JPS6390830U - - Google Patents
Info
- Publication number
- JPS6390830U JPS6390830U JP18546186U JP18546186U JPS6390830U JP S6390830 U JPS6390830 U JP S6390830U JP 18546186 U JP18546186 U JP 18546186U JP 18546186 U JP18546186 U JP 18546186U JP S6390830 U JPS6390830 U JP S6390830U
- Authority
- JP
- Japan
- Prior art keywords
- flow rate
- discharge
- vacuum chamber
- discharge gas
- control valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18546186U JPS6390830U (da) | 1986-12-03 | 1986-12-03 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18546186U JPS6390830U (da) | 1986-12-03 | 1986-12-03 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6390830U true JPS6390830U (da) | 1988-06-13 |
Family
ID=31134108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18546186U Pending JPS6390830U (da) | 1986-12-03 | 1986-12-03 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6390830U (da) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010205477A (ja) * | 2009-03-02 | 2010-09-16 | Nissin Ion Equipment Co Ltd | ガス制御装置、ガス制御装置の制御方法及びそれらを用いたイオン注入装置 |
-
1986
- 1986-12-03 JP JP18546186U patent/JPS6390830U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010205477A (ja) * | 2009-03-02 | 2010-09-16 | Nissin Ion Equipment Co Ltd | ガス制御装置、ガス制御装置の制御方法及びそれらを用いたイオン注入装置 |