JPWO2019217704A5 - - Google Patents
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- JPWO2019217704A5 JPWO2019217704A5 JP2020562576A JP2020562576A JPWO2019217704A5 JP WO2019217704 A5 JPWO2019217704 A5 JP WO2019217704A5 JP 2020562576 A JP2020562576 A JP 2020562576A JP 2020562576 A JP2020562576 A JP 2020562576A JP WO2019217704 A5 JPWO2019217704 A5 JP WO2019217704A5
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- Prior art keywords
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- array
- nucleotide
- nucleic acid
- photoacid generator
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- 238000000034 method Methods 0.000 claims description 62
- 239000002773 nucleotide Substances 0.000 claims description 46
- 125000003729 nucleotide group Chemical group 0.000 claims description 46
- 102000039446 nucleic acids Human genes 0.000 claims description 24
- 108020004707 nucleic acids Proteins 0.000 claims description 24
- 150000007523 nucleic acids Chemical class 0.000 claims description 24
- 102000040430 polynucleotide Human genes 0.000 claims description 22
- 108091033319 polynucleotide Proteins 0.000 claims description 22
- 239000002157 polynucleotide Substances 0.000 claims description 22
- 125000006239 protecting group Chemical group 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 238000003786 synthesis reaction Methods 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 10
- 238000011065 in-situ storage Methods 0.000 claims description 8
- 230000002194 synthesizing effect Effects 0.000 claims description 8
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 238000010523 cascade reaction Methods 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 claims description 4
- -1 -tert-butyl acetate phenyl acetate Chemical compound 0.000 claims description 3
- OWZCLYMEMJOKAC-UHFFFAOYSA-N (4-tert-butylphenyl) benzoate Chemical compound C1=CC(C(C)(C)C)=CC=C1OC(=O)C1=CC=CC=C1 OWZCLYMEMJOKAC-UHFFFAOYSA-N 0.000 claims description 2
- LNLGXWZOBTUQSC-UHFFFAOYSA-N (4-tert-butylphenyl) trifluoromethanesulfonate Chemical compound CC(C)(C)C1=CC=C(OS(=O)(=O)C(F)(F)F)C=C1 LNLGXWZOBTUQSC-UHFFFAOYSA-N 0.000 claims description 2
- LRWLGGPRIFYAPO-UHFFFAOYSA-N 2-(2-nitrophenyl)propyl carbonochloridate Chemical compound ClC(=O)OCC(C)C1=CC=CC=C1[N+]([O-])=O LRWLGGPRIFYAPO-UHFFFAOYSA-N 0.000 claims description 2
- 125000000590 4-methylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 claims description 2
- LZQMCUIWYRQLOG-UHFFFAOYSA-N 4-tert-butylbenzenesulfonic acid Chemical group CC(C)(C)C1=CC=C(S(O)(=O)=O)C=C1 LZQMCUIWYRQLOG-UHFFFAOYSA-N 0.000 claims description 2
- 239000005711 Benzoic acid Substances 0.000 claims description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims description 2
- 235000010233 benzoic acid Nutrition 0.000 claims description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 2
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 claims description 2
- MBXNQZHITVCSLJ-UHFFFAOYSA-N methyl fluorosulfonate Chemical compound COS(F)(=O)=O MBXNQZHITVCSLJ-UHFFFAOYSA-N 0.000 claims description 2
- XTBFPVLHGVYOQH-UHFFFAOYSA-N methyl phenyl carbonate Chemical compound COC(=O)OC1=CC=CC=C1 XTBFPVLHGVYOQH-UHFFFAOYSA-N 0.000 claims description 2
- OIRDBPQYVWXNSJ-UHFFFAOYSA-N methyl trifluoromethansulfonate Chemical compound COS(=O)(=O)C(F)(F)F OIRDBPQYVWXNSJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000000178 monomer Substances 0.000 claims description 2
- 230000005257 nucleotidylation Effects 0.000 claims description 2
- FCJSHPDYVMKCHI-UHFFFAOYSA-N phenyl benzoate Chemical compound C=1C=CC=CC=1C(=O)OC1=CC=CC=C1 FCJSHPDYVMKCHI-UHFFFAOYSA-N 0.000 claims description 2
- CTYRPMDGLDAWRQ-UHFFFAOYSA-N phenyl hydrogen sulfate Chemical compound OS(=O)(=O)OC1=CC=CC=C1 CTYRPMDGLDAWRQ-UHFFFAOYSA-N 0.000 claims description 2
- GRJHONXDTNBDTC-UHFFFAOYSA-N phenyl trifluoromethanesulfonate Chemical compound FC(F)(F)S(=O)(=O)OC1=CC=CC=C1 GRJHONXDTNBDTC-UHFFFAOYSA-N 0.000 claims description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 229910021653 sulphate ion Inorganic materials 0.000 claims description 2
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 claims description 2
- RZUVLSPXCZYMIM-UHFFFAOYSA-N (4-tert-butylphenyl) hydrogen carbonate Chemical compound CC(C)(C)C1=CC=C(OC(O)=O)C=C1 RZUVLSPXCZYMIM-UHFFFAOYSA-N 0.000 claims 1
Description
いくつかの実施形態では、前記保護基はＤＭＴである。
[本発明1001]
所定の配列を有するポリヌクレオチドを合成するための方法であって、
保護された核酸を第1の特徴部に含む支持体を提供することと、
前記支持体を、光酸発生剤を含むフォトレジスト溶液と接触させることと、
前記支持体をある波長の光に曝露することであって、前記光酸発生剤は、前記波長の光に曝露されたときにカスケード反応を介して弱酸を生成し、前記弱酸は、前記第1の特徴部において前記核酸を脱保護させる、前記曝露することと、
保護された核酸を、前記第1の特徴部において、前記脱保護された核酸に結合させることと、
を含む、前記方法。
[本発明1002]
前記弱酸が、酢酸、炭酸、リン酸、スルホン酸、トリフルオロメタンスルホン酸、または安息香酸を含む、本発明1001の方法。
[本発明1003]
前記光酸発生剤が、4－ｔｅｒｔブチルフェニル酸を含む、本発明1001の方法。
[本発明1004]
前記光酸発生剤が、4－ｔｅｒｔブチル酢酸フェニル及びＰＧＭＥＡを含む、本発明1001の方法。
[本発明1005]
前記光酸発生剤が、4－ｔｅｒｔブチルフェニルカーボネートと、プロピレンカーボネート、メチルフェニルカーボネート、及びＰＧＭＥＡからなる群から選択される化合物とを含む、本発明1001の方法。
[本発明1006]
前記光酸発生剤が、4－ｔｅｒｔブチルフェニルホスファート及びフェニルホスファートを含む、本発明1001の方法。
[本発明1007]
前記光酸発生剤が、4－ｔｅｒｔブチルフェニルスルホナートと、フェニルスルファート、4メチルフェニルスルファート、ジメチルスルファート、メチルトリフルオロメタンスルホナート、及びメチルフルオロスルホナートからなる群から選択される化合物とを含む、本発明1001の方法。
[本発明1008]
前記光酸発生剤が、4－ｔｅｒｔブチルフェニルトリフラート及びフェニルトリフルオロメタンスルホナートを含む、本発明1001の方法。
[本発明1009]
前記光酸発生剤が、4－ｔｅｒｔブチル安息香酸フェニル及び安息香酸フェニルを含む、本発明1001の方法。
[本発明1010]
前記保護された核酸がＤＭＴ基を含む、本発明1001の方法。
[本発明1011]
前記ＤＭＴ基が5’炭素で前記核酸に結合している、本発明1001の方法。
[本発明1012]
光の前記波長が約350ｎｍである、本発明1001の方法。
[本発明1013]
意図された長さ及び配列のポリヌクレオチドを合成するために前記ステップを繰り返すことをさらに含む、本発明1001の方法。
[本発明1014]
前記支持体が、前記保護された核酸を含む少なくとも10、少なくとも100、少なくとも1，000、または少なくとも10，000の特徴部を含む、本発明1001の方法。
[本発明1015]
所定の配列をそれぞれ有するポリヌクレオチドのアレイを合成するための方法であって、
表面に結合された、保護された核酸のアレイを含む支持体を提供することと、
前記支持体を、光酸発生剤を含む溶液と接触させることと、
前記支持体の選択された領域をある波長の光に曝露することであって、前記光酸発生剤は、前記波長の光に曝露された各場所において前記核酸を脱保護させるために、前記波長の光に曝露されたときにカスケード反応を介して弱酸を生成する、前記曝露することと、
前記脱保護された核酸に結合させるように、選択された入力ヌクレオチドを、前記ウェハーに接触させることと、
を含む、前記方法。
[本発明1016]
前記入力ヌクレオチドがＤＭＴ保護基を含む、本発明1015の方法。
[本発明1017]
所定の配列及び意図された長さをそれぞれ有するポリヌクレオチドのアレイを生成するのに十分な回数、前記ステップを繰り返すことをさらに含む、本発明1015の方法。
[本発明1018]
ヌクレオチドモノマーを、支持体に結合させたポリヌクレオチドに連結するための方法であって、
ａ．第1の特徴部において支持体の表面に結合させた末端ヌクレオチドを含む前記支持体を提供することと、
ｂ．前記末端ヌクレオチド上でＮＰＰＯＣ保護基のｉｎ ｓｉｔｕ合成を実施することと、
ｃ．前記支持体を前記第1の特徴部において、ある波長の光に曝露して、前記末端ヌクレオチドから前記ＮＰＰＯＣ保護基を除去することと、
ｄ．前記支持体を、保護された入力ヌクレオチドと接触させて、前記保護された入力ヌクレオチドを、前記第1の特徴部において、前記脱保護された末端ヌクレオチドに結合させることと、
を含む、前記方法。
[本発明1019]
（ｅ）前記末端ヌクレオチドに結合された前記保護された入力核酸を脱保護させることと、次いでステップ（ａ）～（ｅ）を繰り返して、第2の保護された入力核酸を結合させることとをさらに含む、本発明1018の方法。
[本発明1020]
前記基板に結合された意図された長さ及び配列のポリヌクレオチドを合成するのに十分な回数、すべてのステップを繰り返すことをさらに含む、本発明1019の方法。
[本発明1021]
前記支持体を前記波長の光に曝露する前に、前記支持体を、ＩＴＸを含むフォトレジスト溶液と接触させることをさらに含む、本発明1018の方法。
[本発明1022]
光の前記波長が約365ｎｍである、本発明1018の方法。
[本発明1023]
前記ＮＰＰＯＣ保護基が、前記末端ヌクレオチドの5’炭素に結合している、本発明1018の方法。
[本発明1024]
前記末端ヌクレオチドを含む前記支持体を提供することは、前記ｉｎ ｓｉｔｕＮＰＰＯＣ合成を実施する前に、前記末端ヌクレオチドを全体的に脱保護させることを含む、本発明1018の方法。
[本発明1025]
ＮＰＰＯＣのｉｎ ｓｉｔｕ合成を実施することは、前記支持体を、クロロギ酸2－（2－ニトロフェニル）プロピル及びピリジンを含むＮＰＰＯＣ合成溶液と接触させることを含む、本発明1018の方法。
[本発明1026]
前記ＮＰＰＯＣ合成溶液が、1－メチル－2－ピロリジノンをさらに含む、本発明1025の方法。
[本発明1027]
所定の配列をそれぞれ有するポリヌクレオチドのアレイを合成するための方法であって、
ａ．表面に結合された、保護されたヌクレオチドのアレイを含む支持体を提供することと、
ｂ．前記ヌクレオチドのアレイ上でＮＰＰＯＣ保護基のｉｎ ｓｉｔｕ合成を実施することと、
ｃ．前記支持体をある波長の光に選択的に曝露して、選択された入力ヌクレオチドの付加が望まれる、ヌクレオチドの前記アレイからの選択されたヌクレオチドから、前記ＮＰＰＯＣ保護基を除去することと、
ｄ．前記脱保護されたヌクレオチドに結合させるように、前記選択された入力ヌクレオチドを、前記アレイに接触させることと、
ｅ．ステップ（ｃ）～（ｅ）を、所望のヌクレオチド付加の層を完成させるのに十分な回数繰り返して、それによって、所定の配列をそれぞれ有するポリヌクレオチドのアレイを合成することと、
を含む、前記方法。
[本発明1028]
（ｆ）ＮＰＰＯＣ保護基のｉｎ ｓｉｔｕ合成の前に、前記ポリヌクレオチドのアレイに結合させた前記入力ヌクレオチドを全体的に脱保護させることをさらに含む、本発明1027の方法。
[本発明1029]
所定の配列及び意図された長さをそれぞれ有するポリヌクレオチドのアレイを生成するのに十分な回数、ステップ（ｂ）～（ｆ）を繰り返し、かつ、ＮＰＰＯＣ保護基のｉｎ ｓｉｔｕ合成の前に、前記ポリヌクレオチドのアレイに結合させた前記入力ヌクレオチドを全体的に脱保護させることをさらに含む、本発明1027の方法。
[本発明1030]
前記選択された入力ヌクレオチドが保護基を含む、本発明1027の方法。
[本発明1031]
前記保護基がＤＭＴである、本発明1030の方法。
In some embodiments, the protecting group is DMT.
[Invention 1001]
A method for synthesizing a polynucleotide having a predetermined sequence.
To provide a support containing the protected nucleic acid in the first feature, and to provide a support.
Contacting the support with a photoresist solution containing a photoacid generator
By exposing the support to light of a wavelength, the photoacid generator produces a weak acid via a cascade reaction when exposed to light of the wavelength, the weak acid being the first. Deprotecting, exposing, and deprotecting the nucleic acid in the features of the
To bind the protected nucleic acid to the deprotected nucleic acid in the first feature section.
The method described above.
[Invention 1002]
The method of the present invention 1001, wherein the weak acid comprises acetic acid, carbonic acid, phosphoric acid, sulfonic acid, trifluoromethanesulfonic acid, or benzoic acid.
[Invention 1003]
The method of the present invention 1001, wherein the photoacid generator comprises 4-tert-butylphenylic acid.
[Invention 1004]
The method of the present invention 1001, wherein the photoacid generator comprises 4-tert-butyl acetate phenyl acetate and PGMEA.
[Invention 1005]
The method of the present invention 1001 wherein the photoacid generator comprises a 4-tert butyl phenyl carbonate and a compound selected from the group consisting of propylene carbonate, methyl phenyl carbonate and PGMEA.
[Invention 1006]
The method of the present invention 1001, wherein the photoacid generator comprises 4-tert-butylphenylphosphate and phenylphosphart.
[Invention 1007]
The photoacid generator is a compound selected from the group consisting of 4-tert butylphenyl sulfonate, phenyl sulphate, 4-methyl phenyl sulphate, dimethyl sulphate, methyl trifluoromethane sulfonate, and methyl fluoro sulphonate. The method of the present invention 1001 comprising.
[Invention 1008]
The method of the present invention 1001 wherein the photoacid generator comprises 4-tert butyl phenyltriflate and phenyltrifluoromethanesulfonate.
[Invention 1009]
The method of the present invention 1001 wherein the photoacid generator comprises 4-tertbutylphenylbenzoate and phenylbenzoate.
[Invention 1010]
The method of the present invention 1001 wherein the protected nucleic acid comprises a DMT group.
[Invention 1011]
The method of the present invention 1001 in which the DMT group is attached to the nucleic acid with 5'carbon.
[Invention 1012]
The method of the present invention 1001 wherein the wavelength of light is about 350 nm.
[Invention 1013]
The method of the present invention 1001 further comprising repeating the steps to synthesize a polynucleotide of the intended length and sequence.
[Invention 1014]
The method of the invention 1001 wherein the support comprises at least 10, at least 100, at least 1,000, or at least 10,000 features comprising the protected nucleic acid.
[Invention 1015]
A method for synthesizing an array of polynucleotides having a predetermined sequence, respectively.
To provide a support containing an array of protected nucleic acids bound to the surface,
Contacting the support with a solution containing a photoacid generator
By exposing a selected region of the support to light of a wavelength, the photoacid generator is to deprotect the nucleic acid at each location exposed to light of the wavelength. The exposure and the above-mentioned exposure, which produces a weak acid through a cascade reaction when exposed to light.
Contacting the wafer with selected input nucleotides to bind to the deprotected nucleic acid.
The method described above.
[Invention 1016]
The method of the present invention 1015, wherein the input nucleotide comprises a DMT protecting group.
[Invention 1017]
The method of the invention 1015, further comprising repeating the steps a sufficient number of times to generate an array of polynucleotides having a given sequence and the intended length, respectively.
[Invention 1018]
A method for linking a nucleotide monomer to a polynucleotide bound to a support.
a. To provide the support containing the terminal nucleotide bound to the surface of the support in the first feature.
b. Performing in situ synthesis of the NPPOC protecting group on the terminal nucleotides
c. To remove the NPPOC protecting group from the terminal nucleotide by exposing the support to light of a certain wavelength in the first feature.
d. Contacting the support with the protected input nucleotide to attach the protected input nucleotide to the deprotected terminal nucleotide in the first feature.
The method described above.
[Invention 1019]
(E) Deprotecting the protected input nucleic acid bound to the terminal nucleotide, and then repeating steps (a) to (e) to bind the second protected input nucleic acid. The method of the present invention 1018, further comprising.
[Invention 1020]
The method of the invention 1019 further comprising repeating all steps a sufficient number of times to synthesize a polynucleotide of the intended length and sequence bound to the substrate.
[Invention 1021]
The method of the invention 1018, further comprising contacting the support with a photoresist solution containing ITX prior to exposing the support to light of the wavelength.
[Invention 1022]
The method of the present invention 1018, wherein the wavelength of light is about 365 nm.
[Invention 1023]
The method of the present invention 1018, wherein the NPPOC protecting group is attached to the 5'carbon of the terminal nucleotide.
[Invention 1024]
The method of the invention 1018 comprising providing the support comprising the terminal nucleotide to totally deprotect the terminal nucleotide prior to performing the insituNPPOC synthesis.
[Invention 1025]
Performing in situ synthesis of NPPOC comprises contacting the support with an NPPOC synthetic solution containing 2- (2-nitrophenyl) propyl chloroformate and pyridine, the method of the present invention 1018.
[Invention 1026]
The method of the present invention 1025, wherein the NPPOC synthetic solution further comprises 1-methyl-2-pyrrolidinone.
[Invention 1027]
A method for synthesizing an array of polynucleotides having a predetermined sequence, respectively.
a. To provide a support containing an array of protected nucleotides attached to the surface,
b. Performing in situ synthesis of the NPPOC protecting group on the array of nucleotides
c. Selective exposure of the support to light of a wavelength to remove the NPPOC protecting group from the selected nucleotides from the array of nucleotides for which addition of the selected input nucleotides is desired.
d. Contacting the array with the selected input nucleotide to bind to the deprotected nucleotide.
e. Steps (c)-(e) are repeated a sufficient number of times to complete the layer of desired nucleotide addition, thereby synthesizing an array of polynucleotides each having a given sequence.
The method described above.
[Invention 1028]
(F) The method of the invention 1027, further comprising deprotecting the input nucleotides attached to the array of polynucleotides entirely prior to in situ synthesis of the NPPOC protecting group.
[Invention 1029]
Repeat steps (b)-(f) a sufficient number of times to generate an array of polynucleotides having the given sequence and the intended length, respectively, and prior to insitu synthesis of the NPPOC protecting group, said. The method of the invention 1027, further comprising deprotecting the input nucleotide bound to an array of polynucleotides entirely.
[Invention 1030]
The method of the present invention 1027, wherein the selected input nucleotide comprises a protecting group.
[Invention 1031]
The method of the present invention 1030, wherein the protecting group is DMT.
Claims (23)
保護された核酸を第１の特徴部に含む支持体を提供することと、
前記支持体を、光酸発生剤を含むフォトレジスト溶液と接触させることと、
前記支持体をある波長の光に曝露することであって、前記光酸発生剤は、前記波長の光に曝露されたときにカスケード反応を介して弱酸を生成し、前記弱酸は、前記第１の特徴部において前記核酸を脱保護させる、前記曝露することと、
保護された核酸を、前記第１の特徴部において、前記脱保護された核酸に結合させることと、
を含む、前記方法。 A method for synthesizing a polynucleotide having a predetermined sequence.
To provide a support containing the protected nucleic acid in the first feature and
Contacting the support with a photoresist solution containing a photoacid generator
By exposing the support to light of a wavelength, the photoacid generator produces a weak acid via a cascade reaction when exposed to light of the wavelength, the weak acid being the first. Deprotecting, exposing, and deprotecting the nucleic acid in the features of the
To bind the protected nucleic acid to the deprotected nucleic acid in the first feature section.
The method described above.
b. 前記光酸発生剤が、４－ｔｅｒｔブチルフェニル酸を含む、
請求項１に記載の方法。 Whether the weak acid comprises acetic acid, carbonic acid, phosphoric acid, sulfonic acid, trifluoromethanesulfonic acid, or benzoic acid ; or
b. The photoacid generator comprises 4-tert-butylphenylic acid .
The method according to claim 1.
b.前記光酸発生剤が、４－ｔｅｒｔブチルフェニルカーボネートと、プロピレンカーボネート、メチルフェニルカーボネート、及びＰＧＭＥＡからなる群から選択される化合物とを含む、請求項１に記載の方法。 Does the photoacid generator contain 4-tert-butyl acetate phenyl acetate and PGMEA ; or
b. The method of claim 1, wherein the photoacid generator comprises 4-tert-butylphenyl carbonate and a compound selected from the group consisting of propylene carbonate, methylphenyl carbonate, and PGMEA .
b. 前記光酸発生剤が、４－ｔｅｒｔブチルフェニルスルホナートと、フェニルスルファート、４メチルフェニルスルファート、ジメチルスルファート、メチルトリフルオロメタンスルホナート、及びメチルフルオロスルホナートからなる群から選択される化合物とを含むか；
c. 前記光酸発生剤が、４－ｔｅｒｔブチルフェニルトリフラート及びフェニルトリフルオロメタンスルホナートを含むか；または
d. 前記光酸発生剤が、４－ｔｅｒｔブチル安息香酸フェニル及び安息香酸フェニルを含む、
請求項１に記載の方法。 Does the photoacid generator contain 4-tert-butylphenylphosphate and phenylphosphart ;
b. The photoacid generator is selected from the group consisting of 4-tert butylphenyl sulfonate, phenyl sulphate, 4 methyl phenyl sulphate, dimethyl sulphate, methyl trifluoromethane sulfonate, and methyl fluoro sulphonate. Does it contain compounds;
c. Does the photoacid generator contain 4-tert-butylphenyltriflate and phenyltrifluoromethanesulfonate; or
d. The photoacid generator comprises 4-tertbutylphenylbenzoate and phenylbenzoate .
The method according to claim 1.
表面に結合された、保護された核酸のアレイを含む支持体を提供することと、
前記支持体を、光酸発生剤を含む溶液と接触させることと、
前記支持体の選択された領域をある波長の光に曝露することであって、前記光酸発生剤は、前記波長の光に曝露された各場所において前記核酸を脱保護させるために、前記波長の光に曝露されたときにカスケード反応を介して弱酸を生成する、前記曝露することと、
前記脱保護された核酸に結合させるように、選択された入力ヌクレオチドを、前記ウェハーに接触させることと、
を含む、前記方法。 A method for synthesizing an array of polynucleotides having a predetermined sequence, respectively.
To provide a support containing an array of protected nucleic acids bound to the surface,
Contacting the support with a solution containing a photoacid generator
By exposing a selected region of the support to light of a wavelength, the photoacid generator is to deprotect the nucleic acid at each location exposed to light of the wavelength. The exposure and the above-mentioned exposure, which produces a weak acid through a cascade reaction when exposed to light.
Contacting the wafer with selected input nucleotides to bind to the deprotected nucleic acid.
The method described above.
b. 所定の配列及び意図された長さをそれぞれ有するポリヌクレオチドのアレイを生成するのに十分な回数、前記ステップを繰り返すことをさらに含む、
請求項１０に記載の方法。 Does the input nucleotide contain a DMT protecting group ; or
b. Further comprising repeating the steps a sufficient number of times to generate an array of polynucleotides having the given sequence and the intended length, respectively .
The method according to claim 10 .
ａ．第１の特徴部において支持体の表面に結合させた末端ヌクレオチドを含む前記支持体を提供することと、
ｂ．前記末端ヌクレオチド上でＮＰＰＯＣ保護基のｉｎ ｓｉｔｕ合成を実施することと、
ｃ．前記支持体を前記第１の特徴部において、ある波長の光に曝露して、前記末端ヌクレオチドから前記ＮＰＰＯＣ保護基を除去することと、
ｄ．前記支持体を、保護された入力ヌクレオチドと接触させて、前記保護された入力ヌクレオチドを、前記第１の特徴部において、前記脱保護された末端ヌクレオチドに結合させることと、
を含む、前記方法。 A method for linking a nucleotide monomer to a polynucleotide bound to a support.
a. To provide the support containing the terminal nucleotide bound to the surface of the support in the first feature.
b. Performing in situ synthesis of the NPPOC protecting group on the terminal nucleotides
c. To remove the NPPOC protecting group from the terminal nucleotide by exposing the support to light of a certain wavelength in the first feature.
d. Contacting the support with the protected input nucleotide to attach the protected input nucleotide to the deprotected terminal nucleotide in the first feature.
The method described above.
b. 光の前記波長が約３６５ｎｍである、
請求項１２に記載の方法。 Does it further include contacting the support with a photoresist solution containing ITX before exposing the support to light of the wavelength ;
b. The wavelength of light is about 365 nm ,
The method according to claim 12 .
b. 前記末端ヌクレオチドを含む前記支持体を提供することは、前記ｉｎ ｓｉｔｕＮＰＰＯＣ合成を実施する前に、前記末端ヌクレオチドを全体的に脱保護させることを含む、
請求項１２に記載の方法。 Is the NPPOC protecting group attached to the 5'carbon of the terminal nucleotide ; or
b. Providing the support containing the terminal nucleotide comprises deprotecting the terminal nucleotide as a whole prior to performing the insituNPPOC synthesis .
The method according to claim 12 .
ａ．表面に結合された、保護されたヌクレオチドのアレイを含む支持体を提供することと、
ｂ．前記ヌクレオチドのアレイ上でＮＰＰＯＣ保護基のｉｎ ｓｉｔｕ合成を実施することと、
ｃ．前記支持体をある波長の光に選択的に曝露して、選択された入力ヌクレオチドの付加が望まれる、ヌクレオチドの前記アレイからの選択されたヌクレオチドから、前記ＮＰＰＯＣ保護基を除去することと、
ｄ．前記脱保護されたヌクレオチドに結合させるように、前記選択された入力ヌクレオチドを、前記アレイに接触させることと、
ｅ．ステップ（ｃ）～（ｅ）を、所望のヌクレオチド付加の層を完成させるのに十分な回数繰り返して、それによって、所定の配列をそれぞれ有するポリヌクレオチドのアレイを合成することと、
を含む、前記方法。 A method for synthesizing an array of polynucleotides having a predetermined sequence, respectively.
a. To provide a support containing an array of protected nucleotides attached to the surface,
b. Performing in situ synthesis of the NPPOC protecting group on the array of nucleotides
c. Selective exposure of the support to light of a wavelength to remove the NPPOC protecting group from the selected nucleotides from the array of nucleotides for which addition of the selected input nucleotides is desired.
d. Contacting the array with the selected input nucleotide to bind to the deprotected nucleotide.
e. Steps (c)-(e) are repeated a sufficient number of times to complete the layer of desired nucleotide addition, thereby synthesizing an array of polynucleotides each having a given sequence.
The method described above.
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