JPS6385503A - Diffraction grating - Google Patents

Diffraction grating

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Publication number
JPS6385503A
JPS6385503A JP23215386A JP23215386A JPS6385503A JP S6385503 A JPS6385503 A JP S6385503A JP 23215386 A JP23215386 A JP 23215386A JP 23215386 A JP23215386 A JP 23215386A JP S6385503 A JPS6385503 A JP S6385503A
Authority
JP
Japan
Prior art keywords
diffraction grating
recording
grating
horizontal
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23215386A
Other languages
Japanese (ja)
Other versions
JPH0827403B2 (en
Inventor
Hideyuki Noda
英行 野田
Masahito Koike
雅人 小池
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP23215386A priority Critical patent/JPH0827403B2/en
Publication of JPS6385503A publication Critical patent/JPS6385503A/en
Publication of JPH0827403B2 publication Critical patent/JPH0827403B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Holo Graphy (AREA)

Abstract

PURPOSE:To improve the correction of aberration by using astigmatic light for recording light and forming a grating pattern by changing the distances from the light source points in the directions horizontal and vertical to a diffraction grating up to a grating substrate in the direction of a recording beam. CONSTITUTION:The spherical diffraction grating substrate 7, a spherical mirror 8 having 0.6132 radius of curvature, a troidal mirror 9 having 0.6132 radius of curvature in a horizontal direction and 0.5852 radius of curvature in a vertical direction and laser light sources 10, 11 which emit spherical waves are provided. Marks ''circled X, marks ''circled dot'' are respectively the focuses by the concave mirrors 8, 9 of the laser light source points 10, 11 in the horizontal and vertical directions. The recording by the astigmatic light; i.e., the recording of the grating pattern by substantially changing the distances from the points 10, 11 in the horizontal and vertical direction of the diffraction grating up to the substrate in the beam direction of the recording light is thereby executed.

Description

【発明の詳細な説明】 0)産業上の利用分野 本発明はホログラフィによって製作さnf′C,回折格
子に関する。
DETAILED DESCRIPTION OF THE INVENTION 0) Industrial Application Field The present invention relates to an nf'C diffraction grating produced by holography.

(ロ)従来技術 凹面回折格子?用いろ分光器では、凹面回折格子の結像
性に収差が現わnるが、このような収差を補正す/)た
めにホログラフィを用いて凹面回折格子の格子パターン
として特殊なパターンklJJ作することが実施さnて
いる。しかし従来は、格子基板上に格子パターンを形成
する念めの記録光に球面波を用いていたので、格子パタ
ーン¥i回転双曲線群と格子基板との交り群に限定さn
、充分な収差補正ができなかった。特に写真乾板やアレ
イ検出器音用いる分光器では分散方向の収差の補正、結
像面をより平面に近くすること、結像面の中心が概略回
折格子中心方間と蚕亘であることなど、使用上の必要条
件を満たす友めの結像特性の補正子はかる必要がある九
め9例えば非点収差など、実効効率が低下するにもかか
わらず、この方面の収差補正は行わnていないのが実状
である。
(b) Conventional concave diffraction grating? In a spectrometer, aberrations appear in the imaging performance of the concave diffraction grating, but in order to correct such aberrations, a special pattern is created as the grating pattern of the concave diffraction grating using holography. Things are being implemented. However, in the past, a spherical wave was used for recording light to form a grating pattern on a grating substrate, so the grating pattern was limited to the intersection group of the rotational hyperbola group and the grating substrate.
, it was not possible to sufficiently correct aberrations. In particular, in spectrometers that use photographic plates or array detector sounds, correction of aberrations in the dispersion direction, making the imaging surface closer to a flat surface, and ensuring that the center of the imaging surface is roughly between the centers of the diffraction gratings and the like, etc. It is necessary to create a corrector with better imaging characteristics that meet the requirements for use. 9. For example, astigmatism, although the effective efficiency decreases, correction of aberrations in this direction is not performed. is the actual situation.

また、平面回折格子は、従来俵楡切ジで格子溝を作って
おり、格子パターンは等間隔百勝格子であって、この型
の回折格子は千n自身は収差に持っていないが、コリメ
ータ素子とプレメータ素子に凹07]伐を用いる分光器
では、凹面緯に球面illを用い軸外し状態で使う之め
、こnらの凹面鏡によって収差が発生していた。この収
を補正する九めには、平面回折格子の格子パターンを特
殊なものにして2回折格子にコリメータ鏡及びカメラ鏡
によって発生する収差を打消すような収差を発生させn
はよいが、この場合にもホログラフィの利用によってそ
のような特殊な格子パターンが裏作さnる。しかし、や
はり記録光に球面波を用いていたので収差補正は不充分
なものであった。
In addition, in the conventional planar diffraction grating, the grating grooves are made by cutting grooves, and the grating pattern is an evenly spaced 100-kachi grating. In a spectrometer that uses a concave 07] section as a premeter element, a spherical ill is used as the concave surface and is used in an off-axis state, so aberrations are caused by these concave mirrors. The ninth step to correcting this aberration is to make the grating pattern of the plane diffraction grating special and generate an aberration in the second diffraction grating that cancels the aberration caused by the collimator mirror and camera mirror.
However, even in this case, such a special lattice pattern can be created by using holography. However, since a spherical wave was still used for the recording light, aberration correction was insufficient.

(ハ)発明が解決しようとする問題点 本発明は、ホログラフィを用いた回折格子の格子パター
ンの形成に改善を行って、より完全な収差補正を可能に
しようとするものである。
(c) Problems to be Solved by the Invention The present invention attempts to improve the formation of a grating pattern of a diffraction grating using holography to enable more complete aberration correction.

に)問題解決のための手段 本発明の回折格子は、ホログラフィによって回折格子基
板に回折格子パターンを記録するための記録光の九線方
向上で9回折格子の水平。
(b) Means for Solving the Problem The diffraction grating of the present invention uses nine horizontal directions of the diffraction grating on the nine-line direction of recording light for recording a diffraction grating pattern on a diffraction grating substrate by holography.

垂直方向の発散光源点から回折格子基板までの距離を実
質的に変えたこと全特徴とする。
The entire feature is that the distance from the vertical diverging light source point to the grating substrate is substantially changed.

(ホ)作用 ホログラフィによる回折格子パターンの裏作法は9回折
格子基板に互に干渉可能な二元束の元を投影して回折格
子パターン全形成させ、この干渉パターンを基板面に焼
付は記録するもので、上記二元束を記録光、その光源を
記録光源と云う。従来は、上記した二つの記録光として
平面波域或は球面波を用いていた。これに対して本発明
では、記録光の光線方同上で回折格子の水平、垂直方向
の発散光源点から回折格子基板までの距離を実質的に変
えるため、水平、垂直方向の焦点が異なる光(アスティ
グマティック元、astigmatic党)を記録光と
したものである。
(E) The method for creating a diffraction grating pattern using action holography is to project the elements of binary fluxes that can interfere with each other onto a nine-diffraction grating substrate to form the entire diffraction grating pattern, and record this interference pattern by printing on the substrate surface. The above-mentioned binary flux is called recording light, and its light source is called a recording light source. Conventionally, a plane wave region or a spherical wave has been used as the above two recording lights. On the other hand, in the present invention, the distance from the diverging light source point of the diffraction grating in the horizontal and vertical directions to the diffraction grating substrate is substantially changed in the direction of the recording light beam, so that the beam direction of the recording light beam ( Astigmatic original, astigmatic party) was used as the recording light.

こnKより干渉パターンを形成する記録条件のパラメー
タが増加し、得ら九る干渉パターンも変化に富み、干渉
パターンの選択の自由度が増すので、記@条件の選択に
よって従来に比較し収差補正がより完全にできるように
なった。
Since the parameters of the recording conditions for forming the interference pattern have increased from this nK, the resulting interference pattern is also rich in variation, and the degree of freedom in selecting the interference pattern has increased, so by selecting the conditions described above, aberration correction can be improved compared to the conventional method. became more complete.

記録条件のパラメータが増加すると云うのは球面波を用
いる場合、パラメータは点光源の位置のデータだけであ
るが、アスティグマティック51f:を用いると、水平
方向と垂直方向との点光源の位置が実質的に異なること
になり、特に垂直方向の結像条件に関係する記録条件の
パラメータが増力口し次ことになるので、それによって
分光器の光学系全体としての収差、特に非点収差を効果
的に補正できることになるのである。
The reason why the parameters of recording conditions increase is that when using a spherical wave, the only parameter is data on the position of the point light source, but when Astigmatic 51f is used, the position of the point light source in the horizontal and vertical directions increases. The parameters of the recording conditions, especially those related to the vertical imaging conditions, will be substantially different from the intensifier, thereby reducing the effects of aberrations, especially astigmatism, in the optical system of the spectrometer as a whole. This means that it can be corrected.

(へ)夾施例 (球面回折格子基板を用いた場合ン 第2図は、従来の球面回折格子の格子パターン記録時の
配at示す図であって、4はホログラフ4”)り干渉縞
を記録し9回折格子に仕立てる感光剤を塗付した球面回
折格子基板、5,6は球面波t−発生するレーザ光源点
である。この場合1元源点5.6ヲ焦点とする回転双曲
線群と基板との交線に縞を生ずる。この場合の具体的な
記録条件は、波長441.6nmのレーザ光音用いる一
合。
(f) Example (Using a spherical diffraction grating substrate) Fig. 2 is a diagram showing the layout of a conventional spherical diffraction grating when recording a grating pattern, and 4 is a hologram 4'') to produce interference fringes. A spherical diffraction grating substrate coated with a photosensitizer to be recorded and made into a 9-diffraction grating, 5 and 6 are laser light source points that generate a spherical wave t.In this case, a rotational hyperbola group with one source point 5.6 as the focal point. A stripe is generated at the intersection line between the laser beam and the substrate.The specific recording conditions in this case are one using a laser beam with a wavelength of 441.6 nm.

rc ”= 0.9896  、  I = −4,7
64rD:0.9908  +  δ= 10.101
’第1図は第2(8)で示した従来の口折格子と同一の
水平(分散)方向焦線 を持ち、非点収差を補正するた
め、垂直方向の焦線が水平方向の焦線のほぼ中心で交じ
わるような回折格子の格子パターン(第3図参照)を形
成する本発明の回折格子の格子パターン記録時の配置を
示し次回である。7は球面回折格子基板、8は曲率半径
0゜61320球面鏡、9は水平方向の曲率半径0.6
132゜垂直方向の曲率半径0.5852のトロイダル
鏡であり、10.11は球面波を発するレーザ光源点で
ある。この場合の具体的な記録条件は、レーザ波長44
1.6nmのレーザ元を用いる場合pc=1.5819
 、  qc=0.5923  、  rc = 15
.000’りD=1.5831  t  qD冨0.5
923  、  τo = 15.000゜である。図
中■、■印はそれぞn水平、垂直方向のレーザ光源点1
0.11の凹面鏡8,9による焦点であり、これにより
スティグマティッ元によ八 る記録、すなわち記録光の光線方同上で回折格子の水平
、垂直方向の元源点から格子基板までσJ纜詭を宙辱的
f姿9て玖エバI−ソの詔佛イできることになる。
rc”=0.9896, I=−4,7
64rD: 0.9908 + δ= 10.101
'Figure 1 has the same horizontal (dispersion) focal line as the conventional refraction grating shown in Figure 2 (8), and in order to correct astigmatism, the vertical focal line becomes the horizontal focal line. The next section shows the arrangement of the grating patterns of the diffraction gratings of the present invention, which form a grating pattern of the diffraction gratings (see FIG. 3) that intersect approximately at the center of the gratings. 7 is a spherical diffraction grating substrate, 8 is a 61320 spherical mirror with a radius of curvature of 0°, and 9 is a horizontal radius of curvature of 0.6.
132° is a toroidal mirror with a radius of curvature of 0.5852 in the vertical direction, and 10.11 is a laser light source point that emits a spherical wave. The specific recording conditions in this case are that the laser wavelength is 44
When using a 1.6 nm laser source, pc = 1.5819
, qc=0.5923, rc=15
.. 000'ri D=1.5831 t qD depth 0.5
923, τo = 15.000°. ■ and ■ marks in the figure are the laser light source points 1 in the horizontal and vertical directions, respectively.
This is the focal point of the concave mirrors 8 and 9 with a diameter of 0.11, and this allows recording based on the stigmatized source, that is, the σJ trace from the source point in the horizontal and vertical directions of the diffraction grating to the grating substrate in the same direction as the recording light beam. In this humiliating appearance, Kueva I-So's imperial edict can be performed.

上記実施例の回折格子を用りた分光系の一例kM3図に
示す。1が人口スリット、2が本発明による回折格子、
3は写真乾板又はアレイ検出器面であジ、波長域350
nm〜750nmにおいて水平(分散)方向焦線とのず
れが最小になる位置に設置する。分光系の配置は、第3
図においてr=0.9514  、  α= 19.2
681’+= 1.0035  、  !+=−7.1
64゜rz= 1.0104  、  /2=  6.
309゜であジ、回折格子2の水平方向の曲率半径は1
゜000である。
An example of a spectroscopic system using the diffraction grating of the above embodiment is shown in Fig. kM3. 1 is an artificial slit, 2 is a diffraction grating according to the present invention,
3 is the photographic plate or array detector surface, wavelength range 350
It is installed at a position where the deviation from the focal line in the horizontal (dispersion) direction is minimized in the range from nm to 750 nm. The arrangement of the spectroscopic system is the third one.
In the figure, r=0.9514, α=19.2
681'+=1.0035, ! +=-7.1
64°rz=1.0104, /2=6.
At 309 degrees, the horizontal radius of curvature of the diffraction grating 2 is 1
It is ゜000.

(トロイダル回折格子基板を用いfc場合)第4図は第
3図の分光系と同一の分光系に用いらnる本発明の他の
実施例の回折格子の格子パターン記録時の配置2示す図
で、第2図で示した従来の回折格子の水平方向の焦線上
に水平方向焦線、垂直方向焦線金持ち(第3図参照几全
波畏域にわ之って非点収差を補正したものである。図に
おいて12はトロイダル回折格子基板、13は曲率半径
1.000の球面鏡、  14.15は波長441.6
nmの球面波を発するンーザ光源点である。具体的な記
録条件は pc=1.9854  、  qc=0.9957  
、  τc=5.2889ro=0.9908  、 
 I=−4,764°、δ=10.134゜である。図
中■、O印はそA(’Aレーザ光光焦点14よる水平、
垂直方向の焦点であジ、こnにより、アスティグマティ
ック党による記録、すなわち記録光の元線方同上で回折
格子の水平、垂直方向の光源点から格子基板までの距離
を実質的に変えて格子パターンの記録ができることにな
る。
(When fc is used using a toroidal diffraction grating substrate) FIG. 4 is a diagram showing arrangement 2 of a grating pattern of a diffraction grating according to another embodiment of the present invention used in the same spectroscopic system as that shown in FIG. 3. The horizontal focal line and the vertical focal line are placed on the horizontal focal line of the conventional diffraction grating shown in Figure 2 (see Figure 3). In the figure, 12 is a toroidal diffraction grating substrate, 13 is a spherical mirror with a radius of curvature of 1.000, and 14.15 is a wavelength of 441.6.
This is a laser light source point that emits a nm spherical wave. The specific recording conditions are pc=1.9854, qc=0.9957
, τc=5.2889ro=0.9908,
I=-4,764°, δ=10.134°. In the figure, ■, O mark is A (horizontal by 'A laser beam focus 14,
With the vertical focal point, the distance from the horizontal and vertical light source point of the diffraction grating to the grating substrate can be substantially changed depending on the recording by the astigmatism, that is, the direction of the recording beam. This will allow you to record a grid pattern.

(平面回折格子基板を用いた場合] 第5図は本発明のさらに他の実施例の回折格子の格子パ
ターン記録時の配置を示す図である。
(When a Planar Diffraction Grating Substrate is Used) FIG. 5 is a diagram showing the arrangement of a diffraction grating according to still another embodiment of the present invention when recording a grating pattern.

24は平面口折格子基板、20.22は記録光源点。24 is a plane-opening grating substrate, and 20.22 is a recording light source point.

21は曲率半径1.0000の球面鏡、23は水平方向
の曲率半径1.0000垂直方向の曲率半径0.938
8のトロイダ/l’鏡である。この場合の具体的な記録
条件はレーザ波長441.6nmのレーザ光を用いる場
合。
21 is a spherical mirror with a radius of curvature of 1.0000, 23 is a radius of curvature in the horizontal direction of 1.0000 and a radius of curvature in the vertical direction of 0.938.
8 toroid/l' mirror. The specific recording conditions in this case are when a laser beam with a laser wavelength of 441.6 nm is used.

pc=1.9724   、  qc=0.9767 
 、  τc=5.1211)D=2.0799  1
  qD=0.9879  、  τo = 4 、9
56’1 = 33.438       δ= 1.
210’である。図中■■ばそnぞれレーザ光源点20
゜22の凹面m 21123による水平、垂直方向の焦
点ア であり、こnよりスティグマティック元による記録、す
なわち記録光の光線方同上で回折格子の水平、垂直方向
の光源点から格子基板までの距離全実質的に変えて格子
パターンの記録かできることになる。
pc=1.9724, qc=0.9767
, τc=5.1211)D=2.0799 1
qD=0.9879, τo=4,9
56'1 = 33.438 δ= 1.
210'. In the diagram, laser light source points 20
It is a focal point in the horizontal and vertical directions due to the concave surface m 21123 of ゜22, and from this n, recording by the stigmatic element, that is, the distance from the light source point of the diffraction grating in the horizontal and vertical directions to the grating substrate in the direction of the recording light beam is the same as above. This means that the grid pattern can be recorded with virtually all changes.

第6図は上記実施例の回折格子を用いる分光系の一例を
示す図で、16が入口スリット、17が凹面鏡、18が
本発明による回折格子、19が出口スリットでめる。回
折格子18Iri、波長域300〜900nmにおいて
、水平(分散夕方同焦点とのずれが最小になる位置に設
置する。分光系の配置は図において、凹面鏡17を曲率
半径1 、000の球面fr’J 、1m折格子18を
格子定数”/1200 mm l使用法r=0.775
5  、  D=0.6204  、  r=0.70
64θ=10°   1 2に=20゜ である。
FIG. 6 is a diagram showing an example of a spectroscopic system using the diffraction grating of the above embodiment, in which 16 is an entrance slit, 17 is a concave mirror, 18 is a diffraction grating according to the present invention, and 19 is an exit slit. The diffraction grating 18Iri is installed at a position where the deviation from the horizontal (dispersion evening parfocal) is minimized in the wavelength range of 300 to 900 nm. , the 1m folded grating 18 has a lattice constant "/1200 mm l usage r = 0.775
5, D=0.6204, r=0.70
64θ=10° 1 2 = 20°.

ア 上記実施例では、二つの記録光ともステイグマチイック
元を使用しているが、設計上は二つの記録光のうち、少
なくと奄一方についてだけア Aスティグマティック元、すなわち光源点から格・子基
板までの距離を変えておけば充分なことが多い。
A. In the above embodiment, both of the two recording beams use a stigmatic source, but due to the design, only one of the two recording beams is used as a stigmatic source, that is, a stigmatic source from the light source point. In many cases, it is sufficient to change the distance to the slave board.

(ト)効果 4ツタ九を用い、記録光線方同上で回折格子の水平、垂
直方向の光源点から格子基板までの距離を実質的にスえ
て格子パターンを形成したので9分元器(回折格子)が
発生する収差の補正が従来リホログラフィック回折格子
に比し一層良好になった。特に非点収差の補正に対して
著しい効果がある。第7図はこの効果を示す因で。
(G) Effect 4 Using a 4-point nine, a grating pattern was formed by substantially altering the distance from the light source point of the diffraction grating in the horizontal and vertical directions to the grating substrate in the direction of the recording beam. ) The correction of aberrations that occur is better than that of conventional reholographic diffraction gratings. In particular, it has a remarkable effect on correcting astigmatism. Figure 7 shows this effect.

間隔旧I h量玖二4g)1し21マ開 θ)凸 ≦−
」丘几 シ 980 mmとし、第3図に示した乾板面
3でのいくつかの波長を持つ単色光を入口スリット1の
中心から入射させた場合の収差による広がりを示したも
のである。
Spacing old I h amount Kuji 4g) 1 to 21 ma open θ) Convex ≦-
This figure shows the spread due to aberrations when monochromatic light having several wavelengths is incident from the center of the entrance slit 1 at the dry plate surface 3 shown in FIG.

回折格子の面積は40 X 40 mrnとした。(a
)図は従来の回折格子(第2図)を用いた場合、(b)
図は第1図に示し九本発明の実施例の回折格子を用いた
場合、(C)図は第4図に示し九本発明の他の実施例の
回折格子を用いた場合である。(a)図に比較して1本
発明による(b)図および(e)図では垂直方向の収差
、すなわち非点収差が著しく補正さnていることが認め
らnる。
The area of the diffraction grating was 40×40 mrn. (a
) Figure shows (b) when a conventional diffraction grating (Figure 2) is used.
The figure shows the case where the diffraction grating of the embodiment of the present invention shown in FIG. 1 is used, and the figure (C) shows the case where the diffraction grating of the other embodiment of the present invention shown in FIG. 4 is used. It can be seen that vertical aberrations, that is, astigmatism, are significantly corrected in FIGS. 1B and 2E according to the present invention as compared to FIG. 1A.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は9本発明による回折格子の格子パターン記録時
の配置を示す平面図、第2図は、従来の回折格子の格子
パターン記録時の配fl’に示す平面図、第3図は9本
発明の実施例の回折格子を用いた分光器の平面図、第4
図は9本発明による他の回折格子の格子パターン記録時
の配置を示す平面図、第5図は9本発明によるさらに他
の回折格子の格子パターン記録時の配置を示す平面図、
第6図は第5図実施例の回折格子音用いた分光器の平面
図、第7図は9本発明による回折格子の性能。 効果を示すグラフである。 1.16・・・入ロスリッ)2.18・・・回折格子3
・・・乾板(検出器2面 4、7.12.24・・・回折格子基板5、6.10.
11.14.15.20.22・・・記録光源点8.2
3・・・トロイダ/L’鏡 9.13.21・・・球面
鏡17・・・凹面鏡 19・・・出ロスリットfi:埋
人fF−埋士E Ei 哨 該:5.・。 −;1− 第7図 650hm  750nn−
1 is a plan view showing the arrangement of a diffraction grating according to the present invention at the time of grating pattern recording, FIG. A fourth plan view of a spectrometer using a diffraction grating according to an embodiment of the present invention.
9 is a plan view showing the arrangement of another diffraction grating according to the present invention when recording a grating pattern; FIG. 5 is a plan view showing the arrangement when recording a grating pattern of still another diffraction grating according to the present invention;
6 is a plan view of a spectrometer using the diffraction grating sound of the embodiment shown in FIG. 5, and FIG. 7 shows the performance of the diffraction grating according to the present invention. This is a graph showing the effect. 1.16...Input loss filter) 2.18...Diffraction grating 3
... Dry plate (detector 2 side 4, 7.12.24... Diffraction grating substrate 5, 6.10.
11.14.15.20.22... Recording light source point 8.2
3...Troid/L' mirror 9.13.21...Spherical mirror 17...Concave mirror 19...Output loss slit fi: Buried fF-Buried E Ei Sentence:5.・. -;1- Figure 7 650hm 750nn-

Claims (1)

【特許請求の範囲】[Claims] (1) 回折格子基板面に二つの干渉し得る光束を投影
して干渉パターンを形成させ,この干渉パターンを基板
面に記録して製作された格子パターンを有する回折格子
において,二つの干渉光束の主光線方同上で,回折格子
の水平,垂直方向の発散光源点から回折格子基板までの
距離を実質的に変えたことを特徴とする回折格子。
(1) In a diffraction grating that has a grating pattern produced by projecting two interfering light beams onto the surface of a diffraction grating substrate and forming an interference pattern, this interference pattern is recorded on the substrate surface. A diffraction grating characterized in that the distance from the diverging light source point in the horizontal and vertical directions of the diffraction grating to the diffraction grating substrate is substantially changed in the principal ray direction.
JP23215386A 1986-09-29 1986-09-29 Diffraction grating Expired - Lifetime JPH0827403B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23215386A JPH0827403B2 (en) 1986-09-29 1986-09-29 Diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23215386A JPH0827403B2 (en) 1986-09-29 1986-09-29 Diffraction grating

Publications (2)

Publication Number Publication Date
JPS6385503A true JPS6385503A (en) 1988-04-16
JPH0827403B2 JPH0827403B2 (en) 1996-03-21

Family

ID=16934825

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23215386A Expired - Lifetime JPH0827403B2 (en) 1986-09-29 1986-09-29 Diffraction grating

Country Status (1)

Country Link
JP (1) JPH0827403B2 (en)

Also Published As

Publication number Publication date
JPH0827403B2 (en) 1996-03-21

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