JPS6441128U - - Google Patents
Info
- Publication number
- JPS6441128U JPS6441128U JP13555387U JP13555387U JPS6441128U JP S6441128 U JPS6441128 U JP S6441128U JP 13555387 U JP13555387 U JP 13555387U JP 13555387 U JP13555387 U JP 13555387U JP S6441128 U JPS6441128 U JP S6441128U
- Authority
- JP
- Japan
- Prior art keywords
- pipe
- raw material
- vacuum
- vapor phase
- phase growth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002994 raw material Substances 0.000 claims description 8
- 238000001947 vapour-phase growth Methods 0.000 claims description 5
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987135553U JPH0627944Y2 (ja) | 1987-09-07 | 1987-09-07 | 気相成長装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1987135553U JPH0627944Y2 (ja) | 1987-09-07 | 1987-09-07 | 気相成長装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6441128U true JPS6441128U (US06265458-20010724-C00056.png) | 1989-03-13 |
JPH0627944Y2 JPH0627944Y2 (ja) | 1994-07-27 |
Family
ID=31395282
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1987135553U Expired - Lifetime JPH0627944Y2 (ja) | 1987-09-07 | 1987-09-07 | 気相成長装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0627944Y2 (US06265458-20010724-C00056.png) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06244120A (ja) * | 1993-02-19 | 1994-09-02 | Sony Corp | ウエハ処理装置におけるガス供給装置 |
JPH101776A (ja) * | 1996-06-10 | 1998-01-06 | Canon Inc | 半導体を作製する装置のガス供給方法および供給装置 |
JP2018006682A (ja) * | 2016-07-07 | 2018-01-11 | 昭和電工株式会社 | ガス配管システム、化学気相成長装置、成膜方法及びSiCエピタキシャルウェハの製造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5748850A (en) * | 1980-09-08 | 1982-03-20 | Fujitsu Ltd | Carrier reproducing circuit |
-
1987
- 1987-09-07 JP JP1987135553U patent/JPH0627944Y2/ja not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5748850A (en) * | 1980-09-08 | 1982-03-20 | Fujitsu Ltd | Carrier reproducing circuit |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06244120A (ja) * | 1993-02-19 | 1994-09-02 | Sony Corp | ウエハ処理装置におけるガス供給装置 |
JPH101776A (ja) * | 1996-06-10 | 1998-01-06 | Canon Inc | 半導体を作製する装置のガス供給方法および供給装置 |
JP2018006682A (ja) * | 2016-07-07 | 2018-01-11 | 昭和電工株式会社 | ガス配管システム、化学気相成長装置、成膜方法及びSiCエピタキシャルウェハの製造方法 |
WO2018008334A1 (ja) * | 2016-07-07 | 2018-01-11 | 昭和電工株式会社 | ガス配管システム、化学気相成長装置、成膜方法及びSiCエピタキシャルウェハの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JPH0627944Y2 (ja) | 1994-07-27 |