JPWO2008035595A1 - Organic electroluminescence device - Google Patents
Organic electroluminescence device Download PDFInfo
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- JPWO2008035595A1 JPWO2008035595A1 JP2008535328A JP2008535328A JPWO2008035595A1 JP WO2008035595 A1 JPWO2008035595 A1 JP WO2008035595A1 JP 2008535328 A JP2008535328 A JP 2008535328A JP 2008535328 A JP2008535328 A JP 2008535328A JP WO2008035595 A1 JPWO2008035595 A1 JP WO2008035595A1
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- dopant material
- organic
- emitting layer
- organic electroluminescence
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- 238000005401 electroluminescence Methods 0.000 title claims abstract description 32
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- 239000002184 metal Substances 0.000 claims abstract description 23
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- 150000003624 transition metals Chemical class 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- 125000002889 tridecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000000025 triisopropylsilyl group Chemical group C(C)(C)[Si](C(C)C)(C(C)C)* 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000006617 triphenylamine group Chemical group 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
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Abstract
発光寿命に優れた有機エレクトロルミネッセンス素子は、対向した陰極と陽極の間にホスト材料とドーパント材料とを含有する発光層を少なくとも有する有機エレクトロルミネッセンス素子において、該ドーパント材料が下記一般式(1)で表され、該ドーパント材料の含有濃度が発光層の厚さ方向において、陽極側から陰極側に減少していることを特徴とする。【化1】(式中、R1は置換基を表す。Zは5〜7員環を形成するのに必要な非金属原子群を表す。n1は0〜5の整数を表す。B1〜B5は炭素原子、窒素原子、酸素原子もしくは硫黄原子を表し、少なくとも一つは窒素原子を表す。M1は元素周期表における8〜10族の金属を表す。X1及びX2は炭素原子、窒素原子もしくは酸素原子を表し、L1はX1及びX2と共に2座の配位子を形成する原子群を表す。)The organic electroluminescence device having an excellent emission lifetime is an organic electroluminescence device having at least a light emitting layer containing a host material and a dopant material between a cathode and an anode facing each other. The dopant material is represented by the following general formula (1). The concentration of the dopant material is reduced from the anode side to the cathode side in the thickness direction of the light emitting layer. In the formula, R1 represents a substituent. Z represents a group of nonmetallic atoms necessary to form a 5- to 7-membered ring. N1 represents an integer of 0 to 5. B1 to B5 represent Represents a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom, at least one represents a nitrogen atom, M1 represents a group 8-10 metal in the periodic table, and X1 and X2 represent a carbon atom, a nitrogen atom or an oxygen atom. L1 represents an atomic group forming a bidentate ligand together with X1 and X2.)
Description
本発明は、有機エレクトロルミネッセンス素子に関する。 The present invention relates to an organic electroluminescence element.
従来、発光型の電子ディスプレイデバイスとして、エレクトロルミネッセンスディスプレイ(以下、ELDという)がある。ELDの構成要素としては、無機エレクトロルミネッセンス素子や有機エレクトロルミネッセンス素子(以下、有機EL素子ともいう)が挙げられる。無機エレクトロルミネッセンス素子は平面型光源として使用されてきたが、発光素子を駆動させるためには交流の高電圧が必要である。有機EL素子は発光する化合物を含有する発光層を陰極と陽極で挟んだ構成を有し、発光層に電子及び正孔を注入して、再結合させることにより励起子(エキシトン)を生成させ、このエキシトンが失活する際の光の放出(蛍光・リン光)を利用して発光する素子であり、数V〜数十V程度の電圧で発光が可能であり、更に自己発光型であるために視野角に富み、視認性が高く、薄膜型の完全固体素子であるために省スペース、携帯性等の観点から注目されている。 Conventionally, as a light-emitting electronic display device, there is an electroluminescence display (hereinafter referred to as ELD). Examples of the constituent elements of ELD include inorganic electroluminescent elements and organic electroluminescent elements (hereinafter also referred to as organic EL elements). Inorganic electroluminescent elements have been used as planar light sources, but an alternating high voltage is required to drive the light emitting elements. An organic EL device has a structure in which a light emitting layer containing a compound that emits light is sandwiched between a cathode and an anode, injects electrons and holes into the light emitting layer, and recombines them to generate excitons (exciton). It is an element that emits light by using light emission (fluorescence / phosphorescence) when this exciton is deactivated, and can emit light at a voltage of several volts to several tens of volts, and is also self-luminous. In addition, it is attracting attention from the viewpoints of space saving, portability and the like because it is a thin film type complete solid element with a wide viewing angle and high visibility.
しかしながら、今後の実用化に向けた有機EL素子においては、更に低消費電力で効率よく高輝度に発光する有機EL素子の開発が望まれている。 However, in organic EL elements for practical use in the future, development of organic EL elements that emit light efficiently and with high luminance with lower power consumption is desired.
特許第3093796号公報では、スチルベン誘導体、ジスチリルアリーレン誘導体またはトリススチリルアリーレン誘導体に微量の蛍光体をドープし、発光輝度の向上、素子の長寿命化を達成している。また、8−ヒドロキシキノリンアルミニウム錯体をホスト化合物として、これに微量の蛍光体をドープした有機発光層を有する素子(例えば、特開昭63−264692号公報)、8−ヒドロキシキノリンアルミニウム錯体をホスト化合物として、これにキナクリドン系色素をドープした有機発光層を有する素子(例えば、特開平3−255190号公報)等が知られている。 In Japanese Patent No. 3093796, a small amount of a phosphor is doped into a stilbene derivative, a distyrylarylene derivative or a tristyrylarylene derivative to achieve an improvement in light emission luminance and a longer device lifetime. Further, an element having an organic light-emitting layer in which an 8-hydroxyquinoline aluminum complex is used as a host compound and a small amount of phosphor is doped thereto (for example, JP-A 63-264692), and an 8-hydroxyquinoline aluminum complex is used as a host compound. For example, an element having an organic light emitting layer doped with a quinacridone dye (for example, JP-A-3-255190) is known.
以上のように、励起一重項からの発光を用いる場合、一重項励起子と三重項励起子の生成比が1:3であるため発光性励起種の生成確率が25%であり、光の取り出し効率が約20%であるため、外部取り出し量子効率(ηext)の限界は5%とされている。 As described above, when light emission from excited singlet is used, the generation ratio of singlet excitons and triplet excitons is 1: 3, and thus the generation probability of luminescent excited species is 25%. Since the efficiency is about 20%, the limit of the external extraction quantum efficiency (ηext) is set to 5%.
ところが、プリンストン大より励起三重項からのリン光発光を用いる有機EL素子の報告(M.A.Baldo et al.,Nature、395巻、151〜154頁(1998年))がされて以来、室温でリン光を示す材料の研究が活発になってきている。 However, since Princeton University reported on an organic EL device using phosphorescence emission from an excited triplet (MA Baldo et al., Nature, 395, 151-154 (1998)), Research on materials that exhibit phosphorescence has become active.
例えば、M.A.Baldo et al.,Nature、403巻、17号、750〜753頁(2000年)、また米国特許第6,097,147号明細書等にも開示されている。 For example, M.M. A. Baldo et al. , Nature, 403, 17, 750-753 (2000), US Pat. No. 6,097,147, and the like.
励起三重項を使用すると、内部量子効率の上限が100%となるため励起一重項の場合に比べて原理的に発光効率が4倍となり、冷陰極管とほぼ同等の性能が得られる可能性があることから照明用途としても注目されている。 When the excited triplet is used, the upper limit of the internal quantum efficiency is 100%. In principle, the luminous efficiency is four times that of the excited singlet, and there is a possibility that almost the same performance as a cold cathode tube can be obtained. Therefore, it is attracting attention as a lighting application.
例えば、S.Lamansky et al.,J.Am.Chem.Soc.,123巻、4304頁(2001年)等においては、多くの化合物がイリジウム錯体系等重金属錯体を中心に合成検討されている。 For example, S.M. Lamansky et al. , J .; Am. Chem. Soc. , 123, 4304 (2001), etc., many compounds are being studied for synthesis centering on heavy metal complexes such as iridium complexes.
また、前述のM.A.Baldo et al.,Nature、403巻、17号、750〜753頁(2000年)においては、ドーパントとしてトリス(2−フェニルピリジン)イリジウムを用いた検討がされている。 In addition, the aforementioned M.I. A. Baldo et al. , Nature, 403, 17, 750-753 (2000), studies have been made using tris (2-phenylpyridine) iridium as a dopant.
その他、M.E.Tompson等は、The 10th International Workshop on Inorganic and Organic Electroluminescence(EL’00、浜松)において、ドーパントとしてL2Ir(acac)、例えば、(ppy)2Ir(acac)を、またMoon−Jae Youn.0g、Tetsuo Tsutsui等はやはりThe 10th International Workshop on Inorganic and Organic Electroluminescence(EL’00、浜松)において、ドーパントとしてトリス(2−(p−トリル)ピリジン)イリジウム(Ir(ptpy)3)、トリス(ベンゾ[h]キノリン)イリジウム(Ir(bzq)3)等を用いた検討を行っている(なおこれらの金属錯体は一般にオルトメタル化イリジウム錯体と呼ばれている。)。In addition, M.M. E. Thompson et al. In The 10th International Works on Inorganic and Organic Electroluminescence (EL'00, Hamamatsu) used L 2 Ir (acac), for example, (ppy) 2 Ir (acac), e 0 g, Tetsuo Tsutsui, etc. Again The 10th International Workshop on Inorganic and Organic Electroluminescence (EL'00, Hamamatsu), the dopant as tris (2-(p-tolyl) pyridine) iridium (Ir (ptpy) 3), tris (benzo [H] Quinoline) Iridium (Ir (bzq) 3 ) and the like have been studied (these metal complexes are generally called ortho-metalated iridium complexes).
また、前記S.Lamansky et al.,J.Am.Chem.Soc.,123巻、4304頁(2001年)や特開2001−247859号公報等においても、各種イリジウム錯体を用いて素子化する試みがされている。 In addition, the S. Lamansky et al. , J .; Am. Chem. Soc. , 123, 4304 (2001) and Japanese Patent Application Laid-Open No. 2001-247859, etc., attempts have been made to form devices using various iridium complexes.
また、高い発光効率を得るためにThe 10th International Workshop on Inorganic and Organic Electroluminescence(EL’00、浜松)では、Ikai等はホール輸送性の化合物をリン光性化合物のホストとして用いている。また、M.E.Tompson等は各種電子輸送性材料をリン光性化合物のホストとして、これらに新規なイリジウム錯体をドープして用いている。 In order to obtain high luminous efficiency, in the 10th International Workshop on Inorganic and Organic Electroluminescence (EL'00, Hamamatsu), Ikai et al. Uses a hole transporting compound as a host of a phosphorescent compound. In addition, M.M. E. Thompson et al. Use various electron transporting materials as a host of phosphorescent compounds, doped with a novel iridium complex.
中心金属をイリジウムの代わりに白金としたオルトメタル化錯体も注目されている。この種の錯体に関しては、配位子に特徴を持たせた例が多数知られている。 Orthometalated complexes in which the central metal is platinum instead of iridium are also attracting attention. With respect to this type of complex, many examples are known in which ligands are characterized.
いずれの場合も発光素子とした場合の発光輝度や発光効率は、その発光する光がリン光に由来することから従来の素子に比べ大幅に改良されるものであるが、素子の発光寿命については従来の素子よりも低いという問題点があった。このように、リン光性の高効率の発光材料は発光波長の短波化と素子の発光寿命の改善が難しく、実用に耐えうる性能を十分に達成できていないのが現状である。 In either case, the light emission brightness and light emission efficiency of the light emitting device are greatly improved compared to conventional devices because the emitted light is derived from phosphorescence. There was a problem that it was lower than the conventional element. As described above, it is difficult for phosphorescent high-efficiency light-emitting materials to shorten the light emission wavelength and improve the light-emission lifetime of the device, and have not been able to achieve practically sufficient performance.
また、波長の短波化に関してはこれまでフェニルピリジンにフッ素原子、トリフルオロメチル基、シアノ基等の電子吸引性基を置換基として導入すること、配位子としてピコリン酸やピラザボール系の配位子を導入することが知られているが、これらの配位子では発光材料の発光波長が短波化して青色を達成し、高効率の素子を達成できる一方、素子の発光寿命は大幅に劣化するため、そのトレードオフの改善が求められていた。 In addition, regarding wavelength shortening, introduction of electron-withdrawing groups such as fluorine atoms, trifluoromethyl groups, and cyano groups into phenylpyridine as substituents, and picolinic acid and pyrazabole-based ligands as ligands However, with these ligands, the emission wavelength of the luminescent material is shortened to achieve a blue color, and a high-efficiency device can be achieved. There was a need to improve the trade-off.
配位子としてフェニルピリジンの母核にカルバゾールの部分構造を導入した金属錯体が知られている(例えば、特許文献1、2参照。)。また、配位子としてフェニルピラゾールの母核にカルバゾールの部分構造を導入した金属錯体が知られている(例えば、特許文献3参照)。ここで開示されているように、金属錯体の配位子の構造にヘテロ原子を含む三環以上の環からなる縮環構造を導入することにより、発光の素子寿命に改善が見られるが、まだ十分ではなく色度の点でも改良の余地が残っている。 As a ligand, a metal complex in which a carbazole partial structure is introduced into the mother nucleus of phenylpyridine is known (see, for example, Patent Documents 1 and 2). In addition, a metal complex in which a partial structure of carbazole is introduced as a ligand into the mother nucleus of phenylpyrazole is known (for example, see Patent Document 3). As disclosed herein, by introducing a condensed ring structure composed of three or more rings containing heteroatoms into the structure of the ligand of the metal complex, the lifetime of the light emitting device can be improved. There is still room for improvement in terms of chromaticity.
一方、配位子としてフェニルイミダゾールを基本骨格にして、種々の置換基を導入した例が開示されている(例えば、特許文献4、5参照。)。 On the other hand, examples in which various substituents are introduced using phenylimidazole as a basic skeleton as a ligand are disclosed (for example, see Patent Documents 4 and 5).
また、金属錯体を含有する発光層を有する有機EL素子において、発光層内で発光領域を、つまりは金属錯体の含有量の濃度を制御することで発光層界面での発光位置を制御し、長寿命化することが行われている(例えば、特許文献6、7参照。)。 In addition, in an organic EL device having a light emitting layer containing a metal complex, the light emitting region in the light emitting layer, that is, the concentration of the content of the metal complex is controlled to control the light emitting position at the light emitting layer interface. The lifetime has been increased (for example, see Patent Documents 6 and 7).
しかしながら、これら技術は発光寿命には大きな改善は見られず、改良の余地が残っている。
本発明の目的は、発光寿命に優れた有機エレクトロルミネッセンス素子を提供することにある。 The objective of this invention is providing the organic electroluminescent element excellent in the light emission lifetime.
本発明の上記目的は、下記構成により達成される。 The above object of the present invention is achieved by the following configurations.
1.対向した陰極と陽極の間にホスト材料とドーパント材料とを含有する発光層を少なくとも有する有機エレクトロルミネッセンス素子において、該ドーパント材料が下記一般式(1)で表され、該ドーパント材料の含有濃度が発光層の厚さ方向において、陽極側から陰極側に減少していることを特徴とする有機エレクトロルミネッセンス素子。 1. In an organic electroluminescence device having at least a light-emitting layer containing a host material and a dopant material between an opposing cathode and an anode, the dopant material is represented by the following general formula (1), and the content concentration of the dopant material emits light. An organic electroluminescence element, wherein the thickness decreases from the anode side to the cathode side in the thickness direction of the layer.
(式中、R1は置換基を表す。Zは5〜7員環を形成するのに必要な非金属原子群を表す。n1は0〜5の整数を表す。B1〜B5は炭素原子、窒素原子、酸素原子もしくは硫黄原子を表し、少なくとも一つは窒素原子を表す。M1は元素周期表における8〜10族の金属を表す。X1及びX2は炭素原子、窒素原子もしくは酸素原子を表し、L1はX1及びX2と共に2座の配位子を形成する原子群を表す。m1は1、2または3の整数を表し、m2は0、1または2の整数を表すが、m1+m2は2または3である。)
2.前記ドーパント材料の含有濃度の陽極側から陰極側においての減少が段階的であることを特徴とする前記1に記載の有機エレクトロルミネッセンス素子。(In the formula, R 1 represents a substituent. Z represents a group of nonmetallic atoms necessary to form a 5- to 7-membered ring. N1 represents an integer of 0 to 5. B 1 to B 5 represent carbon. Represents an atom, nitrogen atom, oxygen atom or sulfur atom, at least one represents a nitrogen atom, M 1 represents a group 8-10 metal in the periodic table, and X 1 and X 2 represent a carbon atom, nitrogen atom or Represents an oxygen atom, and L 1 represents an atomic group forming a bidentate ligand together with X 1 and X 2 , m1 represents an integer of 1, 2 or 3, m2 represents an integer of 0, 1 or 2 (Where m1 + m2 is 2 or 3)
2. 2. The organic electroluminescence device as described in 1 above, wherein the concentration of the dopant material is gradually decreased from the anode side to the cathode side.
3.前記ドーパント材料の含有濃度の陽極側から陰極側においての減少が連続的であることを特徴とする前記1に記載の有機エレクトロルミネッセンス素子。 3. 2. The organic electroluminescence device according to 1 above, wherein the concentration of the dopant material is continuously decreased from the anode side to the cathode side.
4.前記一般式(1)で表されるドーパント材料における、m2が0であることを特徴とする前記1〜3のいずれか1項に記載の有機エレクトロルミネッセンス素子。 4). 4. The organic electroluminescence device according to any one of 1 to 3, wherein m2 in the dopant material represented by the general formula (1) is 0.
5.前記一般式(1)で表されるドーパント材料における、B1〜B5で形成される含窒素複素環がイミダゾール環であることを特徴とする前記1〜4のいずれか1項に記載の有機エレクトロルミネッセンス素子。5). 5. The organic according to any one of 1 to 4, wherein the nitrogen-containing heterocycle formed by B 1 to B 5 in the dopant material represented by the general formula (1) is an imidazole ring. Electroluminescence element.
6.前記発光層において、ホスト材料のイオン化ポテンシャルIphとドーパント材料のイオン化ポテンシャルIpdとが下式(1)を満たすことを特徴とする前記1〜5のいずれか1項に記載の有機エレクトロルミネッセンス素子。 6). 6. The organic electroluminescence device according to any one of 1 to 5, wherein in the light emitting layer, the ionization potential Iph of the host material and the ionization potential Ipd of the dopant material satisfy the following formula (1).
式(1) Iph−Ipd≧0.7
7.前記発光層の陽極側に含まれるドーパント材料の濃度をA質量%、陰極側に含まれるドーパント材料の濃度をB質量%としたとき、A/B≧1.5を満たすことを特徴とする前記1〜6のいずれか1項に記載の有機エレクトロルミネッセンス素子。Formula (1) Iph-Ipd ≧ 0.7
7). A / B ≧ 1.5 is satisfied when the concentration of the dopant material contained on the anode side of the light emitting layer is A mass% and the concentration of the dopant material contained on the cathode side is B mass%. The organic electroluminescent element of any one of 1-6.
8.前記ドーパント材料のリン光波長ピークが480nm以下であることを特徴とする前記1〜7のいずれか1項に記載される有機エレクトロルミネッセンス素子。 8). The phosphorescence wavelength peak of the dopant material is 480 nm or less, The organic electroluminescence element described in any one of 1 to 7 above.
9.更に他の発光層を有することを特徴とする前記1〜8のいずれか1項に記載の有機エレクトロルミネッセンス素子。 9. The organic electroluminescence device according to any one of 1 to 8, further comprising another light emitting layer.
10.発光が白色であることを特徴とする前記1〜9のいずれか1項に記載の有機エレクトロルミネッセンス素子。 10. 10. The organic electroluminescence device according to any one of 1 to 9, wherein the light emission is white.
本発明により、発光寿命に優れた有機エレクトロルミネッセンス素子を提供することができた。 According to the present invention, an organic electroluminescence device having an excellent emission lifetime can be provided.
以下、本発明について詳述する。 Hereinafter, the present invention will be described in detail.
本発明は、対向した陰極と陽極の間にホスト材料とドーパント材料とを含有する発光層を少なくとも有する有機エレクトロルミネッセンス素子(以後、有機EL素子ともいう)において、該ドーパント材料が前記一般式(1)で表され、該ドーパント材料の含有濃度が発光層の厚さ方向において、陽極側から陰極側に減少していることを特徴とする。 The present invention relates to an organic electroluminescence device (hereinafter also referred to as an organic EL device) having at least a light emitting layer containing a host material and a dopant material between a cathode and an anode facing each other. The concentration of the dopant material is reduced from the anode side to the cathode side in the thickness direction of the light emitting layer.
本発明において、陽極側から陰極側に段階的に減少しているとは、2nm以上の範囲においてドーパントの含有量が一定であることを言う。 In the present invention, the gradual decrease from the anode side to the cathode side means that the dopant content is constant in the range of 2 nm or more.
本発明において、ドーパント材料の含有濃度を発光層の厚さ方向において、陽極側から陰極側に減少させるには、ホスト材料とドーパント材料の共蒸着において、蒸着速度を蒸着温度の制御により変化させて連続的減少を達成することができる。また、蒸着速度の変化と共に蒸着装置のシャッターの制御により、意図した段階的減少を達成することができる。 In the present invention, in order to decrease the dopant material content concentration from the anode side to the cathode side in the thickness direction of the light-emitting layer, in the co-evaporation of the host material and the dopant material, the deposition rate is changed by controlling the deposition temperature. A continuous decrease can be achieved. Moreover, the intended stepwise reduction can be achieved by controlling the shutter of the vapor deposition apparatus together with the change of the vapor deposition rate.
これまで、ドーパント材料を含有する発光層を有する有機EL素子において、発光層内で発光領域を、つまりはドーパント材料の含有量の濃度を制御することで発光層界面での発光位置を制御し、長寿命化することが行われている(例えば、特開2003−229272号、同2005−108730号の各公報)。 Until now, in an organic EL device having a light emitting layer containing a dopant material, the light emitting region in the light emitting layer, that is, the light emission position at the light emitting layer interface is controlled by controlling the concentration of the content of the dopant material, It has been practiced to extend the life (for example, JP-A-2003-229272 and JP-A-2005-108730).
励起三重項からの発光を用いるリン光発光素子の場合、励起一重項からの発光を用いる蛍光発光素子に比べると、一重項励起子と三重項励起子の生成比が1:3であるため内部量子効率の上限が100%となるため、励起一重項の場合に比べて原理的に発光効率が4倍となり、高効率な発光を得ることができる。しかし、蛍光発光素子と比較してリン光発光素子は、寿命が悪いことが知られており、特に青色のリン光発光素子に関しては実用化を成すには未だ不十分である。 In the case of a phosphorescent light emitting device using light emission from an excited triplet, the generation ratio of singlet excitons and triplet excitons is 1: 3 compared to a fluorescent light emitting device using light emission from an excited singlet. Since the upper limit of the quantum efficiency is 100%, in principle, the light emission efficiency is four times that of the excited singlet, and highly efficient light emission can be obtained. However, it is known that phosphorescent light-emitting elements have a poor life compared to fluorescent light-emitting elements, and in particular, blue phosphorescent light-emitting elements are still insufficient for practical use.
我々は、鋭意検討を重ねた結果、前記一般式(1)で示されるドーパント材料において、長寿命なリン光発光素子が得られることがわかった。更に鋭意検討を重ねた結果、一般式(1)で示されるドーパント材料を用いたリン光発光素子で、発光層内にドープ濃度の変化、具体的には陽極側から陰極側に濃度勾配(陽極側が濃度が高く、陰極側が濃度が低い)をつけることにより、発光寿命が更に伸びることを見出し、本発明を完成させるに至った。 As a result of intensive studies, we have found that a long-lived phosphorescent light-emitting device can be obtained with the dopant material represented by the general formula (1). As a result of further intensive studies, in the phosphorescent light emitting device using the dopant material represented by the general formula (1), a change in the doping concentration in the light emitting layer, specifically, a concentration gradient (anode) from the anode side to the cathode side. It was found that the light emission life was further extended by attaching a high concentration on the side and a low concentration on the cathode side, and the present invention was completed.
かかる濃度勾配は、発光層を斜めに切削し、TOF−SIMSにて測定することにより確認される。なお、斜め切削は、その前処理として、サイカスNN04(ダイプラウインテス社製)で斜め断面の作製を行う。発光層に複数のドーパントが含まれる場合は、分子量違いによって区別することができる。 Such a concentration gradient is confirmed by cutting the light emitting layer obliquely and measuring with TOF-SIMS. In the oblique cutting, as a pretreatment, an oblique cross section is prepared with Cycus NN04 (manufactured by Daipla Intes). When the light emitting layer contains a plurality of dopants, it can be distinguished by the difference in molecular weight.
TOF−SIMS測定はPhysical Electronics社製の飛行時間型2次イオン質量分析計TRIFT2を用い、1次イオンとして加速電圧25kVのInイオン(ビーム電流は2nA)で行うことができる。 The TOF-SIMS measurement can be performed by using a time-of-flight secondary ion mass spectrometer TRIFT2 manufactured by Physical Electronics, Inc., and using In ions with an acceleration voltage of 25 kV (beam current is 2 nA) as primary ions.
本発明によるリン光発光素子が、驚くべき効果を得られた要因は詳細には明らかにされていないが、本発明者らはその要因を以下のように考えている。しかし、要因はこれに限らない。 Although the cause of the surprising effect of the phosphorescent light emitting device according to the present invention has not been clarified in detail, the present inventors consider the factor as follows. However, the factor is not limited to this.
発光層内においては、ドーパント材料がホスト材料内に分散している状態で存在している。ドーパント材料のイオン化ポテンシャルIpdとホスト材料のイオン化ポテンシャルIphの差が大きいとき(例えば、Iph−Ipd≧0.7eV)には、ドーパント材料が正孔に対して深いトラップとなると考えられる。このとき、発光層に含有されるドーパント材料の濃度が低いとイオン化ポテンシャルの小さいドーパント材料にトラップされた正孔が、発光層内に含有される隣のドーパント材料まで移動することができず、陰極側へと移動することができずに、正孔をトラップした状態でいることが多くなると考えられる。そのため、発光層の陽極側界面の領域に発光が偏ってしまうと考えられることから、発光層の陽極側界面領域での劣化が起こりやすいと考えられ、このことが有機EL素子の寿命が短い原因だと考えられる。 In the light emitting layer, the dopant material exists in a state of being dispersed in the host material. When the difference between the ionization potential Ipd of the dopant material and the ionization potential Iph of the host material is large (for example, Iph−Ipd ≧ 0.7 eV), it is considered that the dopant material becomes a deep trap for holes. At this time, if the concentration of the dopant material contained in the light emitting layer is low, holes trapped in the dopant material having a small ionization potential cannot move to the adjacent dopant material contained in the light emitting layer, and the cathode It is thought that the hole is often trapped without being able to move to the side. For this reason, it is considered that the light emission is biased toward the anode side interface region of the light emitting layer, so that it is considered that deterioration in the anode side interface region of the light emitting layer is likely to occur. It is thought that.
イオン化ポテンシャルとは、化合物のHOMO(最高被占分子軌道)レベルにある電子を真空準位に放出するのに必要なエネルギーで定義され、具体的には膜状態(層状態)の化合物から電子を取り出すのに必要なエネルギーであり、これらは光電子分光法で直接測定することができる。例えば、アルバック−ファイ(株)製ESCA 5600 UPS(ultraviolet photoemission spectroscopy)にて測定することができる。 The ionization potential is defined as the energy required to emit electrons at the HOMO (highest occupied molecular orbital) level of a compound to the vacuum level. Specifically, electrons from a compound in a film state (layer state) This is the energy required for extraction, which can be measured directly by photoelectron spectroscopy. For example, it can be measured by ESCA 5600 UPS (ultraviolet photoemission spectroscopy) manufactured by ULVAC-PHI.
この課題を解決するため、陽極側界面領域のドーパント材料の濃度を高くすることで、陽極側のドーパント分子にトラップされた正孔を陰極側へと移動させ、陽極側界面の領域のみでの劣化を抑制し、発光領域を陰極側にも広げることで、有機エレクトロルミネッセンス素子の長寿命化を検討したところ、前記一般式(1)で表される化合物、特に青色発光ドーパント材料において、長寿命化の効果が驚くほど大きいことがわかった。 In order to solve this problem, by increasing the concentration of the dopant material in the anode side interface region, the holes trapped in the dopant molecules on the anode side are moved to the cathode side, and the deterioration occurs only in the region on the anode side interface. The lifetime of the organic electroluminescent device was studied by extending the emission region to the cathode side, and the lifetime of the compound represented by the general formula (1), particularly the blue light emitting dopant material, was increased. The effect of was found to be surprisingly great.
なお、発光層の陽極側に含まれるドーパント材料の濃度をA質量%、陰極側に含まれるドーパント材料の濃度をB質量%としたとき、本発明においては、A/B≧1.5を満たすことが好ましく、その上限値は20であり、好ましくは上限値は10、より好ましくは上限値は5である。 When the concentration of the dopant material contained on the anode side of the light emitting layer is A mass% and the concentration of the dopant material contained on the cathode side is B mass%, in the present invention, A / B ≧ 1.5 is satisfied. The upper limit is preferably 20, the upper limit is preferably 10, and the upper limit is more preferably 5.
ここで、陽極側濃度(A質量%)とは、発光層の陽極側に隣接する層と、発光層との界面から発光層膜厚1nm以内に含まれるドーパント濃度のことを言い、陰極側濃度(B質量%)とは、発光層の陰極側に隣接する層と、発光層との界面から発光層の膜厚1nm以内に含まれるドーパント濃度のことを言う
一方、ドーパント材料のイオン化ポテンシャルIpdとホスト材料のイオン化ポテンシャルIphの差が小さいときには(例えば、Iph−Ipd<0.7)、ドーパント材料による正孔のトラップが弱いため、陰極側へと正孔が移動することが可能であることから、この場合における濃度勾配を設けた有機EL素子においては長寿命化の効果が小さいと考えられる。Here, the anode side concentration (A mass%) means a dopant concentration contained within 1 nm of the thickness of the light emitting layer from the interface between the light emitting layer and the layer adjacent to the anode side of the light emitting layer. (B mass%) refers to the dopant concentration contained within 1 nm of the thickness of the light emitting layer from the interface between the light emitting layer adjacent to the cathode side and the light emitting layer, while the ionization potential Ipd of the dopant material When the difference in the ionization potential Iph of the host material is small (for example, Iph-Ipd <0.7), the hole can be moved to the cathode side because the trap of the hole by the dopant material is weak. In this case, it is considered that the effect of extending the lifetime is small in the organic EL element provided with the concentration gradient.
《一般式(1)で表されるドーパント材料》
本発明の一般式(1)で表されるドーパント材料において、R1で表される置換基としては、例えば、アルキル基(例えば、メチル基、エチル基、プロピル基、イソプロピル基、t−ブチル基、ペンチル基、ヘキシル基、オクチル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシル基等)、シクロアルキル基(例えば、シクロペンチル基、シクロヘキシル基等)、アルケニル基(例えば、ビニル基、アリル基等)、アルキニル基(例えば、エチニル基、プロパルギル基等)、芳香族炭化水素環基(芳香族炭素環基、アリール基等ともいい、例えば、フェニル基、p−クロロフェニル基、メシチル基、トリル基、キシリル基、ナフチル基、アントリル基、アズレニル基、アセナフテニル基、フルオレニル基、フェナントリル基、インデニル基、ピレニル基、ビフェニリル基等)、芳香族複素環基(例えば、ピリジル基、ピリミジニル基、フリル基、ピロリル基、イミダゾリル基、ベンゾイミダゾリル基、ピラゾリル基、ピラジニル基、トリアゾリル基(例えば、1,2,4−トリアゾール−1−イル基、1,2,3−トリアゾール−1−イル基等)、オキサゾリル基、ベンゾオキサゾリル基、チアゾリル基、イソオキサゾリル基、イソチアゾリル基、フラザニル基、チエニル基、キノリル基、ベンゾフリル基、ジベンゾフリル基、ベンゾチエニル基、ジベンゾチエニル基、インドリル基、カルバゾリル基、カルボリニル基、ジアザカルバゾリル基(前記カルボリニル基のカルボリン環を構成する炭素原子の一つが窒素原子で置き換わったものを示す)、キノキサリニル基、ピリダジニル基、トリアジニル基、キナゾリニル基、フタラジニル基等)、複素環基(例えば、ピロリジル基、イミダゾリジル基、モルホリル基、オキサゾリジル基等)、アルコキシ基(例えば、メトキシ基、エトキシ基、プロピルオキシ基、ペンチルオキシ基、ヘキシルオキシ基、オクチルオキシ基、ドデシルオキシ基等)、シクロアルコキシ基(例えば、シクロペンチルオキシ基、シクロヘキシルオキシ基等)、アリールオキシ基(例えば、フェノキシ基、ナフチルオキシ基等)、アルキルチオ基(例えば、メチルチオ基、エチルチオ基、プロピルチオ基、ペンチルチオ基、ヘキシルチオ基、オクチルチオ基、ドデシルチオ基等)、シクロアルキルチオ基(例えば、シクロペンチルチオ基、シクロヘキシルチオ基等)、アリールチオ基(例えば、フェニルチオ基、ナフチルチオ基等)、アルコキシカルボニル基(例えば、メチルオキシカルボニル基、エチルオキシカルボニル基、ブチルオキシカルボニル基、オクチルオキシカルボニル基、ドデシルオキシカルボニル基等)、アリールオキシカルボニル基(例えば、フェニルオキシカルボニル基、ナフチルオキシカルボニル基等)、スルファモイル基(例えば、アミノスルホニル基、メチルアミノスルホニル基、ジメチルアミノスルホニル基、ブチルアミノスルホニル基、ヘキシルアミノスルホニル基、シクロヘキシルアミノスルホニル基、オクチルアミノスルホニル基、ドデシルアミノスルホニル基、フェニルアミノスルホニル基、ナフチルアミノスルホニル基、2−ピリジルアミノスルホニル基等)、アシル基(例えば、アセチル基、エチルカルボニル基、プロピルカルボニル基、ペンチルカルボニル基、シクロヘキシルカルボニル基、オクチルカルボニル基、2−エチルヘキシルカルボニル基、ドデシルカルボニル基、フェニルカルボニル基、ナフチルカルボニル基、ピリジルカルボニル基等)、アシルオキシ基(例えば、アセチルオキシ基、エチルカルボニルオキシ基、ブチルカルボニルオキシ基、オクチルカルボニルオキシ基、ドデシルカルボニルオキシ基、フェニルカルボニルオキシ基等)、アミド基(例えば、メチルカルボニルアミノ基、エチルカルボニルアミノ基、ジメチルカルボニルアミノ基、プロピルカルボニルアミノ基、ペンチルカルボニルアミノ基、シクロヘキシルカルボニルアミノ基、2−エチルヘキシルカルボニルアミノ基、オクチルカルボニルアミノ基、ドデシルカルボニルアミノ基、フェニルカルボニルアミノ基、ナフチルカルボニルアミノ基等)、カルバモイル基(例えば、アミノカルボニル基、メチルアミノカルボニル基、ジメチルアミノカルボニル基、プロピルアミノカルボニル基、ペンチルアミノカルボニル基、シクロヘキシルアミノカルボニル基、オクチルアミノカルボニル基、2−エチルヘキシルアミノカルボニル基、ドデシルアミノカルボニル基、フェニルアミノカルボニル基、ナフチルアミノカルボニル基、2−ピリジルアミノカルボニル基等)、ウレイド基(例えば、メチルウレイド基、エチルウレイド基、ペンチルウレイド基、シクロヘキシルウレイド基、オクチルウレイド基、ドデシルウレイド基、フェニルウレイド基ナフチルウレイド基、2−ピリジルアミノウレイド基等)、スルフィニル基(例えば、メチルスルフィニル基、エチルスルフィニル基、ブチルスルフィニル基、シクロヘキシルスルフィニル基、2−エチルヘキシルスルフィニル基、ドデシルスルフィニル基、フェニルスルフィニル基、ナフチルスルフィニル基、2−ピリジルスルフィニル基等)、アルキルスルホニル基(例えば、メチルスルホニル基、エチルスルホニル基、ブチルスルホニル基、シクロヘキシルスルホニル基、2−エチルヘキシルスルホニル基、ドデシルスルホニル基等)、アリールスルホニル基またはヘテロアリールスルホニル基(例えば、フェニルスルホニル基、ナフチルスルホニル基、2−ピリジルスルホニル基等)、アミノ基(例えば、アミノ基、エチルアミノ基、ジメチルアミノ基、ブチルアミノ基、シクロペンチルアミノ基、2−エチルヘキシルアミノ基、ドデシルアミノ基、アニリノ基、ナフチルアミノ基、2−ピリジルアミノ基等)、シアノ基、ニトロ基、ヒドロキシ基、メルカプト基、シリル基(例えば、トリメチルシリル基、トリイソプロピルシリル基、トリフェニルシリル基、フェニルジエチルシリル基等)等が挙げられる。これらの置換基のうち、好ましいものはアルキル基もしくはアリール基である。<< Dopant Material Represented by Formula (1) >>
In the dopant material represented by the general formula (1) of the present invention, examples of the substituent represented by R 1 include an alkyl group (for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a t-butyl group). , Pentyl group, hexyl group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, etc.), cycloalkyl group (eg, cyclopentyl group, cyclohexyl group, etc.), alkenyl group (eg, vinyl group, allyl group, etc.) , Alkynyl groups (for example, ethynyl group, propargyl group, etc.), aromatic hydrocarbon ring groups (also called aromatic carbocyclic groups, aryl groups, etc.), for example, phenyl group, p-chlorophenyl group, mesityl group, tolyl group, xylyl Group, naphthyl group, anthryl group, azulenyl group, acenaphthenyl group, fluorenyl group, phenanthryl group, For example, pyridyl group, pyrimidinyl group, furyl group, pyrrolyl group, imidazolyl group, benzoimidazolyl group, pyrazolyl group, pyrazinyl group, triazolyl group (for example, 1, 2,4-triazol-1-yl group, 1,2,3-triazol-1-yl group, etc.), oxazolyl group, benzoxazolyl group, thiazolyl group, isoxazolyl group, isothiazolyl group, furazanyl group, thienyl group, A quinolyl group, a benzofuryl group, a dibenzofuryl group, a benzothienyl group, a dibenzothienyl group, an indolyl group, a carbazolyl group, a carbolinyl group, a diazacarbazolyl group (one of the carbon atoms constituting the carboline ring of the carbolinyl group is a nitrogen atom) ), Quinoxalinyl group, Pyridazinyl group, triazinyl group, quinazolinyl group, phthalazinyl group, etc.), heterocyclic group (eg, pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.), alkoxy group (eg, methoxy group, ethoxy group, propyloxy group, pentyl) Oxy group, hexyloxy group, octyloxy group, dodecyloxy group, etc.), cycloalkoxy group (eg, cyclopentyloxy group, cyclohexyloxy group, etc.), aryloxy group (eg, phenoxy group, naphthyloxy group, etc.), alkylthio group (For example, methylthio group, ethylthio group, propylthio group, pentylthio group, hexylthio group, octylthio group, dodecylthio group, etc.), cycloalkylthio group (for example, cyclopentylthio group, cyclohexylthio group, etc.), arylthio group ( For example, phenylthio group, naphthylthio group, etc.), alkoxycarbonyl group (eg, methyloxycarbonyl group, ethyloxycarbonyl group, butyloxycarbonyl group, octyloxycarbonyl group, dodecyloxycarbonyl group, etc.), aryloxycarbonyl group (eg, Phenyloxycarbonyl group, naphthyloxycarbonyl group, etc.), sulfamoyl group (for example, aminosulfonyl group, methylaminosulfonyl group, dimethylaminosulfonyl group, butylaminosulfonyl group, hexylaminosulfonyl group, cyclohexylaminosulfonyl group, octylaminosulfonyl group) , Dodecylaminosulfonyl group, phenylaminosulfonyl group, naphthylaminosulfonyl group, 2-pyridylaminosulfonyl group, etc.), acyl group (for example, Til group, ethylcarbonyl group, propylcarbonyl group, pentylcarbonyl group, cyclohexylcarbonyl group, octylcarbonyl group, 2-ethylhexylcarbonyl group, dodecylcarbonyl group, phenylcarbonyl group, naphthylcarbonyl group, pyridylcarbonyl group, etc.), acyloxy group ( For example, acetyloxy group, ethylcarbonyloxy group, butylcarbonyloxy group, octylcarbonyloxy group, dodecylcarbonyloxy group, phenylcarbonyloxy group, etc.), amide group (for example, methylcarbonylamino group, ethylcarbonylamino group, dimethylcarbonyl) Amino group, propylcarbonylamino group, pentylcarbonylamino group, cyclohexylcarbonylamino group, 2-ethylhexylcarbonylamino group, octylcal Bonylamino group, dodecylcarbonylamino group, phenylcarbonylamino group, naphthylcarbonylamino group, etc.), carbamoyl group (for example, aminocarbonyl group, methylaminocarbonyl group, dimethylaminocarbonyl group, propylaminocarbonyl group, pentylaminocarbonyl group, cyclohexyl) Aminocarbonyl group, octylaminocarbonyl group, 2-ethylhexylaminocarbonyl group, dodecylaminocarbonyl group, phenylaminocarbonyl group, naphthylaminocarbonyl group, 2-pyridylaminocarbonyl group, etc.), ureido group (for example, methylureido group, ethylureido) Group, pentylureido group, cyclohexylureido group, octylureido group, dodecylureido group, phenylureido group, naphthylureido group, 2-pyri Sulfinyl group (for example, methylsulfinyl group, ethylsulfinyl group, butylsulfinyl group, cyclohexylsulfinyl group, 2-ethylhexylsulfinyl group, dodecylsulfinyl group, phenylsulfinyl group, naphthylsulfinyl group, 2-pyridylsulfinyl group) Group), alkylsulfonyl group (for example, methylsulfonyl group, ethylsulfonyl group, butylsulfonyl group, cyclohexylsulfonyl group, 2-ethylhexylsulfonyl group, dodecylsulfonyl group, etc.), arylsulfonyl group or heteroarylsulfonyl group (for example, phenyl) Sulfonyl group, naphthylsulfonyl group, 2-pyridylsulfonyl group, etc.), amino group (for example, amino group, ethylamino group, dimethylamino group, butyryl) Group, cyclopentylamino group, 2-ethylhexylamino group, dodecylamino group, anilino group, naphthylamino group, 2-pyridylamino group, etc.), cyano group, nitro group, hydroxy group, mercapto group, silyl group (for example, trimethylsilyl group) , Triisopropylsilyl group, triphenylsilyl group, phenyldiethylsilyl group, etc.). Of these substituents, preferred are an alkyl group and an aryl group.
Zは5〜7員環を形成するのに必要な非金属原子群を表す。Zにより形成される5〜7員環としては、例えば、ベンゼン環、ナフタレン環、ピリジン環、ピリミジン環、ピロール環、チオフェン環、ピラゾール環、イミダゾール環、オキサゾール環及びチアゾール環等が挙げられる。これらのうちで好ましいものは、ベンゼン環である。 Z represents a nonmetallic atom group necessary for forming a 5- to 7-membered ring. Examples of the 5- to 7-membered ring formed by Z include a benzene ring, naphthalene ring, pyridine ring, pyrimidine ring, pyrrole ring, thiophene ring, pyrazole ring, imidazole ring, oxazole ring, and thiazole ring. Of these, a benzene ring is preferred.
B1〜B5は炭素原子、窒素原子、酸素原子もしくは硫黄原子を表し、少なくとも一つは窒素原子を表す。これら5つの原子により形成される芳香族含窒素複素環としては単環が好ましい。例えば、ピロール環、ピラゾール環、イミダゾール環、トリアゾール環、テトラゾール環、オキサゾール環、イソオキサゾール環、チアゾール環、イソチアゾール環、オキサジアゾール環及びチアジアゾー環ル等が挙げられる。これらのうちで好ましいのはピラゾール環、イミダゾール環であり、更に好ましくはイミダゾール環である。これらの環は上記の置換基によって更に置換されていてもよい。置換基として好ましいものはアルキル基及びアリール基であり、更に好ましくは、アリール基である。B 1 .about.B 5 represents a carbon atom, a nitrogen atom, an oxygen atom or a sulfur atom, at least one nitrogen atom. The aromatic nitrogen-containing heterocycle formed by these five atoms is preferably a monocycle. Examples include pyrrole ring, pyrazole ring, imidazole ring, triazole ring, tetrazole ring, oxazole ring, isoxazole ring, thiazole ring, isothiazole ring, oxadiazole ring, and thiadiazole ring. Of these, a pyrazole ring and an imidazole ring are preferable, and an imidazole ring is more preferable. These rings may be further substituted with the above substituents. Preferred as the substituent are an alkyl group and an aryl group, and more preferred is an aryl group.
L1はX1、X2と共に2座の配位子を形成する原子群を表す。X1−L1−X2で表される2座の配位子の具体例としては、例えば、置換または無置換のフェニルピリジン、フェニルピラゾール、フェニルイミダゾール、フェニルトリアゾール、フェニルテトラゾール、ピラザボール、ピコリン酸及びアセチルアセトン等が挙げられる。L 1 represents an atomic group that forms a bidentate ligand together with X 1 and X 2 . Specific examples of the bidentate ligand represented by X 1 -L 1 -X 2 include, for example, substituted or unsubstituted phenylpyridine, phenylpyrazole, phenylimidazole, phenyltriazole, phenyltetrazole, pyrazabol, picolinic acid And acetylacetone.
これらの基は上記の置換基によって更に置換されていてもよい。 These groups may be further substituted with the above substituents.
m1は1、2または3の整数を表し、m2は0、1または2の整数を表すが、m1+m2は2または3である。中でも、m2は0である場合が好ましい。 m1 represents an integer of 1, 2 or 3, m2 represents an integer of 0, 1 or 2, and m1 + m2 is 2 or 3. Especially, the case where m2 is 0 is preferable.
M1で表される金属としては、元素周期表の8〜10族の遷移金属元素(単に遷移金属ともいう)が用いられるが、中でもイリジウム、白金が好ましく、更に好ましくはイリジウムである。As the metal represented by M 1 , a transition metal element of group 8 to 10 of the periodic table (also simply referred to as a transition metal) is used, among which iridium and platinum are preferable, and iridium is more preferable.
なお、本発明の一般式(1)で表されるドーパント材料は、重合性基または反応性基を有していてもいなくてもよい。 In addition, the dopant material represented by General formula (1) of this invention does not need to have a polymeric group or a reactive group.
一般式(1)で表されるドーパント材料の内、B1〜B5で形成される含窒素複素環がイミダゾール環である下記一般式(2)で表されるドーパント材料が好ましい。Among the dopant materials represented by the general formula (1), a dopant material represented by the following general formula (2) in which the nitrogen-containing heterocycle formed by B 1 to B 5 is an imidazole ring is preferable.
一般式(2)において、R1、R2、R3は置換基を表し、一般式(1)におけるR1が表す置換基と同義である。Z、n1、M1、X1、X2、L1、m1、m2は一般式(1)におけるそれらと同義である。In the general formula (2), R 1 , R 2 and R 3 represent substituents and have the same meaning as the substituent represented by R 1 in the general formula (1). Z, n1, M 1 , X 1 , X 2 , L 1 , m1, and m2 are synonymous with those in the general formula (1).
一般式(2)において、R2が下記で表されるドーパント材料が更に好ましい。In the general formula (2), a dopant material in which R 2 is represented by the following is more preferable.
R4は立体パラメーター値(Es値)が−0.5以下の置換基を表す。R 4 represents a substituent having a steric parameter value (Es value) of −0.5 or less.
ここで、Es値とは化学反応性より誘導された立体パラメーターであり、この値が小さければ小さいほど立体的に嵩高い置換基ということができる。 Here, the Es value is a steric parameter derived from chemical reactivity. The smaller this value, the more sterically bulky substituent can be said.
以下、Es値について説明する。一般に、酸性条件下でのエステルの加水分解反応においては、置換基が反応の進行に対して及ぼす影響は立体障害だけと考えてよいことが知られており、この事を利用して置換基の立体障害を数値化したものがEs値である。 Hereinafter, the Es value will be described. In general, in ester hydrolysis under acidic conditions, it is known that the influence of substituents on the progress of the reaction may only be considered as steric hindrance. The Es value is obtained by quantifying the steric hindrance.
置換基XのEs値は、次の化学反応式
X−CH2COORX+H2O→X−CH2COOH+RXOH
で表される、酢酸のメチル基の水素原子1つを置換基Xで置換したα位モノ置換酢酸から誘導されるα位モノ置換酢酸エステルを酸性条件下で加水分解する際の反応速度定数kXと、次の化学反応式
CH3COORY+H2O→CH3COOH+RYOH
(RXはRYと同じである)で表される、上記のα位モノ置換酢酸エステルに対応する酢酸エステルを酸性条件下で加水分解する際の反応速度定数kHから次の式で求められる。The Es value of the substituent X is expressed by the following chemical reaction formula: X—CH 2 COORX + H 2 O → X—CH 2 COOH + RXOH
The reaction rate constant kX for hydrolyzing an α-monosubstituted acetic acid ester derived from α-monosubstituted acetic acid in which one hydrogen atom of the methyl group of acetic acid is substituted with the substituent X represented by the formula And the following chemical reaction formula CH 3 COORY + H 2 O → CH 3 COOH + RYOH
(RX is the same as RY) represented by the following formula from the reaction rate constant kH when the acetate corresponding to the α-monosubstituted acetate described above is hydrolyzed under acidic conditions.
Es=log(kX/kH)
置換基Xの立体障害により反応速度は低下し、その結果kX<kHとなるのでEs値は通常負となる。実際にEs値を求める場合には、上記の二つの反応速度定数kXとkHを求め、上記の式により算出する。Es = log (kX / kH)
The reaction rate decreases due to the steric hindrance of the substituent X, and as a result, kX <kH, so the Es value is usually negative. When the Es value is actually obtained, the above two reaction rate constants kX and kH are obtained and calculated by the above formula.
Es値の具体的な例は、Unger,S.H.,Hansch,C.,Prog.Phys.Org.Chem.,12,91(1976)に詳しく記載されている。また、『薬物の構造活性相関』(化学の領域増刊122号、南江堂)、「American Chemical Society Professional Reference Book,’Exploring QSAR’p.81 Table 3−3」にも、その具体的な数値の記載がある。次にその一部を表1に示す。 Specific examples of Es values are given by Unger, S. et al. H. Hansch, C .; , Prog. Phys. Org. Chem. 12, 91 (1976). The specific numerical values are also described in “Structure-activity relationship of drugs” (Regional Chemistry Special Issue 122, Nankodo) and “American Chemical Society Reference Book, 'Exploring QSAR' p.81 Table 3-3”. There is. Next, a part is shown in Table 1.
ここで、注意するのは本明細書で定義するところのEs値は、メチル基のそれを0として定義したのではなく、水素原子を0としたものであり、メチル基を0としたEs値から1.24を差し引いたものである。 Here, it should be noted that the Es value as defined in this specification is not defined by defining that of a methyl group as 0, but by assuming that a hydrogen atom is 0, and an Es value where a methyl group is 0. Minus 1.24.
本発明においてEs値は−0.5以下である。好ましくは−7.0以上−0.6以下である。最も好ましくは−7.0以上−1.0以下である。 In the present invention, the Es value is −0.5 or less. Preferably it is -7.0 or more and -0.6 or less. Most preferably, it is -7.0 or more and -1.0 or less.
以下に、本発明に係る一般式(1)で表されるドーパント材料の具体的な例を挙げるが、本発明はこれらに限定されるものではない。 Specific examples of the dopant material represented by the general formula (1) according to the present invention are given below, but the present invention is not limited thereto.
これらの金属錯体は、例えば、Organic Letter誌、vol3、No.16、2579〜2581頁(2001)、Inorganic Chemistry,第30巻、第8号、1685〜1687頁(1991年)、J.Am.Chem.Soc.,123巻、4304頁(2001年)、Inorganic Chemistry,第40巻、第7号、1704〜1711頁(2001年)、Inorganic Chemistry,第41巻、第12号、3055〜3066頁(2002年)、New Journal of Chemistry.,第26巻、1171頁(2002年)、European Journal of Organic Chemistry,第4巻、695〜709頁(2004年)、更にこれらの文献中に記載の参考文献等の方法を適用することにより合成できる。 These metal complexes are described in, for example, Organic Letter, vol. 16, 2579-2581 (2001), Inorganic Chemistry, Vol. 30, No. 8, 1685-1687 (1991), J. Am. Am. Chem. Soc. , 123, 4304 (2001), Inorganic Chemistry, Vol. 40, No. 7, 1704-1711 (2001), Inorganic Chemistry, Vol. 41, No. 12, 3055-3066 (2002) , New Journal of Chemistry. 26, 1171 (2002), European Journal of Organic Chemistry, Vol. 4, pages 695-709 (2004), and further synthesized by applying methods such as references described in these documents. it can.
本発明において化合物のリン光波長とは、リン光スペクトルの0−0バンドのことである。リン光スペクトルの0−0バンドは以下の測定方法により求めることができる。 In the present invention, the phosphorescence wavelength of a compound is the 0-0 band of the phosphorescence spectrum. The 0-0 band of the phosphorescence spectrum can be obtained by the following measurement method.
測定する化合物をよく脱酸素された塩化メチレン中に溶かし、リン光測定用セルに入れた後、常温(25℃)で励起光を照射し、発光スペクトルを測定する。また、上記溶剤系で溶解できない化合物については、その化合物を溶解しうる任意の溶剤を使用してもよい。 The compound to be measured is dissolved in well-deoxygenated methylene chloride, put into a phosphorescence measurement cell, irradiated with excitation light at room temperature (25 ° C.), and the emission spectrum is measured. Moreover, about the compound which cannot be melt | dissolved in the said solvent type | system | group, you may use the arbitrary solvent which can melt | dissolve the compound.
次に0−0バンドの求め方であるが、本発明においては、上記測定法で得られたリン光スペクトルチャートのなかで最も短波長側に現れる発光極大波長をもって0−0バンドと定義する。また、リン光スペクトルが弱い場合には、スムージング処理することでノイズとピークを分離しピーク波長を読み取ることもできる。なお、スムージング処理としては、Savitzky&Glayの平滑化法等を適用することができる。 Next, the 0-0 band is determined. In the present invention, the emission maximum wavelength that appears on the shortest wavelength side in the phosphorescence spectrum chart obtained by the above-described measurement method is defined as the 0-0 band. If the phosphorescence spectrum is weak, noise and peaks can be separated and peak wavelengths can be read by performing a smoothing process. As the smoothing process, a Savitzky & Gray smoothing method or the like can be applied.
本発明においては、リン光波長ピークが480nm以下であることが好ましい。 In the present invention, the phosphorescence wavelength peak is preferably 480 nm or less.
次に、本発明の有機EL素子の構成層について詳細に説明する。 Next, the constituent layers of the organic EL device of the present invention will be described in detail.
本発明において、有機EL素子の層構成の好ましい具体例を以下に示すが、本発明はこれらに限定されない。 In this invention, although the preferable specific example of the layer structure of an organic EL element is shown below, this invention is not limited to these.
(i)陽極/発光層/陰極
(ii)陽極/正孔輸送層/発光層/陰極
(iii)陽極/正孔輸送層/発光層/電子輸送層/陰極
(iv)陽極/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極
(v)陽極/正孔注入層/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極バッファー層/陰極
(vi)陽極/正孔注入層/正孔輸送層/正孔輸送層A/発光層/電子輸送層/陰極バッファー層/陰極。(I) Anode / light emitting layer / cathode (ii) Anode / hole transport layer / light emitting layer / cathode (iii) Anode / hole transport layer / light emitting layer / electron transport layer / cathode (iv) Anode / hole transport layer / Light emitting layer / hole blocking layer / electron transport layer / cathode (v) anode / hole injection layer / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode buffer layer / cathode (vi) anode / Hole injection layer / hole transport layer / hole transport layer A / light emitting layer / electron transport layer / cathode buffer layer / cathode.
《発光層》
本発明に係る発光層について説明する。<Light emitting layer>
The light emitting layer according to the present invention will be described.
本発明に係る発光層は、電極または電子輸送層、正孔輸送層等から注入されてくる電子及び正孔が再結合して発光する層であり、発光する部分は発光層の層内であっても発光層と隣接層との界面であってもよい。 The light emitting layer according to the present invention is a layer that emits light by recombination of electrons and holes injected from an electrode, an electron transport layer, a hole transport layer, or the like, and the light emitting portion is in the layer of the light emitting layer. Alternatively, it may be the interface between the light emitting layer and the adjacent layer.
(ドーパント材料)
本発明の有機EL素子の発光層には、ドーパント材料とホスト材料が含有される。本発明においては、ドーパント材料として前述した本発明に係る化合物を用いることが好ましい。(Dopant material)
The light emitting layer of the organic EL device of the present invention contains a dopant material and a host material. In the present invention, it is preferable to use the aforementioned compound according to the present invention as a dopant material.
更に公知のドーパント材料を複数種併用してもよい。ドーパント材料を複数種用いることで異なる発光を混ぜることが可能となり、これにより任意の発光色を得ることができる。ドーパント材料の種類、ドープ量を調整することで白色発光が可能であり、照明、バックライトへの応用もできる。 Further, a plurality of known dopant materials may be used in combination. By using a plurality of dopant materials, it is possible to mix different light emission, thereby obtaining an arbitrary emission color. White light emission is possible by adjusting the kind of dopant material and the doping amount, and it can also be applied to illumination and backlight.
公知のドーパント材料の具体例としては、以下の文献に記載されている化合物が挙げられる。 Specific examples of known dopant materials include compounds described in the following documents.
国際公開第00/70655号パンフレット、特開2002−280178号公報、特開2001−181616号公報、特開2002−280179号公報、特開2001−181617号公報、特開2002−280180号公報、特開2001−247859号公報、特開2002−299060号公報、特開2001−313178号公報、特開2002−302671号公報、特開2001−345183号公報、特開2002−324679号公報、国際公開第02/15645号パンフレット、特開2002−332291号公報、特開2002−50484号公報、特開2002−332292号公報、特開2002−83684号公報、特表2002−540572号公報、特開2002−117978号公報、特開2002−338588号公報、特開2002−170684号公報、特開2002−352960号公報、国際公開第01/93642号パンフレット、特開2002−50483号公報、特開2002−100476号公報、特開2002−173674号公報、特開2002−359082号公報、特開2002−175884号公報、特開2002−363552号公報、特開2002−184582号公報、特開2003−7469号公報、特表2002−525808号公報、特開2003−7471号公報、特表2002−525833号公報、特開2003−31366号公報、特開2002−226495号公報、特開2002−234894号公報、特開2002−235076号公報、特開2002−241751号公報、特開2001−319779号公報、特開2001−319780号公報、特開2002−62824号公報、特開2002−100474号公報、特開2002−203679号公報、特開2002−343572号公報、特開2002−203678号公報等。 WO 00/70655 pamphlet, JP 2002-280178, JP 2001-181616, JP 2002-280179, JP 2001-181617, JP 2002-280180, JP 2001-247859, JP 2002-299060, JP 2001-313178, JP 2002-302671, JP 2001-345183, JP 2002-324679, International Publication No. 02/15645 pamphlet, JP 2002-332291 A, JP 2002-50484 A, JP 2002-332292 A, JP 2002-83684 A, JP 2002-540572 A, JP 2002-2002 A. No. 117978, JP 20 JP-A-2-338588, JP-A-2002-170684, JP-A-2002-352960, WO01 / 93642, JP-A-2002-50483, JP-A-2002-1000047, JP-A-2002. No. -173744, JP-A No. 2002-359082, JP-A No. 2002-17584, JP-A No. 2002-363552, JP-A No. 2002-184582, JP-A No. 2003-7469, JP-T-2002-525808. Gazette, JP2003-7471, JP2002-525833, JP2003-31366, JP2002-226495, JP2002-234894, JP2002-2335076 JP 2002-241751 A JP 2001-319779, JP 2001-319780, JP 2002-62824, JP 2002-1000047, JP 2002-203679, JP 2002-343572, JP 2002-203678 gazette etc.
(ホスト材料)
発光層に使用される材料としては、上記のドーパント材料の他にホスト材料がある。(Host material)
As a material used for the light emitting layer, there is a host material in addition to the above dopant material.
ここで本発明においてホスト材料とは、発光層に含有される化合物のうちで室温(25℃)において、リン光発光のリン光量子収率が0.01未満の化合物と定義される。 Here, in the present invention, the host material is defined as a compound having a phosphorescence quantum yield of phosphorescence emission of less than 0.01 at room temperature (25 ° C.) among compounds contained in the light emitting layer.
本発明に用いられるとしてホスト材料は構造的には特に制限はないが、代表的にはカルバゾール誘導体、トリアリールアミン誘導体等が挙げられる。 The host material used in the present invention is not particularly limited in terms of structure, but representative examples include carbazole derivatives and triarylamine derivatives.
以下にカルバゾール誘導体、トリアリールアミン誘導体等の具体例を挙げるが、本発明はこれらに限定されない。 Specific examples of the carbazole derivative, triarylamine derivative and the like are given below, but the present invention is not limited to these.
ホスト材料としては発光の長波長化を防ぎ、なお且つ高Tg(ガラス転移温度)である化合物が好ましい。ここで、高Tgとは100℃以上を言う。 As the host material, a compound that prevents the emission of light from being increased in wavelength and has a high Tg (glass transition temperature) is preferable. Here, high Tg means 100 degreeC or more.
ホスト材料の具体例としては、以下の文献に記載されている化合物が好適である。例えば、特開2001−257076号公報、同2001−313179号公報、同2002−319491号公報、同2001−357977号公報、同2002−334786号公報、同2002−8860号公報、同2002−334787号公報、同2002−15871号公報、同2002−334788号公報、同2002−43056号公報、同2002−334789号公報、同2002−75645号公報、同2002−105445号公報、同2002−343568号公報、同2002−141173号公報、同2002−203683号公報、同2002−363227号公報、同2003−3165号公報、同2002−234888号公報、同2003−27048号公報、同2002−255934号公報、同2002−260861号公報、同2002−280183号公報、同2002−302516号公報、同2002−308837号公報、同2000−21572号公報、同2004−288381号公報等。 As specific examples of the host material, compounds described in the following documents are suitable. For example, Japanese Patent Application Laid-Open Nos. 2001-257076, 2001-313179, 2002-319491, 2001-357777, 2002-334786, 2002-8860, 2002-334787. Gazette, 2002-15871, 2002-334788, 2002-43056, 2002-334789, 2002-75645, 2002-105445, 2002-343568 No. 2002-141173, No. 2002-203683, No. 2002-363227, No. 2003-3165, No. 2002-234888, No. 2003-27048, No. 2002-255934, 2002-260861, JP same 2002-280183, JP same 2002-302516, JP same 2002-308837, JP same 2000-21572, JP same 2004-288381 Patent Publication.
《正孔輸送層》
正孔輸送層とは正孔を輸送する機能を有する材料を含み、広い意味で正孔注入層、電子阻止層も正孔輸送層に含まれる。正孔輸送層は単層もしくは複数層設けることができる。《Hole transport layer》
The hole transport layer includes a material having a function of transporting holes, and in a broad sense, a hole injection layer and an electron blocking layer are also included in the hole transport layer. The hole transport layer can be provided as a single layer or a plurality of layers.
正孔輸送材料としては特に制限はなく、従来、光導伝材料において、正孔の電荷注入輸送材料として慣用されているものやEL素子の正孔注入層、正孔輸送層に使用される公知のものの中から任意のものを選択して用いることができる。 There are no particular restrictions on the hole transport material, and conventionally known photoconductive materials are commonly used as hole charge injection and transport materials, and well-known materials used for hole injection layers and hole transport layers of EL devices. Any one can be selected and used.
正孔輸送材料は正孔の注入もしくは輸送、電子の障壁性のいずれかを有するものであり、有機物、無機物のいずれであってもよい。例えば、トリアゾール誘導体、オキサジアゾール誘導体、イミダゾール誘導体、ポリアリールアルカン誘導体、ピラゾリン誘導体及びピラゾロン誘導体、フェニレンジアミン誘導体、アリールアミン誘導体、アミノ置換カルコン誘導体、オキサゾール誘導体、スチリルアントラセン誘導体、フルオレノン誘導体、ヒドラゾン誘導体、スチルベン誘導体、シラザン誘導体、アニリン系共重合体、また導電性高分子オリゴマー、特にチオフェンオリゴマー等が挙げられる。 The hole transport material has one of hole injection or transport and electron barrier properties, and may be either organic or inorganic. For example, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, Examples thereof include stilbene derivatives, silazane derivatives, aniline copolymers, and conductive polymer oligomers, particularly thiophene oligomers.
正孔輸送材料としては上記のものを使用することができるが、ポルフィリン化合物、芳香族第三級アミン化合物及びスチリルアミン化合物、特に芳香族第三級アミン化合物を用いることが好ましい。 The above-mentioned materials can be used as the hole transport material, but it is preferable to use a porphyrin compound, an aromatic tertiary amine compound and a styrylamine compound, particularly an aromatic tertiary amine compound.
芳香族第三級アミン化合物及びスチリルアミン化合物の代表例としては、N,N,N′,N′−テトラフェニル−4,4′−ジアミノフェニル;N,N′−ジフェニル−N,N′−ビス(3−メチルフェニル)−〔1,1′−ビフェニル〕−4,4′−ジアミン(TPD);2,2−ビス(4−ジ−p−トリルアミノフェニル)プロパン;1,1−ビス(4−ジ−p−トリルアミノフェニル)シクロヘキサン;N,N,N′,N′−テトラ−p−トリル−4,4′−ジアミノビフェニル;1,1−ビス(4−ジ−p−トリルアミノフェニル)−4−フェニルシクロヘキサン;ビス(4−ジメチルアミノ−2−メチルフェニル)フェニルメタン;ビス(4−ジ−p−トリルアミノフェニル)フェニルメタン;N,N′−ジフェニル−N,N′−ジ(4−メトキシフェニル)−4,4′−ジアミノビフェニル;N,N,N′,N′−テトラフェニル−4,4′−ジアミノジフェニルエーテル;4,4′−ビス(ジフェニルアミノ)クオードリフェニル;N,N,N−トリ(p−トリル)アミン;4−(ジ−p−トリルアミノ)−4′−〔4−(ジ−p−トリルアミノ)スチリル〕スチルベン;4−N,N−ジフェニルアミノ−(2−ジフェニルビニル)ベンゼン;3−メトキシ−4′−N,N−ジフェニルアミノスチルベンゼン;N−フェニルカルバゾール、更には米国特許第5,061,569号明細書に記載されている2個の縮合芳香族環を分子内に有するもの、例えば、4,4′−ビス〔N−(1−ナフチル)−N−フェニルアミノ〕ビフェニル(NPD)、特開平4−308688号公報に記載されているトリフェニルアミンユニットが3つスターバースト型に連結された4,4′,4″−トリス〔N−(3−メチルフェニル)−N−フェニルアミノ〕トリフェニルアミン(MTDATA)等が挙げられる。 Representative examples of aromatic tertiary amine compounds and styrylamine compounds include N, N, N ′, N′-tetraphenyl-4,4′-diaminophenyl; N, N′-diphenyl-N, N′— Bis (3-methylphenyl)-[1,1′-biphenyl] -4,4′-diamine (TPD); 2,2-bis (4-di-p-tolylaminophenyl) propane; 1,1-bis (4-di-p-tolylaminophenyl) cyclohexane; N, N, N ′, N′-tetra-p-tolyl-4,4′-diaminobiphenyl; 1,1-bis (4-di-p-tolyl) Aminophenyl) -4-phenylcyclohexane; bis (4-dimethylamino-2-methylphenyl) phenylmethane; bis (4-di-p-tolylaminophenyl) phenylmethane; N, N'-diphenyl-N, N ' − (4-methoxyphenyl) -4,4'-diaminobiphenyl; N, N, N ', N'-tetraphenyl-4,4'-diaminodiphenyl ether; 4,4'-bis (diphenylamino) quadriphenyl; N, N, N-tri (p-tolyl) amine; 4- (di-p-tolylamino) -4 '-[4- (di-p-tolylamino) styryl] stilbene; 4-N, N-diphenylamino- (2-diphenylvinyl) benzene; 3-methoxy-4′-N, N-diphenylaminostilbenzene; N-phenylcarbazole, and also two of those described in US Pat. No. 5,061,569. Having a condensed aromatic ring in the molecule, for example, 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (NPD), JP-A-4-3086 4,4 ', 4 "-tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine in which three triphenylamine units described in Japanese Patent No. 8 are linked in a starburst type ( MTDATA) and the like.
更にこれらの材料を高分子鎖に導入した、またはこれらの材料を高分子の主鎖とした高分子材料を用いることもできる。 Furthermore, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used.
また、p型−Si、p型−SiC等の無機化合物も正孔注入材料、正孔輸送材料として使用することができる。また、正孔輸送材料は、高Tgであることが好ましい。 In addition, inorganic compounds such as p-type-Si and p-type-SiC can also be used as the hole injection material and the hole transport material. The hole transport material preferably has a high Tg.
この正孔輸送層は上記正孔輸送材料を、例えば、真空蒸着法、スピンコート法、キャスト法、インクジェット法、LB法等の公知の方法により、薄膜化することにより形成することができる。正孔輸送層の膜厚については特に制限はないが、通常は5〜5000nm程度である。この正孔輸送層は上記材料の1種または2種以上からなる1層構造であってもよい。 This hole transport layer can be formed by thinning the hole transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, an ink jet method, or an LB method. Although there is no restriction | limiting in particular about the film thickness of a positive hole transport layer, Usually, it is about 5-5000 nm. The hole transport layer may have a single layer structure composed of one or more of the above materials.
また、不純物ドープしたp性の高い正孔輸送層を用いることもできる。その例としては、特開平4−297076号、特開2000−196140号、同2001−102175号の各公報、J.Appl.Phys.,95,5773(2004)などに記載されたものが挙げられる。 Further, a hole transport layer having a high p property doped with impurities can also be used. Examples thereof include JP-A-4-297076, JP-A-2000-196140, and JP-A-2001-102175; Appl. Phys. 95, 5773 (2004), and the like.
《電子輸送層》
電子輸送層とは電子を輸送する機能を有する材料からなり、広い意味で電子注入層、正孔阻止層も電子輸送層に含まれる。電子輸送層は単層もしくは複数層を設けることができる。《Electron transport layer》
The electron transport layer is made of a material having a function of transporting electrons, and in a broad sense, an electron injection layer and a hole blocking layer are also included in the electron transport layer. The electron transport layer can be provided with a single layer or a plurality of layers.
従来、単層の電子輸送層、及び複数層とする場合は発光層に対して、陰極側に隣接する電子輸送層に用いられる電子輸送材料(正孔阻止材料を兼ねる)としては、下記の材料が知られている。更に、電子輸送層は陰極より注入された電子を発光層に伝達する機能を有していればよく、その材料としては従来公知の化合物の中から任意のものを選択して用いることができる。 Conventionally, in the case of a single-layer electron transport layer and a plurality of layers, the following materials are used as the electron transport material (also serving as a hole blocking material) used for the electron transport layer adjacent to the cathode side with respect to the light emitting layer. It has been known. Further, the electron transport layer only needs to have a function of transmitting electrons injected from the cathode to the light emitting layer, and any material can be selected and used from conventionally known compounds.
この電子輸送層に用いられる材料(以下、電子輸送材料という)の例としては、ニトロ置換フルオレン誘導体、ジフェニルキノン誘導体、チオピランジオキシド誘導体、ナフタレンペリレンなどの複素環テトラカルボン酸無水物、カルボジイミド、フレオレニリデンメタン誘導体、アントラキノジメタン及びアントロン誘導体、オキサジアゾール誘導体などが挙げられる。更に、上記オキサジアゾール誘導体において、オキサジアゾール環の酸素原子を硫黄原子に置換したチアジアゾール誘導体、電子吸引基として知られているキノキサリン環を有するキノキサリン誘導体も、電子輸送材料として用いることができる。 Examples of materials used for the electron transport layer (hereinafter referred to as electron transport materials) include heterocyclic tetracarboxylic acid anhydrides such as nitro-substituted fluorene derivatives, diphenylquinone derivatives, thiopyran dioxide derivatives, naphthalene perylene, carbodiimides, Examples include fluorenylidenemethane derivatives, anthraquinodimethane and anthrone derivatives, and oxadiazole derivatives. Furthermore, in the above oxadiazole derivative, a thiadiazole derivative in which the oxygen atom of the oxadiazole ring is substituted with a sulfur atom, and a quinoxaline derivative having a quinoxaline ring known as an electron withdrawing group can also be used as an electron transport material.
更にこれらの材料を高分子鎖に導入した、またはこれらの材料を高分子の主鎖とした高分子材料を用いることもできる。 Furthermore, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used.
また、8−キノリノール誘導体の金属錯体、例えば、トリス(8−キノリノール)アルミニウム(Alq3)、トリス(5,7−ジクロロ−8−キノリノール)アルミニウム、トリス(5,7−ジブロモ−8−キノリノール)アルミニウム、トリス(2−メチル−8−キノリノール)アルミニウム、トリス(5−メチル−8−キノリノール)アルミニウム、ビス(8−キノリノール)亜鉛(Znq)など、及びこれらの金属錯体の中心金属がIn、Mg、Cu、Ca、Sn、GaまたはPbに置き替わった金属錯体も、電子輸送材料として用いることができる。その他、メタルフリー若しくはメタルフタロシアニン、またはそれらの末端がアルキル基やスルホン酸基などで置換されているものも、電子輸送材料として好ましく用いることができる。また、発光層の材料として例示したジスチリルピラジン誘導体も、電子輸送材料として用いることができるし、正孔注入層、正孔輸送層と同様に、n型−Si、n型−SiCなどの無機半導体も電子輸送材料として用いることができる。In addition, metal complexes of 8-quinolinol derivatives such as tris (8-quinolinol) aluminum (Alq 3 ), tris (5,7-dichloro-8-quinolinol) aluminum, tris (5,7-dibromo-8-quinolinol) Aluminum, tris (2-methyl-8-quinolinol) aluminum, tris (5-methyl-8-quinolinol) aluminum, bis (8-quinolinol) zinc (Znq), etc., and the central metals of these metal complexes are In, Mg Metal complexes replaced with Cu, Ca, Sn, Ga, or Pb can also be used as electron transport materials. In addition, metal-free or metal phthalocyanine, or those having terminal ends substituted with an alkyl group or a sulfonic acid group can be preferably used as the electron transport material. In addition, the distyrylpyrazine derivative exemplified as the material of the light emitting layer can also be used as an electron transport material, and similarly to the hole injection layer and the hole transport layer, inorganic such as n-type-Si and n-type-SiC. A semiconductor can also be used as an electron transport material.
この電子輸送層は上記電子輸送材料を、例えば、真空蒸着法、スピンコート法、キャスト法、インクジェット法、LB法等の公知の方法により、薄膜化することにより形成することができる。電子輸送層の膜厚については特に制限はないが、通常は5〜5000nm程度である。この電子輸送層は上記材料の1種または2種以上からなる1層構造であってもよい。 This electron transport layer can be formed by thinning the electron transport material by a known method such as a vacuum deposition method, a spin coating method, a casting method, an ink jet method, or an LB method. Although there is no restriction | limiting in particular about the film thickness of an electron carrying layer, Usually, it is about 5-5000 nm. This electron transport layer may have a single layer structure composed of one or more of the above materials.
また、不純物ドープしたn性の高い電子輸送層を用いることもできる。その例としては、特開平4−297076号、特開2000−196140号、同2001−102175号の各公報、J.Appl.Phys.,95,5773(2004)などに記載されたものが挙げられる。 Alternatively, an impurity-doped electron transport layer having a high n property can be used. Examples thereof include JP-A-4-297076, JP-A-2000-196140, and JP-A-2001-102175; Appl. Phys. 95, 5773 (2004), and the like.
《陽極》
本発明の有機EL素子に係る陽極としては、仕事関数の大きい(4eV以上)金属、合金、電気伝導性化合物及びこれらの混合物を電極物質とするものが好ましく用いられる。このような電極物質の具体例としては、Au等の金属、CuI、インジウムチンオキシド(ITO)、SnO2、ZnO等の導電性透明材料が挙げられる。また、IDIXO(In2O3−ZnO)等非晶質で透明導電膜を作製可能な材料を用いてもよい。"anode"
As the anode according to the organic EL device of the present invention, an electrode having a work function (4 eV or more) metal, alloy, electrically conductive compound and a mixture thereof as an electrode material is preferably used. Specific examples of such electrode substances include metals such as Au, and conductive transparent materials such as CuI, indium tin oxide (ITO), SnO 2 , and ZnO. Alternatively, an amorphous material such as IDIXO (In 2 O 3 —ZnO) capable of forming a transparent conductive film may be used.
陽極はこれらの電極物質を蒸着やスパッタリング等の方法により、薄膜を形成させ、フォトリソグラフィー法で所望の形状のパターンを形成してもよく、あるいはパターン精度をあまり必要としない場合は(100μm以上程度)、上記電極物質の蒸着やスパッタリング時に所望の形状のマスクを介してパターンを形成してもよい。この陽極より発光を取り出す場合には、透過率を10%より大きくすることが望ましく、また陽極としてのシート抵抗は数百Ω/□以下が好ましい。更に膜厚は材料にもよるが、通常10〜1000nm、好ましくは10〜200nmの範囲で選ばれる。 For the anode, these electrode materials may be formed into a thin film by a method such as vapor deposition or sputtering, and a pattern having a desired shape may be formed by a photolithography method, or when the pattern accuracy is not required (about 100 μm or more) ), A pattern may be formed through a mask having a desired shape when the electrode material is deposited or sputtered. When light emission is extracted from the anode, it is desirable that the transmittance be greater than 10%, and the sheet resistance as the anode is preferably several hundred Ω / □ or less. Further, although the film thickness depends on the material, it is usually selected in the range of 10 to 1000 nm, preferably 10 to 200 nm.
《陰極》
一方、本発明に係る陰極としては、仕事関数の小さい(4eV以下)金属(電子注入性金属と称する)、合金、電気伝導性化合物及びこれらの混合物を電極物質とするものが用いられる。このような電極物質の具体例としては、ナトリウム、ナトリウム−カリウム合金、マグネシウム、リチウム、マグネシウム/銅混合物、マグネシウム/銀混合物、マグネシウム/アルミニウム混合物、マグネシウム/インジウム混合物、アルミニウム/酸化アルミニウム(Al2O3)混合物、インジウム、リチウム/アルミニウム混合物、希土類金属等が挙げられる。"cathode"
On the other hand, as the cathode according to the present invention, a cathode having a work function (4 eV or less) metal (referred to as an electron injecting metal), an alloy, an electrically conductive compound, and a mixture thereof is used. Specific examples of such electrode materials include sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture, magnesium / indium mixture, aluminum / aluminum oxide (Al 2 O 3 ) Mixtures, indium, lithium / aluminum mixtures, rare earth metals and the like.
これらの中で電子注入性及び酸化等に対する耐久性の点から、電子注入性金属とこれより仕事関数の値が大きく安定な金属である第二金属との混合物、例えば、マグネシウム/銀混合物、マグネシウム/アルミニウム混合物、マグネシウム/インジウム混合物、アルミニウム/酸化アルミニウム(Al2O3)混合物、リチウム/アルミニウム混合物、アルミニウム等が好適である。Among these, from the viewpoint of electron injecting property and durability against oxidation, etc., a mixture of an electron injecting metal and a second metal which is a stable metal having a larger work function than this, for example, a magnesium / silver mixture, magnesium / Aluminum mixtures, magnesium / indium mixtures, aluminum / aluminum oxide (Al 2 O 3 ) mixtures, lithium / aluminum mixtures, aluminum and the like are preferred.
陰極はこれらの電極物質を蒸着やスパッタリング等の方法により、薄膜を形成させることにより、作製することができる。また、陰極としてのシート抵抗は数百Ω/□以下が好ましく、膜厚は通常10〜1000nm、好ましくは50〜200nmの範囲で選ばれる。なお、発光を透過させるため、有機EL素子の陽極または陰極のいずれか一方が透明または半透明であれば、発光輝度が向上し好都合である。 The cathode can be produced by forming a thin film of these electrode materials by a method such as vapor deposition or sputtering. The sheet resistance as the cathode is preferably several hundred Ω / □ or less, and the film thickness is usually selected in the range of 10 to 1000 nm, preferably 50 to 200 nm. In order to transmit light, if either one of the anode or the cathode of the organic EL element is transparent or translucent, the light emission luminance is improved, which is convenient.
《基体(基板、基材、支持体等ともいう)》
本発明の有機EL素子に係る基体としては、ガラス、プラスチック等の種類には特に限定はなく、また透明のものであれば特に制限はないが、好ましく用いられる基板としては、例えば、ガラス、石英、光透過性樹脂フィルムを挙げることができる。特に好ましい基体は、有機EL素子にフレキシブル性を与えることが可能な樹脂フィルムである。<< Substrate (also referred to as substrate, substrate, support, etc.) >>
The substrate of the organic EL device of the present invention is not particularly limited as to the type of glass, plastic and the like, and is not particularly limited as long as it is transparent. Examples of the substrate preferably used include glass and quartz. And a light transmissive resin film. A particularly preferable substrate is a resin film that can give flexibility to the organic EL element.
樹脂フィルムとしては、例えば、ポリエチレンテレフタレート(PET)、ポリエチレンナフタレート(PEN)、ポリエーテルスルホン(PES)、ポリエーテルイミド、ポリエーテルエーテルケトン、ポリフェニレンスルフィド、ポリアリレート、ポリイミド、ポリカーボネート(PC)、セルローストリアセテート(TAC)、セルロースアセテートプロピオネート(CAP)等からなるフィルム等が挙げられる。 Examples of the resin film include polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), polyetherimide, polyetheretherketone, polyphenylene sulfide, polyarylate, polyimide, polycarbonate (PC), and cellulose. Examples include films made of triacetate (TAC), cellulose acetate propionate (CAP), and the like.
樹脂フィルムの表面には、無機物もしくは有機物の被膜またはその両者のハイブリッド被膜が形成されていてもよく、水蒸気透過率が0.01g/m2・day以下の高バリア性フィルムであることが好ましい。An inorganic or organic film or a hybrid film of both may be formed on the surface of the resin film, and it is preferably a high barrier film having a water vapor transmission rate of 0.01 g / m 2 · day or less.
本発明の有機エレクトロルミネッセンス素子の発光の室温における外部取り出し効率は1%以上であることが好ましく、より好ましくは5%以上である。ここに、外部取り出し量子効率(%)=有機EL素子外部に発光した光子数/有機EL素子に流した電子数×100である。 The external extraction efficiency at room temperature for light emission of the organic electroluminescence device of the present invention is preferably 1% or more, more preferably 5% or more. Here, the external extraction quantum efficiency (%) = the number of photons emitted to the outside of the organic EL element / the number of electrons sent to the organic EL element × 100.
照明用途で用いる場合には、発光ムラを低減させるために粗面加工したフィルム(アンチグレアフィルム等)を併用することもできる。 When used in lighting applications, a film (such as an antiglare film) that has been roughened to reduce unevenness in light emission can be used in combination.
《封止》
本発明の有機EL素子の封止に用いられる封止手段は、例えば、封止部材と電極、支持基盤とを接着剤で接着する方法がある。封止部材としては有機EL素子の表示領域を覆うように配置されておればよく、凹板状でも、平板状でもよい。また、透明性、電気絶縁性は特に限定されない。<Sealing>
As a sealing means used for sealing the organic EL element of the present invention, for example, there is a method of adhering a sealing member, an electrode, and a support base with an adhesive. The sealing member may be disposed so as to cover the display area of the organic EL element, and may be concave or flat. Moreover, transparency and electrical insulation are not particularly limited.
具体的にはガラス板、ポリマー板・フィルム、金属板・フィルム等が挙げられる。ガラス板は特にソーダ石灰ガラス、バリウム・ストロンチウム含有ガラス、鉛ガラス、アルミノケイ酸ガラス、ホウケイ酸ガラス、バリウムホウケイ酸ガラス、石英等を挙げることができる。 Specific examples include a glass plate, a polymer plate / film, and a metal plate / film. Examples of the glass plate include soda lime glass, barium / strontium-containing glass, lead glass, aluminosilicate glass, borosilicate glass, barium borosilicate glass, and quartz.
また、ポリマー板はポリカーボネート、アクリル、ポリエチレンテレフタレート、ポリエーテルサルファイド、ポリサルフォン等を挙げることができる。金属板としては、ステンレス、鉄、銅、アルミニウム、マグネシウム、ニッケル、亜鉛、クロム、チタン、モリブテン、シリコン、ゲルマニウム及びタンタルからなる群から選ばれる一種以上の金属または合金からなるものが挙げられる。本発明は素子を薄膜化できるということからポリマーフィルム、金属フィルムを好ましく使用することができる。 Examples of the polymer plate include polycarbonate, acrylic, polyethylene terephthalate, polyether sulfide, and polysulfone. Examples of the metal plate include those made of one or more metals or alloys selected from the group consisting of stainless steel, iron, copper, aluminum, magnesium, nickel, zinc, chromium, titanium, molybdenum, silicon, germanium, and tantalum. In the present invention, a polymer film and a metal film can be preferably used because the element can be thinned.
更にポリマーフィルムは酸素透過度が10-3ml/m2・24hr・MPa以下、水蒸気透過度(25℃、相対湿度90%RH)が10-5g/m2・24hr以下のものであることが好ましい。封止部材を凹状に加工するのはサンドブラスト加工、化学エッチング加工等が使われる。Further, the polymer film has an oxygen permeability of 10 −3 ml / m 2 · 24 hr · MPa or less and a water vapor permeability (25 ° C., relative humidity 90% RH) of 10 −5 g / m 2 · 24 hr or less. Is preferred. The sealing member is processed into a concave shape by sandblasting, chemical etching, or the like.
接着剤はアクリル酸系オリゴマー、メタクリル酸系オリゴマーの反応性ビニル基を有する光硬化及び熱硬化型接着剤、2−シアノアクリル酸エステルなどの湿気硬化型等の接着剤を挙げることができる。また、エポキシ系などの熱及び化学硬化型(二液混合)がある。また、ホットメルト型のポリアミド、ポリエステル、ポリオレフィンを挙げることができる。また、カチオン硬化タイプの紫外線硬化型エポキシ樹脂接着剤を挙げることができる。なお、有機EL素子が熱処理により劣化する場合があるので、室温から80℃までに接着硬化できるものが好ましい。また、前記接着剤中に乾燥剤を分散させておいてもよい。封止部分への接着剤の塗布は市販のディスペンサーを使ってもよいし、スクリーン印刷のように印刷してもよい。 Examples of the adhesive include photocuring and thermosetting adhesives having reactive vinyl groups such as acrylic acid oligomers and methacrylic acid oligomers, and moisture curing adhesives such as 2-cyanoacrylate. In addition, there are thermal and chemical curing types (two-component mixing) such as epoxy type. Moreover, hot-melt type polyamide, polyester, and polyolefin can be mentioned. Moreover, a cationic curing type ultraviolet curing epoxy resin adhesive can be mentioned. In addition, since an organic EL element may deteriorate by heat processing, what can be adhesive-hardened from room temperature to 80 degreeC is preferable. A desiccant may be dispersed in the adhesive. Application | coating of the adhesive agent to a sealing part may use commercially available dispenser, and may print like screen printing.
また、有機層を挟み支持基盤と対向する側の電極の外側に該電極と有機層を被覆し、支持基盤と接する形で無機物、有機物の層を形成し封止膜とすることも好ましい。この場合、該膜を形成する材料としては、水分や酸素など素子の劣化をもたらすものの浸入を抑制する機能を有する材料であればよく、例えば、酸化珪素、二酸化珪素、窒化珪素などを用いることができる。更に該膜の脆弱性を改良するために、これら無機層と有機材料からなる層の積層構造を持たせることが好ましい。 It is also preferable to cover the electrode and the organic layer on the outer side of the electrode facing the support substrate with the organic layer interposed therebetween, and form an inorganic or organic layer in contact with the support substrate to form a sealing film. In this case, the material for forming the film may be any material that has a function of suppressing intrusion of elements that cause deterioration of the element such as moisture and oxygen. For example, silicon oxide, silicon dioxide, silicon nitride, or the like is used. it can. Further, in order to improve the brittleness of the film, it is preferable to have a laminated structure of these inorganic layers and layers made of organic materials.
《保護膜、保護板》
有機層を挟み支持基盤と対向する側の前記封止膜、あるいは前記封止用フィルムの外側に、素子の機械的強度を高めるために保護膜、あるいは保護板を設けてもよい。特に封止が前記封止膜の場合にはその機械的強度は必ずしも高くないため、このような保護膜、保護板を設けることが好ましい。これに使用することができる材料は、前記封止に用いたのと同様なガラス板、ポリマー板・フィルム、金属板・フィルム等を用いることができるが、軽量且つ薄膜化ということからポリマーフィルムを用いることが好ましい。《Protective film, protective plate》
In order to increase the mechanical strength of the device, a protective film or a protective plate may be provided on the outer side of the sealing film on the side facing the support substrate with the organic layer interposed therebetween or the sealing film. In particular, when the sealing is the sealing film, the mechanical strength is not necessarily high, and thus it is preferable to provide such a protective film and a protective plate. As the material that can be used for this, the same glass plate, polymer plate / film, metal plate / film, and the like used for the sealing can be used. It is preferable to use it.
《有機EL素子の作製方法》
本発明の有機EL素子の作製方法の一例として、陽極/正孔注入層/正孔輸送層/発光層/正孔阻止層/電子輸送層/陰極からなる有機EL素子の作製法について説明する。まず適当な支持基盤上に所望の電極物質、例えば、陽極用物質からなる薄膜を1μm以下、好ましくは10〜200nmの膜厚になるように蒸着やスパッタリング等の方法により形成させて陽極を作製する。<< Method for producing organic EL element >>
As an example of the method for producing the organic EL device of the present invention, a method for producing an organic EL device comprising an anode / hole injection layer / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode will be described. First, a desired electrode material, for example, a thin film made of a material for an anode is formed on a suitable support base by a method such as vapor deposition or sputtering so as to have a film thickness of 1 μm or less, preferably 10 to 200 nm. .
次にこの上に、有機EL素子材料である正孔注入層、正孔輸送層、中間層、また発光層、正孔阻止層、電子輸送層の有機化合物薄膜を形成させる。この有機化合物薄膜の薄膜化の方法としては、前記の如く蒸着法、ウェットプロセス(スピンコート法、キャスト法、インクジェット法、印刷法)等があるが、均質な膜が得られやすく、且つピンホールが生成しにくい等の点から、真空蒸着法、スピンコート法、インクジェット法、印刷法が特に好ましい。更に層毎に異なる製膜法を適用してもよい。 Next, the organic compound thin film of the hole injection layer, the hole transport layer, the intermediate layer, and the light emitting layer, the hole blocking layer, and the electron transport layer, which are organic EL element materials, is formed thereon. As a method for thinning the organic compound thin film, there are a vapor deposition method and a wet process (spin coating method, casting method, ink jet method, printing method) as described above, but it is easy to obtain a uniform film and a pinhole. From the point of being difficult to form, a vacuum deposition method, a spin coating method, an ink jet method, and a printing method are particularly preferable. Further, different film forming methods may be applied for each layer.
製膜に蒸着法を採用する場合、その蒸着条件は使用する化合物の種類等により異なるが、一般にボート加熱温度50〜450℃、真空度10-6〜10-2Pa、蒸着速度0.01〜50nm/秒、基板温度−50〜300℃、膜厚0.1nm〜5μm、好ましくは5〜200nmの範囲で適宜選ぶことが望ましい。これらの層を形成後、その上に陰極用物質からなる薄膜を1μm以下、好ましくは50〜200nmの範囲の膜厚になるように、例えば、蒸着やスパッタリング等の方法により形成させ、陰極を設けることにより所望の有機EL素子が得られる。When employing a vapor deposition method for film formation, the vapor deposition conditions vary depending on the type of compound used, but generally a boat heating temperature of 50 to 450 ° C., a degree of vacuum of 10 −6 to 10 −2 Pa, and a vapor deposition rate of 0.01 to It is desirable to select appropriately within the range of 50 nm / second, substrate temperature −50 to 300 ° C., film thickness 0.1 nm to 5 μm, preferably 5 to 200 nm. After these layers are formed, a thin film made of a cathode material is formed thereon by a method such as vapor deposition or sputtering so as to have a film thickness of 1 μm or less, preferably 50 to 200 nm, and a cathode is provided. Thus, a desired organic EL element can be obtained.
この有機EL素子の作製は、一回の真空引きで一貫して正孔注入層から陰極まで作製してもよく、途中で取り出して異なる製膜法を施してもよい。その際、作業を乾燥不活性ガス雰囲気下で行う等の配慮が必要となる。また、作製順序を逆にして層順を逆に作製することも可能である。このようにして得られた多色の表示装置に直流電圧を印加する場合には、陽極を+、陰極を−の極性として電圧2〜40V程度を印加すると発光が観測できる。また、交流電圧を印加してもよい。なお、印加する交流の波形は任意でよい。 The organic EL element may be produced from a hole injection layer to a cathode consistently by a single evacuation, or may be taken out halfway and subjected to different film forming methods. At that time, it is necessary to consider that the work is performed in a dry inert gas atmosphere. It is also possible to reverse the layer order and reverse the layer order. When a DC voltage is applied to the multicolor display device thus obtained, light emission can be observed by applying a voltage of about 2 to 40 V with the anode as + and the cathode as-polarity. An alternating voltage may be applied. The alternating current waveform to be applied may be arbitrary.
《用途》
本発明の有機エレクトロルミネッセンス素子は、表示デバイス、ディスプレイ、各種発光光源として用いることができる。<Application>
The organic electroluminescence element of the present invention can be used as a display device, a display, or various light sources.
発光光源として、本発明の有機EL素子を用いる照明装置としては、家庭用照明、車内照明、時計や液晶用のバックライト、看板広告、信号機、光記憶媒体の光源、電子写真複写機の光源、光通信処理機の光源、光センサーの光源等が挙げられるがこれに限定するものではない。 Illumination devices that use the organic EL element of the present invention as a light-emitting light source include home lighting, interior lighting, backlights for watches and liquid crystals, billboard advertisements, traffic lights, light sources for optical storage media, light sources for electrophotographic copying machines, Examples include, but are not limited to, a light source of an optical communication processor and a light source of an optical sensor.
また、本発明の有機EL素子は照明用や露光光源のような1種のランプとして使用してもよいし、画像を投影するタイプのプロジェクション装置や、静止画像や動画像を直接視認するタイプの表示装置(ディスプレイ)として使用してもよい。 The organic EL element of the present invention may be used as a kind of lamp for illumination or exposure light source, a projection device that projects an image, or a type that directly recognizes a still image or a moving image. It may be used as a display device (display).
動画再生用の表示装置として使用する場合の駆動方式は、単純マトリクス(パッシブマトリクス)方式でもアクティブマトリクス方式でもどちらでもよい。 The driving method when used as a display device for moving image reproduction may be either a simple matrix (passive matrix) method or an active matrix method.
また、異なる発光色を有する本発明の有機EL素子を3種以上使用することにより、フルカラー表示装置を作製することが可能である。 Moreover, it is possible to produce a full-color display device by using three or more organic EL elements of the present invention having different emission colors.
または、一色の発光色、例えば、白色発光をカラーフィルターを用いてB、G、R光を取り出し、フルカラー化することも可能である。 Alternatively, it is also possible to extract a single emission color, for example, white emission using a color filter and extract B, G, and R light to make it full color.
更に、有機EL素子の発光色を色変換フィルターを用いて他色に変換し、フルカラー化することも可能であるが、その場合、有機EL発光のλmaxは480nm以下であることが好ましい。 Furthermore, the emission color of the organic EL element can be converted to another color by using a color conversion filter to obtain a full color. In that case, the λmax of the organic EL emission is preferably 480 nm or less.
以下、実施例により本発明を具体的に説明するが、本発明はこれらに限定されるものではない。 EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto.
実施例1
《有機EL素子1−1〜1−4の作製》
陽極として100mm×100mm×1.1mmのガラス基板上にITO(インジウムチンオキシド)を100nm製膜した基板(NHテクノグラス社製NA45)にパターニングを行った後、このITO透明電極を設けた透明支持基板をイソプロピルアルコールで超音波洗浄し、乾燥窒素ガスで乾燥し、UVオゾン洗浄を5分間行った。Example 1
<< Preparation of Organic EL Elements 1-1 to 1-4 >>
Transparent support provided with this ITO transparent electrode after patterning on a substrate (NH45 manufactured by NH Techno Glass) made of ITO (indium tin oxide) with a thickness of 100 nm on a glass substrate of 100 mm × 100 mm × 1.1 mm as an anode The substrate was ultrasonically cleaned with isopropyl alcohol, dried with dry nitrogen gas, and subjected to UV ozone cleaning for 5 minutes.
この透明支持基板を市販の真空蒸着装置の基板ホルダーに固定し、一方、モリブデン製抵抗加熱ボートにCuPcを200mg入れ、別のモリブデン製抵抗加熱ボートにα−NPDを200mg入れ、別のモリブデン製抵抗加熱ボートにH−1を100mg入れ、別のモリブデン製抵抗加熱ボートに化合物1−79を100mg入れ、更に別のモリブデン製抵抗加熱ボートにBAlqを200mg入れ、真空蒸着装置に取付けた。 This transparent support substrate is fixed to a substrate holder of a commercially available vacuum deposition apparatus, while 200 mg of CuPc is put into a molybdenum resistance heating boat, and 200 mg of α-NPD is put into another molybdenum resistance heating boat, and another molybdenum resistance is added. 100 mg of H-1 was put into a heating boat, 100 mg of compound 1-79 was put into another resistance heating boat made of molybdenum, and 200 mg of BAlq was put into another resistance heating boat made of molybdenum, and attached to a vacuum deposition apparatus.
次いで、真空槽を4×10-4Paまで減圧した後、CuPcの入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒で透明支持基板に蒸着し20nmの正孔注入層を設けた。更に、α−NPDの入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒、前記正孔注入層上に蒸着して20nmの正孔輸送層を設けた。Next, after reducing the pressure of the vacuum chamber to 4 × 10 −4 Pa, the heating boat containing CuPc was energized and heated, and deposited on the transparent support substrate at a deposition rate of 0.1 nm / second to form a 20 nm hole injection layer. Was provided. Further, the heating boat containing α-NPD was energized and heated, and was deposited on the hole injection layer at a deposition rate of 0.1 nm / second to provide a 20 nm hole transport layer.
次いで、H−1の入った前記加熱ボートと化合物1−79の入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒、0.012nm/秒で前記正孔輸送層上に共蒸着を開始し、化合物1−79の入った前記加熱ボートを調節し、陰極側での発光層に含まれる化合物1−79の含有濃度が3質量%となるように前記膜厚40nmの発光層を設けた。このとき、前記発光層内での化合物1−79の含有濃度は陽極側から陰極側へと連続的に変化している。 Next, the heating boat containing H-1 and the heating boat containing compound 1-79 are energized and heated, and deposited on the hole transport layer at a deposition rate of 0.1 nm / second and 0.012 nm / second. Co-evaporation is started, the heating boat containing compound 1-79 is adjusted, and light emission of 40 nm is performed so that the concentration of compound 1-79 contained in the light emitting layer on the cathode side is 3% by mass. A layer was provided. At this time, the concentration of the compound 1-79 in the light emitting layer continuously changes from the anode side to the cathode side.
また、次いでBAlqの入った前記加熱ボートに通電し、蒸着速度0.1nm/秒で前記発光層上に蒸着して、膜厚30nmの電子輸送層を設けた。なお、蒸着時の基板温度は室温であった。 Then, the heating boat containing BAlq was energized and deposited on the light emitting layer at a deposition rate of 0.1 nm / second to provide an electron transport layer having a thickness of 30 nm. In addition, the substrate temperature at the time of vapor deposition was room temperature.
引き続き陰極バッファー層としてフッ化リチウム0.5nmを蒸着し、更にアルミニウム110nmを蒸着して陰極を形成し、有機EL素子1−1を作製した。 Then, 0.5 nm of lithium fluoride was vapor-deposited as a cathode buffer layer, and also aluminum 110nm was vapor-deposited, the cathode was formed, and the organic EL element 1-1 was produced.
有機EL素子1−1の作製において、陽極側の化合物1−79の含有濃度と陰極側の化合物1−79の含有濃度を表2に示すようにした以外は、有機EL素子1−1と同じ方法で有機EL素子1−2〜1−4を作製した。 In the production of the organic EL element 1-1, the same as the organic EL element 1-1 except that the content concentration of the compound 1-79 on the anode side and the content concentration of the compound 1-79 on the cathode side are shown in Table 2. Organic EL devices 1-2 to 1-4 were prepared by the method.
H−1(ホスト材料)のイオン化ポテンシャル:5.45eV(計算)
化合物1−79(ドーパント材料)のイオン化ポテンシャル:4.33eV(計算)。Ionization potential of H-1 (host material): 5.45 eV (calculation)
Ionization potential of compound 1-79 (dopant material): 4.33 eV (calculation).
《有機EL素子1−1〜1−4の評価》
有機EL素子1−1〜1−4の評価を行い、その結果を表3に示す。表3に示した各素子の発光寿命は、各有機EL素子を正面輝度が1000cd/m2となる駆動電圧(V)で駆動し、輝度が半減するまでの時間をとって、有機EL素子1−4を100とする相対値で表した。<< Evaluation of Organic EL Elements 1-1 to 1-4 >>
The organic EL elements 1-1 to 1-4 are evaluated, and the results are shown in Table 3. The light emission lifetime of each element shown in Table 3 is determined by driving each organic EL element with a driving voltage (V) at which the front luminance is 1000 cd / m 2 and taking the time until the luminance is halved. -4 was expressed as a relative value with 100.
表3から、本発明の有機EL素子は長寿命であることがわかる。 From Table 3, it can be seen that the organic EL device of the present invention has a long lifetime.
実施例2
《有機EL素子2−1〜2−4の作製》
陽極として100mm×100mm×1.1mmのガラス基板上にITO(インジウムチンオキシド)を100nm製膜した基板(NHテクノグラス社製NA45)にパターニングを行った後、このITO透明電極を設けた透明支持基板をイソプロピルアルコールで超音波洗浄し、乾燥窒素ガスで乾燥し、UVオゾン洗浄を5分間行った。Example 2
<< Production of Organic EL Elements 2-1 to 2-4 >>
Transparent support provided with this ITO transparent electrode after patterning on a substrate (NH45 manufactured by NH Techno Glass) made of ITO (indium tin oxide) with a thickness of 100 nm on a glass substrate of 100 mm × 100 mm × 1.1 mm as an anode The substrate was ultrasonically cleaned with isopropyl alcohol, dried with dry nitrogen gas, and subjected to UV ozone cleaning for 5 minutes.
この透明支持基板を市販の真空蒸着装置の基板ホルダーに固定し、一方、モリブデン製抵抗加熱ボートにCuPcを200mg入れ、別のモリブデン製抵抗加熱ボートにα−NPDを200mg入れ、別のモリブデン製抵抗加熱ボートにH−1を100mg入れ、別のモリブデン製抵抗加熱ボートに化合物1−99を100mg入れ、更に別のモリブデン製抵抗加熱ボートにBAlqを200mg入れ、真空蒸着装置に取付けた。 This transparent support substrate is fixed to a substrate holder of a commercially available vacuum deposition apparatus, while 200 mg of CuPc is put into a molybdenum resistance heating boat, and 200 mg of α-NPD is put into another molybdenum resistance heating boat, and another molybdenum resistance is added. 100 mg of H-1 was placed in a heating boat, 100 mg of compound 1-99 was placed in another resistance heating boat made of molybdenum, and 200 mg of BAlq was placed in another resistance heating boat made of molybdenum, and attached to a vacuum deposition apparatus.
次いで、真空槽を4×10-4Paまで減圧した後、CuPcの入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒で透明支持基板に蒸着し20nmの正孔注入層を設けた。更に、α−NPDの入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒、前記正孔注入層上に蒸着して20nmの正孔輸送層を設けた。Next, after reducing the pressure of the vacuum chamber to 4 × 10 −4 Pa, the heating boat containing CuPc was energized and heated, and deposited on the transparent support substrate at a deposition rate of 0.1 nm / second to form a 20 nm hole injection layer. Was provided. Further, the heating boat containing α-NPD was energized and heated, and was deposited on the hole injection layer at a deposition rate of 0.1 nm / second to provide a 20 nm hole transport layer.
次いで、H−1の入った前記加熱ボートと化合物1−99の入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒、0.012nm/秒で前記正孔輸送層上に共蒸着を開始し、化合物1−99の入った前記加熱ボートを調節し、陰極側での発光層に含まれる化合物1−99の含有濃度が3質量%となるように前記膜厚40nmの発光層を設けた。このとき、前記発光層内での化合物1−99の含有濃度は陽極側から陰極側へと連続的に変化している。 Next, the heating boat containing H-1 and the heating boat containing compound 1-99 were energized and heated, and deposited on the hole transport layer at a deposition rate of 0.1 nm / second and 0.012 nm / second. Co-evaporation is started, the heating boat containing compound 1-99 is adjusted, and light emission of 40 nm is performed so that the concentration of compound 1-99 contained in the light emitting layer on the cathode side is 3% by mass. A layer was provided. At this time, the concentration of compound 1-99 in the light emitting layer is continuously changed from the anode side to the cathode side.
また、次いでBAlqの入った前記加熱ボートに通電し、蒸着速度0.1nm/秒で前記発光層上に蒸着して、膜厚30nmの電子輸送層を設けた。なお、蒸着時の基板温度は室温であった。 Then, the heating boat containing BAlq was energized and deposited on the light emitting layer at a deposition rate of 0.1 nm / second to provide an electron transport layer having a thickness of 30 nm. In addition, the substrate temperature at the time of vapor deposition was room temperature.
引き続き陰極バッファー層としてフッ化リチウム0.5nmを蒸着し、更にアルミニウム110nmを蒸着して陰極を形成し、有機EL素子2−1を作製した。 Then, 0.5 nm of lithium fluoride was vapor-deposited as a cathode buffer layer, and also aluminum 110nm was vapor-deposited, the cathode was formed, and the organic EL element 2-1 was produced.
有機EL素子2−1の作製において、陽極側の化合物1−99の含有濃度と陰極側の化合物1−99の含有濃度を表4に示すようにした以外は、有機EL素子2−1と同じ方法で有機EL素子2−2〜2−4を作製した。 In the production of the organic EL element 2-1, the same as the organic EL element 2-1, except that the concentration of the compound 1-99 on the anode side and the concentration of the compound 1-99 on the cathode side are as shown in Table 4. Organic EL elements 2-2 to 2-4 were prepared by the method.
H−1(ホスト材料)のイオン化ポテンシャル:5.45eV(計算)
化合物1−99(ドーパント材料)のイオン化ポテンシャル:4.36eV(計算)。Ionization potential of H-1 (host material): 5.45 eV (calculation)
Ionization potential of compound 1-99 (dopant material): 4.36 eV (calculation).
《有機EL素子2−1〜2−4の評価》
有機EL素子2−1〜2−4の評価を行い、その結果を表5に示す。表5に示した各素子の発光寿命は、各有機EL素子を正面輝度が1000cd/m2となる駆動電圧(V)で駆動し、輝度が半減するまでの時間をとって、有機EL素子2−4を100とする相対値で表した。<< Evaluation of Organic EL Elements 2-1 to 2-4 >>
The organic EL elements 2-1 to 2-4 were evaluated, and the results are shown in Table 5. The light emission lifetime of each element shown in Table 5 is determined by driving each organic EL element with a driving voltage (V) at which the front luminance is 1000 cd / m 2 and taking the time until the luminance is halved. -4 was expressed as a relative value with 100.
表5から、本発明の有機EL素子は長寿命であることがわかる。 From Table 5, it can be seen that the organic EL device of the present invention has a long lifetime.
実施例3
《有機EL素子3−1〜3−4の作製》
陽極として100mm×100mm×1.1mmのガラス基板上にITO(インジウムチンオキシド)を100nm製膜した基板(NHテクノグラス社製NA45)にパターニングを行った後、このITO透明電極を設けた透明支持基板をイソプロピルアルコールで超音波洗浄し、乾燥窒素ガスで乾燥し、UVオゾン洗浄を5分間行った。Example 3
<< Preparation of organic EL elements 3-1 to 3-4 >>
Transparent support provided with this ITO transparent electrode after patterning on a substrate (NH45 manufactured by NH Techno Glass) made of ITO (indium tin oxide) with a thickness of 100 nm on a glass substrate of 100 mm × 100 mm × 1.1 mm as an anode The substrate was ultrasonically cleaned with isopropyl alcohol, dried with dry nitrogen gas, and subjected to UV ozone cleaning for 5 minutes.
この透明支持基板を市販の真空蒸着装置の基板ホルダーに固定し、一方、モリブデン製抵抗加熱ボートにCuPcを200mg入れ、別のモリブデン製抵抗加熱ボートにα−NPDを200mg入れ、別のモリブデン製抵抗加熱ボートにH−1を100mg入れ、別のモリブデン製抵抗加熱ボートに化合物1−99を100mg入れ、更に別のモリブデン製抵抗加熱ボートにBAlqを200mg入れ、真空蒸着装置に取付けた。 This transparent support substrate is fixed to a substrate holder of a commercially available vacuum deposition apparatus, while 200 mg of CuPc is put into a molybdenum resistance heating boat, and 200 mg of α-NPD is put into another molybdenum resistance heating boat, and another molybdenum resistance is added. 100 mg of H-1 was placed in a heating boat, 100 mg of compound 1-99 was placed in another resistance heating boat made of molybdenum, and 200 mg of BAlq was placed in another resistance heating boat made of molybdenum, and attached to a vacuum deposition apparatus.
次いで、真空槽を4×10-4Paまで減圧した後、CuPcの入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒で透明支持基板に蒸着し20nmの正孔注入層を設けた。更に、α−NPDの入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒、前記正孔注入層上に蒸着して20nmの正孔輸送層を設けた。Next, after reducing the pressure of the vacuum chamber to 4 × 10 −4 Pa, the heating boat containing CuPc was energized and heated, and deposited on the transparent support substrate at a deposition rate of 0.1 nm / second to form a 20 nm hole injection layer. Was provided. Further, the heating boat containing α-NPD was energized and heated, and was deposited on the hole injection layer at a deposition rate of 0.1 nm / second to provide a 20 nm hole transport layer.
次いで、H−1の入った前記加熱ボートと化合物1−99の入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒、0.009nm/秒で前記正孔輸送層上に共蒸着を開始し、膜厚5nm蒸着し、更にH−1の入った前記加熱ボートと化合物1−99の入った前記加熱ボートに通電して加熱し、蒸着速度0.1nm/秒、0.006nm/秒で前記正孔輸送層上に共蒸着を開始し、膜厚35nm蒸着し、膜厚40nmの発光層を設けた。前記発光層内での化合物1−99の含有濃度は、陽極側から陰極側へと段階的に変化している。 Next, the heating boat containing H-1 and the heating boat containing compound 1-99 are energized and heated, and deposited on the hole transport layer at a deposition rate of 0.1 nm / second and 0.009 nm / second. Co-evaporation was started, the film thickness was 5 nm, and the heating boat containing H-1 and the heating boat containing compound 1-99 were energized and heated, and the deposition rate was 0.1 nm / sec. Co-evaporation was started on the hole transport layer at 006 nm / second, and a 35 nm-thick film was deposited to provide a 40 nm thick light-emitting layer. The concentration of compound 1-99 in the light emitting layer changes stepwise from the anode side to the cathode side.
また、次いでBAlqの入った前記加熱ボートに通電し、蒸着速度0.1nm/秒で前記発光層上に蒸着して、膜厚30nmの電子輸送層を設けた。なお、蒸着時の基板温度は室温であった。 Then, the heating boat containing BAlq was energized and deposited on the light emitting layer at a deposition rate of 0.1 nm / second to provide an electron transport layer having a thickness of 30 nm. In addition, the substrate temperature at the time of vapor deposition was room temperature.
引き続き陰極バッファー層としてフッ化リチウム0.5nmを蒸着し、更にアルミニウム110nmを蒸着して陰極を形成し、有機EL素子3−1を作製した。 Then, 0.5 nm of lithium fluoride was vapor-deposited as a cathode buffer layer, and also aluminum 110nm was vapor-deposited, the cathode was formed, and the organic EL element 3-1 was produced.
有機EL素子2−1の作製において、陽極側の化合物1−99の含有濃度と陰極側の化合物1−99の含有濃度を表6に示すようにした以外は、有機EL素子3−1と同じ方法で有機EL素子3−2から3−4を作製した。 In the production of the organic EL element 2-1, the same as the organic EL element 3-1, except that the content concentration of the compound 1-99 on the anode side and the content concentration of the compound 1-99 on the cathode side are shown in Table 6. Organic EL elements 3-2 to 3-4 were prepared by the method.
《有機EL素子3−1〜3−4の評価》
実施例1と同様に発光寿命の評価を行った。有機EL素子3−4を100としたときの相対値で示した。<< Evaluation of Organic EL Elements 3-1 to 3-4 >>
The light emission lifetime was evaluated in the same manner as in Example 1. The value is shown as a relative value when the organic EL element 3-4 is 100.
表7から、本発明の有機EL素子は長寿命であることがわかる。 From Table 7, it can be seen that the organic EL device of the present invention has a long lifetime.
実施例4
《有機EL素子4−1〜4−3の作製》
陽極として100mm×100mm×1.1mmのガラス基板上にITO(インジウムチンオキシド)を100nm製膜した基板(NHテクノグラス社製NA−45)にパターニングを行った後、このITO透明電極を設けた透明支持基板をイソプロピルアルコールで超音波洗浄し、乾燥窒素ガスで乾燥し、UVオゾン洗浄を5分間行った。Example 4
<< Production of Organic EL Elements 4-1 to 4-3 >>
After patterning on a substrate (NA-45 manufactured by NH Techno Glass Co., Ltd.) formed by depositing 100 nm of ITO (indium tin oxide) on a 100 mm × 100 mm × 1.1 mm glass substrate as an anode, this ITO transparent electrode was provided. The transparent support substrate was ultrasonically cleaned with isopropyl alcohol, dried with dry nitrogen gas, and subjected to UV ozone cleaning for 5 minutes.
この透明支持基板上に、ポリ(3,4−エチレンジオキシチオフェン)−ポリスチレンスルホネート(PEDOT/PSS、Bayer社製、Baytron P Al 4083)を純水で70%に希釈した溶液を3000rpm、30秒でスピンコート法により製膜した後、200℃にて1時間乾燥し、膜厚30nmの第1正孔輸送層を設けた。 On this transparent support substrate, a solution obtained by diluting poly (3,4-ethylenedioxythiophene) -polystyrene sulfonate (PEDOT / PSS, Bayer, Baytron P Al 4083) to 70% with pure water at 3000 rpm for 30 seconds. After the film formation by spin coating, the film was dried at 200 ° C. for 1 hour to provide a first hole transport layer having a thickness of 30 nm.
この基板を窒素雰囲気下に移し、第1正孔輸送層上に50mgのα−NPDを10mlのトルエンに溶解した溶液を1000rpm、30秒の条件下、スピンコート法により製膜し、第2正孔輸送層とした。 The substrate was transferred to a nitrogen atmosphere, and a solution of 50 mg α-NPD dissolved in 10 ml of toluene was formed on the first hole transport layer by spin coating at 1000 rpm for 30 seconds, and the second positive electrode was formed. A hole transport layer was formed.
この第2正孔輸送層上に、100mgのH−1と10mgの化合物1−99を10mlのトルエンに溶解した溶液を1000rpm、30秒の条件下、スピンコート法により製膜し、膜厚約20nmの第1発光層とした。更に、前記発光層上に100mgのH−1を10mlのトルエンに溶解した溶液を滴下し、1000rpm、30秒の条件下、スピンコート法により第2の発光層を製膜した。このとき、第1発光層から化合物1−99がトルエン溶媒により溶解し、第2の発光層へと拡散することで化合物1−99の含有量が連続的に変化し、陽極側の発光層における化合物1−99の含有量が陰極側の化合物1−99の含有量よりも大きい発光層を作製した。第1発光層と第2発光層を合わせた発光層の膜厚は、約50nmであった。 On this second hole transport layer, a solution prepared by dissolving 100 mg of H-1 and 10 mg of compound 1-99 in 10 ml of toluene was formed by spin coating at 1000 rpm for 30 seconds. A first light emitting layer having a thickness of 20 nm was obtained. Further, a solution obtained by dissolving 100 mg of H-1 in 10 ml of toluene was dropped on the light emitting layer, and a second light emitting layer was formed by spin coating under conditions of 1000 rpm and 30 seconds. At this time, the compound 1-99 is dissolved in the toluene solvent from the first light-emitting layer and diffused into the second light-emitting layer, whereby the content of the compound 1-99 is continuously changed. A light emitting layer was produced in which the content of compound 1-99 was larger than the content of compound 1-99 on the cathode side. The thickness of the combined light emitting layer of the first light emitting layer and the second light emitting layer was about 50 nm.
次に、この発光層上に50mgの(tBu)PBDを10mlのトルエンに溶解した溶液を1000rpm、30秒の条件下、スピンコート法により製膜し、60℃で1時間真空乾燥し、膜厚約25nmの電子輸送層とした。 Next, a solution obtained by dissolving 50 mg of (tBu) PBD in 10 ml of toluene on this light-emitting layer was formed by spin coating at 1000 rpm for 30 seconds, and vacuum-dried at 60 ° C. for 1 hour. The electron transport layer was about 25 nm.
これを真空蒸着装置に取付け、次いで真空槽を4×10-4Paまで減圧し、陰極バッファー層としてフッ化リチウム1.0nm及び陰極としてアルミニウム110nmを蒸着して陰極を形成し、有機EL素子4−1を作製した。This was attached to a vacuum deposition apparatus, and then the vacuum chamber was depressurized to 4 × 10 −4 Pa. Lithium fluoride 1.0 nm was deposited as a cathode buffer layer and aluminum 110 nm was deposited as a cathode to form a cathode. Organic EL element 4 -1 was produced.
比較例として、有機EL素子4−1において、第1発光層製膜時のトルエン溶液に含まれる化合物1−99の含有量を0mgとし、第2発光層製膜時のトルエン溶液に含まれる化合物1−99の含有量を10mgとした以外は、同様にして有機EL素子4−2を作製した。このときの発光層は、陽極側の化合物1−99の含有濃度は陰極側の化合物1−99の含有濃度よりも小さい。 As a comparative example, in the organic EL element 4-1, the content of the compound 1-99 contained in the toluene solution at the time of forming the first light emitting layer was 0 mg, and the compound contained in the toluene solution at the time of forming the second light emitting layer An organic EL element 4-2 was produced in the same manner except that the content of 1-99 was 10 mg. In this case, in the light emitting layer, the content concentration of the compound 1-99 on the anode side is smaller than the content concentration of the compound 1-99 on the cathode side.
更に比較例として、有機EL素子4−1において、第1発光層製膜時のトルエン溶液に含まれる化合物1−99の含有量を5mgとし、第2発光層を製膜しない以外は同様にして有機EL素子4−3を作製した。このときの発光層は、化合物1−99の含有濃度が陽極側から陰極側まで変化せず、均一である。 Further, as a comparative example, in the organic EL element 4-1, the content of compound 1-99 contained in the toluene solution at the time of forming the first light emitting layer was set to 5 mg, and the second light emitting layer was not formed in the same manner. Organic EL element 4-3 was produced. In this case, the light-emitting layer is uniform in that the concentration of compound 1-99 does not change from the anode side to the cathode side.
《有機EL素子4−1〜4−3の評価》
実施例1と同様に発光寿命の評価を行った。有機EL素子4−3を100としたときの相対値で示した。<< Evaluation of Organic EL Elements 4-1 to 4-3 >>
The light emission lifetime was evaluated in the same manner as in Example 1. The value is shown as a relative value when the organic EL element 4-3 is 100.
表8から、本発明の有機EL素子は、塗布型の有機EL素子においても長寿命化されていることがわかる。 From Table 8, it can be seen that the organic EL element of the present invention has a long life even in a coating type organic EL element.
Claims (10)
(式中、R1は置換基を表す。Zは5〜7員環を形成するのに必要な非金属原子群を表す。n1は0〜5の整数を表す。B1〜B5は炭素原子、窒素原子、酸素原子もしくは硫黄原子を表し、少なくとも一つは窒素原子を表す。M1は元素周期表における8〜10族の金属を表す。X1及びX2は炭素原子、窒素原子もしくは酸素原子を表し、L1はX1及びX2と共に2座の配位子を形成する原子群を表す。m1は1、2または3の整数を表し、m2は0、1または2の整数を表すが、m1+m2は2または3である。)In an organic electroluminescence device having at least a light-emitting layer containing a host material and a dopant material between an opposing cathode and an anode, the dopant material is represented by the following general formula (1), and the content concentration of the dopant material emits light. An organic electroluminescence element, wherein the thickness decreases from the anode side to the cathode side in the thickness direction of the layer.
(In the formula, R 1 represents a substituent. Z represents a group of nonmetallic atoms necessary to form a 5- to 7-membered ring. N1 represents an integer of 0 to 5. B 1 to B 5 represent carbon. Represents an atom, nitrogen atom, oxygen atom or sulfur atom, at least one represents a nitrogen atom, M 1 represents a group 8-10 metal in the periodic table, and X 1 and X 2 represent a carbon atom, nitrogen atom or Represents an oxygen atom, and L 1 represents an atomic group forming a bidentate ligand together with X 1 and X 2 , m1 represents an integer of 1, 2 or 3, m2 represents an integer of 0, 1 or 2 (Where m1 + m2 is 2 or 3)
式(1) Iph−Ipd≧0.7The ionization potential Iph of the host material and the ionization potential Ipd of the dopant material satisfy the following formula (1) in the light-emitting layer, according to any one of claims 1 to 5. Organic electroluminescence device.
Formula (1) Iph-Ipd ≧ 0.7
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