JPWO2019014213A5

JPWO2019014213A5 -

Info

Publication number: JPWO2019014213A5
Application number: JP2019567975A
Authority: JP
Publication date: 2022-12-15
Anticipated expiration: 2038-07-10

Description

本開示のスラリーには、カチオン性、アニオン性、両性イオン性又は非イオン性から選択される様々な界面活性剤も緩衝剤として加えることができる。界面活性剤は、個別に用いることも、混合状態で用いることもできる。本発明で使用できる界面活性剤のリストが、Ｍ. Ｊ. Ｒｏｓｅｎ「ＳｕｒｆａｃｔａｎｔｓａｎｄＩｎｔｅｒｆａｃｉａｌＰｈｅｎｏｍｅｎａ」、１９８９年、ＪｏｈｎＷｉｌｅｙ＆Ｓｏｎｓ社（以下、Ｒｏｓｅｎと呼ぶ）の３～３２、５２～５４、７０～８０、１２２～１３２及び３９８～４０１ページに記載されている。界面活性剤の濃度は、０．０００１ｇ／Ｌから１００ｇｍ／Ｌまで変えることができ、典型的な濃度の範囲は０．１ｇｍ／Ｌ～５ｇｍ／Ｌである。ＢＲは、非イオン性界面活性剤の添加により、１．０から２．５超に変化することがわかった。更に、ＢＲ比の増加は、硬質の金属及び非金属の研磨の際の除去率の増加にもつながる。
Various surfactants selected from cationic, anionic, zwitterionic or nonionic can also be added to the slurry of the present disclosure as buffering agents. Surfactants can be used individually or in admixture. A list of surfactants that can be used in the present invention is given by M.J. 80, 122-132 and 398-401. Surfactant concentrations can vary from 0.0001 g/L to 100 gm/L, with typical concentrations ranging from 0.1 gm/L to 5 gm/L. BR was found to change from 1.0 to greater than 2.5 with the addition of nonionic surfactant. Furthermore, increasing the BR ratio also leads to increased removal rates during polishing of hard metals and non-metals.

Claims

an aqueous solvent;
at least one percompound oxidizing agent with a pH value of 1-5 or 8-11 and a concentration of 0.01M-2.0M;
at least one buffering agent, different from said percompound oxidizing agent, with a buffering ratio greater than 2.5
including
The buffer ratio is
(i) the amount of strong acid required to lower the pH value of the first slurry solution comprising said aqueous solvent, said peroxide oxidizing agent and said buffering agent from 9.0 to 3.0;
(ii) the amount of said strong acid required to lower the pH value of a second slurry solution, which is identical to the first slurry solution except that it does not contain said buffering agent, from 9.0 to 3.0;
is defined as the ratio (i)/(ii) of
the buffer comprises a nonionic surfactant at a concentration ranging from 0.1 gm/L to 5 gm/L in the slurry solution;
The slurry solution does not contain hard slurry particles, or has only soft slurry particles having a Vickers hardness of less than 300 Kg/mm ² or a Mohs hardness of less than 4 throughout the chemical mechanical polishing ( CMP) slurry solution .

The slurry solution of claim 1, wherein said slurry solution further comprises transition metal ions at a concentration of 0.03M to 1M in addition to transition metal ions that may be present in said peroxide oxidizing agent.

The slurry solution contains MnO having a Mohs hardness of 3 or less _２2 2. The slurry solution of claim 1, further comprising particles of

4. The slurry solution of claim 3 , wherein said particles of MnO ₂ having a Mohs hardness of 3 or less are autocatalytically formed in-situ particles .

2. The slurry solution of claim 1, wherein the percompound oxidizing agent comprises potassium permanganate or sodium permanganate.

The nonionic surfactant is polyethylene glycol ether, polypropylene glycol alkyl ether, glucoside alkyl ether, polyethylene glycol octylphenyl ether, polyethylene glycol alkylphenyl ether, glycerol alkyl ester, polyoxyethylene glycol sorbitan alkyl ester, sorbitan alkyl ester, 2. The slurry solution of claim 1, comprising at least one of cocamide, dodecyldimethylamine oxide, block copolymers of polyethylene glycol and polypropylene glycol, polyethoxylated tallow amine.

2. The method of claim 1, wherein when the peroxide oxidant comprises alkali metal ions, the slurry solution further comprises at least one type of alkali metal ion in addition to the alkali metal ions in the peroxide oxidant. slurry solution .

an aqueous solvent;
at least one percompound oxidizing agent with a concentration of 0.01 M to 2.0 M, a pH value of 1 to 5 or 8 to 11, and a buffer ratio of greater than 2.5, unlike said percompound oxidizing agents. A slurry solution containing at least one buffer of
The buffer ratio is
(i) the amount of strong acid required to lower the pH value of the slurry solution comprising said aqueous solvent, said peroxide oxidizing agent and said buffering agent from 9.0 to 3.0;
(ii) the amount of said strong acid required to lower the pH value of a second slurry solution, which is identical to the first slurry solution except that it does not contain said buffering agent, from 9.0 to 3.0;
is defined as the ratio (i)/(ii) of
the buffer comprises a nonionic surfactant at a concentration ranging from 0.1 gm/L to 5 gm/L in the slurry solution;
providing a slurry solution containing no hard slurry particles or having only soft slurry particles having a Vickers hardness of less than 300 Kg/mm ² or a Mohs hardness of less than 4;
Dropping the slurry solution onto a hard surface having a Vickers hardness of greater than 1,000 Kg/mm ² ;
A method of chemical-mechanical polishing (CMP) of a hard surface, comprising pressing the polishing pad against the hard surface with the slurry solution in between while rotating the polishing pad against the hard surface.

9. The method of claim 8 , wherein the hard surface comprises carbides, nitrides, or mixtures thereof.

9. The method of claim 8 , wherein the slurry solution further comprises transition metal ions at a concentration of 0.03M to 1M in addition to transition metal ions that may be present in the peroxide oxidant.

9. The method of claim 8 , wherein the polishing pad comprises a polymer pad having a Shore D hardness of less than 100, and wherein the pressing pressure is less than 15 psi.

The slurry solution contains MnO having a Mohs hardness of 3 or less _２2 9. The method of claim 8, further comprising particles of

13. The method of claim 12 , wherein the particles of _MnO2 having a Mohs hardness of 3 or less are autocatalytically formed in-situ particles .

9. The method of claim 8 , wherein the percompound oxidizing agent comprises potassium permanganate or sodium permanganate.

The nonionic surfactant is polyethylene glycol ether, polypropylene glycol alkyl ether, glucoside alkyl ether, polyethylene glycol octylphenyl ether, polyethylene glycol alkylphenyl ether, glycerol alkyl ester, polyoxyethylene glycol sorbitan alkyl ester, sorbitan alkyl ester, 9. The method of claim 8, comprising at least one of cocamide, dodecyldimethylamine oxide, block copolymers of polyethylene glycol and polypropylene glycol, polyethoxylated tallow amine.

9. The method of claim 8 , wherein when the peroxide oxidant comprises alkali metal ions, the slurry solution further comprises at least one alkali metal ion in addition to the alkali metal ions in the peroxide oxidant. Method.