JPS6428921U - - Google Patents
Info
- Publication number
- JPS6428921U JPS6428921U JP12252687U JP12252687U JPS6428921U JP S6428921 U JPS6428921 U JP S6428921U JP 12252687 U JP12252687 U JP 12252687U JP 12252687 U JP12252687 U JP 12252687U JP S6428921 U JPS6428921 U JP S6428921U
- Authority
- JP
- Japan
- Prior art keywords
- filtration
- piping system
- backwashing
- pulp
- processes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000011001 backwashing Methods 0.000 claims description 2
- 238000001914 filtration Methods 0.000 claims 5
- 238000000034 method Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 description 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12252687U JPS6428921U (fr) | 1987-08-12 | 1987-08-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12252687U JPS6428921U (fr) | 1987-08-12 | 1987-08-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6428921U true JPS6428921U (fr) | 1989-02-21 |
Family
ID=31370541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12252687U Pending JPS6428921U (fr) | 1987-08-12 | 1987-08-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6428921U (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7335282B2 (en) | 1999-02-12 | 2008-02-26 | Jianming Fu | Sputtering using an unbalanced magnetron |
| US9209074B2 (en) | 2001-07-25 | 2015-12-08 | Applied Materials, Inc. | Cobalt deposition on barrier surfaces |
-
1987
- 1987-08-12 JP JP12252687U patent/JPS6428921U/ja active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7335282B2 (en) | 1999-02-12 | 2008-02-26 | Jianming Fu | Sputtering using an unbalanced magnetron |
| US9209074B2 (en) | 2001-07-25 | 2015-12-08 | Applied Materials, Inc. | Cobalt deposition on barrier surfaces |