JPS6490250A - Radiation-sensitive resin composition - Google Patents

Radiation-sensitive resin composition

Info

Publication number
JPS6490250A
JPS6490250A JP24768087A JP24768087A JPS6490250A JP S6490250 A JPS6490250 A JP S6490250A JP 24768087 A JP24768087 A JP 24768087A JP 24768087 A JP24768087 A JP 24768087A JP S6490250 A JPS6490250 A JP S6490250A
Authority
JP
Japan
Prior art keywords
radiation
resin composition
sensitive resin
60mol
cresol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24768087A
Other languages
Japanese (ja)
Other versions
JPH0768435B2 (en
Inventor
Satoshi Miyashita
Hitoshi Oka
Takao Miura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP62247680A priority Critical patent/JPH0768435B2/en
Publication of JPS6490250A publication Critical patent/JPS6490250A/en
Publication of JPH0768435B2 publication Critical patent/JPH0768435B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Abstract

PURPOSE:To obtain the title composition for circuits of a high degree of integration, excellent in sensitivity, resolution and developability, by mixing a specified alkali-soluble novolac resin with a specified 1,2-quinonediazide compound. CONSTITUTION:This radiation-sensitive resin composition comprises and alkali- soluble novolac resin (A) obtained by polycondensing a phenol containing 20-80mol.% m-cresol, 5-60mol.% p-cresol and 5-60mol.% polyalkylphenol selected from among 2,3- and 3,4-dimethylphenol, 2,3,5-trimethylphenol, etc. with an aldehyde, and satisfying the relationships: a/b=0-1.5, and c/b=0.4-2 wherein a, b and c are the maximum heights of the peaks falling in the ranges of weight-average MWs (in terms of PS) of 6,300-25,000, 2,500-6,000 and 150-900, when determined by a gel permeation chromatography in which a monodisperse PS is used as a standard and a 1,2-quinonediazide compound (B) comprising 1,2-naphthoquinonediazide-5-sulfonic ester of tetrahydroxybenzo phenone.
JP62247680A 1987-09-30 1987-09-30 Radiation-sensitive resin composition Expired - Fee Related JPH0768435B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62247680A JPH0768435B2 (en) 1987-09-30 1987-09-30 Radiation-sensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62247680A JPH0768435B2 (en) 1987-09-30 1987-09-30 Radiation-sensitive resin composition

Publications (2)

Publication Number Publication Date
JPS6490250A true JPS6490250A (en) 1989-04-06
JPH0768435B2 JPH0768435B2 (en) 1995-07-26

Family

ID=17167054

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62247680A Expired - Fee Related JPH0768435B2 (en) 1987-09-30 1987-09-30 Radiation-sensitive resin composition

Country Status (1)

Country Link
JP (1) JPH0768435B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02275955A (en) * 1988-07-07 1990-11-09 Sumitomo Chem Co Ltd Positive type radiation sensitive resist composition
US5237037A (en) * 1989-09-08 1993-08-17 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions containing fully substituted novolak polymers
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
JPH07126354A (en) * 1993-10-29 1995-05-16 Sumitomo Metal Mining Co Ltd High-molecular-weight phenol resin and synthesizing method of the same using enzyme catalyst
EP0595361A3 (en) * 1992-10-30 1997-04-02 Matsushita Electric Ind Co Ltd Method of forming micropatterns
US5736292A (en) * 1989-08-24 1998-04-07 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5792585A (en) * 1898-10-05 1998-08-11 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
JPH02275955A (en) * 1988-07-07 1990-11-09 Sumitomo Chem Co Ltd Positive type radiation sensitive resist composition
US5736292A (en) * 1989-08-24 1998-04-07 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups
US5783355A (en) * 1989-08-24 1998-07-21 Sumitomo Chemical Company, Limited Radiation-sensitive positive resist composition
US5237037A (en) * 1989-09-08 1993-08-17 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions containing fully substituted novolak polymers
EP0701169A1 (en) * 1989-09-08 1996-03-13 Ocg Microelectronic Materials, Inc. Radiation-sensitive compositions containing fully substituted novolak polymers
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
EP0595361A3 (en) * 1992-10-30 1997-04-02 Matsushita Electric Ind Co Ltd Method of forming micropatterns
JPH07126354A (en) * 1993-10-29 1995-05-16 Sumitomo Metal Mining Co Ltd High-molecular-weight phenol resin and synthesizing method of the same using enzyme catalyst

Also Published As

Publication number Publication date
JPH0768435B2 (en) 1995-07-26

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees