JPS6460605A - Photopolymerizable composition - Google Patents

Photopolymerizable composition

Info

Publication number
JPS6460605A
JPS6460605A JP63171068A JP17106888A JPS6460605A JP S6460605 A JPS6460605 A JP S6460605A JP 63171068 A JP63171068 A JP 63171068A JP 17106888 A JP17106888 A JP 17106888A JP S6460605 A JPS6460605 A JP S6460605A
Authority
JP
Japan
Prior art keywords
photopolymerizable composition
photopolymerizable
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63171068A
Other languages
Japanese (ja)
Inventor
Arekusandaa Barufuoa Rosu
Aasaa Superii Jiyon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
MacDermid Autotype Ltd
Original Assignee
Autotype International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Autotype International Ltd filed Critical Autotype International Ltd
Publication of JPS6460605A publication Critical patent/JPS6460605A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/14—Polymers provided for in subclass C08G
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00—Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904—Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP63171068A 1987-07-11 1988-07-11 Photopolymerizable composition Pending JPS6460605A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB878716378A GB8716378D0 (en) 1987-07-11 1987-07-11 Photopolymerisable compositions

Publications (1)

Publication Number Publication Date
JPS6460605A true JPS6460605A (en) 1989-03-07

Family

ID=10620509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63171068A Pending JPS6460605A (en) 1987-07-11 1988-07-11 Photopolymerizable composition

Country Status (6)

Country Link
US (1) US5043362A (en)
EP (1) EP0299591B1 (en)
JP (1) JPS6460605A (en)
AU (1) AU611694B2 (en)
DE (1) DE3877441T2 (en)
GB (1) GB8716378D0 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017003911A (en) * 2015-06-15 2017-01-05 株式会社ムラカミ Photosensitive resin composition, photosensitive film, plate material for screen printing and photosensitive resist film

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NZ223178A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of being hot melt molded, printing plates therefrom and methods of preparation
NZ223177A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of hot melt molding and printing plate therefrom
AU639240B2 (en) * 1989-06-28 1993-07-22 Ajinomoto Co., Inc. Polyether acrylamide derivatives and active energy ray curable resin composition
DE4027301A1 (en) * 1990-08-29 1992-03-05 Hoechst Ag PHOTOPOLYMERIZABLE MIXTURE AND MADE FROM THIS PHOTOPOLYMERISABLE RECORDING MATERIAL
EP0493317B2 (en) * 1990-12-18 2001-01-10 Ciba SC Holding AG Radiosensitive composition on basis of water as solvent
ES2157494T3 (en) * 1996-02-20 2001-08-16 Asahi Chemical Ind PROCEDURE FOR THE MANUFACTURE OF PHOTOSENSIBLE RESIN PRINT PLATES.
US6770324B2 (en) 2001-04-06 2004-08-03 Kennedy Acquisition, Inc. Method of forming a non-uniform, protective coating on a flexible substrate
CA2731927C (en) * 2008-08-12 2016-10-11 Basf Se Dispersions of polyurethanes, their preparation and use

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2893868A (en) * 1955-08-22 1959-07-07 Du Pont Polymerizable compositions
US4228232A (en) * 1979-02-27 1980-10-14 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing ethylenically unsaturated oligomers
US4340686A (en) * 1979-05-29 1982-07-20 E. I. Du Pont De Nemours And Company Carbamated poly(vinyl alcohol) useful as a binder in elastomeric photopolymer compositions
GB2109392B (en) * 1981-11-03 1985-06-26 Sericol Group Ltd Photopolymerisable materials for use in producing screen printing stencils
US4418138A (en) * 1981-11-03 1983-11-29 Sericol Group Limited Photopolymerizable materials for use in producing stencils for screen printing
GB2127834B (en) * 1982-09-27 1985-12-04 Grace W R & Co A continuous process for making solid free-flowing water dispersible pva-aldehyde reaction product
US4523983A (en) * 1983-05-09 1985-06-18 W. R. Grace & Co. Reactive plastisol dispersion
NZ223178A (en) * 1987-01-17 1990-01-29 Nippon Paint Co Ltd Water-developable photosensitive resin composition capable of being hot melt molded, printing plates therefrom and methods of preparation

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017003911A (en) * 2015-06-15 2017-01-05 株式会社ムラカミ Photosensitive resin composition, photosensitive film, plate material for screen printing and photosensitive resist film

Also Published As

Publication number Publication date
DE3877441D1 (en) 1993-02-25
AU611694B2 (en) 1991-06-20
GB8716378D0 (en) 1987-08-19
AU1884188A (en) 1989-01-12
EP0299591B1 (en) 1993-01-13
EP0299591A3 (en) 1990-12-12
DE3877441T2 (en) 1993-05-13
US5043362A (en) 1991-08-27
EP0299591A2 (en) 1989-01-18

Similar Documents

Publication Publication Date Title
JPS6433104A (en) Photopolymerizable composition
EP0276016A3 (en) Photopolymerizable composition
DE3572673D1 (en) Photopolymerizable composition
EP0328036A3 (en) Photopolymerizable composition
GB8721936D0 (en) Composition
EP0300410A3 (en) Photopolymerizable composition
EP0284991A3 (en) Photopolymerizable dental composition
EP0292963A3 (en) Fiber-treatment composition
GB2203336B (en) Composition
EP0295211A3 (en) Photoresist composition
EP0315988A3 (en) Photopolymerizable composition
HUT51856A (en) Mollusquicid composition
EP0333224A3 (en) Photopolymerizable composition
GB8715191D0 (en) Composition
HK1006598A1 (en) Dye-sensitive photopolymerizable compositions
EP0249468A3 (en) Photopolymerizable composition
EG18594A (en) Shampo composition
GB2189496B (en) Photopolymerizable composition
JPS6460605A (en) Photopolymerizable composition
JPS6433108A (en) Photopolymerizable composition
GB8728389D0 (en) Photopolymerisable composition
GB8718528D0 (en) Photopolymerisable composition
EP0294220A3 (en) Photopolymerizable composition
JPS6462310A (en) Photopolymerizable composition
EP0337403A3 (en) Photopolymerizable compositions