側の面(以下、裏面ともいう)から、樹脂層に対して光を照射する。
樹脂層に対して照射する光は、樹脂層の全面に照射されても、パターン状に照射されてもよい。樹脂層に光をパターン状に照射することで、樹脂層に硬化部分(光硬化性樹脂の場合は、露光部)と未硬化部分(光硬化性樹脂の場合は、未露光部)をパターン状に形成することができる。この樹脂層の未硬化部を除去することで、物体の表面に感光性樹脂の硬化物からなるパターン状の構造を形成することができる。
(B) Primary Irradiation Step In the primary irradiation step, the resin layer is irradiated with light from the surface (hereinafter, also referred to as the back surface) opposite to the side on which the resin layer of the substrate is formed.
The light applied to the resin layer may be applied to the entire surface of the resin layer or may be applied in a pattern. By irradiating the resin layer with light in a pattern, the cured portion (exposed portion in the case of a photocurable resin) and the uncured portion (unexposed portion in the case of a photocurable resin) are patterned in the resin layer. Can be formed into. By removing the uncured portion of the resin layer, a patterned structure made of a cured product of the photosensitive resin can be formed on the surface of the object.

樹脂層に対してパターン状に光を照射する方法は、特に制限されない。例えば、基板の表面に遮光性の材料でパターンを形成するかフォトマスクを用いて、光が部分的に樹脂層に到達しないようにする方法、光の照射をパターン状に実施する方法などが挙げられる。高精細なパターンを形成する観点からは、基板の表面に遮光性の材料でパターンを形成するかフォトマスクを用いる方法が好ましく、基板の樹脂層が形成される側の表面にパターンを形成する方法がより好ましい。 The method of irradiating the resin layer with light in a pattern is not particularly limited. For example, a method of forming a pattern on the surface of a substrate with a light-shielding material or using a photomask to prevent light from partially reaching the resin layer, a method of irradiating light in a pattern, and the like can be mentioned. Be done. From the viewpoint of forming a high-definition pattern, a method of forming a pattern on the surface of the substrate with a light-shielding material or using a photomask is preferable, and a method of forming a pattern on the surface on the side where the resin layer of the substrate is formed. Is more preferable.

樹脂層に対して照射される光の種類は、感光性樹脂に反応を生じさせうるものであれば、特に制限されない。中でも、加工精度、加工のし易さ等の観点からは、紫外線が好ましい。光照射に用いる光源は特に制限されず、例えば、フォトリソグラフィ技術で一般に使用される光源から選択してもよい。具体的には、発光ダイオード(LED)、半導体レーザ、エキシマレーザ、メタルハライドランプ、高圧水銀灯等が挙げられる。 The type of light irradiated to the resin layer is not particularly limited as long as it can cause a reaction in the photosensitive resin. Above all, ultraviolet rays are preferable from the viewpoint of processing accuracy, ease of processing, and the like. The light source used for light irradiation is not particularly limited, and may be selected from, for example, light sources generally used in photolithography technology. Specific examples thereof include light emitting diodes (LEDs), semiconductor lasers, excimer lasers, metal halide lamps, and high-pressure mercury lamps.

本開示の方法では、樹脂層に対する光の照射が、樹脂層の一部が硬化しない条件で行われる。これにより、光照射後の樹脂層の上に物体を配置した際に、樹脂層の硬化していない部分が物体の非平坦な表面の凹凸に入り込む。物体の非平坦な表面の凹凸に入り込んだ状態の樹脂が後述する二次照射工程で硬化すると、樹脂が本来有する接着力に加え、アンカー効果が発現して樹脂が強固に物体に接着する。 In the method of the present disclosure, the resin layer is irradiated with light under the condition that a part of the resin layer is not cured. As a result, when the object is placed on the resin layer after light irradiation, the uncured portion of the resin layer enters the unevenness of the non-flat surface of the object. When the resin in a state of being embedded in the unevenness of the non-flat surface of the object is cured in the secondary irradiation step described later, in addition to the adhesive force originally possessed by the resin, an anchor effect is exhibited and the resin firmly adheres to the object.

本開示の方法では、光の照射を基板の裏面から行う。これにより、樹脂層が物体の非平坦な表面と接する部分(すなわち、光が照射される側と逆側)に硬化していない部分を効果的に作り出すことができる。 In the method of the present disclosure, light irradiation is performed from the back surface of the substrate. As a result, it is possible to effectively create a uncured portion in the portion where the resin layer is in contact with the non-flat surface of the object (that is, the side opposite to the side irradiated with light).

樹脂層に対する光の照射を、樹脂層の一部が硬化しない条件で行う方法は、特に制限されない。例えば、照射条件(照射強度、照射時間等)を調整しても、その他の条件を調整してもよい。 The method of irradiating the resin layer with light under the condition that a part of the resin layer is not cured is not particularly limited. For example, the irradiation conditions (irradiation intensity, irradiation time, etc.) may be adjusted, or other conditions may be adjusted.

(c)物体配置工程
物体配置工程では、光を照射された樹脂層の上に非平坦な表面を有する物体を配置する。
非平坦な表面を有する物体の形態は、特に制限されない。例えば、表面が非平坦であって内部は密である物体であっても、スポンジのように内部に空隙を有する物体(多孔質体)であっても、その他の形態の物体であってもよい。また、物体の表面は全てが非平坦であっても、部分的に非平坦であってもよい。
(C) Object placement step In the object placement step, an object having a non-flat surface is placed on the resin layer irradiated with light.
The morphology of an object having a non-flat surface is not particularly limited. For example, it may be an object having a non-flat surface and a dense interior, an object having voids inside (porous body) such as a sponge, or an object of other forms. .. Further, the surface of the object may be completely non-flat or partially non-flat.

物体が有する非平坦な表面の具体的な態様は、樹脂層の硬化していない部分が入り込むことができる状態であれば、特に制限されない。例えば、表面に細孔が存在する状態、表面に起伏がある状態、表面が起毛した状態などであってもよい。 The specific aspect of the non-flat surface of the object is not particularly limited as long as the uncured portion of the resin layer can enter. For example, there may be a state in which pores are present on the surface, a state in which the surface is undulating, a state in which the surface is raised, and the like.

非平坦な表面を有する物体の材質は、特に制限されない。例えば、樹脂等の有機材料からなる物体であっても、ガラス、カーボン、セラミックス等の無機材料からなる物体であっても、これらの複合体であってもよい。 The material of the object having a non-flat surface is not particularly limited. For example, it may be an object made of an organic material such as resin, an object made of an inorganic material such as glass, carbon, or ceramics, or a composite thereof.

物体の配置は、物体の非平坦な表面が樹脂層に対向するように行われる。これにより、硬化していない樹脂層の一部が物体の非平坦な表面の凹凸に入り込む。物体の配置は、加圧せずに行っても、加圧して行ってもよい。 The placement of the object is such that the non-flat surface of the object faces the resin layer. As a result, a part of the uncured resin layer penetrates into the unevenness of the non-flat surface of the object. The object may be arranged without pressurization or with pressurization.

(d)二次照射工程
二次照射工程では、物体配置工程の後に、基板の裏面から、樹脂層に対してさらに光を照射する。
樹脂層に対して二次照射工程を行うことで、物体の非平坦な表面の凹凸に入り込んだ硬化していない樹脂が硬化して、樹脂が物体に強固に接着する。
(D) Secondary Irradiation Step In the secondary irradiation step, after the object placement step, the resin layer is further irradiated with light from the back surface of the substrate.
By performing the secondary irradiation step on the resin layer, the uncured resin that has entered the unevenness of the non-flat surface of the object is cured, and the resin is firmly adhered to the object.

二次照射工程を実施する方法は、特に制限されない。例えば、一次照射工程において樹脂層に対して光を照射する方法に準じて行うことができる。 The method of carrying out the secondary irradiation step is not particularly limited. For example, it can be performed according to the method of irradiating the resin layer with light in the primary irradiation step.

二次照射工程で樹脂層に対して光を照射する領域は、樹脂層の全面であっても、一部であってもよい。
二次照射工程で樹脂層に対して光を照射する領域が樹脂層の一部である場合、光を照射する領域の位置は特に制限されない。例えば、樹脂層の縁部であっても、その他の部分であってもよい。光を照射する領域の面積の割合は特に制限されない。例えば、樹脂層の総面積の50%以下であっても、30%以下であっても、10%以下であってもよい。また、樹脂層の総面積の1%以上であっても、5%以上であっても、10%以上であってもよい。
The region for irradiating the resin layer with light in the secondary irradiation step may be the entire surface or a part of the resin layer.
When the region for irradiating the resin layer with light in the secondary irradiation step is a part of the resin layer, the position of the region for irradiating the light is not particularly limited. For example, it may be an edge portion of the resin layer or another portion. The ratio of the area of the area to be irradiated with light is not particularly limited. For example, it may be 50% or less, 30% or less, or 10% or less of the total area of the resin layer. Further, it may be 1% or more, 5% or more, or 10% or more of the total area of the resin layer.

樹脂層が二次照射工程で光を照射される領域と、光を照射されない領域とを有する場合、光を照射される領域は物体に固着した状態であり、光を照射されない領域は物体に固着していない状態であってもよい。 When the resin layer has a region irradiated with light in the secondary irradiation step and a region not irradiated with light, the region irradiated with light is in a state of being fixed to the object, and the region not irradiated with light is fixed to the object. It may not be in the state.

一次照射工程における光の照射をパターン状に行い、未硬化部(ネガティブ型光硬化性樹脂の場合は、未露光部)を後述する除去工程で除去して樹脂層にパターンを形成する場合は、樹脂層のパターンを形成しない部分(例えば、樹脂層の縁部)にのみ光を照射してもよい。 When the light irradiation in the primary irradiation step is performed in a pattern and the uncured portion (in the case of a negative type photocurable resin, the unexposed portion) is removed in the removal step described later to form a pattern on the resin layer, Light may be applied only to the portion that does not form the pattern of the resin layer (for example, the edge portion of the resin layer).

(e)除去工程
本開示の方法では、二次照射工程の後に、樹脂層の硬化していない部分を除去してもよい。
樹脂層に対する光の照射をパターン状に行った場合は、硬化していない部分(光硬化性樹脂を用いる場合は、未露光部)を除去することで、物体の表面にパターン状の樹脂からなる表面構造を形成することができる。
本開示の方法では、接着時に流動性を有する樹脂層(感光性樹脂)が、意図しない箇所に流動しても、その後の除去(現像)工程で除去できる。このため、マイクロスケールの微細な構造に対しても適用できる。
(E) Removal Step In the method of the present disclosure, the uncured portion of the resin layer may be removed after the secondary irradiation step.
When the resin layer is irradiated with light in a pattern, the uncured portion (unexposed portion when a photocurable resin is used) is removed to form a patterned resin on the surface of the object. A surface structure can be formed.
In the method of the present disclosure, even if the resin layer (photosensitive resin) having fluidity at the time of adhesion flows to an unintended portion, it can be removed in the subsequent removal (development) step. Therefore, it can be applied to a fine structure on a microscale.

樹脂層の硬化していない部分を除去する手法は、特に制限されない。例えば、フォトリソグラフィ技術で一般に使用される現像液を用いて除去してもよい。 The method for removing the uncured portion of the resin layer is not particularly limited. For example, it may be removed using a developer commonly used in photolithography techniques.

(f)剥離工程
本開示の方法では、樹脂層から基板を剥離してもよい。
基板から樹脂層を剥離する場合は、剥離しやすくするための層(犠牲層等)を基板の樹脂層が形成される面にあらかじめ形成してもよい。また、樹脂層を剥離した後の基板は、再利用してもよい。
(F) Peeling Step In the method of the present disclosure, the substrate may be peeled from the resin layer.
When the resin layer is peeled from the substrate, a layer (sacrificial layer or the like) for facilitating the peeling may be formed in advance on the surface of the substrate on which the resin layer is formed. Further, the substrate after the resin layer is peeled off may be reused.

以下、図面を参照して本開示の方法を具体的に説明する。図1は、本開示の表面加工方法の一例を概略的に示す工程図である。本工程では、光硬化性の感光樹脂を用いて樹脂層を形成する。 Hereinafter, the method of the present disclosure will be specifically described with reference to the drawings. FIG. 1 is a process diagram schematically showing an example of the surface processing method of the present disclosure. In this step, a resin layer is formed using a photocurable photosensitive resin.

まず、図1(a)に示すように、基板1の上に樹脂層2を形成する(樹脂層形成工程)。基板1の樹脂層が形成される側の面には、一時光照射工程で使用される光を透過しない材料でパターンが形成されている。また、樹脂層の基板からの剥離を容易にするための犠牲層3が形成されている。 First, as shown in FIG. 1A, the resin layer 2 is formed on the substrate 1 (resin layer forming step). A pattern is formed on the surface of the substrate 1 on the side where the resin layer is formed with a material that does not transmit light used in the temporary light irradiation step. Further, a sacrificial layer 3 is formed to facilitate peeling of the resin layer from the substrate.

次いで、図1(b)に示すように、基板1の樹脂層2が形成された面と逆側の面(裏面)から光4を照射する(一次照射工程)。これにより、樹脂層2の光が照射された領域(露光部)の樹脂が硬化する。光4の照射は、樹脂層2の物体5と接する側が硬化しない条件で行われる。 Next, as shown in FIG. 1 (b), the light 4 is irradiated from the surface (back surface) opposite to the surface on which the resin layer 2 of the substrate 1 is formed (primary irradiation step). As a result, the resin in the light-irradiated region (exposed portion) of the resin layer 2 is cured. The irradiation of the light 4 is performed under the condition that the side of the resin layer 2 in contact with the object 5 is not cured.

次いで、図1(c)に示すように、樹脂層2の上に物体5を配置する(物体配置工程)。物体5は非平坦な表面を有し、この表面が樹脂層2に対向するように配置される。これにより、樹脂層2の硬化していない部分が物体5の非平坦な表面の凹凸に入り込む。 Next, as shown in FIG. 1C, the object 5 is placed on the resin layer 2 (object placement step). The object 5 has a non-flat surface, and the surface is arranged so as to face the resin layer 2. As a result, the uncured portion of the resin layer 2 enters the unevenness of the non-flat surface of the object 5.

次いで、図1(d)に示すように、基板1の裏面からさらに光6を照射する(二次照射工程)。本工程では、マスク7を用いて、光6が樹脂層2の縁部にのみ照射されるようにする。これにより、樹脂層2の縁部では、物体5の非平坦な表面の凹凸に入り込んだ部分が硬化して、物体5に強固に接着する。 Next, as shown in FIG. 1 (d), light 6 is further irradiated from the back surface of the substrate 1 (secondary irradiation step). In this step, the mask 7 is used so that the light 6 is irradiated only to the edge portion of the resin layer 2. As a result, at the edge of the resin layer 2, the portion of the object 5 that has entered the unevenness of the non-flat surface is hardened and firmly adhered to the object 5.

次いで、図1(e)に示すように、樹脂層の硬化していない部分を除去する(除去工程)。これにより、樹脂層2の除去されなかった部分からなるパターン状の構造が物体5の表面に形成される。 Next, as shown in FIG. 1 (e), the uncured portion of the resin layer is removed (removal step). As a result, a patterned structure composed of the unremoved portion of the resin layer 2 is formed on the surface of the object 5.

次いで、図1(f)に示すように、樹脂層2から基板1を剥離する(剥離工程)。これにより、樹脂層2によるパターン状の構造が表面に形成された物体5が得られる。 Next, as shown in FIG. 1 (f), the substrate 1 is peeled from the resin layer 2 (peeling step). As a result, the object 5 in which the patterned structure formed by the resin layer 2 is formed on the surface is obtained.

本開示の方法により表面加工が施された物体は、種々の用途に利用できる。例えば、多孔質体の表面に所定のサイズの開口部を有するパターンの樹脂層を設けることで、特定の物体を選択的に通過又は遮断する目的に利用することができる。 Objects whose surface has been surface-processed by the method of the present disclosure can be used for various purposes. For example, by providing a resin layer having a pattern having an opening of a predetermined size on the surface of the porous body, it can be used for the purpose of selectively passing or blocking a specific object.

ある実施態様では、本開示の方法により表面加工が施された物体は、細胞の培養を行うための基材(足場材)として利用される。
具体的には、例えば、生体適合性を有する材料からなる多孔質体の表面に、血管外部に存在する細胞のサイズよりも小さい開口部を有するパターンの樹脂層を形成することで、生体内の血管付近の環境を擬似的に作製できる。このように表面加工された物体を足場材として用いることで、多孔質部分(血管外部に相当)では血管外部の細胞の3次元的な培養を、樹脂層部分(血管壁に相当)では血管内皮細胞の2次元的な培養を並行して実施する(共培養)ことができる。
In certain embodiments, the object surfaced by the methods of the present disclosure is used as a substrate (scaffolding material) for culturing cells.
Specifically, for example, by forming a resin layer having a pattern having an opening smaller than the size of a cell existing outside the blood vessel on the surface of a porous body made of a biocompatible material, the resin layer in the living body is formed. The environment near the blood vessel can be created in a simulated manner. By using the surface-processed object as a scaffold material, three-dimensional culture of cells outside the blood vessel is performed in the porous part (corresponding to the outside of the blood vessel), and vascular endothelium is used in the resin layer part (corresponding to the blood vessel wall). Two-dimensional culture of cells can be performed in parallel (co-culture).

<積層体>
本開示の積層体は、非平坦な表面を有する物体と、前記物体の非平坦な表面上に配置される樹脂層を備え、前記樹脂層は感光性樹脂の硬化物であり、前記樹脂層の少なくとも一部が前記物体の非平坦な表面に入り込んでいる、積層体である。
<Laminated body>
The laminate of the present disclosure includes an object having a non-flat surface and a resin layer arranged on the non-flat surface of the object, and the resin layer is a cured product of a photosensitive resin, and the resin layer of the resin layer. It is a laminate in which at least a part of the object has penetrated into the non-flat surface of the object.

本開示の積層体は、物体の非平坦な表面上に配置される樹脂層を備え、この樹脂層は感光性樹脂を用いて形成される。このため、物体の表面が平坦でなくても、フォトリソグラフィ技術を利用して高精細な表面構造がその上に形成される。 The laminate of the present disclosure comprises a resin layer arranged on a non-flat surface of an object, the resin layer being formed using a photosensitive resin. Therefore, even if the surface of the object is not flat, a high-definition surface structure is formed on the surface structure using photolithography technology.

さらに本開示の積層体は、樹脂層の少なくとも一部が物体の非平坦な表面に入り込んでいる。これにより、樹脂層が本来有する接着力に加え、アンカー効果が発現して、樹脂層が物体に強固に接着している。 Further, in the laminate of the present disclosure, at least a part of the resin layer penetrates into the non-flat surface of the object. As a result, in addition to the adhesive force originally possessed by the resin layer, an anchor effect is exhibited, and the resin layer is firmly adhered to the object.

樹脂層が物体の非平坦な表面に入り込んでいる部分の位置は特に制限されない。例えば、樹脂層の縁部であっても、その他の部分であってもよい。樹脂層が物体の非平坦な表面に入り込んでいる部分の面積の割合は特に制限されない。例えば、樹脂層の総面積の50%以下であっても、30%以下であっても、20%以下であってもよい。また、樹脂層の総面積の1%以上であっても、5%以上であっても、10%以上であってもよい。 The position of the portion where the resin layer penetrates into the non-flat surface of the object is not particularly limited. For example, it may be an edge portion of the resin layer or another portion. The ratio of the area where the resin layer penetrates the non-flat surface of the object is not particularly limited. For example, it may be 50% or less, 30% or less, or 20% or less of the total area of the resin layer. Further, it may be 1% or more, 5% or more, or 10% or more of the total area of the resin layer.

樹脂層が物体の非平坦な表面に入り込んでいる部分と、物体の非平坦な表面に入り込んでいない部分とを有する場合、樹脂層の物体の非平坦な表面に入り込んでいる部分は物体に固着した状態であり、樹脂層の物体の非平坦な表面に入り込んでいない部分は物体に固着していない状態であってもよい。 If the resin layer has a portion that penetrates the non-flat surface of the object and a portion that does not penetrate the non-flat surface of the object, the portion of the resin layer that penetrates the non-flat surface of the object sticks to the object. The portion of the resin layer that has not entered the non-flat surface of the object may be in a state of not being fixed to the object.

本開示の積層体を構成する物体及び樹脂層の詳細及び好ましい態様は、上述した物体の表面加工方法において使用される物体及び樹脂層の詳細及び好ましい態様と同様である。 The details and preferred embodiments of the object and the resin layer constituting the laminate of the present disclosure are the same as the details and preferred embodiments of the object and the resin layer used in the above-described method for processing the surface of the object.

本開示の積層体は、種々の用途に利用できる。例えば、上述した物体の表面加工方法において表面加工がされた物体の用途として述べたような細胞の培養を行うための基材としての利用が挙げられる。 The laminate of the present disclosure can be used for various purposes. For example, in the above-mentioned method for surface processing an object, use as a base material for culturing cells as described as an application of a surface-processed object can be mentioned.

<積層体の製造方法>
本開示の積層体の製造方法は、上述した積層体の製造方法であって、(a)基板上に感光性樹脂を含む樹脂層を形成する樹脂層形成工程と、
(b)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対して光を照射する一次照射工程と、
(c)前記光を照射された樹脂層の上に、非平坦な表面を有する物体を配置する物体配置工程と、
(d)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対してさらに光を照射する二次照射工程とを備え、
前記一次照射工程は、前記樹脂層の一部が硬化しない条件で行われ、前記物体配置工程は、前記物体の非平坦な表面が前記樹脂層に対向するように行われる、積層体の製造方法である。
<Manufacturing method of laminated body>
The method for producing a laminate of the present disclosure is the above-mentioned method for producing a laminate, which includes (a) a resin layer forming step of forming a resin layer containing a photosensitive resin on a substrate.
(B) A primary irradiation step of irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed.
(C) An object arranging step of arranging an object having a non-flat surface on the resin layer irradiated with light.
(D) A secondary irradiation step of further irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed is provided.
The primary irradiation step is performed under a condition that a part of the resin layer is not cured, and the object placement step is performed so that the non-flat surface of the object faces the resin layer. Is.

上記方法によれば、物体の表面が平坦でなくても、フォトリソグラフィ技術を利用して高精細な表面構造が物体の表面に形成された積層体を製造することができる。 According to the above method, even if the surface of the object is not flat, it is possible to manufacture a laminate in which a high-definition surface structure is formed on the surface of the object by using photolithography technology.

上記方法における各工程の詳細及び好ましい態様は、上述した物体の表面加工方法における各工程の詳細及び好ましい態様と同様である。 The details and preferred embodiments of each step in the above method are the same as the details and preferred embodiments of each step in the above-described method for processing the surface of an object.

<表面加工試験>
ガラス基板の片面に、孔径5μm、格子サイズ4μmのメッシュパターンをクロムを用いて形成し、犠牲層(Omnicoat、膜厚:20nm以下)をその上に形成した。次いで、犠牲層の上に、感光性樹脂としてエポキシ系ネガティブレジスト(SU−8、日本化薬株式会社)を用いて樹脂層を形成した(厚さ:10μm)。
<Surface processing test>
A mesh pattern having a pore diameter of 5 μm and a lattice size of 4 μm was formed on one side of the glass substrate using chromium, and a sacrificial layer (Omnicoat, film thickness: 20 nm or less) was formed on the mesh pattern. Next, a resin layer was formed on the sacrificial layer using an epoxy-based negative resist (SU-8, Nippon Kayaku Co., Ltd.) as a photosensitive resin (thickness: 10 μm).

ガラス基板の樹脂層が形成された面と逆側の面から、紫外線(波長:365nm)を照射し、樹脂層の光が照射された部分を硬化させた。このとき、樹脂層の光照射面と逆側の部分が硬化しないように照射条件を調整した。 Ultraviolet rays (wavelength: 365 nm) were irradiated from the surface of the glass substrate opposite to the surface on which the resin layer was formed, and the light-irradiated portion of the resin layer was cured. At this time, the irradiation conditions were adjusted so that the portion of the resin layer opposite to the light irradiation surface was not cured.

光照射後の樹脂層の上に、多孔質の細胞培養基材(Alvetex Scaffold、直径8mm、厚さ:200μm)を配置した。このとき、樹脂層の硬化していない部分が表面張力によって細胞培養基材の樹脂層と接する面の細孔に入り込んだ状態になった。 A porous cell culture substrate (Alvetex Scaffold, diameter 8 mm, thickness: 200 μm) was placed on the resin layer after light irradiation. At this time, the uncured portion of the resin layer entered the pores of the surface of the cell culture substrate in contact with the resin layer due to surface tension.

さらに、ガラス基板の樹脂層が形成された面と逆側の面から、紫外線(波長:365nm)を照射した。このとき、マスクを用いて、細胞培養機材の縁部に相当する樹脂層にのみ光が照射されるようにして、樹脂を完全に硬化させた。 Further, ultraviolet rays (wavelength: 365 nm) were irradiated from the surface of the glass substrate opposite to the surface on which the resin layer was formed. At this time, the resin was completely cured by irradiating only the resin layer corresponding to the edge of the cell culture equipment with light using a mask.

次いで、現像液(SU−8 Developer、日本化薬株式会社)を用いて未硬化の樹脂を溶解除去し、ガラス基板を剥離した。得られた細胞培養基材の表面を走査型電子顕微鏡で観察したところ、図2及び図3に示すように、感光性樹脂の硬化物からなるメッシュ状の樹脂層が形成された部分(メッシュ部)と、メッシュ部の周囲に感光性樹脂が細胞培養基材の細孔に入り込んで硬化した部分(接着部)とが形成されていた。 Next, the uncured resin was dissolved and removed using a developing solution (SU-8 Developer, Nippon Kayaku Co., Ltd.), and the glass substrate was peeled off. When the surface of the obtained cell culture substrate was observed with a scanning electron microscope, as shown in FIGS. 2 and 3, a portion (mesh portion) in which a mesh-like resin layer made of a cured product of a photosensitive resin was formed. ), And a portion (adhesive portion) in which the photosensitive resin entered the pores of the cell culture substrate and was cured was formed around the mesh portion.

<細胞培養試験>
上記方法で作製したメッシュ状の樹脂層を備える細胞培養基材を生体内の2次元と3次元構造に見立て、HeLa細胞とHepG2細胞の共培養を実施した。その結果、細胞培養基材側でHeLa細胞、樹脂層側でHepG2細胞をそれぞれ培養することができた。
<Cell culture test>
The cell culture substrate provided with the mesh-like resin layer prepared by the above method was regarded as a two-dimensional and three-dimensional structure in a living body, and HeLa cells and HepG2 cells were co-cultured. As a result, HeLa cells could be cultured on the cell culture substrate side, and HepG2 cells could be cultured on the resin layer side.

1…基板、2…樹脂層、3…犠牲層、4…光、5…物体、6…光、7…マスク 1 ... substrate, 2 ... resin layer, 3 ... sacrificial layer, 4 ... light, 5 ... object, 6 ... light, 7 ... mask

Claims (10)

(a)基板上に感光性樹脂を含む樹脂層を形成する樹脂層形成工程と、
(b)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対して光を照射する一次照射工程と、
(c)前記光を照射された樹脂層の上に、非平坦な表面を有する物体を配置する物体配置工程と、
(d)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対してさらに光を照射する二次照射工程とを備え、
前記一次照射工程は、前記樹脂層の一部が硬化しない条件で行われ、前記物体配置工程は、前記物体の非平坦な表面が前記樹脂層に対向するように行われる、物体の表面加工方法。
(A) A resin layer forming step of forming a resin layer containing a photosensitive resin on a substrate, and
(B) A primary irradiation step of irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed.
(C) An object arranging step of arranging an object having a non-flat surface on the resin layer irradiated with light.
(D) A secondary irradiation step of further irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed is provided.
The primary irradiation step is performed under a condition that a part of the resin layer is not cured, and the object placement step is performed so that the non-flat surface of the object faces the resin layer. ..
前記物体は多孔質体である、請求項1に記載の物体の表面加工方法。 The method for surface processing an object according to claim 1, wherein the object is a porous body. 前記感光性樹脂は光硬化性樹脂である、請求項1又は請求項2に記載の表面加工方法。 The surface processing method according to claim 1 or 2, wherein the photosensitive resin is a photocurable resin. 非平坦な表面を有する物体と、前記物体の非平坦な表面上に配置される樹脂層を備え、前記樹脂層は感光性樹脂の硬化物であり、前記樹脂層の少なくとも一部が前記物体の非平坦な表面に入り込んでいる、積層体。 An object having a non-flat surface and a resin layer arranged on the non-flat surface of the object are provided, the resin layer is a cured product of a photosensitive resin, and at least a part of the resin layer is the object. A laminate that penetrates into a non-flat surface. 前記物体は多孔質体である、請求項4に記載の積層体。 The laminate according to claim 4, wherein the object is a porous body. 前記感光性樹脂は光硬化性樹脂である、請求項4又は請求項5に記載の積層体。 The laminate according to claim 4 or 5, wherein the photosensitive resin is a photocurable resin. 前記樹脂層が前記物体の非平坦な表面に入り込んでいる部分は前記樹脂層の縁部である、請求項4〜請求項6のいずれ1項に記載の積層体。 The laminate according to any one of claims 4 to 6, wherein the portion where the resin layer penetrates into the non-flat surface of the object is an edge portion of the resin layer. 前記樹脂層が前記物体の非平坦な表面に入り込んでいる部分は前記樹脂層の総面積の50%以下である、請求項4〜請求項7のいずれ1項に記載の積層体。 The laminate according to any one of claims 4 to 7, wherein the portion where the resin layer penetrates into the non-flat surface of the object is 50% or less of the total area of the resin layer. 前記樹脂層が前記物体の非平坦な表面に入り込んでいる部分と、前記物体の非平坦な表面に入り込んでいない部分とを有し、前記物体の非平坦な表面に入り込んでいる部分は前記物体に固着した状態であり、前記物体の非平坦な表面に入り込んでいない部分は前記物体に固着していない状態である、請求項4〜請求項8のいずれ1項に記載の積層体。 The resin layer has a portion that penetrates into the non-flat surface of the object and a portion that does not penetrate into the non-flat surface of the object, and the portion that penetrates into the non-flat surface of the object is the object. The laminate according to any one of claims 4 to 8, wherein the portion that is stuck to the object and does not enter the non-flat surface of the object is not stuck to the object. (a)基板上に感光性樹脂を含む樹脂層を形成する樹脂層形成工程と、
(b)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対して光を照射する一次照射工程と、
(c)前記光を照射された樹脂層の上に、非平坦な表面を有する物体を配置する物体配置工程と、
(d)前記基板の前記樹脂層が形成された側と逆側の面から、前記樹脂層に対してさらに光を照射する二次照射工程とを備え、
前記一次照射工程は、前記樹脂層の一部が硬化しない条件で行われ、前記物体配置工程は、前記物体の非平坦な表面が前記樹脂層に対向するように行われる、請求項4〜請求項9のいずれか1項に記載の積層体の製造方法。
(A) A resin layer forming step of forming a resin layer containing a photosensitive resin on a substrate, and
(B) A primary irradiation step of irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed.
(C) An object arranging step of arranging an object having a non-flat surface on the resin layer irradiated with light.
(D) A secondary irradiation step of further irradiating the resin layer with light from a surface of the substrate opposite to the side on which the resin layer is formed is provided.
Claims 4 to claim that the primary irradiation step is performed under a condition that a part of the resin layer is not cured, and the object placement step is performed so that the non-flat surface of the object faces the resin layer. Item 9. The method for producing a laminate according to any one of Items 9.
JP2020556164A 2018-11-15 2019-11-14 Surface processing method of object, laminate, and method for manufacturing laminate Active JP7410572B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2018214872 2018-11-15
JP2018214872 2018-11-15
PCT/JP2019/044689 WO2020100976A1 (en) 2018-11-15 2019-11-14 Object surface processing method, laminate, and laminate production method

Publications (2)

Publication Number Publication Date
JPWO2020100976A1 true JPWO2020100976A1 (en) 2021-10-07
JP7410572B2 JP7410572B2 (en) 2024-01-10

Family

ID=70731591

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2020556164A Active JP7410572B2 (en) 2018-11-15 2019-11-14 Surface processing method of object, laminate, and method for manufacturing laminate

Country Status (2)

Country Link
JP (1) JP7410572B2 (en)
WO (1) WO2020100976A1 (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000024589A (en) * 1998-07-09 2000-01-25 Dainippon Printing Co Ltd Decorative material and its production
WO2017209284A1 (en) * 2016-06-02 2017-12-07 凸版印刷株式会社 Method for manufacturing display body, display intermediate, and display body
JP2018004939A (en) * 2016-07-01 2018-01-11 Jsr株式会社 Photosensitive resin composition, cell culture substrate and method for producing the same, and treatment agent for cell culture substrate

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6025749A (en) * 1983-07-22 1985-02-08 大日本印刷株式会社 Manufacture of synthetic resin composite sheet

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000024589A (en) * 1998-07-09 2000-01-25 Dainippon Printing Co Ltd Decorative material and its production
WO2017209284A1 (en) * 2016-06-02 2017-12-07 凸版印刷株式会社 Method for manufacturing display body, display intermediate, and display body
JP2018004939A (en) * 2016-07-01 2018-01-11 Jsr株式会社 Photosensitive resin composition, cell culture substrate and method for producing the same, and treatment agent for cell culture substrate

Also Published As

Publication number Publication date
WO2020100976A1 (en) 2020-05-22
JP7410572B2 (en) 2024-01-10

Similar Documents

Publication Publication Date Title
JP4262271B2 (en) Imprint method, imprint apparatus, and structure manufacturing method
KR101602974B1 (en) Pellicle for lithography and manufacturing method for pellicle layer
JP5875197B2 (en) Reticle chuck cleaner and reticle chuck cleaning method
Scharnweber et al. Rapid prototyping of microstructures in polydimethylsiloxane (PDMS) by direct UV-lithography
EP3168863A1 (en) Mold for step-and-repeat imprinting, and method for producing same
TWI663472B (en) Manufacturing method of fine structure
Landis Nano Lithography
JP5879942B2 (en) Cell culture substrate manufacturing method, cell culture substrate, and cell sheet manufacturing method using the same
JP4832341B2 (en) Printing plate manufacturing method
JP2007178783A (en) Method for manufacturing patterned body and manufacturing device for patterned body
JPWO2018105608A1 (en) Particle trapping device
JP7410572B2 (en) Surface processing method of object, laminate, and method for manufacturing laminate
JP6409284B2 (en) Imprint mold substrate, imprint mold, method for producing the same, and method for regenerating imprint mold
JP2007313886A (en) Method for manufacturing film having uneven surface, film having uneven surface, method for manufacturing support having uneven surface, and support having uneven surface
JP4588041B2 (en) Printing plate manufacturing method using resin mold
CN108866478B (en) Mask manufacturing method and mask
JP2019155550A (en) Method for manufacturing micro-flow passage
JP7270350B2 (en) Method for manufacturing patterned body
Tormen et al. Three-dimensional micro-and nanostructuring by combination of nanoimprint and x-ray lithography
US8399179B2 (en) High aspect ratio microstructures
KR102159231B1 (en) Cell culture container and manufacturing method thereof
EP2851749B1 (en) X-ray mask structure and method for preparing the same
JP2010147295A (en) Method for forming three-dimensional microstructure, and method for manufacturing liquid ejecting head
JP6318840B2 (en) Manufacturing method of substrate for imprint mold
Wang et al. Fabrication of high-transmission microporous membranes by proton beam writing-based molding technique

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20220929

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20230606

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20230804

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20231005

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20231205

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20231215

R150 Certificate of patent or registration of utility model

Ref document number: 7410572

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150