JPS6415927U - - Google Patents

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Publication number
JPS6415927U
JPS6415927U JP10642187U JP10642187U JPS6415927U JP S6415927 U JPS6415927 U JP S6415927U JP 10642187 U JP10642187 U JP 10642187U JP 10642187 U JP10642187 U JP 10642187U JP S6415927 U JPS6415927 U JP S6415927U
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JP
Japan
Prior art keywords
housing
concentration distribution
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laser beam
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Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10642187U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10642187U priority Critical patent/JPS6415927U/ja
Publication of JPS6415927U publication Critical patent/JPS6415927U/ja
Pending legal-status Critical Current

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  • Measurement Of Mechanical Vibrations Or Ultrasonic Waves (AREA)

Description

【図面の簡単な説明】
第1図はこの考案の一実施例を示す部分断面略
線図、第2図は濃度分布フイルタの特性を例示す
る図、第3図は従来例を示す部分断面図である。 11……ハウジング、12……弾性手段、13
……濃度分布フイルタ、14……発光素子、15
,18……光フアイバ、16,19……光コネク
タ、17……受光素子。

Claims (1)

    【実用新案登録請求の範囲】
  1. ハウジング11と、このハウジング内に弾性支
    持した濃度分布フイルタ13と、ハウジングに連
    結されて、濃度分布フイルタを横切る方向へレー
    ザ光線を出力する発光素子14と、これもまたハ
    ウジングに連絡され、濃度分布フイルタを通過し
    たレーザ光線を受ける受光素子17とを具えてな
    る振動センサ。
JP10642187U 1987-07-13 1987-07-13 Pending JPS6415927U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10642187U JPS6415927U (ja) 1987-07-13 1987-07-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10642187U JPS6415927U (ja) 1987-07-13 1987-07-13

Publications (1)

Publication Number Publication Date
JPS6415927U true JPS6415927U (ja) 1989-01-26

Family

ID=31339917

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10642187U Pending JPS6415927U (ja) 1987-07-13 1987-07-13

Country Status (1)

Country Link
JP (1) JPS6415927U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7615132B2 (en) 2003-10-17 2009-11-10 Hitachi High-Technologies Corporation Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7615132B2 (en) 2003-10-17 2009-11-10 Hitachi High-Technologies Corporation Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method

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