JPWO2019044277A1 - Manufacturing method of color filter, manufacturing method of solid-state image sensor, manufacturing method of image display device and color filter - Google Patents

Abstract

Provided is a method for manufacturing a color filter, which has good pixel pattern formation and can suppress the generation of residues on other pixels after pixel formation and the generation of color transfer between adjacent pixels. In addition, a method for manufacturing a solid-state image sensor, a method for manufacturing an image display device, and a color filter are provided. The method for producing this color filter includes a step of applying a transparent layer forming composition to the surface of the first pixel 2 formed on the support 1 to form a transparent layer 3 having an average thickness of 300 nm or less, and a transparent layer. A step of applying the pixel forming composition on the first pixel 2 on which the layer 3 is formed to form the pixel forming composition layer 4a, and a pattern forming on the pixel forming composition layer 4a are performed. It includes a step of forming a second pixel 4 having a color different from that of the first pixel 2.

Description

The present invention relates to a method for manufacturing a color filter, a method for manufacturing a solid-state image sensor, a method for manufacturing an image display device, and a color filter.

In recent years, with the spread of digital cameras, camera-equipped mobile phones, and the like, demand for solid-state image sensors such as charge-coupling elements (CCD) image sensors has increased significantly. Color filters are used as key devices for displays and optical elements.

Further, Patent Document 1 has at least a patterned red-green-blue pixel and a non-patterned transparent protective film on a transparent substrate, and a region of the red and green pixels is a transparent protective film on the red and green pixels. Is formed, and the blue pixel region is a method for manufacturing a color filter in which blue pixels are laminated on a transparent protective film, and is transparent and non-photosensitive on a transparent substrate in which red and green pixels are formed in a pattern. After applying the sex resin to a non-patterned shape, it is preheated at 80 to 160 ° C. to form a transparent non-photosensitive resin layer, and after applying a blue photosensitive resin on the transparent non-photosensitive resin layer, 80 to 80 to A step of preheating at 160 ° C. to form a blue photosensitive resin layer, a step of exposing the blue photosensitive resin layer via a photomask, and a step of etching only the blue photosensitive resin layer with a developing solution. An invention relating to a method for producing a color filter including a step of collectively heat-treating a transparent non-photosensitive resin layer and a blue photosensitive resin layer at 160 to 210 ° C. is described. Further, paragraph No. 0021 describes that the film thickness of the transparent protective film in the blue pixel region is preferably 1.5 μm or more, and more preferably 1.6 μm or more. According to Patent Document 1, it is described that such a configuration can suppress a decrease in the transmittance of blue pixels and can achieve both high transmittance and white balance.

Further, in Patent Document 2, (1) a first color colored layer is formed on a substrate, and a laser beam is applied to a portion other than a region to be a colored pixel to obtain a laser beam of the first color colored layer. A step of forming colored pixels of the first color by evaporating the irradiated portion, (2) a first transparent resin layer that is not mixed with the colored pixels of the first color is placed on the substrate from above the colored pixels of the first color. (3) A second color colored layer is formed on the first transparent resin layer, and laser light is applied to a portion other than the region to be the second color colored pixel, and the laser light is output. The step of forming the second color colored pixel by evaporating the second color colored layer on the first transparent resin layer, (4) the second not mixed with the second color colored pixel. The step of forming the transparent resin layer on the substrate from above the colored pixels of the second color, and (5) forming the colored layer of the third color on the second transparent resin layer and coloring the laser beam of the third color. A third-color colored pixel is formed by irradiating a portion other than the area to be a pixel and controlling the output of the laser beam to evaporate the third-color colored layer on the second transparent resin layer. An invention relating to a method for manufacturing a color filter including a step is described.

Japanese Unexamined Patent Publication No. 2013-88691 Japanese Unexamined Patent Publication No. 09-113719

Generally, a color filter has pixels of a plurality of colors. Such a color filter having pixels of a plurality of colors is manufactured by sequentially forming pixels one by one. For example, the first pixel 51 is formed on the support 50 (see FIG. 4), and then the composition for pixel formation is applied to the support 50 on which the first pixel 51 is formed to apply the composition layer 52a. (See FIG. 5), and then a pattern is formed on the composition layer 52a to form a second pixel 52 (see FIG. 6). By repeating such a process, a color filter having pixels of a plurality of colors is manufactured.

However, in the conventional method, after the pattern formation of the second pixel 52, the residue 100 is generated on the first pixel 51, or between adjacent pixels (for example, the first pixel 51 and the second pixel 52). In some cases, color transfer occurred and color mixing occurred. From the viewpoint of the color separation performance of the pixels of each color, it is desirable to suppress the generation of such residues and the generation of color transfer.

Further, when the present inventor examined the inventions described in Patent Documents 1 and 2, it was found that the inventions described in Patent Documents 1 and 2 had insufficient pixel pattern forming property.

Therefore, an object of the present invention is to manufacture a color filter that has good pixel pattern formation and can suppress the generation of residues on other pixels after pixel formation and the generation of color transfer between adjacent pixels. To provide a method. Another object of the present invention is to provide a method for manufacturing a solid-state image sensor, a method for manufacturing an image display device, and a color filter.

As a result of diligent studies by the present inventor, by manufacturing the color filter through the steps described later, the pattern formability of the pixels is good, and the residue on other pixels after the pixel formation is generated and adjacent to each other. We have found that the occurrence of color transfer between pixels can be suppressed, and have completed the present invention. That is, the present invention is as follows.
<1> A step of applying a transparent layer forming composition containing a curable compound to the surface of the first pixel formed on the support to form a transparent layer having an average thickness of 300 nm or less.
A step of applying a pixel-forming composition on a first pixel on which a transparent layer is formed to form a pixel-forming composition layer, and
A method for manufacturing a color filter, which comprises a step of forming a pattern on a pixel-forming composition layer to form a second pixel having a color different from that of the first pixel.
<2> The method for manufacturing a color filter according to <1>, wherein a pattern is formed on the pixel-forming composition layer by a photolithography method to form a second pixel.
<3> The method for producing a color filter according to <1> or <2>, wherein at least one of the first pixel and the second pixel contains 50% by mass or more of a colorant.
<4> The method for producing a color filter according to any one of <1> to <3>, wherein the pixel forming composition contains at least one selected from a chromatic colorant and a black colorant.
<5> The color filter according to any one of <1> to <4>, wherein a transparent layer forming composition is applied to the surface of the first pixel to form a transparent layer having an average thickness of 5 to 100 nm. Manufacturing method.
<6> The method for producing a color filter according to any one of <1> to <5>, wherein the composition for forming a transparent layer contains a compound having a crosslinkable group as a curable compound.
<7> A method for manufacturing a solid-state image sensor, which comprises the method for manufacturing a color filter according to any one of <1> to <6>.
<8> A method for manufacturing an image display device, which includes the method for manufacturing a color filter according to any one of <1> to <6>.
<9> The support has a first pixel and a second pixel having a color different from that of the first pixel.
A transparent layer having an average thickness of 300 nm or less is provided on the surface of the first pixel.
A transparent layer having an average thickness of 300 nm or less is provided between the second pixel and the support.
Color filter.
<10> The color filter according to <9>, which has a transparent layer having an average thickness of 300 nm or less between the first pixel and the second pixel.

According to the present invention, there is a method for manufacturing a color filter that has good pixel pattern formation and can suppress the generation of residues on other pixels after pixel formation and the generation of color transfer between adjacent pixels. Can be provided. Further, a method for manufacturing a solid-state image sensor, a method for manufacturing an image display device, and a color filter can be provided.

It is explanatory drawing of the manufacturing method of the color filter of this invention. It is explanatory drawing of the manufacturing method of the color filter of this invention. It is explanatory drawing of the manufacturing method of the color filter of this invention. It is explanatory drawing of the manufacturing method of the conventional color filter. It is explanatory drawing of the manufacturing method of the conventional color filter. It is explanatory drawing of the manufacturing method of the conventional color filter.

The contents of the present invention will be described in detail below.
In the notation of a group (atomic group) in the present specification, the notation not describing substitution and non-substitution includes those having no substituent as well as those having a substituent. For example, the "alkyl group" includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
In the present specification, "exposure" includes not only exposure using light but also drawing using particle beams such as an electron beam and an ion beam, unless otherwise specified. Further, as the light used for exposure, generally, the emission line spectrum of a mercury lamp, far ultraviolet rays typified by an excimer laser, extreme ultraviolet rays (EUV light), X-rays, active rays such as electron beams, or radiation can be mentioned.
The numerical range represented by using "~" in the present specification means a range including the numerical values before and after "~" as the lower limit value and the upper limit value.
In the present specification, the total solid content means the total mass of all the components of the composition excluding the solvent.
As used herein, "(meth) acrylate" represents both acrylate and methacrylate, or either, and "(meth) acrylic" represents both acrylic and methacrylic, or either. ) Allyl ”represents both allyl and methacrylic, or either, and“ (meth) acryloyl ”represents both acryloyl and methacrylic, or either.
In the present specification, the term "process" is included in this term not only as an independent process but also as long as the desired action of the process is achieved even if it cannot be clearly distinguished from other processes. ..
In the present specification, the weight average molecular weight (Mw) and the number average molecular weight (Mn) are defined as polystyrene-equivalent values measured by gel permeation chromatography (GPC).

<Manufacturing method of color filter>
In the method for producing a color filter of the present invention, a transparent layer forming composition containing a curable compound is applied to the surface of a first pixel formed on a support to form a transparent layer having an average thickness of 300 nm or less. Process and
A step of applying a pixel-forming composition on a first pixel on which a transparent layer is formed to form a pixel-forming composition layer, and
It is characterized by including a step of forming a pattern on the pixel-forming composition layer and forming a second pixel having a color different from that of the first pixel.

According to the method for producing a color filter of the present invention, a pixel forming composition is applied onto a first pixel on which the transparent layer is formed to form a pixel forming composition layer, and the pixel forming composition is formed. Since the layer is patterned to form a second pixel having a color different from that of the first pixel, the pixel-forming composition layer is formed on the first pixel after the pattern is formed on the second pixel. The generation of the derived residue can be effectively suppressed. Further, by forming the transparent layer on the surface of the first pixel, color transfer between the first pixel and the second pixel can be effectively suppressed. Further, since the average thickness of the transparent layer is 300 nm or less, there is no influence on the pattern forming property of the second pixel, and the pattern forming property of the second pixel is good.

In the method for producing a color filter of the present invention, at least one of the first pixel and the second pixel contains 50% by mass or more (more preferably 55% by mass or more, still more preferably 60% by mass or more) of the colorant. In some cases, the effect of the present invention can be obtained more remarkably, and the present invention can be obtained when at least the second pixel contains 50% by mass or more (more preferably 55% by mass or more, still more preferably 60% by mass or more) of the colorant. The effect is more remarkable, and the present invention is obtained when both the first pixel and the second pixel contain 50% by mass or more (more preferably 55% by mass or more, still more preferably 60% by mass or more) of the colorant. The effect of is particularly remarkable. That is, in the conventional method, when an attempt is made to manufacture a color filter in which the first pixel or the second pixel contains a larger amount of a colorant, a residue is generated on the first pixel or color transfer occurs between pixels. However, according to the present invention, even in the case of producing a color filter in which the first pixel and the second pixel contain a large amount of a colorant, the generation of residues on the pixels and the inter-pixels tend to be easy. Since the occurrence of color transfer can be effectively suppressed, the effect of the present invention can be obtained more remarkably.

Further, in the method for producing a color filter of the present invention, the composition for forming a transparent layer preferably contains a compound having a crosslinkable group as a curable compound. By forming the transparent layer using such a transparent layer forming composition, it is possible to form a transparent layer having excellent properties such as adhesion to the support and the first pixel and solvent resistance. Furthermore, the generation of residues on the pixels and the color mixing between the pixels can be effectively suppressed.
Hereinafter, each step of the method for manufacturing the color filter of the present invention will be described in detail.

(Step of forming a transparent layer)
In the method for producing a color filter of the present invention, first, a composition for forming a transparent layer containing a curable compound is applied to the surface of the first pixel 2 formed on the support 1, and the average thickness is 300 nm or less. The transparent layer 3 is formed. As a result, as shown in FIG. 1, the transparent layer 3 is formed on the surfaces of the support 1 and the first pixel 2 substantially along the shape of the first pixel 2. In addition, "transparency" in the present invention means that the transmittance of visible light is 75% or more, preferably 80% or more, and particularly preferably 90% or more.

The average thickness of the transparent layer 3 is 300 nm or less, preferably 5 to 300 nm, more preferably 5 to 100 nm, and even more preferably 5 to 50 nm. Since the average thickness of the transparent layer 3 is 300 nm or less, the pattern formation property of the second pixel provided in the next step is improved, and the residue on the first pixel and the color transfer between the pixels are generated. Can be effectively suppressed.

In the present invention, the thickness of the transparent layer is the shorter of the distance from the surface or side surface of the first pixel to the surface of the transparent layer and the distance from the surface of the support 1 to the surface of the transparent layer. Let the value of be the thickness of the transparent layer. For example, in FIG. 1, the thickness of the transparent layer formed on the surface 2a of the first pixel is t1. Further, the thickness of the transparent layer formed on the side surface 2b of the first pixel is t2. The thickness of the transparent layer formed on the surface 1a of the support is t3. In addition, the thickness of the transparent layer can be measured from a scanning electron microscope (SEM) image of a cross section cut perpendicular to the support. The same applies to the thickness of the first pixel and the second pixel.
Further, the average thickness of the transparent layer 3 in the method for manufacturing a color filter of the present invention is the thickness of any three transparent layers formed on the upper surface 2a of the first pixel and the thickness on the surface 1a of the support. It means the average value with the thickness of any three places of the formed transparent layer.

The type of the first pixel 2 may be any pixel constituting the color filter, and is not particularly limited. For example, colored pixels such as red pixels, blue pixels, green pixels, yellow pixels, magenta pixels, and cyan pixels, transparent pixels, and black pixels can be mentioned. Further, the first pixel 2 is preferably a pixel containing a colorant, and more preferably a pixel containing at least one selected from a chromatic colorant and a black colorant.

The thickness of the first pixel 2 is preferably 0.1 to 10.0 μm. The upper limit is preferably 5.0 μm or less, more preferably 2.0 μm or less, and further preferably 1.0 μm or less. The lower limit is preferably 0.3 μm or more, and more preferably 0.4 μm or more. Further, the thickness of the first pixel 2 is preferably 2 to 1000 times, more preferably 4 to 400 times, and further preferably 8 to 200 times the average thickness of the transparent layer 3. preferable.

For the first pixel 2, for example, a pixel forming composition is applied onto a support to form a pixel forming composition layer, and a pattern is formed on the pixel forming composition layer by a conventionally known method. It can be formed by performing. Examples of the pixel-forming composition include a pixel-forming composition described later. Examples of the pattern forming method include a photolithography method and a dry etching method. The pattern forming method in the photolithography method includes a step of exposing the pixel forming composition layer in a pattern (exposure step) and a pattern (pixel) by developing and removing the pixel forming composition layer of the unexposed portion. It is preferable to include a step of forming (development step). If necessary, a step (post-baking step) of baking the developed pattern (pixels) may be provided. The pattern formation by the dry etching method includes a step of curing the composition layer for pixel formation to form a cured product layer and a step of forming a patterned photoresist layer on the cured product layer. It is preferable to include a step of dry etching the cured product layer with an etching gas using the photoresist layer as a mask.

The type of the support 1 is not particularly limited. Substrates (silicon wafers, silicon carbide wafers, silicon nitride wafers, sapphire wafers, glass wafers, etc.) used in various electronic devices such as solid-state imaging elements can be used. Further, a substrate for a solid-state image sensor on which a photodiode is formed can also be used.

The method of applying the composition for forming a transparent layer is not particularly limited, and examples thereof include a spin coating method, a slit coating method, an inkjet method, a dip coating method, and a screen printing method. Of these, the spin coating method is preferable because it can form a uniform film with a small amount.

It is also preferable that the composition for forming a transparent layer is applied to the surface of the first pixel 2 and then further dried. The drying conditions are not particularly limited. For example, the drying temperature is preferably 60 to 150 ° C. The upper limit of the drying temperature is preferably 130 ° C. or lower, more preferably 110 ° C. or lower. The lower limit of the drying temperature is preferably 80 ° C. or higher, more preferably 90 ° C. or higher. The drying time is preferably 60 seconds to 600 seconds. The upper limit of the drying time is preferably 300 seconds or less, more preferably 180 seconds or less. The lower limit of the drying time is preferably 80 seconds or more, more preferably 100 seconds or more. Drying can be performed using a hot plate, an oven, or the like.

Further, it is preferable to perform further heat treatment (post-baking) after the above-mentioned drying. When post-baking is performed, the post-baking temperature is preferably 180 to 260 ° C., for example. The upper limit of the post-bake temperature is preferably 250 ° C. or lower, more preferably 240 ° C. or lower. The lower limit of the post-bake temperature is preferably 190 ° C. or higher, more preferably 200 ° C. or higher. The post-baking time is preferably 60 seconds to 600 seconds. The upper limit of the post-baking time is preferably 300 seconds or less, more preferably 180 seconds or less. The lower limit of the post-baking time is preferably 80 seconds or more, more preferably 100 seconds or more. Post-baking can be performed using a hot plate, an oven, or the like.

Further, instead of the above heat treatment, exposure may be performed. For example, as the radiation (light) that can be used for exposure, ultraviolet rays such as g-ray and i-line are preferable, and i-ray is more preferable. Irradiation dose (exposure dose), for example, preferably ^{0.03~2.5J / cm 2, 0.05~1.0J / cm} 2 is more preferable. The oxygen concentration at the time of exposure can be appropriately selected. The transparent layer after exposure may be further heat-treated (post-baked).

(Step of forming a composition layer for pixel formation)
Next, in the method for producing a color filter of the present invention, the pixel forming composition is applied onto the first pixel 2 on which the transparent layer 3 is formed as described above to form the pixel forming composition layer 4a. Form (see FIG. 2). Here, as shown in FIG. 2, the pixel-forming composition layer 4a may be formed in a region where the transparent layer 3 is formed other than on the first pixel 2 on which the transparent layer 3 is formed. Except for the step of applying the pixel forming composition on the first pixel 2 on which the transparent layer 3 is formed to form the pixel forming composition layer 4a and on the first pixel 2 on which the transparent layer 3 is formed. The step of forming the pixel-forming composition layer 4a in the region of the above may be performed in the same step. As the pixel-forming composition, a composition in which pixels having a color different from that of the first pixel are formed is appropriately selected and used. For example, when the first pixel is a green pixel, in this step, the composition for forming a pixel is a composition other than the composition for forming a green pixel (for example, a composition for forming a red pixel, a composition for forming a blue pixel). Composition etc.) is used. Details of the pixel forming composition will be described later.

As a legal method for the pixel forming composition, a conventionally known method can be used. For example, a spin coating method, a slit coating method, an inkjet method, a dip coating method, a screen printing method and the like can be mentioned.

It is also preferable to dry the pixel-forming composition layer 4a formed on the support 1. The drying conditions are not particularly limited. For example, the drying temperature is preferably 60 to 150 ° C. The upper limit of the drying temperature is preferably 130 ° C. or lower, more preferably 110 ° C. or lower. The lower limit of the drying temperature is preferably 80 ° C. or higher, more preferably 90 ° C. or higher. The drying time is preferably 10 to 600 seconds. The upper limit of the drying time is preferably 300 seconds or less, more preferably 180 seconds or less. The lower limit of the drying time is preferably 40 seconds or more, more preferably 60 seconds or more. Drying can be performed using a hot plate, an oven, or the like.

(Step of forming the second pixel)
Next, a pattern is formed on the pixel-forming composition layer 4a on the support 1 formed as described above, and the second pixel 4 having a color different from that of the first pixel 2 is placed on the support 1. Form (Fig. 3). By doing so, as shown in FIG. 3, the first pixel 2 and the second pixel 4 are formed on the support 1, respectively, and the surface of the first pixel 2 and the surface of the first pixel 2 are formed. , A color filter having a structure in which a transparent layer 3 having an average thickness of 300 nm or less is formed between the second pixel 4 and the support 1 can be manufactured.

In the present invention, it is preferable that the pixel-forming composition layer 4a is patterned by a photolithography method to form the second pixel 4. As a pattern forming method in the photolithography method, a step of exposing the pixel forming composition layer 4a in a pattern (exposure step) and a step of developing and removing the pixel forming composition layer 4a of the unexposed portion to form a pattern. It is preferable to include a step of forming (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Hereinafter, each step will be described in detail.

In the exposure step, the pixel-forming composition layer 4a is exposed in a pattern. For example, the pixel-forming composition layer 4a can be exposed in a pattern by exposing the pixel-forming composition layer 4a through a mask having a predetermined mask pattern using an exposure device such as a stepper. As a result, the exposed portion can be cured. As the radiation (light) that can be used for exposure, ultraviolet rays such as g-line and i-line are preferably used (particularly preferably i-line). Irradiation dose (exposure dose), for example, preferably ^{0.03~2.5J / cm 2, 0.05~1.0J / cm} 2 is more preferable. The oxygen concentration at the time of exposure can be appropriately selected, and in addition to the operation in the atmosphere, for example, in a low oxygen atmosphere having an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, substantially anoxic). ), Or in a high oxygen atmosphere where the oxygen concentration exceeds 21% by volume (for example, 22% by volume, 30% by volume, 50% by volume). The exposure intensity is can be set appropriately, usually ^{1000W / m 2 ~100000W / m 2} ( ^{e.g., 5000W / m 2, 15000W /} m 2, 35000W / m 2) can be selected from the range of .. Oxygen concentration and exposure illuminance may appropriately combined conditions, for example, illuminance 10000 W / ^{m 2} at an oxygen concentration of 10 vol%, oxygen concentration of 35 vol% can be such illuminance 20000W / ^{m 2.}

In the developing step, the unexposed portion of the pixel-forming composition layer 4a is developed and removed. The unexposed portion of the pixel-forming composition layer 4a can be developed and removed using a developing solution. An alkaline developer is desirable as the developer. The temperature of the developing solution is preferably, for example, 20 to 30 ° C. The development time is preferably 20 to 180 seconds.

As the developing solution, an alkaline aqueous solution obtained by diluting an alkaline agent with pure water is preferably used. Examples of the alkaline agent include aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide. Do, benzyltrimethylammonium hydroxide, dimethylbis (2-hydroxyethyl) ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene and other organic alkaline compounds, and water. Examples thereof include inorganic alkaline compounds such as sodium oxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate, and sodium metasilicate. The concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass. In addition, the developing solution may further contain a surfactant. Examples of the surfactant include the surfactant described later, and a nonionic surfactant is preferable. From the viewpoint of convenience of transfer and storage, the developer may be once produced as a concentrated solution and diluted to a concentration required for use. The dilution ratio is not particularly limited, but can be set in the range of, for example, 1.5 to 100 times. When a developer composed of such an alkaline aqueous solution is used, it is preferable to wash (rinse) with pure water after development.

It is also possible to perform heat treatment (post-baking) after developing and drying. Post-baking is a post-development heat treatment to complete the curing of the film. When post-baking is performed, the post-baking temperature is preferably 100 to 240 ° C., for example. From the viewpoint of film hardening, 200 to 230 ° C. is more preferable.

The thickness of the second pixel 4 is preferably 0.1 to 10.0 μm. The upper limit is preferably 5.0 μm or less, more preferably 2.0 μm or less, and further preferably 1.0 μm or less. The lower limit is preferably 0.3 μm or more, and more preferably 0.4 μm or more. Further, the thickness of the second pixel 4 is preferably 2 to 1000 times, more preferably 4 to 400 times, and further preferably 8 to 200 times the average thickness of the transparent layer 3. preferable.

In this way, a color filter including the first pixel and the second pixel can be manufactured. Further, by sequentially repeating each of the above steps, a color filter having three or more types of pixels can be manufactured.

<Composition for forming a transparent layer>
Next, the composition for forming a transparent layer used in the method for producing a color filter of the present invention will be described.

The viscosity of the composition for forming a transparent layer is preferably 0.1 to 5.0 mPa · s at 25 ° C. The lower limit is preferably 0.5 mPa · s or more, and more preferably 0.7 mPa · s or more. The upper limit is preferably 4.0 mPa · s or less, and more preferably 3.0 mPa · s or less. When the viscosity of the transparent layer forming composition is within the above range, the coating property of the transparent layer forming composition is good, and it is easy to form a transparent layer which is a thin film and has little variation in film thickness. As a method for measuring the viscosity, for example, a viscometer RE85L (rotor: 1 ° 34'× R24, measuring range 0.6 to 1200 mPa · s) manufactured by Toki Sangyo Co., Ltd. is used, and the temperature is adjusted to 25 ° C. Can be measured. The solid content concentration of the transparent layer forming composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass, and 0.01 to 3% by mass. It is more preferable, and it is particularly preferable that it is 0.01 to 1% by mass. When the solid content concentration of the transparent layer forming composition is within the above range, the coating property of the transparent layer forming composition is good, and it is easy to form a thin film having a transparent layer having little variation in film thickness. Hereinafter, the components used in the composition for forming a transparent layer will be described.

<< Curable compound >>
The composition for forming a transparent layer contains a curable compound. Examples of the curable compound include a compound having a crosslinkable group and a resin having no crosslinkable group. The curable compound used in the present invention preferably contains a compound having a crosslinkable group, because the effect of the present invention can be obtained more remarkably. Examples of the crosslinkable group include a group having an ethylenically unsaturated bond, an epoxy group, a methylol group, an alkoxymethyl group and the like. Examples of the group having an ethylenically unsaturated bond include a vinyl group, a (meth) allyl group, and a (meth) acryloyl group. The curable compound is preferably a compound having a crosslinkable group, and more preferably a compound having a group having an ethylenically unsaturated bond. The compound having a group having an ethylenically unsaturated bond may be a monomer or a resin such as a polymer. The compound having a group having an ethylenically unsaturated bond is preferably a resin. When a resin-type compound having a group having an ethylenically unsaturated bond is used, it is easy to more uniformly apply the composition for forming a transparent layer to the first pixel. Therefore, the film-forming property of the transparent layer forming composition can be improved. Further, as a compound having a group having an ethylenically unsaturated bond, a compound having a group having a monomer type ethylenically unsaturated bond and a compound having a group having a resin type ethylenically unsaturated bond may be used in combination. Is also preferable. Hereinafter, a compound having a group having a monomer-type ethylenically unsaturated bond is also referred to as monomer A. Further, a compound having a group having a resin-type ethylenically unsaturated bond is also referred to as resin A.

The molecular weight of the monomer A is preferably 100 to 3000. The upper limit is preferably 2000 or less, and more preferably 1500 or less. The lower limit is preferably 150 or more, and more preferably 250 or more. The weight average molecular weight of the resin A is preferably 5000 to 20000. The upper limit is preferably 19000 or less, more preferably 18000 or less. The lower limit is preferably 8000 or more, and more preferably 10000 or more.

(Monomer A)
The monomer A is preferably a (meth) acrylate compound having 3 to 15 functions, and more preferably a (meth) acrylate compound having 3 to 6 functions. Specific examples include the compounds described in paragraph numbers 0995 to 0108 of JP2009-288705, paragraph numbers 0227 of JP2013-29760, and paragraphs 0254 to 0257 of JP2008-292970. These contents are incorporated herein by reference.

As the monomer A, compounds represented by the formulas (MO-1) to (MO-5) can also be preferably used. In the formula, when T is an oxyalkylene group, the end on the carbon atom side is bonded to R.

In the above formula, n is 0 to 14 and m is 1 to 8. A plurality of R and T existing in one molecule may be the same or different. In each of the compounds represented by the formulas (MO-1) to (MO-5), at least one of a plurality of Rs is -OC (= O) CH = CH ₂ or -OC (= O). Represents a group represented by C (CH ₃ ) = CH ₂ . Specific examples of the compounds represented by the formulas (MO-1) to (MO-5) include the compounds described in paragraphs 0248 to 0251 of JP-A-2007-269779, the contents of which are described in the present invention. Incorporated into the specification.

The monomer A includes dipentaerythritol triacrylate (commercially available KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.) and dipentaerythritol tetraacrylate (commercially available KAYARAD D-320; Nippon Kayaku). (Made by Co., Ltd.), Dipentaerythritol penta (meth) acrylate (commercially available KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (commercially available KAYARAD DPHA; Japan) Yakuhin Co., Ltd., A-DPH-12E; manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), and compounds having a structure in which these (meth) acryloyl groups are bonded via ethylene glycol and / or propylene glycol residues. (For example, SR454, SR499 commercially available from Sartmer) can be preferably used. These oligomer types can also be used. The monomer A includes trimethylolpropane tri (meth) acrylate, trimethylolpropane propyleneoxy-modified tri (meth) acrylate, trimethylolpropane ethyleneoxy-modified tri (meth) acrylate, and isocyanurate ethyleneoxy-modified tri (meth) acrylate. It is also preferable to use a trifunctional (meth) acrylate compound such as pentaerythritol trimethylolpropane (meth) acrylate. Commercially available products of trifunctional (meth) acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, and M-305. , M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) And so on.

As the monomer A, it is also preferable to use a compound having an acid group such as a carboxyl group, a sulfo group, and a phosphoric acid group. Examples of commercially available products include Aronix M-305, M-510, and M-520 manufactured by Toagosei Co., Ltd.

As the monomer A, it is also preferable to use a compound having a caprolactone structure. Examples of commercially available products include KAYARAD DPCA-20, DPCA-30, DPCA-60, DPCA-120 (manufactured by Nippon Kayaku Co., Ltd.) and the like.
As the monomer A, it is also preferable to use a compound having an alkyleneoxy group. The compound having an alkyleneoxy group is preferably a compound having an ethyleneoxy group and / or a propyleneoxy group, more preferably a compound having an ethyleneoxy group, and having 4 to 20 ethyleneoxy groups3. It is more preferably a ~ hexafunctional (meth) acrylate compound. Commercially available products of compounds having an alkyleneoxy group include SR-494 (manufactured by Sartmer, tetrafunctional (meth) acrylate having four ethyleneoxy groups) and KAYARAD TPA-330 (manufactured by Nippon Kayaku Co., Ltd., isobutyleneoxy). Trifunctional (meth) acrylate having three groups) and the like can be mentioned.

(Resin A)
The resin A is preferably a polymer containing a repeating unit having a group having an ethylenically unsaturated bond in the side chain, and more preferably a polymer having a repeating unit represented by the formula (1).

In the formula, R ¹ represents a hydrogen atom or an alkyl group, L ¹ represents a single bond or a divalent linking group, and P ¹ represents a group having an ethylenically unsaturated bond.

The alkyl group represented by R ¹ is preferably an alkyl group having 1 to 3 carbon atoms, and preferably a methyl group. R ¹ is preferably a hydrogen atom or a methyl group.

L ¹ represents a single bond or a divalent linking group. The divalent linking group is selected from an alkylene group having 1 to 30 carbon atoms, an arylene group having 6 to 12 carbon atoms, and -CO-, -OCO-, -O-, -NH- and -SO _2-. There is a group formed by combining one of the above types. The alkylene group and the arylene group may have a substituent or may be unsubstituted. Examples of the substituent include a halogen atom, an alkyl group, an aryl group, a hydroxyl group, a carboxyl group, an alkoxy group, an aryloxy group and the like. Hydroxyl group is preferred. The alkylene group may be linear, branched or cyclic.

P ¹ represents a group having an ethylenically unsaturated bond. As the group having an ethylenically unsaturated bond, a vinyl group, a (meth) allyl group, and a (meth) acryloyl group are preferable, and the polymerization reactivity is high, and more excellent moisture resistance can be easily obtained (meth). ) Acryloyl groups are more preferred.

In the resin A, the content of the repeating unit having a group having an ethylenically unsaturated bond in the side chain is preferably 5 to 100% by mass of all the repeating units. The lower limit is preferably 10% by mass or more, more preferably 15% by mass or more. The upper limit is preferably 90% by mass or less, more preferably 80% by mass or less, further preferably 75% by mass or less, and particularly preferably 70% by mass or less.

The resin A preferably further contains a repeating unit having an acid group. Examples of the acid group include a carboxyl group, a sulfo group, and a phosphoric acid group. Only one type of acid group may be contained, or two or more types may be contained. The proportion of the repeating unit having an acid group is preferably 1 to 50% by mass of all the repeating units constituting the polymer. The lower limit is more preferably 2% by mass or more, further preferably 3% by mass or more. The upper limit is more preferably 35% by mass or less, and further preferably 30% by mass or less.

When the resin A has an acid group, the acid value of the resin A is preferably 10 to 100 mgKOH / g. The lower limit is preferably 15 mgKOH / g or more, and more preferably 20 mgKOH / g or more. The upper limit is preferably 90 mgKOH / g or less, more preferably 80 mgKOH / g or less, further preferably 70 mgKOH / g or less, and particularly preferably 60 mgKOH / g or less.

The resin A also preferably contains a repeating unit having an aryl group in the side chain. The proportion of repeating units having an aryl group in the side chain is preferably 1 to 80% by mass of all the repeating units constituting the polymer. The lower limit is more preferably 10% by mass or more, further preferably 15% by mass or more. The upper limit is more preferably 70% by mass or less, and further preferably 60% by mass or less.

The resin A is at least one compound selected from the compound represented by the following formula (ED1) and the compound represented by the formula (1) of JP2010-168539 (hereinafter, these compounds are referred to as "ether dimer". It is also preferable to include a polymer obtained by polymerizing a monomer component containing).

In the formula (ED1), R ¹ and R ² each independently represent a hydrocarbon group having 1 to 25 carbon atoms which may have a hydrogen atom or a substituent.

As a specific example of the ether dimer, for example, paragraph No. 0317 of JP2013-29760A can be referred to, and the content thereof is incorporated in the present specification. The ether dimer may be of only one type or of two or more types.

Specific examples of the resin A include a polymer having the following structure. In the following structural formula, Me represents a methyl group.

As the resin A, a commercially available product can also be used. For example, Dianal NR series (manufactured by Mitsubishi Rayon Co., Ltd.), Photomer 6173 (COOH-containing polyurethane acrylic oligomer. Diamond Shamrock Co., manufactured by Ltd.), Viscort R-264, KS resist 106 (all manufactured by Osaka Organic Chemical Industry Co., Ltd.) , Praxel CF200 series (manufactured by Daicel Co., Ltd.), Ebeclyl3800 (manufactured by Daicel UCB Co., Ltd.), Acrylic RD-F8 (manufactured by Nippon Shokubai Co., Ltd.) and the like.

The content of the curable compound is preferably 0.01 to 1% by mass with respect to the total mass of the composition for forming a transparent layer. The lower limit is preferably 0.05% by mass or more, and more preferably 0.1% by mass or more. The upper limit is preferably 0.9% by mass or less, more preferably 0.8% by mass or less. The content of the curable compound in the total solid content of the composition for forming a transparent layer is preferably 50 to 100% by mass, and the lower limit is preferably 70% by mass or more, more preferably 90% by mass or more. .. The content of the compound having a crosslinkable group in the total amount of the curable compound is preferably 50 to 100% by mass, and the lower limit is preferably 70% by mass or more, more preferably 90% by mass or more, and substantially. It is particularly preferable that the compound is composed only of a compound having a crosslinkable group. When the curable compound is composed only of a compound having a substantially crosslinkable group, the content of the compound having a crosslinkable group in the total amount of the curable compound is preferably 99% by mass or more. It is more preferably 99.5% by mass or more, more preferably 99.9% by mass or more, and particularly preferably composed only of a compound having a crosslinkable group.

The content of the compound having a group having an ethylenically unsaturated bond is preferably 0.01 to 1% by mass with respect to the total mass of the composition for forming a transparent layer. The lower limit is preferably 0.05% by mass or more, and more preferably 0.1% by mass or more. The upper limit is preferably 0.9% by mass or less, more preferably 0.8% by mass or less. The content of the compound having a group having an ethylenically unsaturated bond in the total solid content of the composition for forming a transparent layer is preferably 50 to 100% by mass, and the lower limit is preferably 70% by mass or more. , 90% by mass or more is more preferable.

The content of the resin A in the total amount of the curable compound is preferably 50 to 100% by mass, more preferably 70 to 100% by mass, further preferably 90 to 100% by mass, and substantially. It is particularly preferable that the resin A is used alone. According to this aspect, the film-forming property of the composition for forming a transparent layer is good. When the curable compound is substantially composed only of the resin A, the content of the resin A in the total amount of the curable compound is preferably 99% by mass or more, preferably 99.5% by mass or more. It is more preferable, it is more preferably 99.9% by mass or more, and it is particularly preferable that it is composed of only the resin A.

<< Surfactant >>
The composition for forming a transparent layer may contain a surfactant. By containing a surfactant in the transparent layer forming composition, the coatability of the transparent layer forming composition can be improved. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used. Of these, a fluorine-based surfactant is preferable. By including a fluorine-based surfactant in the composition for forming a transparent layer, more excellent coatability can be easily obtained. Therefore, it is easy to form a transparent layer having a uniform film thickness with a thin film.

The fluorine content in the fluorine-based surfactant is preferably 3 to 40% by mass, more preferably 5 to 30% by mass, and particularly preferably 7 to 25% by mass. A fluorine-based surfactant having a fluorine content within the above range is effective in terms of uniformity of coating film thickness and liquid saving.

Examples of the fluorine-based surfactant include Megafuck F171, F172, F173, F176, F177, F141, F142, F143, F144, R30, F437, F475, F479, F482, F554, and F780 (above, DIC Corporation). , Florard FC430, FC431, FC171 (all manufactured by Sumitomo 3M Ltd.), Surfron S-382, SC-101, SC-103, SC-104, SC-105, SC-1068, SC-381, SC -383, S-393, KH-40 (above, manufactured by Asahi Glass Co., Ltd.), PF636, PF656, PF6320, PF6520, PF7002 (above, manufactured by OMNOVA) and the like. As the fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of JP2015-117327 and the compounds described in paragraphs 0117 to 0132 of JP2011-132503 can also be used.

The fluorine-based surfactant has a molecular structure having a functional group containing a fluorine atom, and an acrylic compound in which a portion of the functional group containing a fluorine atom is cleaved when heat is applied and the fluorine atom volatilizes can also be preferably used. .. Examples of such a fluorine-based surfactant include the Mega Fvck DS series manufactured by DIC Corporation (The Chemical Daily, February 22, 2016) (Nikkei Sangyo Shimbun, February 23, 2016), for example, Mega Fvck DS. -21 can be mentioned.

As the fluorine-based surfactant, it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound. For such a fluorine-based surfactant, the description in JP-A-2016-216602 can be referred to, and the content thereof is incorporated in the present specification.

As the fluorine-based surfactant, a block polymer can also be used. For example, the compounds described in JP-A-2011-89090 can be mentioned. The fluorine-based surfactant has a repeating unit derived from a (meth) acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy groups and propyleneoxy groups) (meth). A fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used. The following compounds are also exemplified as the fluorine-based surfactant used in the present invention. In the formula below,% indicating the ratio of the repeating unit is mol%.

The weight average molecular weight of the above compounds is preferably 3,000 to 50,000, for example 14,000.

As the fluorine-based surfactant, a fluorine-containing polymer having an ethylenically unsaturated bond group in the side chain can also be used. Specific examples include the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP2010-164965. Examples of commercially available products include Megafvck RS-101, RS-102, RS-718-K, RS-72-K manufactured by DIC Corporation.

Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, their ethoxylates and propoxylates (eg, glycerol propoxylates, glycerol ethoxylates, etc.), polyoxyethylene lauryl ethers, polyoxyethylene stearyl ethers, etc. Polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester, Pluronic L10, L31, L61, L62, 10R5, 17R2, 25R2 (BASF) , Tetronic 304, 701, 704, 901, 904, 150R1 (BASF), Solsparse 20000 (Nippon Lubrizol Co., Ltd.), NCW-101, NCW-1001, NCW-1002 (Wako Pure Chemical Industries, Ltd.) Industrial Co., Ltd.), Pionin D-6112, D-6112-W, D-6315 (manufactured by Takemoto Yushi Co., Ltd.), Orphine E1010, Surfinol 104, 400, 440 (manufactured by Nissin Chemical Industry Co., Ltd.) And so on.

Examples of the cationic surfactant include organosiloxane polymer KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid-based (co) polymer Polyflow No. 75, No. 90, No. Examples include 95 (manufactured by Kyoeisha Chemical Co., Ltd.) and W001 (manufactured by Yusho Co., Ltd.).

Examples of the anionic surfactant include W004, W005, W017 (manufactured by Yusho Co., Ltd.), Sandet BL (manufactured by Sanyo Chemical Industries, Ltd.) and the like.

Examples of the silicone-based surfactant include Torre Silicone DC3PA, Torre Silicone SH7PA, Torre Silicone DC11PA, Torre Silicone SH21PA, Torre Silicone SH28PA, Torre Silicone SH29PA, Torre Silicone SH30PA, Torre Silicone SH8400 (all, Toray Dow Corning Co., Ltd.). ), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF6001, KF6002 (all manufactured by Shinetsu Silicone Co., Ltd.) (Manufactured by), BYK307, BYK323, BYK330 (all manufactured by Big Chemie) and the like. It is also preferable to use a compound having the following structure.

The content of the surfactant is preferably 0.0001 to 0.1% by mass, preferably 0.0005% by mass or more, and 0.001 by mass, based on the total mass of the composition for forming a transparent layer. More preferably by mass% or more. The upper limit is preferably 0.05% by mass or less, more preferably 0.01% by mass or less. The content of the surfactant in the total solid content of the composition for forming a transparent layer is preferably 0.01 to 2.0% by mass, and the lower limit is preferably 0.05% by mass or more, preferably 0.1. More preferably by mass% or more. The upper limit is preferably 1.5% by mass or less, more preferably 1.0% by mass or less. Only one type of surfactant may be used, or two or more types may be used in combination. When two or more types are used in combination, the total amount is preferably in the above range.

<< Solvent >>
The composition for forming a transparent layer preferably contains a solvent. The solvent is preferably an organic solvent. The solvent is not particularly limited as long as it satisfies the solubility of each component and the coatability of the composition for forming a transparent layer.

Examples of the organic solvent include the following organic solvents. Examples of esters include ethyl acetate, -n-butyl acetate, isobutyl acetate, cyclohexyl acetate, amyl formate, isoamyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, ethyl lactate, alkyloxyoxyacetate. (For example, methyl alkyloxyacetate, ethyl alkyloxyacetate, butyl alkyloxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate, etc.)), alkyl 3-alkyloxypropionate Esters (eg, methyl 3-alkyloxypropionate, ethyl 3-alkyloxypropionate, etc. (eg, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, 3-ethoxypropionate) (Ethyl, etc.)), 2-alkyloxypropionate alkyl esters (eg, methyl 2-alkyloxypropionate, ethyl 2-alkyloxypropionate, propyl 2-alkyloxypropionate, etc. (eg, methyl 2-methoxypropionate)) , 2-Methyl propionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate)), 2-alkyloxy-2-methylpropionate methyl and 2-alkyloxy-2- Ethyl methyl propionate (eg, methyl 2-methoxy-2-methylpropionate, ethyl 2-ethoxy-2-methylpropionate, etc.), methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetoacetate, ethyl acetoacetate , 2-Oxobutanoate methyl, 2-oxobutanoate ethyl and the like. Examples of ethers include diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl cellosolve acetate, ethyl cellosolve acetate, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monomethyl ether, and propylene glycol. Examples thereof include monomethyl ether acetate, propylene glycol monoethyl ether acetate, and propylene glycol monopropyl ether acetate. Examples of the ketones include methyl ethyl ketone, cyclohexanone, cyclopentanone, 2-heptanone, 3-heptanone and the like. Preferred examples of aromatic hydrocarbons include toluene and xylene. Further, 3-methoxy-N, N-dimethylpropanamide and 3-butoxy-N, N-dimethylpropanamide are also preferable from the viewpoint of improving solubility. The organic solvent may be used alone or in combination of two or more. However, it may be better to reduce aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as a solvent for environmental reasons (for example, 50 mass ppm (parts per) with respect to the total amount of the organic solvent. Million) or less, 10 mass ppm or less, or 1 mass ppm or less).

In the present invention, it is preferable to use a solvent having a low metal content as the solvent. The metal content in the solvent is preferably, for example, 10 mass ppb (parts per parts) or less. If necessary, a solvent having a metal content of mass ppt (parts per tension) level may be used, and such a high-purity solvent is provided by, for example, Toyo Synthetic Co., Ltd. (The Chemical Daily, November 13, 2015). Day).

Examples of the method for removing impurities such as metals from the solvent include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter. The filter pore diameter of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene or nylon.

The solvent may contain isomers (compounds having the same number of atoms but different structures). Further, only one kind of isomer may be contained, or a plurality of kinds may be contained.

In the present invention, the organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

The content of the solvent is preferably 90 to 99.99% by mass, preferably 95% by mass or more, more preferably 97% by mass or more, and 99% by mass, based on the total mass of the composition for forming a transparent layer. More preferably by mass% or more. When the content of the solvent is within the above range, the coating property of the composition for forming a transparent layer is good, and it is easy to form a transparent layer which is a thin film and has little variation in film thickness.

<< Photopolymerization Initiator >>
When the transparent layer forming composition used in the present invention contains a compound having a group having an ethylenically unsaturated bond as a curable compound, the transparent layer forming composition further contains a photopolymerization initiator. Can be done. The photopolymerization initiator is not particularly limited and may be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light rays in the ultraviolet region to the visible region is preferable. Further, it may be a compound that produces an active radical by causing some action with a photoexcited sensitizer.

Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole, oxime compounds, organic peroxides, and the like. Examples thereof include thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds and α-aminoketone compounds. From the viewpoint of exposure sensitivity, the photopolymerization initiator includes trihalomethyltriazine compound, benzyldimethylketal compound, α-hydroxyketone compound, α-aminoketone compound, acylphosphine compound, phosphine oxide compound, metallocene compound, oxime compound, and triarylimidazole. Dimer, onium compounds, benzothiazole compounds, benzophenone compounds, acetophenone compounds, cyclopentadiene-benzene-iron complexes, halomethyloxaziazole compounds and 3-aryl substituted coumarin compounds are preferred, oxime compounds, α-hydroxyketone compounds, α- A compound selected from an aminoketone compound and an acylphosphine compound is more preferable, and an oxime compound is further preferable. As the photopolymerization initiator, the description in paragraphs 0065 to 0111 of JP-A-2014-130173 can be referred to, and the contents thereof are incorporated in the present specification.

Examples of commercially available α-hydroxyketone compounds include IRGACURE-184, DAROCUR-1173, IRGACURE-500, IRGACURE-2959, and IRGACURE-127 (all manufactured by BASF). Examples of commercially available α-aminoketone compounds include IRGACURE-907, IRGACURE-369, IRGACURE-379, and IRGACURE-379EG (all manufactured by BASF). Examples of commercially available acylphosphine compounds include IRGACURE-819 and DAROCUR-TPO (all manufactured by BASF).

As the oxime compound, for example, the compound described in JP-A-2001-233842, the compound described in JP-A-2000-80068, and the compound described in JP-A-2006-342166 can be used. Specific examples of the oxime compound include, for example, 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminovtan-2-one, 3-propionyloxyiminovtan-2-one, and 2-acetoxyiminopentane-3-3. On, 2-acetoxyimino-1-phenylpropane-1-one, 2-benzoyloxyimino-1-phenylpropane-1-one, 3- (4-toluenesulfonyloxy) iminobutane-2-one, and 2-ethoxy Examples thereof include carbonyloxyimino-1-phenylpropan-1-one.

Examples of the oxime compound include J. C. S. Perkin II (1979, pp. 1653-1660), J. Mol. C. S. Perkin II (1979, pp. 156-162), Journal of Photosystem Science and Technology (1995, pp. 202-232), JP-A-2000-66385, JP-A-2000-80068, JP-A-2004. Compounds and the like described in JP-A-534977 and JP-A-2006-342166 can also be used. As commercially available products, IRGACURE-OXE01, IRGACURE-OXE02, IRGACURE-OXE03, and IRGACURE-OXE04 (all manufactured by BASF) are also preferably used. In addition, TRONLY TR-PBG-304, TRONLY TR-PBG-309, TRONLY TR-PBG-305 (manufactured by Changzhou Powerful Electronic New Materials Co., Ltd. , ADEKA PUTMER N-1919 (Photopolymerization Initiator 2 of JP2012-14052A) (all manufactured by ADEKA Corporation) can be used.

Further, as an oxime compound other than the above, a compound described in JP-A-2009-5199004 in which an oxime is linked to the N-position of the carbazole ring, and a compound described in US Pat. No. 7,626,957 in which a heterosubstituted group is introduced at a benzophenone moiety. , The compounds described in JP-A-2010-15025 and US Patent Publication No. 2009-292039, the keto-oxime compounds described in International Publication No. 2009/131189, the triazine skeleton and the oxime skeleton, in which a nitro group was introduced into the dye moiety. The compound described in US Pat. No. 7,556,910, which is contained in the same molecule, and the compound described in JP-A-2009-221114, which has an absorption maximum at 405 nm and has good sensitivity to a g-ray light source, are used. You may. Preferably, for example, paragraph numbers 0274 to 0306 of JP2013-29760A can be referred to, the contents of which are incorporated herein.

Further, as the photopolymerization initiator, an oxime compound having a fluorene ring can also be used. Specific examples of the oxime compound having a fluorene ring include the compounds described in JP-A-2014-137466. This content is incorporated herein by reference.
Further, as the photopolymerization initiator, an oxime compound having a benzofuran skeleton can also be used. Specific examples thereof include compounds OE-01 to OE-75 described in International Publication No. 2015/036910.

Further, as the photopolymerization initiator, an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is a naphthalene ring can also be used. Specific examples of such an oxime compound include the compounds described in International Publication No. 2013/083505.

Further, as the photopolymerization initiator, an oxime compound having a fluorine atom can also be used. Specific examples of the oxime compound having a fluorine atom are described in the compounds described in JP-A-2010-262028, compounds 24, 36-40 described in JP-A-2014-500852, and JP-A-2013-164471. Compound (C-3) and the like. This content is incorporated herein by reference.

Further, as the photopolymerization initiator, an oxime compound having a nitro group can be used. The oxime compound having a nitro group is also preferably a dimer. Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP2013-114249A and paragraphs 0008-0012 and 0070-0079 of JP2014-137466, and Patent No. Examples thereof include the compounds described in paragraphs 0007 to 0025 of Japanese Patent Application Laid-Open No. 4223071, ADEKA ARKULS NCI-831 (manufactured by ADEKA Corporation), and the like.

Specific examples of the oxime compound preferably used in the present invention are shown below, but the present invention is not limited thereto.

The oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength region of 350 nm to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength region of 360 nm to 480 nm. Further, the oxime compound is preferably a compound having high absorbance at 365 nm and 405 nm.

From the viewpoint of sensitivity, the molar extinction coefficient of the oxime compound at 365 nm or 405 nm is preferably 1,000 to 300,000, more preferably 2,000 to 300,000, and 5,000 to 200, It is particularly preferably 000. The molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g / L using an ethyl acetate solvent with an ultraviolet-visible spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).

In the present invention, a bifunctional or trifunctional or higher functional photopolymerization initiator may be used as the photopolymerization initiator. Specific examples of such a photopolymerization initiator include paragraph numbers 0417 to JP-A-2010-527339, JP-A-2011-524436, WO2015 / 004565, and JP-A-2016-532675. 0412, Dimers of oxime compounds described in paragraphs 0039 to 0055 of International Publication No. 2017/033680, and compounds (E) and compounds (G) described in Japanese Patent Publication No. 2013-522445. , Cmpd1 to 7 described in International Publication No. 2016/034963, and the like.

The content of the photopolymerization initiator is preferably 3% by mass or less, more preferably 2.5% by mass or less, and 1.5% by mass or less, based on the total mass of the composition for forming a transparent layer. Is more preferable. The lower limit may be, for example, 0.01% by mass or more. The content of the photopolymerization initiator in the total solid content of the transparent layer forming composition is preferably 35% by mass or less, more preferably 30% by mass or less, and more preferably 25% by mass or less. Is even more preferable. The lower limit is preferably 5% by mass or more.
It is also preferable that the composition for forming a transparent layer does not substantially contain a photopolymerization initiator. When the photopolymerization initiator is not substantially contained, the content of the photopolymerization initiator is preferably 1% by mass or less, preferably 0.1% by mass, based on the total solid content of the composition for forming a transparent layer. It is more preferably less than or equal to, more preferably 0.01% by mass or less, and particularly preferably not contained.

<< Other additives >>
The transparent layer forming composition can further contain additives such as a silane coupling agent, a polymerization inhibitor, an antioxidant, an ultraviolet absorber, and an antiaggregating agent. The content of these other additives is preferably 5% by mass or less, more preferably 3% by mass or less, and 1% by mass or less, based on the total solid content of the composition for forming a transparent layer. It is more preferable that it is present, and it is particularly preferable that it is not substantially contained. When substantially no other additive is contained, the content of the other additive is preferably 0.01% by mass or less based on the total solid content of the composition for forming a transparent layer, preferably 0.005. It is more preferably 0% by mass or less, further preferably 0.001% by mass or less, and particularly preferably not contained.

<Pixel forming composition>
Next, the pixel forming composition used in the method for producing a color filter of the present invention will be described. The pixel-forming composition used in the present invention is preferably a composition for forming colored pixels in a color filter. Examples of the colored pixel include a red pixel, a blue pixel, a green pixel, a yellow pixel, a magenta pixel, and a cyan pixel.

<< Colorant >>
The pixel-forming composition preferably contains a colorant. Examples of the colorant include a chromatic colorant and a black colorant. Examples of the chromatic colorant include a yellow colorant, an orange colorant, a red colorant, a green colorant, a purple colorant, and a blue colorant. Specific examples of the chromatic colorant include the following.

Color Index (CI) Pigment Yellow 1,2,3,4,5,6,10,11,12,13,14,15,16,17,18,20,24,31,32,34, 35,35: 1,36,36: 1,37,37: 1,40,42,43,53,55,60,61,62,63,65,73,74,77,81,83,86, 93,94,95,97,98,100,101,104,106,108,109,110,113,114,115,116,117,118,119,120,123,125,126,127,128, 129,137,138,139,147,148,150,151,152,153,154,155,156,161,162,164,166,167,168,169,170,171,172,173,174 175,176,177,179,180,181,182,185,187,188,193,194,199,213,214 (above, yellow pigment);
C. I. Pigment Orange 2,5,13,16,17: 1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73 ( Above, orange pigment);
C. I. Pigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48: 1,48: 2,48: 3,48: 4, 49,49: 1,49: 2,52: 1,52: 2,53: 1,57: 1,60: 1,63: 1,66,67,81: 1,81: 2,81: 3, 83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184 185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,270,272,279 (above, red pigment) );
C. I. Pigment Green 7,10,36,37,58,59 (above, green pigment);
C. I. Pigment Violet 1,19,23,27,32,37,42,58,59 (above, purple pigment);
C. I. Pigment Blue 1,2,15,15: 1,15: 2,15: 3,15: 4,15: 6,16,22,60,64,66,79,80 (above, blue pigment).

Further, as a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms in a molecule, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms. It is also possible to use. Specific examples include the compounds described in WO 2015/118720.

Further, as the blue colorant, an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples include the compounds described in paragraph numbers 0022 to 0030 of JP2012-247591A and paragraph numbers 0047 of JP2011-157478A.

Further, as the yellow colorant, the quinophthalone compounds described in paragraphs 0011 to 0034 of JP2013-54339A, the quinophthalone compounds described in paragraphs 0013 to 0058 of JP2014-262228, and the like can also be used. ..

Dyes can also be used as the chromatic colorant. Examples of the dye include JP-A-64-90403, JP-A-64-91102, JP-A-1-94301, JP-A-6-11614, US Pat. No. 4,808,501, JP-A-5. Examples thereof include dyes disclosed in JP-A-333207, JP-A-6-35183, JP-A-6-51115, JP-A-6-194828, and the like. When classified as a chemical structure, pyrazole azo compound, pyromethene compound, anilino azo compound, triarylmethane compound, anthraquinone compound, benzylidene compound, oxonor compound, pyrazorotriazole azo compound, pyridone azo compound, cyanine compound, phenothiazine compound, pyropyrazole azomethin compound, etc. Can be mentioned.

Moreover, you may use a dye multimer as a colorant. The dye multimer is preferably a dye that is used by being dissolved in a solvent, but may form particles. When the dye multimer is a particle, the dye multimer is used by dispersing it in a solvent or the like. The pigment multimer in the particle state can be obtained, for example, by emulsion polymerization. Examples of the pigment multimer in the particle state include compounds described in JP-A-2015-214682. Further, as the dye multimer, compounds described in JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742 and the like can also be used. ..

Examples of the black colorant include inorganic black colorants such as carbon black and titanium black, and organic black colorants such as bisbenzofuranone compounds, azomethine compounds, and perylene compounds. Examples of the bisbenzofuranone compound include the compounds described in JP-A-2010-534726, JP-A-2012-515233, and JP-A-2012-515234. For example, as "Irgaphor Black" manufactured by BASF. It is available. Examples of the perillene compound include C.I. I. Pigment Black 31, 32 and the like can be mentioned. Examples of the azomethine compound include those described in JP-A-1-170601 and JP-A-2-34664, and are available as, for example, "Chromofine Black A1103" manufactured by Dainichiseika.

The content of the colorant is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, and 55% by mass or more, based on the total solid content of the pixel-forming composition. Is even more preferable, 60% by mass or more is even more preferable, and 65% by mass or more is particularly preferable. The upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, and even more preferably 70% by mass or less. The colorant contained in the pixel forming composition may be one kind or two or more kinds. When two or more kinds of colorants are contained, the total amount is preferably in the above range.

<< Polymerizable compound >>
The pixel-forming composition can contain a polymerizable compound. As the polymerizable compound, a known compound that can be crosslinked by radicals, acids, or heat can be used. Examples of the polymerizable compound include compounds having a group having an ethylenically unsaturated bond.
Examples of the group having an ethylenically unsaturated bond include a vinyl group, a (meth) allyl group, and a (meth) acryloyl group.
The polymerizable compound is more preferably a radically polymerizable compound. The polymerizable compound may be in any chemical form such as a monomer, a prepolymer or an oligomer, but a monomer is preferable. The molecular weight of the polymerizable compound is preferably 100 to 3000. The upper limit is more preferably 2000 or less, and even more preferably 1500 or less. The lower limit is more preferably 150 or more, and even more preferably 250 or more. The polymerizable compound is preferably a (meth) acrylate compound having 3 to 15 functionalities, and more preferably a (meth) acrylate compound having 3 to 6 functionalities. Specific examples of these compounds are described in paragraphs 0905 to 0108 of JP2009-288705A, paragraph 0227 of JP2013-29760A, and paragraphs 0254 to 0257 of JP2008-292970. Compounds are mentioned and these contents are incorporated herein. Further, as the polymerizable compound, a compound having a group having an ethylenically unsaturated bond described in the above-mentioned section of the composition for forming a transparent layer (for example, monomer A) can also be preferably used.

The content of the polymerizable compound is preferably 0.1 to 50% by mass with respect to the total solid content of the pixel-forming composition. The lower limit is more preferably 0.5% by mass or more, and further preferably 1% by mass or more. The upper limit is more preferably 45% by mass or less, and further preferably 40% by mass or less. The polymerizable compound may be used alone or in combination of two or more. When two or more types are used in combination, the total amount is preferably in the above range.

<< Photopolymerization Initiator >>
The pixel-forming composition can contain a photopolymerization initiator. The photopolymerization initiator is not particularly limited and may be appropriately selected from known photopolymerization initiators. Examples of these details include the photopolymerization initiator described in the section of the composition for forming a transparent layer described above. The content of the photopolymerization initiator is preferably 0.1 to 50% by mass, more preferably 0.5 to 30% by mass, still more preferably 1 to 20% by mass, based on the total solid content of the pixel-forming composition. The photopolymerization initiator may be used alone or in combination of two or more. When two or more types are used in combination, the total amount is preferably in the above range.

<< Compound with epoxy group >>
The pixel-forming composition can contain a compound having an epoxy group. According to this aspect, the mechanical strength of the film can be improved. As the compound having an epoxy group, a compound having two or more epoxy groups in one molecule is preferable. The upper limit of the epoxy group is preferably 100 or less, more preferably 10 or less, and further preferably 5 or less.

The compound having an epoxy group is preferably a compound having a structure having an aromatic ring and / or an aliphatic ring, and more preferably a compound having a structure having an aliphatic ring. The epoxy group is preferably attached to the aromatic ring and / or the aliphatic ring via a single bond or a linking group. As the linking group, an alkylene group, an arylene group, and -NR'-(R'represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent, and hydrogen. Atoms are preferred), -SO _2- , -CO-, -COO-, -OCO-, -O-, -S- and groups consisting of a combination thereof.
In the case of a compound having an aliphatic ring, the epoxy group is preferably a compound directly bonded (single bond) to the aliphatic ring. In the case of a compound having an aromatic ring, the epoxy group is preferably a compound formed by bonding to the aromatic ring via a linking group. The linking group is preferably an alkylene group or a group composed of a combination of an alkylene group and —O—.
Further, as the compound having an epoxy group, a compound having a structure in which two or more aromatic rings are linked by a hydrocarbon group can also be used. The hydrocarbon group is preferably an alkylene group having 1 to 6 carbon atoms. The epoxy group is preferably linked via the linking group.

The epoxy equivalent (= molecular weight of the compound having an epoxy group / number of epoxy groups) of the compound having an epoxy group is preferably 500 g / eq or less, more preferably 100 to 400 g / eq, and 100 to 300 g. It is more preferably / eq.

The compound having an epoxy group may be either a low molecular weight compound (for example, a molecular weight of less than 1000) or a high molecular weight compound (macromethylule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). .. The molecular weight of the compound having an epoxy group (in the case of a polymer, the weight average molecular weight) is preferably 200 to 100,000, more preferably 500 to 50,000. The upper limit of the molecular weight (in the case of a polymer, the weight average molecular weight) is preferably 3000 or less, more preferably 2000 or less, and further preferably 1500 or less.

Compounds having an epoxy group are described in paragraphs 0034 to 0036 of JP2013-011869, paragraphs 0147 to 0156 of JP2014-043556, and paragraph numbers 0085-0092 of JP2014-089408. It is also possible to use the compound. These contents are incorporated in the present specification. As commercially available products, for example, as bisphenol A type epoxy resins, jER825, jER827, jER828, jER834, jER1001, jER1002, jER1003, jER1055, jER1007, jER1009, jER1010 (all manufactured by Mitsubishi Chemical Corporation), EPICLON860, EPICLON1050 , EPICLON1051, EPICLON1055 (all manufactured by DIC Corporation), etc., and examples of the bisphenol F type epoxy resin include jER806, jER807, jER4004, jER4005, jER4007, jER4010 (all manufactured by Mitsubishi Chemical Corporation), EPICLON830, and EPICLON835. (Above, manufactured by DIC Corporation), LCE-21, RE-602S (above, manufactured by Nippon Kayaku Co., Ltd.), etc. As phenol novolac type epoxy resins, jER152, jER154, jER157S70, jER157S65 (above, Mitsubishi Chemical Co., Ltd.), EPICLON N-740, EPICLON N-770, EPICLON N-775 (all manufactured by DIC Corporation), etc. As cresol novolac type epoxy resins, EPICLON N-660 and EPICLON N -665, EPICLON N-670, EPICLON N-673, EPICLON N-680, EPICLON N-690, EPICLON N-695 (all manufactured by DIC Corporation), EOCN-1020 (manufactured by Nippon Kayaku Co., Ltd.), etc. As the aliphatic epoxy resin, ADEKA RESIN EP-4080S, EP-4085S, EP-4088S (all manufactured by ADEKA Co., Ltd.), celoxide 2021P, celoxide 2081, celoxide 2083, celoxide 2085, EHPE3150, EPOLEAD. PB 3600, PB 4700 (manufactured by DIC CORPORATION), Denacol EX-212L, EX-214L, EX-216L, EX-321L, EX-850L (manufactured by Nagase ChemteX Corporation), etc. .. In addition, ADEKA RESIN EP-4000S, EP-4003S, EP-4010S, EP-4011S (all manufactured by ADEKA Corporation), NC-2000, NC-3000, NC-7300, XD-1000, Examples thereof include EPPN-501, EPPN-502 (all manufactured by ADEKA Corporation), jER1031S (manufactured by Mitsubishi Chemical Corporation), and the like.

The content of the compound having an epoxy group is preferably 0.1 to 40% by mass with respect to the total solid content of the pixel-forming composition. The lower limit is, for example, more preferably 0.5% by mass or more, further preferably 1% by mass or more. The upper limit is, for example, more preferably 30% by mass or less, further preferably 20% by mass or less. The compound having an epoxy group may be used alone or in combination of two or more. When two or more types are used in combination, the total amount is preferably in the above range. When the polymerizable compound and the compound having an epoxy group are used in combination, the ratio (mass ratio) of the two is preferably mass of the polymerizable compound: mass of the compound having an epoxy group = 100: 1 to 100: 400. , 100: 1 to 100: 100 is more preferable, and 100: 1 to 100: 50 is even more preferable.

<< Resin >>
The pixel-forming composition can contain a resin. Examples of the resin include (meth) acrylic resin, en-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, and polyamideimide resin. , Polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, siloxane resin and the like. The resin is blended, for example, for the purpose of dispersing particles such as pigments in the composition and for the purpose of a binder. A resin mainly used for dispersing particles such as pigments is also referred to as a dispersant. However, such an application of the resin is an example, and it can be used for a purpose other than such an application. The weight average molecular weight (Mw) of the resin is preferably 5000 to 100,000. The number average molecular weight (Mn) of the resin is preferably 1000 to 20,000.

In the present invention, it is also preferable to use a resin having an acid group as the resin. Examples of the acid group include a carboxyl group, a phosphoric acid group, a sulfo group, a phenolic hydroxyl group and the like, and a carboxyl group is preferable. The acid value of the resin having an acid group is preferably 25 to 200 mgKOH / g. The lower limit is more preferably 30 mgKOH / g or more, and further preferably 40 mgKOH / g or more. The upper limit is more preferably 150 mgKOH / g or less, further preferably 120 mgKOH / g or less, and particularly preferably 100 mgKOH / g or less. A resin having an acid group can be preferably used as an alkali-soluble resin.

In the present invention, it is also preferable to use a resin having a group having an ethylenically unsaturated bond as the resin. As the resin having a group having an ethylenically unsaturated bond, the resin A described in the above-mentioned section of the composition for forming a transparent layer can also be used.

In the present invention, a resin can also be used as the dispersant. Examples of the dispersant include pigment dispersants described in paragraphs 0173 to 0179 of JP-A-2015-151530, the contents of which are incorporated in the present specification. Examples of commercially available dispersants include Disperbyk-161 (manufactured by BYK Chemie). Further, the product described in paragraph No. 0129 of JP2012-137564A can also be used as a dispersant.

The content of the resin is preferably 1 to 80% by mass with respect to the total solid content of the pixel-forming composition. The lower limit is more preferably 5% by mass or more, and further preferably 10% by mass or more. The upper limit is more preferably 70% by mass or less, and further preferably 60% by mass or less.

<< Solvent >>
The pixel-forming composition preferably contains a solvent. Examples of the solvent include the solvent described in the above-mentioned section of the composition for forming a transparent layer. The content of the solvent is preferably such that the total solid content of the pixel-forming composition is 5 to 80% by mass. The lower limit is preferably 10% by mass or more. The upper limit is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less.

<< Surfactant >>
The pixel-forming composition can contain a surfactant. Examples of the surfactant include the surfactant described in the above-mentioned section of the composition for forming a transparent layer, and a fluorine-based surfactant is preferable. The content of the surfactant is preferably 0.001 to 2.0% by mass, more preferably 0.005 to 1.0% by mass, based on the total solid content of the pixel-forming composition. The surfactant may be used alone or in combination of two or more. When two or more types are used in combination, the total amount is preferably in the above range.

<< Pigment derivative >>
The pixel-forming composition can contain a pigment derivative. Examples of the pigment derivative include compounds having a structure in which a part of the chromophore is replaced with an acid group, a basic group or a phthalimide methyl group. The colorants constituting the pigment derivative include quinoline skeleton, benzoimidazolone skeleton, diketopyrrolopyrrole skeleton, azo skeleton, phthalocyanine skeleton, anthracinone skeleton, quinacridone skeleton, dioxazine skeleton, and perinone skeleton. Skeletons, perylene skeletons, thioindigo skeletons, isoindolin skeletons, isoindolinone skeletons, quinophthalone skeletons, slene skeletons, metal complex skeletons, etc., quinoline skeletons, benzoimidazolone skeletons, diketo Pyrrolopyrrole skeleton, azo skeleton, quinophthalone skeleton, isoindolin skeleton and phthalocyanine skeleton are preferable, and azo skeleton and benzoimidazolone skeleton are more preferable. As the acid group contained in the pigment derivative, a sulfo group and a carboxyl group are preferable, and a sulfo group is more preferable. As the basic group contained in the pigment derivative, an amino group is preferable, and a tertiary amino group is more preferable. As a specific example of the pigment derivative, for example, the description in paragraphs 0162 to 0183 of JP-A-2011-52065 can be referred to, and this content is incorporated in the present specification. When the composition for forming a pixel contains a pigment derivative, the content of the pigment derivative is preferably 1 to 30 parts by mass, more preferably 3 to 20 parts by mass with respect to 100 parts by mass of the pigment. Only one kind of pigment derivative may be used, or two or more kinds may be used in combination.

<< Silane Coupling Agent >>
The pixel-forming composition can contain a silane coupling agent. In the present invention, the silane coupling agent means a silane compound having a hydrolyzable group and other functional groups. Further, the hydrolyzable group refers to a substituent that is directly linked to a silicon atom and can form a siloxane bond by a hydrolysis reaction and / or a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group and the like. The silane coupling agent has at least one group selected from a vinyl group, an epoxy group, a methacryl group, an amino group, an isocyanurate group, a ureido group, a mercapto group, a sulfide group, and an isocyanate group, and an alkoxy group. Silane compounds are preferred. For details of the silane coupling agent, the description in paragraphs 0155 to 0158 of JP2013-254847A can be referred to, and the contents thereof are incorporated in the present specification. When the pixel-forming composition contains a silane coupling agent, the content of the silane coupling agent is preferably 0.001 to 20% by mass, preferably 0.01, based on the total solid content of the pixel-forming composition. 10% by mass is more preferable, and 0.1 to 5% by mass is particularly preferable. The pixel-forming composition may contain only one type of silane coupling agent, or may contain two or more types of silane coupling agent.

<< Polymerization inhibitor >>
The pixel-forming composition can contain a polymerization inhibitor. Examples of the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol), and the like. Examples thereof include 2,2'-methylenebis (4-methyl-6-t-butylphenol) and N-nitrosophenylhydroxyamine salts (ammonium salt, primary cerium salt, etc.). When the pixel-forming composition contains a polymerization inhibitor, the content of the polymerization inhibitor is preferably 0.01 to 5% by mass with respect to the total solid content of the pixel-forming composition. The pixel-forming composition may contain only one type of polymerization inhibitor, or may contain two or more types of polymerization inhibitors.

<< Other additives >>
The pixel-forming composition can further contain other additives such as an ultraviolet absorber, an antioxidant, a filler, an adhesion promoter, an antioxidant, and an antioxidant. Examples of these other additives include the additives described in paragraphs 0164 to 0300 of JP2016-102191A, the contents of which are incorporated in the present specification.

<Color filter>
Next, the color filter of the present invention will be described. The color filter of the present invention has a first pixel on a support and a second pixel having a color different from that of the first pixel, and has an average thickness of 300 nm or less on the surface of the first pixel. It has a transparent layer, and has a transparent layer having an average thickness of 300 nm or less between the second pixel and the support.

With reference to FIG. 3, the thickness of the first pixel 2 is preferably 0.1 to 10.0 μm. The upper limit is preferably 5.0 μm or less, more preferably 2.0 μm or less, and further preferably 1.0 μm or less. The lower limit is preferably 0.3 μm or more, and more preferably 0.4 μm or more. The average thickness of the transparent layer 3 formed on the surface of the first pixel 2 is preferably 5 to 300 nm, more preferably 5 to 100 nm, and further preferably 5 to 50 nm. preferable. Further, the thickness of the first pixel 2 is preferably 2 to 1000 times, preferably 4 to 400 times, the average thickness of the transparent layer 3 formed on the surface of the first pixel 2. More preferably, it is 8 to 200 times more preferably.

The thickness of the second pixel 4 is preferably 0.1 to 10.0 μm. The upper limit is preferably 5.0 μm or less, more preferably 2.0 μm or less, and further preferably 1.0 μm or less. The lower limit is preferably 0.3 μm or more, and more preferably 0.4 μm or more. The average thickness of the transparent layer 3 formed between the second pixel 4 and the support 1 is preferably 5 to 300 nm, more preferably 5 to 100 nm, and more preferably 5 to 50 nm. Is more preferable. Further, the thickness of the second pixel 4 is preferably 2 to 1000 times the average thickness of the transparent layer 3 formed between the second pixel 4 and the support 1, and is 4 to 400 times. It is more preferably double, and even more preferably 8 to 200 times.

The color filter of the present invention preferably has a transparent layer having an average thickness of 300 nm or less between the first pixel and the second pixel. The average thickness of the transparent layer between the first pixel and the second pixel is preferably 5 to 300 nm, more preferably 5 to 100 nm, and even more preferably 5 to 50 nm.

In the color filter of the present invention, the average thickness of the transparent layer formed on the surface of the first pixel is the average value of the thicknesses of the above-mentioned transparent layers at any three locations. Further, the average thickness of the transparent layer formed between the second pixel 4 and the support is an average value of the thicknesses of any three places of the transparent layer described above. Further, the average thickness of the transparent layer formed between the first pixel and the second pixel is an average value of the thicknesses of any three places of the transparent layer described above. In addition, the thickness of the transparent layer can be measured from a scanning electron microscope (SEM) image of a cross section cut perpendicular to the support. The same applies to the thickness of the first pixel and the second pixel.

In the color filter of the present invention, at least one of the first pixel and the second pixel preferably contains 55% by mass or more of a colorant, and at least the second pixel contains 55% by mass or more of a colorant. It is more preferable that both the first pixel and the second pixel contain 55% by mass or more of the colorant.

The color filter of the present invention may be further formed with a functional layer such as a protective layer. The color filter of the present invention can be used for a solid-state image sensor such as a CCD (charge coupling element) or CMOS (complementary metal oxide semiconductor), an image display device, or the like.

<Manufacturing method of solid-state image sensor>
The method for manufacturing a solid-state image sensor of the present invention includes the above-mentioned method for manufacturing a color filter of the present invention. The configuration of the solid-state image sensor is not particularly limited as long as it functions as a solid-state image sensor, and examples thereof include the following configurations.

On the substrate, there are a plurality of photodiodes constituting the light receiving area of a solid-state image sensor (CCD (charge coupling element) image sensor, CMOS (complementary metal oxide semiconductor) image sensor, etc.) and a transfer electrode made of polysilicon or the like. A device protective film made of silicon nitride or the like formed on the photodiode and the transfer electrode so as to have a light-shielding film in which only the light receiving portion of the photodiode is opened, and to cover the entire surface of the light-shielding film and the light-receiving part of the photodiode. And has a color filter on the device protective film. Further, a configuration having a condensing means (for example, a microlens or the like; the same applies hereinafter) on the device protective film under the color filter (near the substrate), a configuration having a condensing means on the color filter, and the like. There may be. An image pickup device provided with a solid-state image sensor can be used not only for a digital camera and an electronic device having an image pickup function (mobile phone, etc.), but also for an in-vehicle camera and a surveillance camera.

<Manufacturing method of image display device>
The manufacturing method of the image display device includes the manufacturing method of the color filter of the present invention described above. Examples of the image display device include a liquid crystal display device and an organic electroluminescence display device. For details on the definition of image display devices and the details of each image display device, see, for example, "Electronic Display Device (Akio Sasaki, Kogyo Chosakai Co., Ltd., 1990)", "Display Device (Junaki Ibuki, Sangyo Tosho Co., Ltd.)" )) ”, Etc. Further, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994)". The liquid crystal display device to which the present invention can be applied is not particularly limited, and for example, it can be applied to various types of liquid crystal display devices described in the above-mentioned "next-generation liquid crystal display technology".

The present invention will be specifically described below with reference to examples. The materials, amounts used, ratios, treatment contents, treatment procedures, etc. shown in the following examples can be appropriately changed as long as they do not deviate from the gist of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. Unless otherwise specified, "parts" and "%" are based on mass.

<Preparation of composition for forming transparent layer>
(Composition for forming a transparent layer 1)
The raw materials shown below were mixed to prepare a composition for forming a transparent layer. The viscosity of this transparent layer forming composition at 25 ° C. was 1.20 mPa · s.
Curable compound 1 ... 0.35 parts by mass Propylene glycol monomethyl ether acetate (PGMEA) ... 99.65 parts by mass

(Composition for forming a transparent layer 2)
The raw materials shown below were mixed to prepare a composition for forming a transparent layer. The viscosity of this transparent layer forming composition at 25 ° C. was 1.20 mPa · s.
Curable compound 2 ... 0.35 parts by mass Propylene glycol monomethyl ether acetate (PGMEA) ... 99.65 parts by mass

(Composition for forming a transparent layer 3)
The raw materials shown below were mixed to prepare a composition for forming a transparent layer. The viscosity of this transparent layer forming composition at 25 ° C. was 1.20 mPa · s.
Curable compound 1 ... 0.35 parts by mass Photopolymerization initiator 1 ... 0.005 parts by mass Propylene glycol monomethyl ether acetate (PGMEA) ... 99.65 parts by mass

Curable compound 1: Resin having the following structure (Mw = 14000, the numerical value added to the main chain is the molar ratio of the repeating unit).

Curable compound 2: Resin having the following structure (Mw = 11000, the numerical value added to the main chain is the molar ratio of the repeating unit).

Photopolymerization Initiator 1: Compound with the following structure

<Preparation of composition for pixel formation>
<< Preparation of Green dispersion >>
9.5 parts by mass of the Green pigments listed in the table below and C.I. I. A mixture of 2.4 parts by mass of Pigment Yellow 185, 1.2 parts by mass of the derivatives listed in the table below, 4.6 parts by mass of the dispersant listed in the table below, and 82.3 parts by mass of PGMEA. The liquid was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm system). Then, using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism, dispersion treatment was performed at a flow rate of 500 g / min under a pressure of 2000 kg / cm ³ . This dispersion treatment was repeated 10 times to obtain a Green dispersion.

<< Preparation of Red dispersion >>
8.3 parts by mass of Red pigments listed in the table below and C.I. I. A mixture of 2.3 parts by mass of Pigment Yellow 139, 2.4 parts by mass of the derivatives listed in the table below, 3.9 parts by mass of the dispersant listed in the table below, and 83.1 parts by mass of PGMEA. The liquid was mixed and dispersed for 3 hours using a bead mill (zirconia beads 0.3 mm system), and then 2000 kg / cm ³ was further used with a high pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. The dispersion treatment was carried out under pressure at a flow rate of 500 g / min. This dispersion treatment was repeated 10 times to obtain a Red dispersion.

The raw materials used for the preparation of the Green dispersion and the Red dispersion are as follows.
(Green pigment)
Green Pigment 1: C.I. I. Pigment Green 7
Green Pigment 2: C.I. I. Pigment Green 36
Green Pigment 3: C.I. I. Pigment Green 58
(Red pigment)
Red Pigment 1: C.I. I. Pigment Red 254
Red Pigment 2: C.I. I. Pigment Red 264
(Derivative)
Derivative 1: Compound with the following structure

Derivative 2: Compound with the following structure

(Dispersant)
Dispersant 1: Resin having the following structure (Mw = 20000, the numerical value added to the main chain is the molar ratio of the repeating unit, and the numerical value added to the side chain is the number of repeating units).

Dispersant 2: Resin having the following structure (Mw = 24000, the numerical value added to the main chain is the molar ratio of the repeating unit, and the numerical value added to the side chain is the number of repeating units).

Dispersant 3: Resin having the following structure (Mw = 38900, the numerical value added to the main chain is the molar ratio of the repeating unit, and the numerical value added to the side chain is the number of repeating units).

Dispersant 4: Resin having the following structure (Mw = 32683, the numerical value added to the main chain is the molar ratio of the repeating unit, and the numerical value added to the side chain is the number of repeating units).

<< Preparation of Green Composition >>
The following raw materials were mixed to prepare a Green composition.
[Green Prescription 1]
Green dispersions listed in the table below: 71.8 parts by mass Resins listed in the table below: 1.1 parts by mass Polymerizable compounds listed in the table below: 1.8 parts by mass Described in the table below Photopolymerization initiator ・ ・ ・ 0.8 parts by mass Surfactants listed in the table below ・ ・ ・ 0.3 parts by mass Polymerization inhibitors listed in the table below ・ ・ ・ 0.009 parts by mass PGMEA ・ ・ ・ 24 .1 part by mass

[Green prescription 2]
Green dispersion described in the table below ... 78.2 parts by mass Resin listed in the table below ... 0.3 parts by mass Polymerized compound described in the table below ... 1.6 parts by mass Described in the table below Photopolymerization initiator ・ ・ ・ 0.7 parts by mass Surfactants listed in the table below ・ ・ ・ 0.3 parts by mass Polymerization inhibitors listed in the table below ・ ・ ・ 0.00079 parts by mass PGMEA ・ ・ ・ 18 .8 parts by mass

[Green prescription 3]
Green dispersions listed in the table below: 85.9 parts by mass Resins listed in the table below: 0.3 parts by mass Polymerizable compounds listed in the table below: 0.6 parts by mass Described in the table below Photopolymerization initiator ・ ・ ・ 0.3 parts by mass Surfactants listed in the table below ・ ・ ・ 0.3 parts by mass Polymerization inhibitors listed in the table below ・ ・ ・ 0.00032 parts by mass PGMEA ・ ・ ・ 12 .5 parts by mass

<< Preparation of Red Composition >>
The following raw materials were mixed to prepare a Red composition.
[Red prescription 1]
Red dispersions listed in the table below ... 66.2 parts by mass Resins listed in the table below ... 1.3 parts by mass Polymerizable compounds listed in the table below ... 1.1 parts by mass Described in the table below Photopolymerization initiator ・ ・ ・ 0.5 parts by mass Surfactants listed in the table below ・ ・ ・ 0.04 parts by mass Polymerization inhibitors listed in the table below ・ ・ ・ 0.00054 parts by mass PGMEA ・ ・ ・ 30 .9 parts by mass

[Red prescription 2]
Red dispersions listed in the table below: 72.9 parts by mass Resins listed in the table below: 0.4 parts by mass Polymerizable compounds listed in the table below: 0.9 parts by mass Described in the table below Photopolymerization initiator ・ ・ ・ 0.4 parts by mass Surfactants listed in the table below ・ ・ ・ 0.04 parts by mass Polymerization inhibitors listed in the table below ・ ・ ・ 0.00045 parts by mass PGMEA ・ ・ ・ 25 .4 parts by mass

[Red prescription 3]
Red dispersions listed in the table below: 79.5 parts by mass Resins listed in the table below: 0.1 parts by mass Polymerizable compounds listed in the table below: 0.3 parts by mass Described in the table below Photopolymerization initiator ・ ・ ・ 0.1 parts by mass Surfactants listed in the table below ・ ・ ・ 0.04 parts by mass Polymerization inhibitors listed in the table below ・ ・ ・ 0.00016 parts by mass PGMEA ・ ・ ・ 19 .9 parts by mass

The raw materials used for preparing the Green composition and Red composition are as follows.
(Green dispersion)
Green dispersions 1-12: The above-mentioned Green dispersions 1-12
(Red dispersion)
Red dispersions 1-10: The above-mentioned Red dispersions 1-10
(resin)
Resin 1: Resin having the following structure (Mw = 14000, the numerical value added to the main chain is the molar ratio of the repeating unit).

Resin 2: Resin having the following structure (Mw = 5000, the numerical value added to the main chain is the molar ratio of the repeating unit).

Resin 3: Resin having the following structure (Mw = 11000, the numerical value added to the main chain is the molar ratio of the repeating unit).

Resin 4: Resin having the following structure (Mw = 11000, the numerical value added to the main chain is the molar ratio of the repeating unit).

(Polymerizable compound)
Polymerizable compound 1: Mixture of the following compounds (mixture of left side compound and right side compound with a molar ratio of 7: 3)

Polymerizable compound 2: The following compounds

Polymerizable compound 3: A compound having the following structure

(Photopolymerization initiator)
Photopolymerization Initiator 1: Photopolymerization Initiator 1 described above
Photopolymerization Initiator 2: Compound with the following structure

Photopolymerization Initiator 3: Compound with the following structure

Photopolymerization Initiator 4: Compound with the following structure

(Surfactant)
Surfactant 1: The following mixture (Mw = 14000). In the formula below,% indicating the ratio of the repeating unit is mol%.

Surfactant 2: A compound having the following structure

(Polymerization inhibitor)
Polymerization inhibitor 1: p-methoxyphenol

<Evaluation>
(Evaluation of residue and pattern formation)
The first pixel-forming composition described in the table below was applied onto the support by a spin coating method so that the film thickness after film formation was 0.5 μm. Then, it was heated at 100 ° C. for 2 minutes using a hot plate. Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at an exposure amount of 150 mJ / cm ² through a mask having a Bayer pattern of 0.9 μm. Then, paddle development was carried out at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, the mixture was rinsed with a spin shower, washed with pure water, and then heated at 220 ° C. for 5 minutes using a hot plate to form a first pixel having a pattern.
Next, the composition for forming a transparent layer was applied on the support on which the first pixel was formed by a spin coating method, and then heated at 100 ° C. for 2 minutes using a hot plate. When the lucidum lucidum compositions 1 and 2 were used, they were then heated at 230 ° C. for 2 minutes using a hot plate to the average thickness shown in the table below on the first pixel and support. A transparent layer was formed. When the transparent layer forming composition 3 is used, it is exposed with an exposure amount of 150 mJ / cm ² using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), and the first pixel and the support are used. A transparent layer having the average thickness shown in the table below was formed on the body. The values of the average thickness of the transparent layer in the table below are the thicknesses of any three transparent layers formed on the upper surface of the first pixel and the transparent layer formed on the surface of the support. It is the average value with the thickness of any three places. The thickness of the transparent layer was measured from a scanning electron microscope (SEM) image of a cross section cut perpendicular to the support.
Using MCPD-3700 (manufactured by Otsuka Electronics Co., Ltd.), the transmittance (spectroscopy 1) of the first pixel after forming the transparent layer in the wavelength range of 400 to 700 nm was measured.
Next, the second pixel-forming composition described in the table below was applied onto the support on which the transparent layer was formed by a spin coating method so that the film thickness after film formation was 0.5 μm. It was then heated at 100 ° C. for 2 minutes using a hot plate. Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at an exposure amount of 150 mJ / cm ² through a mask having an island pattern of 0.9 μm. Then, paddle development was carried out at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, the mixture was rinsed with a spin shower, washed with pure water, and then heated at 220 ° C. for 5 minutes using a hot plate to form a second pixel.
Using MCPD-3700 (manufactured by Otsuka Electronics Co., Ltd.), the transmittance (spectroscopy 2) in the wavelength range of 400 to 700 nm of the first pixel after forming the second pixel was measured.
The maximum value T1 of the amount of change in the transmittance was obtained using the spectroscopy 1 and the spectroscopy 2 of the first pixel. The maximum value of the amount of change in the transmittance is the amount of change in the first pixel before and after the formation of the second pixel at the wavelength where the amount of change in the transmittance in the wavelength range of 400 to 700 nm is the largest. ..

Next, the first pixel and the second pixel are formed in the same manner as described above except that the transparent layer is not formed, and the amount of change in the transmittance is changed by using the spectra 1 and 2 of the first pixels. The maximum value T2 of was obtained.

The residue was evaluated according to the following criteria using the maximum value T2 of the change in transmittance when the transparent layer was not formed and the maximum value T1 of the change in transmittance when the transparent layer was formed. When the value of T1 / T2 is less than 1, it means that the generation of the residue can be suppressed as compared with the case where the transparent layer is not formed.
(Criteria for determining residue)
5: T1 / T2 value is less than 0.2 4: T1 / T2 value is 0.2 or more and less than 0.5 3: T1 / T2 value is 0.5 or more and less than 0.8 2: T1 / T2 Value is 0.8 or more and less than 1.0 1: T1 / T2 value is 1.0

The pattern formability was evaluated according to the following criteria, with the width of the upper part of the second pixel being L1 and the width of the lower part of the second pixel being L2.
(Criteria for pattern formation)
5: L1-L2 is less than 0.05 μm 4: L1-L2 is 0.05 μm or more and less than 0.10 μm 3: L1-L2 is 0.10 μm or more and less than 0.15 μm 2: L1-L2 is 0.15 μm or more and 0. Less than 20 μm 1: L1-L2 is 0.20 μm or more

(Evaluation of color mixing)
The following raw materials were mixed to prepare a composition for an undercoat layer.
PGMEA ・ ・ ・ 19.20 parts by mass
Ethyl lactate: 36.67 parts by mass
Resin: (Benzyl methacrylate / methacrylic acid / -2-hydroxyethyl methacrylate copolymer (molar ratio = 60: 20: 20) 41% ethyl acetate solution) ... 30.51 parts by mass dipentaerythritol hexaacrylate.・ ・ 12.20 parts by mass
Polymerization inhibitor 1 ・ ・ ・ 0.006 parts by mass
Surfactant 1 ・ ・ ・ 0.83 parts by mass Photopolymerization initiator (TAZ-107, manufactured by Midori Chemical Co., Ltd.) ・ ・ ・ 0.59 parts by mass

The composition for an undercoat layer was applied on a 200 mm (8 inch) glass wafer by spin coating to form a coating film, and the formed coating film was heat-treated on a hot plate at 120 ° C. for 120 seconds. The coating rotation speed of the spin coating was adjusted so that the film thickness of the coating film after the heat treatment was about 0.5 μm. The coating film after the heat treatment was further treated in an oven at 220 ° C. for 1 hour to cure the coating film and form an undercoat layer. As described above, a glass wafer with an undercoat layer having an undercoat layer formed on the glass wafer was obtained.
The first pixel-forming composition described in the table below was applied onto a glass wafer with an undercoat layer by a spin coating method so that the film thickness after film formation was 1.0 μm. Then, it was heated at 100 ° C. for 2 minutes using a hot plate. Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at an exposure amount of 1000 mJ / cm ² through a mask having a Bayer pattern of 7.0 μm. Then, paddle development was carried out at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, the mixture was rinsed with a spin shower, washed with pure water, and then heated at 220 ° C. for 5 minutes using a hot plate to form a first pixel having a pattern.
Next, the composition for forming a transparent layer described in the following table was applied onto the support on which the first pixel was formed by a spin coating method, and then heated at 100 ° C. for 2 minutes using a hot plate. When the lucidum lucidum compositions 1 and 2 were used, they were then heated at 230 ° C. for 2 minutes using a hot plate to the average thickness shown in the table below on the first pixel and support. A transparent layer was formed. When the transparent layer forming composition 3 is used, it is exposed with an exposure amount of 150 mJ / cm ² using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), and the first pixel and the support are used. A transparent layer having the average thickness shown in the table below was formed on the body.
Next, the second pixel-forming composition described in the table below was applied onto the support on which the transparent layer was formed by a spin coating method so that the film thickness after film formation was 1.0 μm. It was then heated at 100 ° C. for 2 minutes using a hot plate. Next, using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.), exposure was performed at an exposure amount of 1000 mJ / cm ² through a mask having an island pattern of 7.0 μm. Then, paddle development was carried out at 23 ° C. for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). Then, it was rinsed with a spin shower and then washed with pure water to form a second pixel. Then, it was heated at 220 ° C. for 5 minutes using a hot plate.
The absorbances of the first pixel and the second pixel at wavelengths of 400 to 700 nm before and after the heat treatment of the second pixel were measured with a microspectroscopic light measuring device (LCF-1500M manufactured by Otsuka Electronics Co., Ltd.). The maximum value of the rate of change in the absorbance of the first pixel before and after heating to the second pixel and the maximum value of the rate of change in the absorbance of the second pixel were determined. The maximum value of the change rate of the absorbance is the amount of change in the wavelength in which the amount of change in the absorbance in the wavelength range of 400 to 700 nm is the largest for each pixel before and after the heat treatment of the second pixel.
The rate of change in absorbance was determined as follows.
Rate of change in absorbance of the first pixel (%) = | 1-2 Absorbance of the first pixel after heat treatment to the second pixel / Absorbance of the first pixel before heat treatment to the second pixel | × 100
Rate of change in absorbance of the second pixel (%) = | 1-2 Absorbance of the second pixel after heat treatment to the second pixel / Absorbance of the second pixel before heat treatment to the second pixel | × 100
-Criteria-
A: Absorbance change rate is less than 10% B: Absorbance change rate is 10% or more

As shown in the above table, the examples had good evaluations of residue, pattern forming property, and color mixing.
Even when the first pixel or the second pixel is formed by using the Blue composition prepared by replacing the pigment in the Green composition or the Red composition with a blue pigment, the same result as in the above Example is obtained. was gotten.

1: Support 2: First pixel 3: Transparent layer 4: Second pixel 4a: Pixel-forming composition layer 50: Support 51: First pixel 52: Second pixel 52a: Composition layer

Claims (10)

A step of applying a transparent layer forming composition containing a curable compound to the surface of the first pixel formed on the support to form a transparent layer having an average thickness of 300 nm or less, and
A step of applying a pixel-forming composition on the first pixel on which the transparent layer is formed to form a pixel-forming composition layer, and
A method for manufacturing a color filter, which comprises a step of forming a pattern on the pixel-forming composition layer to form a second pixel having a color different from that of the first pixel. The method for manufacturing a color filter according to claim 1, wherein a pattern is formed on the pixel-forming composition layer by a photolithography method to form the second pixel. The method for producing a color filter according to claim 1 or 2, wherein at least one of the first pixel and the second pixel contains 50% by mass or more of a colorant. The method for producing a color filter according to any one of claims 1 to 3, wherein the pixel-forming composition contains at least one selected from a chromatic colorant and a black colorant. In the step of forming the transparent layer, a transparent layer forming composition containing a curable compound is applied to the surface of the first pixel formed on the support to form a transparent layer having an average thickness of 5 to 100 nm. The method for manufacturing a color filter according to any one of claims 1 to 4, which is a step. The method for producing a color filter according to any one of claims 1 to 5, wherein the composition for forming a transparent layer contains a compound having a crosslinkable group as the curable compound. A method for manufacturing a solid-state image sensor, which comprises the method for manufacturing a color filter according to any one of claims 1 to 6. A method for manufacturing an image display device, which comprises the method for manufacturing a color filter according to any one of claims 1 to 6. On the support, a first pixel and a second pixel having a color different from that of the first pixel are provided.
A transparent layer having an average thickness of 300 nm or less is provided on the surface of the first pixel.
A transparent layer having an average thickness of 300 nm or less is provided between the second pixel and the support.
Color filter. The color filter according to claim 9, further comprising a transparent layer having an average thickness of 300 nm or less between the first pixel and the second pixel.