JPS648261U - - Google Patents
Info
- Publication number
- JPS648261U JPS648261U JP10295487U JP10295487U JPS648261U JP S648261 U JPS648261 U JP S648261U JP 10295487 U JP10295487 U JP 10295487U JP 10295487 U JP10295487 U JP 10295487U JP S648261 U JPS648261 U JP S648261U
- Authority
- JP
- Japan
- Prior art keywords
- carriage
- turntable
- hooks
- chassis
- compact disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Supporting Of Heads In Record-Carrier Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10295487U JPS648261U (de) | 1987-07-03 | 1987-07-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10295487U JPS648261U (de) | 1987-07-03 | 1987-07-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS648261U true JPS648261U (de) | 1989-01-18 |
Family
ID=31333337
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10295487U Pending JPS648261U (de) | 1987-07-03 | 1987-07-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS648261U (de) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7456103B2 (en) | 2003-02-28 | 2008-11-25 | Fujitsu Limited | Etch-resistant film, forming method thereof, surface-modified resist pattern, forming method thereof, semiconductor device and manufacturing method thereof |
-
1987
- 1987-07-03 JP JP10295487U patent/JPS648261U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7456103B2 (en) | 2003-02-28 | 2008-11-25 | Fujitsu Limited | Etch-resistant film, forming method thereof, surface-modified resist pattern, forming method thereof, semiconductor device and manufacturing method thereof |
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