JPS6488535A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS6488535A
JPS6488535A JP62244045A JP24404587A JPS6488535A JP S6488535 A JPS6488535 A JP S6488535A JP 62244045 A JP62244045 A JP 62244045A JP 24404587 A JP24404587 A JP 24404587A JP S6488535 A JPS6488535 A JP S6488535A
Authority
JP
Japan
Prior art keywords
composition
title composition
absorbing agent
antihalation effect
compd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62244045A
Other languages
Japanese (ja)
Inventor
Akitoshi Kumagai
Hiroichi Niki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP62244045A priority Critical patent/JPS6488535A/en
Publication of JPS6488535A publication Critical patent/JPS6488535A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Abstract

PURPOSE:To obtain the title composition capable of forming a photosensitive film having a good antihalation effect by incorporating a cyclic rubber, a bisazide compd. and an absorbing agent selected from specified compds. in the title composition. CONSTITUTION:The title composition contains the cyclic rubber, the bisazide compd., and the absorbing agent selected from the compd. shown by formula I (wherein R is alkyl group, X is halogen atom, phi is a benzene nucleus having one or two substituents). When the absorbing agent is incorporated in the photoresist, a fine pattern with the good reproducibility can be formed by the excellent antihalation effect, and a solvent contd. in the title composition is completely released, as said agent can be prebaked at 80-100 deg.C, without injuring the antihalation effect. Accordingly, the sticking property of the photoresist to a substrate can be improved. Thus, the antihalation effect of the title composition can be stably maintained at the time of exposing said composition, and a finer pattern with the good accuracy and reproducibility can be formed, and the allowable range of a lithographic process is enlarged, thereby easily making the handling of said composition.
JP62244045A 1987-09-30 1987-09-30 Photoresist composition Pending JPS6488535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62244045A JPS6488535A (en) 1987-09-30 1987-09-30 Photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62244045A JPS6488535A (en) 1987-09-30 1987-09-30 Photoresist composition

Publications (1)

Publication Number Publication Date
JPS6488535A true JPS6488535A (en) 1989-04-03

Family

ID=17112900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62244045A Pending JPS6488535A (en) 1987-09-30 1987-09-30 Photoresist composition

Country Status (1)

Country Link
JP (1) JPS6488535A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6594155B2 (en) 2001-03-21 2003-07-15 Nec Corporation Mounting structure of electronic parts
US10219054B2 (en) 2012-05-31 2019-02-26 Nitto Denko Corporation Protective member for acoustic component and waterproof case

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6594155B2 (en) 2001-03-21 2003-07-15 Nec Corporation Mounting structure of electronic parts
US10219054B2 (en) 2012-05-31 2019-02-26 Nitto Denko Corporation Protective member for acoustic component and waterproof case

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