JPS6422033A - Deposition system for thin-film - Google Patents
Deposition system for thin-filmInfo
- Publication number
- JPS6422033A JPS6422033A JP17948087A JP17948087A JPS6422033A JP S6422033 A JPS6422033 A JP S6422033A JP 17948087 A JP17948087 A JP 17948087A JP 17948087 A JP17948087 A JP 17948087A JP S6422033 A JPS6422033 A JP S6422033A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- decomposition chamber
- gas decomposition
- substrate
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To improve the efficiency of decomposition of a gas, and to increase the deposition rate of a deposit remarkably by installing a gas decomposition chamber and confining beams in the deposition of a thin-film through a photo- CVD method. CONSTITUTION:Small holes 22 bored to a gas decomposition chamber 20 are directed in the direction of a substrate 35, and two branched nozzles 44 are formed at the nose of a second gas introducing system 43. Small holes 45 are bored at every twenty position at regular intervals toward the direction just under the gas decomposition chamber 20 in the substrate 35 in each nozzle 44, and SiH4 gas is sprayed onto the substrate 35 while being mixed with dissociated O2 gas. A mirror 11b is fixed into an adapter 50 by a ring screw 52a and positioned vertically to a laser tube 10 and the gas decomposition chamber 20, and functions to partition the laser tube 10 and the gas decomposition chamber 20 as well as to comfine beams into one reflecting mirror of a laser and the gas decomposition chamber 20.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17948087A JPS6422033A (en) | 1987-07-17 | 1987-07-17 | Deposition system for thin-film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17948087A JPS6422033A (en) | 1987-07-17 | 1987-07-17 | Deposition system for thin-film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6422033A true JPS6422033A (en) | 1989-01-25 |
Family
ID=16066576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17948087A Pending JPS6422033A (en) | 1987-07-17 | 1987-07-17 | Deposition system for thin-film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6422033A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012524416A (en) * | 2009-04-20 | 2012-10-11 | アプライド マテリアルズ インコーポレイテッド | Quartz window having gas supply mechanism and processing apparatus including the quartz window |
-
1987
- 1987-07-17 JP JP17948087A patent/JPS6422033A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012524416A (en) * | 2009-04-20 | 2012-10-11 | アプライド マテリアルズ インコーポレイテッド | Quartz window having gas supply mechanism and processing apparatus including the quartz window |
TWI549212B (en) * | 2009-04-20 | 2016-09-11 | 應用材料股份有限公司 | Quartz window having gas feed and processing equipment incorporating same |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MX9701062A (en) | Jet plasma deposition process and apparatus. | |
AU5365286A (en) | Electrostatic spraying apparatus | |
ES2029679T3 (en) | PROCEDURE TO INCREASE THE AMOUNT OF POWDER ISSUED IN A POWDER COATING INSTALLATION, AS WELL AS A POWDER COATING INSTALLATION. | |
CA1271229C (en) | Plasma flame spray gun method and apparatus with adjustable ratio of radial and tangential plasma gas flow | |
SE9400038L (en) | Methods and apparatus for forming a coating by pyrolysis | |
DE3679098D1 (en) | PLASMA TORCH. | |
CA2090865A1 (en) | Spray nozzle design | |
ES2032179A6 (en) | Process and device for cutting by liquid jet | |
JPS6422033A (en) | Deposition system for thin-film | |
EP0229633A3 (en) | Apparatus and method for laser-induced chemical vapor deposition | |
ZA926149B (en) | Method for microwave plasma assisted CVD diamond coating. | |
JPS56119423A (en) | Combustion method of combustor for gas turbine | |
SE9304038L (en) | Methods and supply means for regulating mixing conditions in a combustion or gasification plant | |
AU1351592A (en) | Production of spray deposits | |
GB1498779A (en) | Impinging air jet combustion apparatus | |
CA2241867A1 (en) | Labyrinth gas feed apparatus and method for a detonation gun | |
JPS57200569A (en) | Apparatus for treating surface with gas decomposed by light | |
JPS6450583A (en) | Lateral turbulent flow discharge type laser | |
JPS5672255A (en) | Fuel injection valve | |
EP0883462A4 (en) | Laser drilling process for producing a plurality of holes in chemical dosage forms using acousto-optic deflector | |
SU1805677A1 (en) | Method for plasma spraying of coatings | |
RU2031985C1 (en) | Method and apparatus to produce polycrystalline zinc selenide | |
JPS5523066A (en) | Forming method for oxide powder layer for optical fiber | |
DE2967547D1 (en) | Method and apparatus for creating and maintaining a self-supporting plasma ball | |
US4135008A (en) | Method of silvering mirrors |