JPS6428819A - Method and device for pattern replication - Google Patents

Method and device for pattern replication

Info

Publication number
JPS6428819A
JPS6428819A JP62183300A JP18330087A JPS6428819A JP S6428819 A JPS6428819 A JP S6428819A JP 62183300 A JP62183300 A JP 62183300A JP 18330087 A JP18330087 A JP 18330087A JP S6428819 A JPS6428819 A JP S6428819A
Authority
JP
Japan
Prior art keywords
transferred
negative
alignment
light
alignment mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62183300A
Other languages
Japanese (ja)
Inventor
Hideki Tomioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62183300A priority Critical patent/JPS6428819A/en
Publication of JPS6428819A publication Critical patent/JPS6428819A/en
Pending legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To enable relative alignment of an element to be transferred to be made with a negative by a method wherein the rear side of the element to be transferred is irradiated with an alignment light to detect an alignment mark made on the element to be transferred. CONSTITUTION:An alignment light source 8b is lighted; the alignment light is divided into two parts by a half mirror 8C; one light irradiates the bottom surface of a negative 4; while the other light irradiates the rear side of an element 2 to be transferred. An X-Y table 1 and a negative mounting base 3 are relatively moved on a horizontal surface so that an alignment mark M made on the element to be transferred and another alignment mark made on the negative 4 may be aligned with a photodetector 8g. Through these procedures, the specified position of the element 2 to be transferred mounted on the table 1 can be precisely aligned with the negative 4 mounted on the base 3.
JP62183300A 1987-07-24 1987-07-24 Method and device for pattern replication Pending JPS6428819A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62183300A JPS6428819A (en) 1987-07-24 1987-07-24 Method and device for pattern replication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62183300A JPS6428819A (en) 1987-07-24 1987-07-24 Method and device for pattern replication

Publications (1)

Publication Number Publication Date
JPS6428819A true JPS6428819A (en) 1989-01-31

Family

ID=16133257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62183300A Pending JPS6428819A (en) 1987-07-24 1987-07-24 Method and device for pattern replication

Country Status (1)

Country Link
JP (1) JPS6428819A (en)

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