JPS643645A - Photopolymerizing composition, 3-layer member containing the same and manufacture thereof and formation of non-peeling resist or solder mask - Google Patents

Photopolymerizing composition, 3-layer member containing the same and manufacture thereof and formation of non-peeling resist or solder mask

Info

Publication number
JPS643645A
JPS643645A JP14193988A JP14193988A JPS643645A JP S643645 A JPS643645 A JP S643645A JP 14193988 A JP14193988 A JP 14193988A JP 14193988 A JP14193988 A JP 14193988A JP S643645 A JPS643645 A JP S643645A
Authority
JP
Japan
Prior art keywords
group
solder mask
unsatd
oligomer
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14193988A
Other languages
English (en)
Inventor
Aasaa Rindorei Andoriyuu
Sumisu Suteiibun
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Imperial Chemical Industries Ltd
Original Assignee
Imperial Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imperial Chemical Industries Ltd filed Critical Imperial Chemical Industries Ltd
Publication of JPS643645A publication Critical patent/JPS643645A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP14193988A 1987-06-12 1988-06-10 Photopolymerizing composition, 3-layer member containing the same and manufacture thereof and formation of non-peeling resist or solder mask Pending JPS643645A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB878713740A GB8713740D0 (en) 1987-06-12 1987-06-12 Photopolymerisable compositions

Publications (1)

Publication Number Publication Date
JPS643645A true JPS643645A (en) 1989-01-09

Family

ID=10618790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14193988A Pending JPS643645A (en) 1987-06-12 1988-06-10 Photopolymerizing composition, 3-layer member containing the same and manufacture thereof and formation of non-peeling resist or solder mask

Country Status (3)

Country Link
EP (1) EP0294953A3 (ja)
JP (1) JPS643645A (ja)
GB (1) GB8713740D0 (ja)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3382078D1 (de) * 1982-12-06 1991-02-07 Ici Plc Aromatische oligomere und harze.
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
DE3477849D1 (en) * 1983-12-06 1989-05-24 Ici Plc Dry film resists

Also Published As

Publication number Publication date
GB8713740D0 (en) 1987-07-15
EP0294953A3 (en) 1989-09-13
EP0294953A2 (en) 1988-12-14

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