JPS6430229A - Device for cleaning photomask - Google Patents
Device for cleaning photomaskInfo
- Publication number
- JPS6430229A JPS6430229A JP18718687A JP18718687A JPS6430229A JP S6430229 A JPS6430229 A JP S6430229A JP 18718687 A JP18718687 A JP 18718687A JP 18718687 A JP18718687 A JP 18718687A JP S6430229 A JPS6430229 A JP S6430229A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- chuck
- nozzles
- mask chuck
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To eliminate the scattering of waterdrop on the edges of a photo mask and on a mask chuck and to make possible a double-side cleaning with no part left uncleaned by a method wherein the title device has opposed two cleaning water jetting nozzles and the photo mask is set on the mask chuck conforming its center to the center of the rotating shaft of the mask chuck between the nozzles. CONSTITUTION:A photo mask 7, which is subjected to position control by mask holding pins 8 on a mask chuck 6 and is set, is rotated on the same rotating shaft as that of the mask chuck by a mask chuck rotating mechanism 12. When cleaning water 14 is jetted on both surfaces of the photo mask from nozzles 9, the cleaning water is jetted only within a nozzle working range 11 at the time of water washing. Whereupon, there is no scattering of waterdrop on the end surfaces of the photo mask and on the mask chuck and the adhesion of a new dirt is eliminated. The upper and lower two nozzles are interlocked and are made to execute the same motion.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18718687A JPS6430229A (en) | 1987-07-27 | 1987-07-27 | Device for cleaning photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18718687A JPS6430229A (en) | 1987-07-27 | 1987-07-27 | Device for cleaning photomask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6430229A true JPS6430229A (en) | 1989-02-01 |
Family
ID=16201614
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18718687A Pending JPS6430229A (en) | 1987-07-27 | 1987-07-27 | Device for cleaning photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6430229A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5680384A (en) * | 1992-11-17 | 1997-10-21 | Seiko Epson Corporation | Laser emission unit, optical head and optical memory device |
CN111748768A (en) * | 2020-06-28 | 2020-10-09 | 武汉华星光电半导体显示技术有限公司 | Mask plate cleaning equipment and mask plate cleaning method |
-
1987
- 1987-07-27 JP JP18718687A patent/JPS6430229A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5680384A (en) * | 1992-11-17 | 1997-10-21 | Seiko Epson Corporation | Laser emission unit, optical head and optical memory device |
CN111748768A (en) * | 2020-06-28 | 2020-10-09 | 武汉华星光电半导体显示技术有限公司 | Mask plate cleaning equipment and mask plate cleaning method |
CN111748768B (en) * | 2020-06-28 | 2022-08-02 | 武汉华星光电半导体显示技术有限公司 | Mask plate cleaning equipment and mask plate cleaning method |
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