JPS644481U - - Google Patents
Info
- Publication number
- JPS644481U JPS644481U JP9863887U JP9863887U JPS644481U JP S644481 U JPS644481 U JP S644481U JP 9863887 U JP9863887 U JP 9863887U JP 9863887 U JP9863887 U JP 9863887U JP S644481 U JPS644481 U JP S644481U
- Authority
- JP
- Japan
- Prior art keywords
- sided display
- reversal plate
- display
- magnetic
- magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000002441 reversible effect Effects 0.000 claims 1
Landscapes
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9863887U JPS644481U (bg) | 1987-06-27 | 1987-06-27 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9863887U JPS644481U (bg) | 1987-06-27 | 1987-06-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS644481U true JPS644481U (bg) | 1989-01-11 |
Family
ID=31325091
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9863887U Pending JPS644481U (bg) | 1987-06-27 | 1987-06-27 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS644481U (bg) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7446048B2 (en) | 2004-01-30 | 2008-11-04 | Matsushita Electric Industrial Co., Ltd. | Dry etching apparatus and dry etching method |
US7585386B2 (en) | 2003-02-03 | 2009-09-08 | Octec Inc. | Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
-
1987
- 1987-06-27 JP JP9863887U patent/JPS644481U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7585386B2 (en) | 2003-02-03 | 2009-09-08 | Octec Inc. | Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
US7446048B2 (en) | 2004-01-30 | 2008-11-04 | Matsushita Electric Industrial Co., Ltd. | Dry etching apparatus and dry etching method |
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