JPS6430229A - Device for cleaning photomask - Google Patents

Device for cleaning photomask

Info

Publication number
JPS6430229A
JPS6430229A JP18718687A JP18718687A JPS6430229A JP S6430229 A JPS6430229 A JP S6430229A JP 18718687 A JP18718687 A JP 18718687A JP 18718687 A JP18718687 A JP 18718687A JP S6430229 A JPS6430229 A JP S6430229A
Authority
JP
Japan
Prior art keywords
mask
chuck
nozzles
mask chuck
photo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18718687A
Other languages
Japanese (ja)
Inventor
Tatsuhiko Yamao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp filed Critical Matsushita Electronics Corp
Priority to JP18718687A priority Critical patent/JPS6430229A/en
Publication of JPS6430229A publication Critical patent/JPS6430229A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To eliminate the scattering of waterdrop on the edges of a photo mask and on a mask chuck and to make possible a double-side cleaning with no part left uncleaned by a method wherein the title device has opposed two cleaning water jetting nozzles and the photo mask is set on the mask chuck conforming its center to the center of the rotating shaft of the mask chuck between the nozzles. CONSTITUTION:A photo mask 7, which is subjected to position control by mask holding pins 8 on a mask chuck 6 and is set, is rotated on the same rotating shaft as that of the mask chuck by a mask chuck rotating mechanism 12. When cleaning water 14 is jetted on both surfaces of the photo mask from nozzles 9, the cleaning water is jetted only within a nozzle working range 11 at the time of water washing. Whereupon, there is no scattering of waterdrop on the end surfaces of the photo mask and on the mask chuck and the adhesion of a new dirt is eliminated. The upper and lower two nozzles are interlocked and are made to execute the same motion.
JP18718687A 1987-07-27 1987-07-27 Device for cleaning photomask Pending JPS6430229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18718687A JPS6430229A (en) 1987-07-27 1987-07-27 Device for cleaning photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18718687A JPS6430229A (en) 1987-07-27 1987-07-27 Device for cleaning photomask

Publications (1)

Publication Number Publication Date
JPS6430229A true JPS6430229A (en) 1989-02-01

Family

ID=16201614

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18718687A Pending JPS6430229A (en) 1987-07-27 1987-07-27 Device for cleaning photomask

Country Status (1)

Country Link
JP (1) JPS6430229A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5680384A (en) * 1992-11-17 1997-10-21 Seiko Epson Corporation Laser emission unit, optical head and optical memory device
CN111748768A (en) * 2020-06-28 2020-10-09 武汉华星光电半导体显示技术有限公司 Mask plate cleaning equipment and mask plate cleaning method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5680384A (en) * 1992-11-17 1997-10-21 Seiko Epson Corporation Laser emission unit, optical head and optical memory device
CN111748768A (en) * 2020-06-28 2020-10-09 武汉华星光电半导体显示技术有限公司 Mask plate cleaning equipment and mask plate cleaning method
CN111748768B (en) * 2020-06-28 2022-08-02 武汉华星光电半导体显示技术有限公司 Mask plate cleaning equipment and mask plate cleaning method

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