JPS6437018A - Plasma processor - Google Patents

Plasma processor

Info

Publication number
JPS6437018A
JPS6437018A JP19321687A JP19321687A JPS6437018A JP S6437018 A JPS6437018 A JP S6437018A JP 19321687 A JP19321687 A JP 19321687A JP 19321687 A JP19321687 A JP 19321687A JP S6437018 A JPS6437018 A JP S6437018A
Authority
JP
Japan
Prior art keywords
electrode sheets
grooves
processed
substrates
holder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19321687A
Other languages
Japanese (ja)
Other versions
JP2547035B2 (en
Inventor
Yoshinobu Hayashi
Shinpei Jinnai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Priority to JP62193216A priority Critical patent/JP2547035B2/en
Publication of JPS6437018A publication Critical patent/JPS6437018A/en
Application granted granted Critical
Publication of JP2547035B2 publication Critical patent/JP2547035B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

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  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To facilitate the installation and removal as well as the assembly and disassembly of substrates to be processed and electrode sheets by a method wherein grooves are cut at every specified intervals in an insulating holder with feeders built in the holder to be partly exposed while multiple plasma producing electrode sheets holding substrates to be processed are arranged to be connected to respective grooves. CONSTITUTION:Grooves 17a, 17b are cut at every specified intervals in an insulating holder 13 with feeder 12 built in the holder to be partly exposed. Multiple plasma producing electrode sheets 7 holding substrates to be processed are arranged to be connected to respective grooves 17a, 17b. Through these procedures, the substrates 2 to be processed and the electrode sheets 7 can be easily installed and removed as well as assembled and disassembled while any defective contact failure can be avoided due to the direct connection of electrode sheets 7 to the grooves 17a, 17b with the feeders 12 in the exposed state.
JP62193216A 1987-07-31 1987-07-31 Plasma processing device Expired - Lifetime JP2547035B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62193216A JP2547035B2 (en) 1987-07-31 1987-07-31 Plasma processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62193216A JP2547035B2 (en) 1987-07-31 1987-07-31 Plasma processing device

Publications (2)

Publication Number Publication Date
JPS6437018A true JPS6437018A (en) 1989-02-07
JP2547035B2 JP2547035B2 (en) 1996-10-23

Family

ID=16304238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62193216A Expired - Lifetime JP2547035B2 (en) 1987-07-31 1987-07-31 Plasma processing device

Country Status (1)

Country Link
JP (1) JP2547035B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007223277A (en) * 2006-02-27 2007-09-06 Seiko Epson Corp Fixture for surface treatment, method of surface treatment, method for manufacturing liquid ejection head, and method for manufacturing liquid droplet ejection apparatus
JP2014118631A (en) * 2012-12-19 2014-06-30 Kaneka Corp Substrate holder and method of manufacturing solar cell substrate
CN109082649A (en) * 2018-09-06 2018-12-25 深圳市捷佳伟创新能源装备股份有限公司 A kind of loading device of stable plated film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638766U (en) * 1979-08-30 1981-04-11

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638766U (en) * 1979-08-30 1981-04-11

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007223277A (en) * 2006-02-27 2007-09-06 Seiko Epson Corp Fixture for surface treatment, method of surface treatment, method for manufacturing liquid ejection head, and method for manufacturing liquid droplet ejection apparatus
JP2014118631A (en) * 2012-12-19 2014-06-30 Kaneka Corp Substrate holder and method of manufacturing solar cell substrate
CN109082649A (en) * 2018-09-06 2018-12-25 深圳市捷佳伟创新能源装备股份有限公司 A kind of loading device of stable plated film

Also Published As

Publication number Publication date
JP2547035B2 (en) 1996-10-23

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