JPS646351A - High-frequency inductive coupling plasma mass spectrometer - Google Patents
High-frequency inductive coupling plasma mass spectrometerInfo
- Publication number
- JPS646351A JPS646351A JP62161593A JP16159387A JPS646351A JP S646351 A JPS646351 A JP S646351A JP 62161593 A JP62161593 A JP 62161593A JP 16159387 A JP16159387 A JP 16159387A JP S646351 A JPS646351 A JP S646351A
- Authority
- JP
- Japan
- Prior art keywords
- argon
- plasma
- gas
- peak
- nitrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
PURPOSE:To easily measure an element under measurement by using argon gas only when plasma is lit then using the mixed gas of argon and nitrogen or only nitrogen gas to maintain the lighting of plasma. CONSTITUTION:The compressed gas guided to the outermost chamber 4a, outer chamber 4b, and inner chamber 4c of a plasma torch 4 is constituted of only argon gas when plasma is lit and constituted of the mixed gas of argon and nitrogen or only nitrogen gas after plasma is lit. After plasma is generated using argon, the fourth-sixth valved flow meters 3a-3c are adjusted and gradually opened. Under this condition, the first-third flow meters 2a-2c are adjusted to gradually decrease the quantity of argon gas. simultaneously, whether the peak of argon (Ar) and the peak of the element being measured are overlapped or not is monitored in the mass spectrum, if the peak of argon (Ar) and the peak of the element being measured are not overlapped, the lighting of plasma 7 is maintained by the mixed gas composition at that time or only nitrogen gas. The element under measurement can be thereby measured easily and correctly.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62161593A JPH0736324B2 (en) | 1987-06-29 | 1987-06-29 | High frequency inductively coupled plasma / mass spectrometer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62161593A JPH0736324B2 (en) | 1987-06-29 | 1987-06-29 | High frequency inductively coupled plasma / mass spectrometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS646351A true JPS646351A (en) | 1989-01-10 |
| JPH0736324B2 JPH0736324B2 (en) | 1995-04-19 |
Family
ID=15738088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62161593A Expired - Lifetime JPH0736324B2 (en) | 1987-06-29 | 1987-06-29 | High frequency inductively coupled plasma / mass spectrometer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0736324B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5130537A (en) * | 1990-03-30 | 1992-07-14 | Hitachi, Ltd. | Plasma analyzer for trace element analysis |
| CN100425641C (en) * | 2004-03-29 | 2008-10-15 | 富士胶片株式会社 | Solution casting method |
-
1987
- 1987-06-29 JP JP62161593A patent/JPH0736324B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5130537A (en) * | 1990-03-30 | 1992-07-14 | Hitachi, Ltd. | Plasma analyzer for trace element analysis |
| CN100425641C (en) * | 2004-03-29 | 2008-10-15 | 富士胶片株式会社 | Solution casting method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0736324B2 (en) | 1995-04-19 |
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