JPS648564B2 - - Google Patents

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Publication number
JPS648564B2
JPS648564B2 JP59104748A JP10474884A JPS648564B2 JP S648564 B2 JPS648564 B2 JP S648564B2 JP 59104748 A JP59104748 A JP 59104748A JP 10474884 A JP10474884 A JP 10474884A JP S648564 B2 JPS648564 B2 JP S648564B2
Authority
JP
Japan
Prior art keywords
pipe
water
tank
header
filtration device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59104748A
Other languages
Japanese (ja)
Other versions
JPS60248206A (en
Inventor
Kyoshi Ootsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP59104748A priority Critical patent/JPS60248206A/en
Publication of JPS60248206A publication Critical patent/JPS60248206A/en
Publication of JPS648564B2 publication Critical patent/JPS648564B2/ja
Granted legal-status Critical Current

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  • Filtration Of Liquid (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、一般産業用水や排水などを過し
て浄化する過装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a filter device for filtering and purifying general industrial water, wastewater, and the like.

〔従来技術〕[Prior art]

(解決しようとする問題点) 従来、この種の過装置としては既に数多く公
知されている。過装置の過槽に充填された
材が汚染されて目詰りが生じると、過能力が低
下するので、汚染された材を新しい材と交換
するか、上水処理場等で一般的に公知の、または
特開昭51−79051、実公昭55−4016等で開示され
ているような、逆洗浄を行なつて目詰りを生じさ
せた汚染物質を除去する種々な方法で過能力の
回復を図つている。
(Problems to be Solved) Many such devices have been known in the past. If the material filled in the overtank of the filtration system becomes contaminated and becomes clogged, the overcapacity will decrease, so either replace the contaminated material with new material, or use the commonly known method at water treatment plants, etc. Or, as disclosed in Japanese Unexamined Patent Publication No. 51-79051, Japanese Utility Model Publication No. 55-4016, etc., the overcapacity can be recovered by various methods of backwashing to remove the contaminants that caused the clogging. It's on.

前者の場合は、過材交換に相当の工数必要と
し、交換頻度に応じてそれなりの設備を必要と
し、かつ過工程を連続的に行うことができな
い。
In the former case, a considerable number of man-hours are required to replace the overfill, a certain amount of equipment is required depending on the frequency of replacement, and the overfill process cannot be carried out continuously.

後者の場合は、厄介な逆洗操作が必要となり
過工程を断続的に中止しなければならず、しかも
逆洗浄のために過した浄水を再使用することに
なるという問題があつた。
In the latter case, a troublesome backwashing operation is required, and the process has to be stopped intermittently, and the purified water used for backwashing has to be reused.

また、改良された過装置として、特公昭51−
41708で開示されているような連続過装置があ
り、汚染材を分離槽へ送つて洗浄後に回収する
方法が提案されているが、過材を循環させるた
めに浄化加圧水を常時エジエクタに通水しなけれ
ばならないという問題があつた。
In addition, as an improved filtering device,
41708, and a method has been proposed in which contaminated material is sent to a separation tank and recovered after cleaning. There was a problem that I had to do it.

〔問題点を解決するための手段〕[Means for solving problems]

本発明は、上記のような問題を解決するために
なされたもので、下方が逆錐状に上方が逆漏斗状
になつて開口される過槽を内設する過装置本
体上に、汚染物質と材を分離するヘツダを設
け、このヘツダに過槽底部に開口をもつて立ち
上る上昇管とサイフオン現象で分離された汚染物
質を排出する下降管と、始動時にサイフオンを形
成するための止弁を介してエジエクタに連結され
る負圧管とを接続し、さらに、原水の流入方向を
最適化する環状分流室を設け、流入原水のもつ水
頭エネルギのみで材の過能力を連続的に回復
できるようにしたことを特徴とした連続過装置
を提供するものである。
The present invention has been made to solve the above-mentioned problems.The present invention has been made in order to solve the above-mentioned problems. The header is equipped with a rising pipe that opens at the bottom of the tank and rises up, a descending pipe that discharges the pollutants separated by the siphon phenomenon, and a stop valve that forms a siphon at the time of startup. A negative pressure pipe is connected to the ejector through the pipe, and an annular distribution chamber is installed to optimize the inflow direction of the raw water, so that the overcapacity of the material can be continuously recovered using only the head energy of the inflowing raw water. The present invention provides a continuous filtration device characterized by the following features.

〔実施例〕〔Example〕

(作用) 本発明による一実施例を図により詳細に説明す
る。図において、1は角筒状または円筒状に形成
され上下が密閉された連続過装置本体、2は上
方が開口されて逆漏斗状に中央部が装置本体1と
同一構造に下方が小径胴部に続いて逆錐状に形成
された過槽本体、2aは砂等でなる材aを充
填した材層、2bは過された浄水の溜り部、
2cは浄水の溢流孔、2dは材ブロー用材、3
は原水分流室、3dは原水分流孔、3b,3cは
原水流出孔、4は原水流入室、5は原水導入管、
6は浄水流出室、7は浄水導出管で一部大気開放
となる、8は上昇管、8aは下端開口、9は洗浄
された材と汚染物質を分離するヘツダ、10は
ロータリバルブ、11は電動モータ、12は材
回収管、13は汚濁水下降管、14は負圧管、1
5は負圧発生用のエジエクタ、16は加圧水供給
管、16a,16bは加圧水の分岐管、17は汚
濁水槽、17aは溢流堰、14a,16c,16
dは止弁、である。
(Operation) An embodiment of the present invention will be described in detail with reference to the drawings. In the figure, 1 is a main body of the continuous filtration device that is formed into a rectangular or cylindrical shape and is sealed at the top and bottom, and 2 is a reverse funnel-shaped central part with an opening at the top, the same structure as the main body 1, and a small diameter body at the bottom. Next, there is an overtank main body formed in an inverted cone shape, 2a is a material layer filled with material a made of sand, etc., 2b is a reservoir for filtered purified water,
2c is a clean water overflow hole, 2d is a material for blowing wood, 3
is a raw water flow chamber, 3d is a raw water flow hole, 3b, 3c are raw water outflow holes, 4 is a raw water inflow chamber, 5 is a raw water introduction pipe,
6 is a purified water outflow chamber, 7 is a purified water outlet pipe that is partially open to the atmosphere, 8 is a rising pipe, 8a is a bottom opening, 9 is a header that separates the cleaned material and pollutants, 10 is a rotary valve, and 11 is a Electric motor, 12 is a material recovery pipe, 13 is a polluted water down pipe, 14 is a negative pressure pipe, 1
5 is an ejector for generating negative pressure, 16 is a pressurized water supply pipe, 16a, 16b are pressurized water branch pipes, 17 is a polluted water tank, 17a is an overflow weir, 14a, 16c, 16
d is a stop valve.

そして、過槽2には、その上方の逆漏斗形の
傾斜部まで材aが充填されて材層2aが形成
され、原水分流室3内には、やや大径の合成樹脂
材等でなる球体3dが充填されて、分流が均等に
行われるようにする。
The overtank 2 is filled with the material a up to the inverted funnel-shaped slope above it, forming a material layer 2a, and the raw water flow chamber 3 contains a sphere made of a synthetic resin material with a slightly large diameter. 3d is filled to ensure even diversion.

ここで、上昇管8の下端開口8aは過槽2の
逆錐状底部に近接して位置され、回収管12の下
端は溢流孔2cよりも所定水頭だけ低く位置さ
れ、汚濁水槽17は過槽2の溢流孔2cとの水
頭差で所定のサイフオン流速が形成されるように
相対的に低く位置され、かつ下降管13の下端を
水シールする深さレベルまで汚濁水を貯溜する。
Here, the lower end opening 8a of the riser pipe 8 is located close to the inverted conical bottom of the overflow tank 2, the lower end of the recovery pipe 12 is located lower than the overflow hole 2c by a predetermined water head, and the polluted water tank 17 is It is located relatively low so that a predetermined siphon flow velocity is formed due to the water head difference with the overflow hole 2c of the tank 2, and polluted water is stored to a depth level that seals the lower end of the downcomer pipe 13.

このように構成された連続過装置の動作につ
いて説明する。
The operation of the continuous filtration device configured in this way will be explained.

先ず、過を開始するにあたり、弁16dを開
いて加圧水を過槽2内に供給し、溢流孔2cよ
り溢流するようなレベルまで張込んで、回収管1
2の下端が所定深さになるようにする。同時に、
汚濁水槽17には適宜用水を注入し、溢流堰17
aまで貯溜して下降管13の下端開口部を水シー
ルする。
First, to start filtration, open the valve 16d to supply pressurized water into the filtration tank 2, fill it to a level where it overflows from the overflow hole 2c, and then drain the recovery pipe 1.
2 so that the lower end is at a predetermined depth. at the same time,
Water is injected into the polluted water tank 17 as appropriate, and the overflow weir 17 is
The water is stored up to a point a and the lower end opening of the downcomer pipe 13 is sealed with water.

次に、止弁16c,14aを開いて加圧水をエ
ジエクタ15へ供給すると、加圧水の噴射でエジ
エクタ15は負圧を発生し、負圧管14を介して
ヘツダ9内に負圧にする。この負圧により、過
槽2の浄水溜り2bまで張込まれた水はロータリ
バルブ10の僅かな間隙を通して回収管12を経
てヘツダ9に吸上げられ、やがてヘツダ9内を、
続いて下降管13、負圧管14を充満して、ヘツ
ダ9を介して上昇管8と下降管13との間にサイ
フオンを完成する。
Next, when the stop valves 16c and 14a are opened to supply pressurized water to the ejector 15, the ejector 15 generates negative pressure by jetting the pressurized water, and the negative pressure is applied to the inside of the header 9 via the negative pressure pipe 14. Due to this negative pressure, the water that has filled up to the purified water reservoir 2b of the overtank 2 is sucked up into the header 9 through the recovery pipe 12 through a small gap in the rotary valve 10, and eventually flows inside the header 9.
Subsequently, the downcomer pipe 13 and negative pressure pipe 14 are filled, and a siphon is completed between the riser pipe 8 and the downcomer pipe 13 via the header 9.

このサイフオンが完成されると、止弁14a,
16c,16dを閉じ、原水導入管5より処理す
べき原水を、流入室4を経て原水分流室3に送り
込むと、充填された球体3dにより側面および上
面に設けた複数の流出孔3b,3cへの圧力が均
等化され、夫々の流出孔3b,3cから所定の方
向に分流されて過層2a内を通流して過を受
ける。
When this siphon is completed, the stop valve 14a,
16c and 16d are closed and the raw water to be treated is sent from the raw water introduction pipe 5 to the raw water flow chamber 3 via the inflow chamber 4, and the filled spheres 3d flow into the plurality of outflow holes 3b and 3c provided on the side and top surfaces. The pressure is equalized, the flow is divided in a predetermined direction from the respective outflow holes 3b and 3c, flows through the overlayer 2a, and undergoes filtration.

そして、過された浄水は溢流孔2cから溢流
し流出室6を経て大気開放されている導出管7よ
り導出される。
The filtered purified water then overflows from the overflow hole 2c, passes through the outflow chamber 6, and is led out from the outflow pipe 7 which is open to the atmosphere.

一方、過層2a底部の汚染された材aは、
サイフオン現象による上昇管8の上昇水流によ
り、下端開口部8aより流入原水に随伴されて吸
い込まれ、揚上されてヘツダ9に入る。この揚上
中に、汚染された材aは、乱流しながら上昇す
る水流との摩擦作用、材間相互の衝突、上昇管
8内壁との衝突等により汚染物質を分離して洗浄
され、ヘツダ9における流速低下で下方に沈降
し、ロータリバルブ10を洩れるようにして上昇
する浄水流で、汚濁水による再汚染を阻止されな
がら堆積し、電動モータ11で駆動されるロータ
リバルブ10の回転により、回収管12を経て
過層2aの上面へ戻される。
On the other hand, the contaminated material a at the bottom of the overlayer 2a is
Due to the rising water flow of the riser pipe 8 due to the siphon phenomenon, it is sucked in along with the incoming raw water from the lower end opening 8a, and is lifted up and enters the header 9. During this lifting, the contaminated material a is washed by separating contaminants by friction with the turbulent rising water flow, collisions between the materials, collision with the inner wall of the rising pipe 8, etc. As the flow velocity decreases, the flow of purified water sinks downward, leaks through the rotary valve 10 and rises, and the purified water is deposited while being prevented from being recontaminated by polluted water, and is recovered by the rotation of the rotary valve 10 driven by the electric motor 11. It is returned to the upper surface of the superlayer 2a via the tube 12.

一方、汚染物質を含む汚濁水は、サイフオン作
用により下降管13を経て汚濁水槽17へ排出さ
れる。
On the other hand, the polluted water containing pollutants is discharged to the polluted water tank 17 via the downcomer pipe 13 due to the siphon action.

この時、サイフオン作用による上昇水流および
下降水流は、原水導入管5の水頭、即ち過層2
aの通流抵抗水頭と、溢流孔2cと汚濁水槽17
の溢流堰17aとの間の水頭差でその速度が定め
られる。上述のようにすると、得られる水頭が大
きくなるように構成できるので、材aの比重を
大きくすることが可能となり、過速度を高める
ことができる。
At this time, the rising water flow and the descending water flow due to the siphon action are equal to the water head of the raw water introduction pipe 5, that is, the overlayer 2
Flow resistance head of a, overflow hole 2c and polluted water tank 17
The speed is determined by the head difference between the overflow weir 17a and the overflow weir 17a. By doing so as described above, the water head obtained can be constructed to be large, so that the specific gravity of the material a can be increased, and the overspeed can be increased.

また、過された浄水は溢流孔2cより自然流
下の形となるので、通流中の原水で材aが浮動
して過性能を低下させるような問題は生じな
い。
Moreover, since the filtered purified water flows down by gravity from the overflow hole 2c, there is no problem such as floating of the material a in flowing raw water and deterioration of overperformance.

さらに、原水分流室3を設けたので、流入する
原水は各方向に分流され、過層2aを通流する
原水は均等に分布されると共に、材aが隅部等
に滞溜することなく上昇管8への吸込みに応じ
て、均等にかつスムースに沈下するようになり、
過性能を良好に維持することができる。
Furthermore, since the raw water flow chamber 3 is provided, the raw water flowing in is divided in each direction, the raw water flowing through the overlayer 2a is evenly distributed, and the material a rises without accumulating in corners etc. It sinks evenly and smoothly according to the suction into the pipe 8,
It is possible to maintain superior performance.

〔発明の効果〕〔Effect of the invention〕

以上、詳述したように、本発明によると、処理
すべき原水の過を連続的に行なえ、この連続
過中に汚染された材を、導入された原水自体が
もつ水頭エネルギで、過層下部から洗浄しなが
ら分離槽まで揚上して過層上面へ戻すように構
成しているので、省エネルギ化しうると共に過
された浄水ロスをなくすことができる。
As described in detail above, according to the present invention, raw water to be treated can be continuously filtered, and materials contaminated during this continuous filtering can be removed from the lower part of the superlayer using the hydraulic head energy of the introduced raw water itself. Since the water is lifted up to the separation tank while being washed and returned to the upper surface of the overlayer, it is possible to save energy and eliminate loss of purified water.

また、サイフオン作用を行う水頭を適当に選定
することにより、材比重を高めて過速度を従
来の過装置に較べ約5倍程度に高めることがで
きる。
In addition, by appropriately selecting the water head that performs the siphon action, it is possible to increase the specific gravity of the material and increase the overspeed to about five times that of conventional sieving devices.

このように、省エネルギ化され、かつ過速度
が高くしかも過性能を高く維持できるという効
果が得ることができる。
In this way, it is possible to achieve the effects of energy saving, high overspeed, and high overperformance.

【図面の簡単な説明】[Brief explanation of drawings]

図は連続過装置の構成を示す概略図。 1……連続過装置本体、2……過槽、2a
……過層、2b……浄水溜り部、2c……溢流
孔、2d……材ブロー口、3……原水分流室、
4……原水流入室、5……原水導入管、6……浄
水流出室、7……浄水導出管、8……上昇管、9
……ヘツダ、10……ロータリバルブ、11……
電動モータ、12……回収管、13……汚濁水下
降管、14……負圧管、15……エジエクタ、1
6……加圧水供給管、17……汚濁水槽、14
a,16c,16d……止弁。
The figure is a schematic diagram showing the configuration of a continuous filtration device. 1...Continuous filtration device main body, 2...Treasure tank, 2a
...superlayer, 2b...purified water reservoir, 2c...overflow hole, 2d...material blowing port, 3...raw water flow chamber,
4... Raw water inflow chamber, 5... Raw water inlet pipe, 6... Purified water outflow chamber, 7... Purified water outlet pipe, 8... Rising pipe, 9
... Header, 10 ... Rotary valve, 11 ...
Electric motor, 12... Recovery pipe, 13... Polluted water descending pipe, 14... Negative pressure pipe, 15... Ejector, 1
6... Pressurized water supply pipe, 17... Polluted water tank, 14
a, 16c, 16d...Stop valve.

Claims (1)

【特許請求の範囲】 1 密閉された過装置本体内に、上方が逆漏斗
状に開口されて上端縁近くに溢流孔を開口し、下
方が小径胴部を介して逆錐状に形成される過槽
を形成し、上記過装置本体の上部に密閉蓋を貫
通して配置され途中にロータリバルブを有する
材回収管を下方に接続するヘツダを載置し、上記
ヘツダに、上記過槽底部に連通する上昇管と、
上記過装置本体の下方に位置する汚濁水槽につ
ながる下降管とを接続してサイフオンを形成して
なることを特徴とする連続過装置。 2 始動時に、上記サイフオンを形成するために
加圧水により負圧を発生させるエジエクタと、上
記エジエクタと上記ヘツダ間を結ぶ負圧管と、上
記過槽内に水を張り込むための張込み管とを設
けたことを特徴とする特許請求の範囲第1項記載
の連続過装置。 3 上記過槽下部の小径胴部を囲繞するように
環状原水分流室を設けたことを特徴とする特許請
求の範囲第1項記載の連続過装置。
[Scope of Claims] 1 Inside the sealed main body of the filter device, the upper part is opened in the shape of an inverted funnel and an overflow hole is opened near the upper edge, and the lower part is formed in the shape of an inverted cone through a small diameter body. A header is placed on the upper part of the over-tank main body, and a header is placed on the upper part of the over-tank, and a header is placed on the upper part of the over-tank, and connects a material recovery pipe with a rotary valve in the middle downwardly. a riser pipe communicating with the
A continuous filtration device characterized in that a siphon is formed by connecting a descending pipe connected to a polluted water tank located below the main body of the filtration device. 2. An ejector that generates negative pressure with pressurized water to form the siphon at startup, a negative pressure pipe connecting the ejector and the header, and a filling pipe for filling water into the overtank are provided. A continuous filtration device according to claim 1, characterized in that: 3. The continuous filtration device according to claim 1, characterized in that an annular raw water flow chamber is provided so as to surround the small-diameter body of the lower part of the filtration tank.
JP59104748A 1984-05-25 1984-05-25 Continuous filtration device Granted JPS60248206A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59104748A JPS60248206A (en) 1984-05-25 1984-05-25 Continuous filtration device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59104748A JPS60248206A (en) 1984-05-25 1984-05-25 Continuous filtration device

Publications (2)

Publication Number Publication Date
JPS60248206A JPS60248206A (en) 1985-12-07
JPS648564B2 true JPS648564B2 (en) 1989-02-14

Family

ID=14389111

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59104748A Granted JPS60248206A (en) 1984-05-25 1984-05-25 Continuous filtration device

Country Status (1)

Country Link
JP (1) JPS60248206A (en)

Also Published As

Publication number Publication date
JPS60248206A (en) 1985-12-07

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