JPS649897U - - Google Patents
Info
- Publication number
- JPS649897U JPS649897U JP10443087U JP10443087U JPS649897U JP S649897 U JPS649897 U JP S649897U JP 10443087 U JP10443087 U JP 10443087U JP 10443087 U JP10443087 U JP 10443087U JP S649897 U JPS649897 U JP S649897U
- Authority
- JP
- Japan
- Prior art keywords
- ladder
- boom
- backstay
- post
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Jib Cranes (AREA)
- Ladders (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10443087U JPS649897U (pt) | 1987-07-09 | 1987-07-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10443087U JPS649897U (pt) | 1987-07-09 | 1987-07-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS649897U true JPS649897U (pt) | 1989-01-19 |
Family
ID=31336135
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10443087U Pending JPS649897U (pt) | 1987-07-09 | 1987-07-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS649897U (pt) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7781326B2 (en) | 2001-02-02 | 2010-08-24 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
| US7846840B2 (en) | 2000-06-28 | 2010-12-07 | Applied Materials, Inc. | Method for forming tungsten materials during vapor deposition processes |
| US9587310B2 (en) | 2001-03-02 | 2017-03-07 | Applied Materials, Inc. | Lid assembly for a processing system to facilitate sequential deposition techniques |
-
1987
- 1987-07-09 JP JP10443087U patent/JPS649897U/ja active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7846840B2 (en) | 2000-06-28 | 2010-12-07 | Applied Materials, Inc. | Method for forming tungsten materials during vapor deposition processes |
| US7781326B2 (en) | 2001-02-02 | 2010-08-24 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
| US9012334B2 (en) | 2001-02-02 | 2015-04-21 | Applied Materials, Inc. | Formation of a tantalum-nitride layer |
| US9587310B2 (en) | 2001-03-02 | 2017-03-07 | Applied Materials, Inc. | Lid assembly for a processing system to facilitate sequential deposition techniques |
| US10280509B2 (en) | 2001-07-16 | 2019-05-07 | Applied Materials, Inc. | Lid assembly for a processing system to facilitate sequential deposition techniques |