JPWO2020052862A5 - - Google Patents

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JPWO2020052862A5
JPWO2020052862A5 JP2021512449A JP2021512449A JPWO2020052862A5 JP WO2020052862 A5 JPWO2020052862 A5 JP WO2020052862A5 JP 2021512449 A JP2021512449 A JP 2021512449A JP 2021512449 A JP2021512449 A JP 2021512449A JP WO2020052862 A5 JPWO2020052862 A5 JP WO2020052862A5
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光学効果層（ＯＥＬ）（ｘ２０）を基板（ｘ１０）上に生成するためのプロセスであって、
ａ）複数の非球状磁性又は磁化可能顔料粒子を含む第１の状態の第１の放射線硬化性コーティング組成物を基板（ｘ１０）表面に塗布することにより、第１のコーティング層（ｘ２１）の１つ又は複数の第１のパターンを形成するステップと、
ｂ）前記第１の放射線硬化性コーティング組成物を
ｉ）磁気軸が前記基板（ｘ１０）表面と実質的に垂直な単一のループ状双極子磁石又はループ状構成に配設され、磁気軸が結果的に前記基板（ｘ１０）表面と実質的に垂直な２つ以上の双極子磁石の組合せであるループ状磁界発生装置（ｘ３１）を備えた磁界発生装置（ｘ３０）と、ｉｉ）磁気軸が前記基板（ｘ１０）表面と実質的に平行な単一の棒状双極子磁石又は磁気軸が結果的に前記基板（ｘ１０）表面と実質的に平行な２つ以上の棒状双極子磁石（ｘ４１）の組合せである磁界発生装置（ｘ４０）とを備えた第１の磁気アセンブリ（ｘ００－ａ）の磁界、
ｉ）支持マトリクス（ｘ３４）、磁気軸が前記基板（ｘ１０）表面と実質的に垂直な単一のループ状双極子磁石又はループ状構成に配設され、磁気軸が前記基板（ｘ１０）表面と実質的に垂直で、同じ磁界方向をそれぞれ有する２つ以上の双極子磁石の組合せであるループ状磁界発生装置（ｘ３１）、磁気軸が前記基板（ｘ１０）表面と実質的に垂直な単一の双極子磁石（ｘ３２）又は磁気軸が前記基板（ｘ１０）表面と実質的に垂直で、同じ磁界方向を有する２つ以上の双極子磁石（ｘ３２）、並びに／又は１つ若しくは複数の磁極片（ｘ３３）を備えた磁界発生装置（ｘ３０）と、ｉｉ）磁気軸が前記基板（ｘ１０）表面と実質的に平行な単一の棒状双極子磁石又は磁気軸が前記基板（ｘ１０）表面と実質的に平行で、同じ磁界方向をそれぞれ有する２つ以上の棒状双極子磁石（ｘ４１）の組合せである磁界発生装置（ｘ４０）とを備えた第１の磁気アセンブリ（ｘ００－ａ）の磁界、或いは、
ｉ）支持マトリクス（ｘ３４）、単一のループ状磁石又はループ状構成に配設された２つ以上の双極子磁石の組合せである半径方向の磁化を有するループ状磁界発生装置（ｘ３１）、磁気軸が前記基板（ｘ１０）表面と実質的に垂直な単一の双極子磁石（ｘ３２）、磁気軸が前記基板（ｘ１０）表面と実質的に平行な単一の双極子磁石（ｘ３２）、又はそれぞれの磁気軸が前記基板（ｘ１０）表面と実質的に垂直な２つ以上の双極子磁石（ｘ３２）を備えた磁界発生装置（ｘ３０）であり、前記ループ状磁界発生装置（ｘ３１）を構成する前記単一のループ状磁石若しくは前記２つ以上の双極子磁石のＮ極が前記ループ状磁界発生装置（ｘ３１）の周辺側を向く場合に、前記単一の双極子磁石（ｘ３２）のＮ極又は前記２つ以上の双極子磁石（ｘ３２）のうちの少なくとも１つのＮ極が前記基板（ｘ１０）表面側を向くか、又は、前記ループ状磁界発生装置（ｘ３１）を構成する前記単一のループ状磁石若しくは前記２つ以上の双極子磁石のＳ極が前記ループ状磁界発生装置（ｘ３１）の周辺側を向く場合に、前記単一の双極子磁石（ｘ３２）のＳ極又は前記２つ以上の双極子磁石（ｘ３２）のうちの少なくとも１つのＳ極が前記基板（ｘ１０）表面側を向く、磁界発生装置（ｘ３０）と、ｉｉ）磁気軸が前記基板（ｘ１０）表面と実質的に平行な単一の棒状双極子磁石又は磁気軸が前記基板（ｘ１０）表面と実質的に平行で、同じ磁界方向をそれぞれ有する２つ以上の棒状双極子磁石（ｘ４１）の組合せである磁界発生装置（ｘ４０）とを備えた第１の磁気アセンブリ（ｘ００－ａ）の磁界、
に曝露することにより、前記非球状磁性又は磁化可能顔料粒子の少なくとも一部を配向させるステップと、
ｃ）ステップｂ）の第１の放射線硬化性コーティング組成物を少なくとも部分的に硬化させて第２の状態とすることにより、前記非球状磁性又は磁化可能顔料粒子をそれぞれの選ばれた位置及び配向に固定するとともに、少なくとも部分的に硬化した１つ又は複数の第１のパターンを形成するステップと、
ｄ）複数の非球状磁性又は磁化可能顔料粒子を含む第１の状態の第２の放射線硬化性コーティング組成物をステップｃ）の少なくとも部分的に硬化した１つ又は複数の第１のパターンに少なくとも部分的に塗布することにより、第２のコーティング層（ｘ２２）の１つ又は複数の第２のパターンを形成するステップと、
ｅ）ステップｂ）の前記第１の磁気アセンブリ（ｘ００－ａ）から選択される第２の磁気アセンブリ（ｘ００－ｂ）の磁界に前記第２の放射線硬化性コーティング組成物を曝露するステップであり、前記第２の磁気アセンブリ（ｘ００－ｂ）が、ステップｂ）において使用される前記第１の磁気アセンブリ（ｘ００－ａ）と異なり、前記磁気アセンブリ（ｘ００－ｂ）の前記磁界発生装置（ｘ４０）の磁場方向が、前記基板（ｘ１０）の基準フレーム内において、前記第１の磁気アセンブリ（ｘ００－ａ）の前記磁界発生装置（ｘ４０）の磁場方向と反対である、ステップと、
ｆ）ステップｅ）の前記第２の放射線硬化性コーティング組成物を少なくとも部分的に硬化させて第２の状態とすることにより、前記非球状磁性又は磁化可能顔料粒子をそれぞれの選ばれた位置及び配向に固定するとともに、少なくとも部分的に硬化した１つ又は複数の第２のパターンを形成するステップであり、前記光学効果層が、当該光学効果層の傾斜によりサイズ及び形状が変化するループ状体の光学的印象を与える、ステップと、
を含む、プロセス。 A process for forming an optical effect layer (OEL) (x20) on a substrate (x10).
a) 1 of the first coating layer (x21) by applying the first radiation curable coating composition in the first state containing a plurality of non-spherical magnetic or magnetizable pigment particles to the surface of the substrate (x10). Steps to form one or more first patterns,
b) The first radiation curable coating composition i) the magnetic axis is arranged in a single looped bipolar magnet or looped configuration substantially perpendicular to the surface of the substrate (x10), with the magnetic axis As a result, the magnetic field generator (x30) provided with the loop-shaped magnetic field generator (x31), which is a combination of two or more bipolar magnets substantially perpendicular to the surface of the substrate (x10), and ii) the magnetic axis A single rod-shaped dipole magnet or magnetic axis substantially parallel to the surface of the substrate (x10) results in two or more rod-shaped dipole magnets (x41) substantially parallel to the surface of the substrate (x10). The magnetic field of the first magnetic assembly (x00-a) with the combined magnetic field generator (x40),
i) The support matrix (x34), the magnetic axis is arranged in a single loop-shaped bipolar magnet or loop-shaped structure substantially perpendicular to the surface of the substrate (x10), and the magnetic axis is arranged with the surface of the substrate (x10). A loop-shaped magnetic field generator (x31), which is a combination of two or more bipolar magnets that are substantially vertical and each have the same magnetic field direction, a single magnetic axis that is substantially perpendicular to the surface of the substrate (x10). Two or more dipole magnets (x32) whose magnetic axis is substantially perpendicular to the surface of the substrate (x10) and has the same magnetic field direction, and / or one or more magnetic pole pieces (x32). A magnetic field generator (x30) equipped with x33) and a single rod-shaped dipole magnet or magnetic axis whose magnetic axis is substantially parallel to the surface of the substrate (x10) are substantially parallel to the surface of the substrate (x10). The magnetic field of the first magnetic assembly (x00-a) with a magnetic field generator (x40) which is a combination of two or more rod-shaped bipolar magnets (x41) parallel to and having the same magnetic field direction, respectively.
i) Support matrix (x34), loop magnetic field generator (x31) with radial magnetization, which is a combination of a single loop magnet or two or more dipole magnets arranged in a loop configuration, magnetism. A single dipole magnet (x32) whose axis is substantially perpendicular to the surface of the substrate (x10), a single dipole magnet (x32) whose magnetic axis is substantially parallel to the surface of the substrate (x10), or A magnetic field generator (x30) having two or more dipole magnets (x32) whose magnetic axes are substantially perpendicular to the surface of the substrate (x10), constituting the loop-shaped magnetic field generator (x31). N of the single dipole magnet (x32) when the N pole of the single loop magnet or the two or more dipole magnets faces the peripheral side of the loop magnetic field generator (x31). The pole or at least one N pole of the two or more dipole magnets (x32) faces the surface side of the substrate (x10), or the single that constitutes the loop-shaped magnetic field generator (x31). When the S pole of the loop magnet or the two or more dipole magnets faces the peripheral side of the loop magnetic field generator (x31), the S pole of the single dipole magnet (x32) or the 2 A magnetic field generator (x30) in which at least one S pole of one or more dipole magnets (x32) faces the surface side of the substrate (x10), and ii) a magnetic axis substantially with the surface of the substrate (x10). A single rod-shaped dipole magnet parallel to or a combination of two or more rod-shaped dipole magnets (x41) whose magnetic axis is substantially parallel to the surface of the substrate (x10) and has the same magnetic field direction, respectively. The magnetic field of the first magnetic assembly (x00-a) with the device (x40),
A step of orienting at least a portion of the non-spherical magnetic or magnetizable pigment particles by exposure to.
c) By at least partially curing the first radiation curable coating composition of step b) to a second state, the non-spherical magnetic or magnetizable pigment particles are placed in their respective selected positions and orientations. With the step of forming one or more first patterns that are fixed to and at least partially cured.
d) At least one or more first patterns of the second radiation curable coating composition in the first state containing a plurality of non-spherical magnetic or magnetizable pigment particles in step c) at least partially cured. A step of forming one or more second patterns of the second coating layer (x22) by partial application.
e) The step of exposing the second radiation curable coating composition to the magnetic field of the second magnetic assembly (x00-b) selected from the first magnetic assembly (x00-a) in step b). The second magnetic assembly (x00-b) is different from the first magnetic assembly (x00-a) used in step b), and the magnetic field generator (x40) of the magnetic assembly (x00-b). ) Is opposite to the magnetic field direction of the magnetic field generator (x40) of the first magnetic assembly (x00-a) in the reference frame of the substrate (x10).
f) By at least partially curing the second radiation curable coating composition of step e) to a second state, the non-spherical magnetic or magnetizable pigment particles are placed at their respective selected positions and. A loop-like body in which the optical effect layer changes in size and shape due to the inclination of the optical effect layer, which is a step of forming one or a plurality of second patterns that are fixed in orientation and at least partially cured. Steps and, which give an optical impression of
Including the process. 前記第１の磁気アセンブリ（ｘ００－ａ）及び／又は前記第２の磁気アセンブリ（ｘ００－ｂ）が、
ｉ）支持マトリクス（ｘ３４）、磁気軸が前記基板（ｘ１０）表面と実質的に垂直な単一のリング状双極子磁石である前記ループ状磁界発生装置（ｘ３１）、並びに１つ若しくは複数の磁極片（ｘ３３）を備えた前記磁界発生装置（ｘ３０）、並びにｉｉ）磁気軸が前記基板（ｘ１０）表面と実質的に平行で、同じ磁界方向をそれぞれ有する２つ以上の棒状双極子磁石（ｘ４１）である前記磁界発生装置（ｘ４０）、或いは、
ｉｉ）前記支持マトリクス（ｘ３４）、ループ状構成、好ましくは正方形状構成に配設され、それぞれの磁気軸が前記基板（ｘ１０）表面と実質的に平行な４つ以上の双極子磁石（ｘ３１）の組合せである半径方向の磁化を有する前記ループ状磁界発生装置（ｘ３１）、及び磁気軸が前記基板（ｘ１０）表面と実質的に垂直で、同じ磁界方向を有する２つ以上の双極子磁石（ｘ３２）を備えた前記磁界発生装置（ｘ３０）、ｉｉ）磁気軸が前記基板（ｘ１０）表面と実質的に平行な単一の棒状双極子磁石である前記磁界発生装置（ｘ４０）であり、前記ループ状磁界発生装置（ｘ３１）を構成する前記４つ以上の双極子磁石のＮ極が前記ループ状磁界発生装置（ｘ３１）の周辺側を向く場合に、前記２つ以上の双極子磁石（ｘ３２）のうちの少なくとも１つのＮ極が前記基板（ｘ１０）表面側を向くか、又は、前記ループ状磁界発生装置（ｘ３１）を構成する前記４つ以上の双極子磁石のＳ極が前記ループ状磁界発生装置（ｘ３１）の周辺側を向く場合に、前記２つ以上の双極子磁石（ｘ３２）のうちの少なくとも１つのＳ極が前記基板（ｘ１０）表面側を向く、前記磁界発生装置（ｘ４０）、並びにｉｉｉ）任意選択で１つ又は複数の磁極片（ｘ５０）、
を独立して備えた、請求項１に記載のプロセス。 The first magnetic assembly (x00-a) and / or the second magnetic assembly (x00-b)
i) The support matrix (x34), the loop-shaped magnetic field generator (x31) in which the magnetic axis is a single ring-shaped bipolar magnet magnet substantially perpendicular to the surface of the substrate (x10), and one or more magnetic poles. The magnetic field generator (x30) with a piece (x33), and ii) two or more rod-shaped bipolar magnets (x41) whose magnetic axis is substantially parallel to the surface of the substrate (x10) and each has the same magnetic field direction. ), The magnetic field generator (x40), or
ii) Four or more dipole magnets (x31) arranged in the support matrix (x34), loop-shaped configuration, preferably square-shaped configuration, each having a magnetic axis substantially parallel to the surface of the substrate (x10). The loop-shaped magnetic field generator (x31) having radial magnetization, which is a combination of the above, and two or more dipole magnets whose magnetic axis is substantially perpendicular to the surface of the substrate (x10) and has the same magnetic field direction (x3). The magnetic field generator (x30) provided with x32), ii) the magnetic field generator (x40), which is a single rod-shaped bipolar magnet whose magnetic axis is substantially parallel to the surface of the substrate (x10). When the N poles of the four or more dipole magnets constituting the loop-shaped magnetic field generator (x31) face the peripheral side of the loop-shaped magnetic field generator (x31), the two or more dipole magnets (x32) ), At least one N pole faces the surface side of the substrate (x10), or the S poles of the four or more bipolar magnets constituting the loop-shaped magnetic field generator (x31) are loop-shaped. The magnetic field generator (x40) in which at least one S pole of the two or more bipolar magnets (x32) faces the surface side of the substrate (x10) when facing the peripheral side of the magnetic field generator (x31). ), And iii) One or more magnetic pole pieces (x50), optionally
The process according to claim 1, wherein the process is independently provided. 前記第１の磁気アセンブリ（ｘ００－ａ）の前記磁界発生装置（ｘ３０）が、前記第１の磁気アセンブリ（ｘ００－ａ）の前記磁界発生装置（ｘ４０）の上に配置され、前記第２の磁気アセンブリ（ｘ００－ｂ）の前記磁界発生装置（ｘ４０）が、前記第２の磁気アセンブリ（ｘ００－ｂ）の前記磁界発生装置（ｘ３０）の上に配置された、請求項２に記載のプロセス。 The magnetic field generator (x30) of the first magnetic assembly (x00-a) is placed on the magnetic field generator (x40) of the first magnetic assembly (x00-a), and the second magnetic assembly (x00-a) is placed on the magnetic field generator (x40). The process according to claim 2, wherein the magnetic field generator (x40) of the magnetic assembly (x00-b) is placed on the magnetic field generator (x30) of the second magnetic assembly (x00-b). .. 前記第１の磁気アセンブリ（ｘ００－ａ）が、
ｉ）前記支持マトリクス（ｘ３４）、磁気軸が前記基板（ｘ１０）表面と実質的に垂直な単一のリング状双極子磁石である前記ループ状磁界発生装置（ｘ３１）、並びに１つ若しくは複数の磁極片（ｘ３３）を備えた前記磁界発生装置（ｘ３０）と、
ｉｉ）磁気軸が前記基板（ｘ１０）表面と実質的に平行で、同じ磁界方向をそれぞれ有する２つ以上の棒状双極子磁石（ｘ４１）である前記磁界発生装置（ｘ４０）と、
を備え、
前記第２の磁気アセンブリ（ｘ００－ｂ）が、
ｉ）前記支持マトリクス（ｘ３４）、ループ状構成、好ましくは正方形状構成に配設され、それぞれの磁気軸が前記基板（ｘ１０）表面と実質的に平行な４つ以上の双極子磁石の組合せである半径方向の磁化を有する前記ループ状磁界発生装置（ｘ３１）、及び磁気軸が前記基板（ｘ１０）表面と実質的に垂直で、同じ磁界方向を有する２つ以上の双極子磁石（ｘ３２）を備えた前記磁界発生装置（ｘ３０）であり、前記ループ状磁界発生装置（ｘ３１）を構成する前記４つ以上の双極子磁石のＮ極が前記ループ状磁界発生装置（ｘ３１）の周辺側を向く場合に、前記２つ以上の双極子磁石（ｘ３２）のうちの少なくとも１つのＮ極が前記基板（ｘ１０）表面側を向くか、又は、前記ループ状磁界発生装置（ｘ３１）を構成する前記４つ以上の双極子磁石のＳ極が前記ループ状磁界発生装置（ｘ３１）の周辺側を向く場合に、前記２つ以上の双極子磁石（ｘ３２）のうちの少なくとも１つのＳ極が前記基板（ｘ１０）表面側を向く、前記磁界発生装置（ｘ３０）と、
ｉｉ）磁気軸が前記基板（ｘ１０）表面と実質的に平行な単一の棒状双極子磁石である前記磁界発生装置（ｘ４０）と、
ｉｉｉ）任意選択で１つ又は複数の磁極片（ｘ５０）と、
を備えた、請求項１又は２に記載のプロセス。 The first magnetic assembly (x00-a)
i) The support matrix (x34), the loop magnetic field generator (x31) in which the magnetic axis is a single ring-shaped dipole magnet substantially perpendicular to the surface of the substrate (x10), and one or more. The magnetic field generator (x30) provided with a magnetic pole piece (x33) and
ii) The magnetic field generator (x40), which is two or more rod-shaped dipole magnets (x41) whose magnetic axis is substantially parallel to the surface of the substrate (x10) and has the same magnetic field direction, respectively.
Equipped with
The second magnetic assembly (x00-b)
i) A combination of four or more dipole magnets arranged in the support matrix (x34), loop-shaped configuration, preferably square-shaped configuration, each of which has a magnetic axis substantially parallel to the surface of the substrate (x10). The looped magnetic field generator (x31) having a certain radial magnetization, and two or more dipole magnets (x32) whose magnetic axis is substantially perpendicular to the surface of the substrate (x10) and having the same magnetic field direction. The magnetic field generator (x30) provided, and the N poles of the four or more dipole magnets constituting the loop magnetic field generator (x31) face the peripheral side of the loop magnetic field generator (x31). In this case, at least one N pole of the two or more dipole magnets (x32) faces the surface side of the substrate (x10), or the loop-shaped magnetic field generator (x31) constitutes the 4th. When the S poles of one or more dipole magnets face the peripheral side of the loop-shaped magnetic field generator (x31), at least one S pole of the two or more dipole magnets (x32) is the substrate (. x10) The magnetic field generator (x30) facing the surface side and
ii) With the magnetic field generator (x40), the magnetic axis is a single rod-shaped dipole magnet substantially parallel to the surface of the substrate (x10).
iii) With one or more magnetic pole pieces (x50) at will,
The process of claim 1 or 2, comprising: 前記第１の磁気アセンブリ（ｘ００－ａ）の前記磁界発生装置（ｘ３０）が、前記第１の磁気アセンブリ（ｘ００－ａ）の前記磁界発生装置（ｘ４０）の上に配置され、前記第２の磁気アセンブリ（ｘ００－ｂ）の前記磁界発生装置（ｘ４０）が、前記第２の磁気アセンブリ（ｘ００－ｂ）の前記磁界発生装置（ｘ３０）の上に配置された、請求項４に記載のプロセス。 The magnetic field generator (x30) of the first magnetic assembly (x00-a) is placed on the magnetic field generator (x40) of the first magnetic assembly (x00-a), and the second magnetic assembly (x00-a) is placed on the magnetic field generator (x40). The process according to claim 4, wherein the magnetic field generator (x40) of the magnetic assembly (x00-b) is placed on the magnetic field generator (x30) of the second magnetic assembly (x00-b). .. ステップａ）及び／又はステップｄ）が、印刷プロセス、好ましくはスクリーン印刷、グラビア印刷、及びフレキソ印刷から成る群から選択される印刷プロセスによって実行される、請求項１～５のいずれか一項に記載のプロセス。 In any one of claims 1-5, step a) and / or step d) is performed by a printing process selected from the group consisting of a printing process, preferably screen printing, gravure printing, and flexographic printing. The process described. 前記複数の非球状磁性又は磁化可能粒子の少なくとも一部が、好ましくは磁性薄膜干渉顔料、磁性コレステリック液晶顔料、及びこれらの混合物から成る群から選択される非球状光学可変磁性又は磁化可能顔料粒子により構成された、請求項１～６のいずれか一項に記載のプロセス。 At least a portion of the plurality of non-spherical magnetic or magnetizable particles is preferably made of non-spherical optically variable magnetic or magnetizable pigment particles selected from the group consisting of magnetic thin film interfering pigments, magnetic cholesteric liquid crystal pigments, and mixtures thereof. The process according to any one of claims 1 to 6, which is configured. 前記非球状磁性又は磁化可能顔料粒子が、前記第１の放射線硬化性コーティング組成物及び前記第２の放射線硬化性コーティング組成物において同じであるか、又は、前記非球状磁性又は磁化可能顔料粒子が、前記第１の放射線硬化性コーティング組成物及び前記第２の放射線硬化性コーティング組成物においてサイズ及び／又は色特性に関して異なる、請求項１～７のいずれか一項に記載のプロセス。 The non-spherical magnetic or magnetizable pigment particles are the same in the first radiation curable coating composition and the second radiation curable coating composition, or the non-spherical magnetic or magnetizable pigment particles are The process according to any one of claims 1 to 7, wherein the first radiation curable coating composition and the second radiation curable coating composition differ in size and / or color characteristics. 前記非球状磁性又は磁化可能顔料粒子が、前記第１の放射線硬化性コーティング組成物においておよそ２重量％～およそ４０重量％の量だけ存在し、前記非球状磁性又は磁化可能顔料粒子が、前記第２の放射線硬化性コーティング組成物においておよそ２重量％～およそ４０重量％の量だけ存在する、請求項１～８のいずれか一項に記載のプロセス。 The non-spherical magnetic or magnetizable pigment particles are present in an amount of about 2% by weight to about 40% by weight in the first radiation curable coating composition, and the non-spherical magnetic or magnetizable pigment particles are the first. The process according to any one of claims 1 to 8, which is present in an amount of about 2% by weight to about 40% by weight in the radiation curable coating composition of 2. 前記非球状磁性又は磁化可能顔料粒子が、前記第１の放射線硬化性コーティング組成物及び前記第２の放射線硬化性コーティング組成物において、およそ同じ量だけ存在する、請求項１～９のいずれか一項に記載のプロセス。 Any one of claims 1 to 9, wherein the non-spherical magnetic or magnetizable pigment particles are present in approximately the same amount in the first radiation curable coating composition and the second radiation curable coating composition. The process described in the section. ステップｃ）が、ステップｂ）と一部同時に実行され、及び／又は、ステップｆ）が、ステップｅ）と一部同時に実行される、請求項１～１０のいずれか一項に記載のプロセス。 The process according to any one of claims 1 to 10, wherein step c) is partially executed simultaneously with step b) and / or step f) is partially executed simultaneously with step e). 前記非球状磁性又は磁化可能顔料粒子が、血小板状顔料粒子であり、当該プロセスが、前記放射線硬化性コーティング組成物を磁界発生装置の動的な磁界に曝露することにより、前記血小板状磁性又は磁化可能顔料粒子の少なくとも一部を２軸配向させるステップであり、ステップａ）の後及びステップｂ）の前、並びに／又は、ステップｄ）の後及びステップｅ）の前に実行される、ステップをさらに含む、請求項１～１１のいずれか一項に記載のプロセス。 The non-spherical magnetic or magnetizable pigment particles are platelet-like pigment particles, and the process exposes the radiation curable coating composition to a dynamic magnetic field of a magnetic field generator to cause the platelet-like magnetism or magnetization. A step of biaxially orienting at least a portion of the possible pigment particles, which is performed after step a) and before step b) and / or after step d) and before step e). The process according to any one of claims 1 to 11, further comprising. 前記第１のコーティング層（ｘ２１）の前記１つ又は複数の第１のパターンの形状及び前記第２のコーティング層（ｘ２２）の前記１つ又は複数の第２のパターンの形状が、１つ又は複数のしるし、ドット、及び／又はラインを独立して表す、請求項１～１２のいずれか一項に記載のプロセス。 The shape of the one or more first patterns of the first coating layer (x21) and the shape of the one or more second patterns of the second coating layer (x22) may be one or more. The process of any one of claims 1-12, which independently represents a plurality of marks, dots, and / or lines.
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