JPS6473071A - Continuous vacuum deposition device - Google Patents

Continuous vacuum deposition device

Info

Publication number
JPS6473071A
JPS6473071A JP22844587A JP22844587A JPS6473071A JP S6473071 A JPS6473071 A JP S6473071A JP 22844587 A JP22844587 A JP 22844587A JP 22844587 A JP22844587 A JP 22844587A JP S6473071 A JPS6473071 A JP S6473071A
Authority
JP
Japan
Prior art keywords
substrate
vacuum deposition
vacuum
sealing
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22844587A
Other languages
Japanese (ja)
Inventor
Yoshio Shimozato
Toshio Taguchi
Etsuro Hirai
Keiji Tanizaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP22844587A priority Critical patent/JPS6473071A/en
Publication of JPS6473071A publication Critical patent/JPS6473071A/en
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To deposit a metal by evaporation continuously on a long-sized traveling substrate at a high equipment operating rate by providing plural sealing parts consisting of sheet rolls and casings before and behind a vacuum deposition chamber at the time of depositing the metal by vacuum evaporation on the surface of the above-mentioned substrate. CONSTITUTION:While the long-sized traveling substrate such as paper or film is run in an arrow direction, the substrate is wound around a winding roll 6 in the vacuum deposition chamber 1 and the vapor 11 of the molten metal 9 in a crucible 8 provided in the lower part of the chamber is stuck as a vapor deposited film on the surface of the substrate 3. The substrate 3 enters a vacuum sealing device consisting of the plural differential pressure chambers 18 constituted of a pair of the sealing rolls 15, partition walls 30 and the casing 16. The substrate passes again through the vacuum sealing device 17 consisting of the plural differential pressure chambers 18 having the similar construction after the vapor deposition of the metallic film thereon and is taken out into the atm. While the traveling substrate 1 is wound around one of the sealing rolls, the substrate travels and since the vacuum deposition is thereby continuously executed, the working rate of the vacuum deposition device is extremely higher than the working rate of a batch system.
JP22844587A 1987-09-14 1987-09-14 Continuous vacuum deposition device Pending JPS6473071A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22844587A JPS6473071A (en) 1987-09-14 1987-09-14 Continuous vacuum deposition device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22844587A JPS6473071A (en) 1987-09-14 1987-09-14 Continuous vacuum deposition device

Publications (1)

Publication Number Publication Date
JPS6473071A true JPS6473071A (en) 1989-03-17

Family

ID=16876604

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22844587A Pending JPS6473071A (en) 1987-09-14 1987-09-14 Continuous vacuum deposition device

Country Status (1)

Country Link
JP (1) JPS6473071A (en)

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