JPS6417873A - Formation of thin film of metal compound decomposition product - Google Patents

Formation of thin film of metal compound decomposition product

Info

Publication number
JPS6417873A
JPS6417873A JP17441087A JP17441087A JPS6417873A JP S6417873 A JPS6417873 A JP S6417873A JP 17441087 A JP17441087 A JP 17441087A JP 17441087 A JP17441087 A JP 17441087A JP S6417873 A JPS6417873 A JP S6417873A
Authority
JP
Japan
Prior art keywords
metal
compd
thin film
decomposition product
substrate surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17441087A
Other languages
Japanese (ja)
Inventor
Hiroshi Suzuki
Seiji Endo
Iwakichi Sugiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Matsumoto Seiyaku Kogyo KK
Original Assignee
Matsumoto Seiyaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsumoto Seiyaku Kogyo KK filed Critical Matsumoto Seiyaku Kogyo KK
Priority to JP17441087A priority Critical patent/JPS6417873A/en
Publication of JPS6417873A publication Critical patent/JPS6417873A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemically Coating (AREA)

Abstract

PURPOSE:To form the title high-quality thin film of a metal compd. decomposition product on the surface of a substrate with good adhesion and at a low cost by dispersing a specified hydrolyzable metal compd. in a gas by an ultrasonic vibrator, and bringing the obtained aerosol into contact with the substrate surface. CONSTITUTION:One or more kinds of hydrolyzable metal compds. (e.g., aluminum isopropoxide and tin octanate) selected from a metal alkoxide, a metal chelate compd., a metal carboxylate, and a metal nitrate are prepared. The hydrolyzable metal compd. is dispersed in a gas by an ultrasonic vibrator. The obtained aerosol is transferred by a carrier gas and brought into contact with the substrate surface, and the thin film of the metal compd. decomposition product is formed on the substrate surface. A compd. which is liq. at ordinary temp. or at the working temp. can be formed into a thin film without using a solvent by this method, and the unevenness in coating due to the volatilization of a solvent can be avoided.
JP17441087A 1987-07-13 1987-07-13 Formation of thin film of metal compound decomposition product Pending JPS6417873A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17441087A JPS6417873A (en) 1987-07-13 1987-07-13 Formation of thin film of metal compound decomposition product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17441087A JPS6417873A (en) 1987-07-13 1987-07-13 Formation of thin film of metal compound decomposition product

Publications (1)

Publication Number Publication Date
JPS6417873A true JPS6417873A (en) 1989-01-20

Family

ID=15978067

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17441087A Pending JPS6417873A (en) 1987-07-13 1987-07-13 Formation of thin film of metal compound decomposition product

Country Status (1)

Country Link
JP (1) JPS6417873A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09141184A (en) * 1995-11-20 1997-06-03 Fuji Electric Co Ltd Method for forming dielectric film
JP2010209363A (en) * 2009-03-06 2010-09-24 Dainippon Printing Co Ltd Production method of laminate having aluminum oxide film
KR20180122342A (en) * 2016-03-11 2018-11-12 가부시키가이샤 니콘 Mist generating device, film forming device, mist generating method, film forming method, and device manufacturing method

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5012110A (en) * 1973-06-06 1975-02-07
JPS5515545A (en) * 1978-07-18 1980-02-02 Nec Corp Microprogram control type information processor
JPS5841720A (en) * 1981-09-02 1983-03-11 Nippon Soda Co Ltd Composition forming metallic oxide film
JPS5841724A (en) * 1981-09-02 1983-03-11 Nippon Soda Co Ltd Composition forming metallic oxide film
JPS5841722A (en) * 1981-09-02 1983-03-11 Nippon Soda Co Ltd Composition forming metallic oxide film
JPS61244025A (en) * 1985-04-22 1986-10-30 Toa Nenryo Kogyo Kk Manufacture of thin film

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5012110A (en) * 1973-06-06 1975-02-07
JPS5515545A (en) * 1978-07-18 1980-02-02 Nec Corp Microprogram control type information processor
JPS5841720A (en) * 1981-09-02 1983-03-11 Nippon Soda Co Ltd Composition forming metallic oxide film
JPS5841724A (en) * 1981-09-02 1983-03-11 Nippon Soda Co Ltd Composition forming metallic oxide film
JPS5841722A (en) * 1981-09-02 1983-03-11 Nippon Soda Co Ltd Composition forming metallic oxide film
JPS61244025A (en) * 1985-04-22 1986-10-30 Toa Nenryo Kogyo Kk Manufacture of thin film

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09141184A (en) * 1995-11-20 1997-06-03 Fuji Electric Co Ltd Method for forming dielectric film
JP2010209363A (en) * 2009-03-06 2010-09-24 Dainippon Printing Co Ltd Production method of laminate having aluminum oxide film
KR20180122342A (en) * 2016-03-11 2018-11-12 가부시키가이샤 니콘 Mist generating device, film forming device, mist generating method, film forming method, and device manufacturing method

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