JPS6484111A - Calibrating method for accurate angle index - Google Patents
Calibrating method for accurate angle indexInfo
- Publication number
- JPS6484111A JPS6484111A JP24083887A JP24083887A JPS6484111A JP S6484111 A JPS6484111 A JP S6484111A JP 24083887 A JP24083887 A JP 24083887A JP 24083887 A JP24083887 A JP 24083887A JP S6484111 A JPS6484111 A JP S6484111A
- Authority
- JP
- Japan
- Prior art keywords
- ray
- angle index
- locking curve
- accurate angle
- recorded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
PURPOSE:To shorten a necessary time and to enable high-accuracy calibration by scanning only a part to be calibrated to the width of a locking curve. CONSTITUTION:A continuous X ray 2 emitted by an X-ray source 1 is stopped down through slits 31 and 32 into thin flux, which causes Bragg reflection on monochromators 41 and 42; and a monochromatic X ray 5 is mode incident on Ge crystal 7 mounted on a goniometer 6 where an accurate angle index is fitted. Then, a diffracted X ray 8 is mode incident on a counter 9 and the intensity at respective points of the locking curve is recorded on a recorder 11 through a measuring meter 10. The output of the accurate angle index, on the other hand, is recorded on a recorder 13 through an amplifier 12 and the angles at the respective points of the locking curve are recorded. The recording data of the recorders 11 and 13 are put together to measure the width of the locking curve at an optional angle position of the accurate index. This value is compared with a logical value to obtain an error in the accurate angle index, thereby performing the high-accuracy calibration.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24083887A JPS6484111A (en) | 1987-09-28 | 1987-09-28 | Calibrating method for accurate angle index |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24083887A JPS6484111A (en) | 1987-09-28 | 1987-09-28 | Calibrating method for accurate angle index |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6484111A true JPS6484111A (en) | 1989-03-29 |
Family
ID=17065454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24083887A Pending JPS6484111A (en) | 1987-09-28 | 1987-09-28 | Calibrating method for accurate angle index |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6484111A (en) |
-
1987
- 1987-09-28 JP JP24083887A patent/JPS6484111A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2724505B2 (en) | Optical attenuation calibration method and optical calibration device | |
ATE115721T1 (en) | METHOD AND ARRANGEMENT FOR CALIBRATION OF AN OPTICAL PYROMETER AND STANDARD PLATES THEREFOR. | |
US6281498B1 (en) | Infrared measuring gauges | |
Howard | Preliminary Solar Magnetograph Observations with Small Apertures. | |
JPS6484111A (en) | Calibrating method for accurate angle index | |
US3441349A (en) | Optical apparatus for measuring the light transmission of a sample body | |
Yoshioka et al. | X-ray analysis of stress in a localized area by use of imaging plate | |
US3816747A (en) | Method and apparatus for measuring lattice parameter | |
JPH02129534A (en) | Photochromic reaction measuring device | |
Kirk | Experimental features of residual stress measurement by X‐ray diffractometry | |
GB1241942A (en) | Improvements in or relating to the calibration of instruments | |
SU664496A1 (en) | Interference method of measuring taper of transparent plates | |
US2882787A (en) | Micro-measurement apparatus | |
JPS6423126A (en) | Multiple light source polarization analyzing method | |
JPS5618440A (en) | Measuring method for precision film thickness of silicon thin film grown on sapphire substrate | |
JPH052830Y2 (en) | ||
SU828041A1 (en) | Method of measuring monocrystal lattice period | |
SU800625A1 (en) | Method of determining mechanical stresses in the dielectric | |
Weeks | Optical measurement of ultrasonic fields | |
SU795159A1 (en) | Method of measuring absorption coefficient | |
JPH0443814Y2 (en) | ||
SU951207A1 (en) | Device for measuring pulse magnetic field strength | |
SU842519A1 (en) | Method of mono-crystal lattice parameter relative measuring | |
Xinghong et al. | New method for measurement of radiochromic optical waveguide (OWG) dosimeter | |
JPS6136931Y2 (en) |