JPS638394A - Fluorine-containing ribofuranoside derivative and production thereof - Google Patents
Fluorine-containing ribofuranoside derivative and production thereofInfo
- Publication number
- JPS638394A JPS638394A JP61149684A JP14968486A JPS638394A JP S638394 A JPS638394 A JP S638394A JP 61149684 A JP61149684 A JP 61149684A JP 14968486 A JP14968486 A JP 14968486A JP S638394 A JPS638394 A JP S638394A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- ribofuranoside
- fluoro
- derivative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229910052731 fluorine Inorganic materials 0.000 title description 16
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title description 8
- 239000011737 fluorine Substances 0.000 title description 8
- HMFHBZSHGGEWLO-SOOFDHNKSA-N D-ribofuranose Chemical class OC[C@H]1OC(O)[C@H](O)[C@@H]1O HMFHBZSHGGEWLO-SOOFDHNKSA-N 0.000 title description 3
- 125000006239 protecting group Chemical group 0.000 claims abstract description 25
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 17
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 14
- 125000005843 halogen group Chemical group 0.000 claims abstract description 10
- 238000010511 deprotection reaction Methods 0.000 claims abstract description 5
- 102000039446 nucleic acids Human genes 0.000 claims abstract description 5
- 108020004707 nucleic acids Proteins 0.000 claims abstract description 5
- 150000007523 nucleic acids Chemical class 0.000 claims abstract description 4
- 230000001603 reducing effect Effects 0.000 claims abstract description 4
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 39
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 11
- 239000000126 substance Substances 0.000 claims description 4
- -1 -OX (X is H Chemical group 0.000 abstract description 13
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract description 11
- 239000002246 antineoplastic agent Substances 0.000 abstract description 2
- 239000003443 antiviral agent Substances 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 2
- YZCFDEQHNNRBNR-FDYHWXHSSA-N [(2r,3r,4s,5r)-3-fluoro-5-methoxy-4-phenylmethoxyoxolan-2-yl]methanol Chemical compound CO[C@@H]1O[C@H](CO)[C@@H](F)[C@H]1OCC1=CC=CC=C1 YZCFDEQHNNRBNR-FDYHWXHSSA-N 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 description 32
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 13
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 11
- 125000001153 fluoro group Chemical group F* 0.000 description 11
- 238000003786 synthesis reaction Methods 0.000 description 11
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 235000000346 sugar Nutrition 0.000 description 8
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 7
- 125000003710 aryl alkyl group Chemical group 0.000 description 7
- 238000003682 fluorination reaction Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000006722 reduction reaction Methods 0.000 description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000004440 column chromatography Methods 0.000 description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- UKVIEHSSVKSQBA-UHFFFAOYSA-N methane;palladium Chemical compound C.[Pd] UKVIEHSSVKSQBA-UHFFFAOYSA-N 0.000 description 5
- 239000002777 nucleoside Substances 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 4
- GFFGJBXGBJISGV-UHFFFAOYSA-N Adenine Chemical compound NC1=NC=NC2=C1N=CN2 GFFGJBXGBJISGV-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- XRECTZIEBJDKEO-UHFFFAOYSA-N flucytosine Chemical compound NC1=NC(=O)NC=C1F XRECTZIEBJDKEO-UHFFFAOYSA-N 0.000 description 4
- 229960004413 flucytosine Drugs 0.000 description 4
- 239000012025 fluorinating agent Substances 0.000 description 4
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 4
- 125000003835 nucleoside group Chemical group 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 150000008163 sugars Chemical class 0.000 description 4
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 4
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
- 238000004293 19F NMR spectroscopy Methods 0.000 description 3
- 229930024421 Adenine Natural products 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 3
- 229960000643 adenine Drugs 0.000 description 3
- 125000001118 alkylidene group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 239000012043 crude product Substances 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- 238000005984 hydrogenation reaction Methods 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 125000000714 pyrimidinyl group Chemical group 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- RTKMFQOHBDVEBC-UHFFFAOYSA-N 3-bromo-3-buten-1-ol Chemical compound OCCC(Br)=C RTKMFQOHBDVEBC-UHFFFAOYSA-N 0.000 description 2
- KDCGOANMDULRCW-UHFFFAOYSA-N 7H-purine Chemical compound N1=CNC2=NC=NC2=C1 KDCGOANMDULRCW-UHFFFAOYSA-N 0.000 description 2
- 102100022210 COX assembly mitochondrial protein 2 homolog Human genes 0.000 description 2
- GHASVSINZRGABV-UHFFFAOYSA-N Fluorouracil Chemical compound FC1=CNC(=O)NC1=O GHASVSINZRGABV-UHFFFAOYSA-N 0.000 description 2
- 101000900446 Homo sapiens COX assembly mitochondrial protein 2 homolog Proteins 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ISAKRJDGNUQOIC-UHFFFAOYSA-N Uracil Chemical compound O=C1C=CNC(=O)N1 ISAKRJDGNUQOIC-UHFFFAOYSA-N 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- OPTASPLRGRRNAP-UHFFFAOYSA-N cytosine Chemical compound NC=1C=CNC(=O)N=1 OPTASPLRGRRNAP-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229960002949 fluorouracil Drugs 0.000 description 2
- 229930182470 glycoside Natural products 0.000 description 2
- UYTPUPDQBNUYGX-UHFFFAOYSA-N guanine Chemical compound O=C1NC(N)=NC2=C1N=CN2 UYTPUPDQBNUYGX-UHFFFAOYSA-N 0.000 description 2
- 239000012442 inert solvent Substances 0.000 description 2
- 229940075610 mercuric cyanide Drugs 0.000 description 2
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- RWQNBRDOKXIBIV-UHFFFAOYSA-N thymine Chemical compound CC1=CNC(=O)NC1=O RWQNBRDOKXIBIV-UHFFFAOYSA-N 0.000 description 2
- WJKHJLXJJJATHN-UHFFFAOYSA-N triflic anhydride Chemical compound FC(F)(F)S(=O)(=O)OS(=O)(=O)C(F)(F)F WJKHJLXJJJATHN-UHFFFAOYSA-N 0.000 description 2
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 2
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 2
- STMUIVWQDNMZCA-CRKDRTNXSA-N (2s,3r,4s,5r)-2-(6-aminopurin-9-yl)-2-fluoro-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound C1=NC=2C(N)=NC=NC=2N1[C@]1(F)O[C@H](CO)[C@@H](O)[C@H]1O STMUIVWQDNMZCA-CRKDRTNXSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 1
- WKMPTBDYDNUJLF-UHFFFAOYSA-N 2-fluoroadenine Chemical compound NC1=NC(F)=NC2=C1N=CN2 WKMPTBDYDNUJLF-UHFFFAOYSA-N 0.000 description 1
- YSNABXSEHNLERR-ZIYNGMLESA-N 5'-Deoxy-5-fluorocytidine Chemical compound O[C@@H]1[C@H](O)[C@@H](C)O[C@H]1N1C(=O)N=C(N)C(F)=C1 YSNABXSEHNLERR-ZIYNGMLESA-N 0.000 description 1
- LMNPKIOZMGYQIU-UHFFFAOYSA-N 5-(trifluoromethyl)-1h-pyrimidine-2,4-dione Chemical compound FC(F)(F)C1=CNC(=O)NC1=O LMNPKIOZMGYQIU-UHFFFAOYSA-N 0.000 description 1
- KSNXJLQDQOIRIP-UHFFFAOYSA-N 5-iodouracil Chemical compound IC1=CNC(=O)NC1=O KSNXJLQDQOIRIP-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- WABFRTVFIWTTDD-UHFFFAOYSA-N Cl.C(C)(C)(C)[SiH](C)C Chemical compound Cl.C(C)(C)(C)[SiH](C)C WABFRTVFIWTTDD-UHFFFAOYSA-N 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- MNZMECMQTYGSOI-UHFFFAOYSA-N acetic acid;hydron;bromide Chemical compound Br.CC(O)=O MNZMECMQTYGSOI-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000002256 antimetabolite Substances 0.000 description 1
- RTEXIPZMMDUXMR-UHFFFAOYSA-N benzene;ethyl acetate Chemical compound CCOC(C)=O.C1=CC=CC=C1 RTEXIPZMMDUXMR-UHFFFAOYSA-N 0.000 description 1
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- MDHYEMXUFSJLGV-UHFFFAOYSA-N beta-phenethyl acetate Natural products CC(=O)OCCC1=CC=CC=C1 MDHYEMXUFSJLGV-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 235000014633 carbohydrates Nutrition 0.000 description 1
- 238000009903 catalytic hydrogenation reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- 229940104302 cytosine Drugs 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- MHDVGSVTJDSBDK-UHFFFAOYSA-N dibenzyl ether Chemical compound C=1C=CC=CC=1COCC1=CC=CC=C1 MHDVGSVTJDSBDK-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229960002523 mercuric chloride Drugs 0.000 description 1
- LWJROJCJINYWOX-UHFFFAOYSA-L mercury dichloride Chemical compound Cl[Hg]Cl LWJROJCJINYWOX-UHFFFAOYSA-L 0.000 description 1
- GPKUICFDWYEPTK-UHFFFAOYSA-N methoxycyclohexatriene Chemical group COC1=CC=C=C[CH]1 GPKUICFDWYEPTK-UHFFFAOYSA-N 0.000 description 1
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical group [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 description 1
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- OKWDNMGIIOQOFT-UHFFFAOYSA-N n-(5-fluoro-2-oxo-1h-pyrimidin-6-yl)-4-methylbenzamide Chemical compound C1=CC(C)=CC=C1C(=O)NC1=NC(=O)NC=C1F OKWDNMGIIOQOFT-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 150000003833 nucleoside derivatives Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000001766 physiological effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 150000003212 purines Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- 229940113082 thymine Drugs 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
- DBGVGMSCBYYSLD-UHFFFAOYSA-N tributylstannane Chemical compound CCCC[SnH](CCCC)CCCC DBGVGMSCBYYSLD-UHFFFAOYSA-N 0.000 description 1
- AKQNYQDSIDKVJZ-UHFFFAOYSA-N triphenylsilane Chemical compound C1=CC=CC=C1[SiH](C=1C=CC=CC=1)C1=CC=CC=C1 AKQNYQDSIDKVJZ-UHFFFAOYSA-N 0.000 description 1
- NFHRNKANAAGQOH-UHFFFAOYSA-N triphenylstannane Chemical compound C1=CC=CC=C1[SnH](C=1C=CC=CC=1)C1=CC=CC=C1 NFHRNKANAAGQOH-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 229940035893 uracil Drugs 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Saccharide Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は新規な含フツ素リボフラノシド誘導体およびそ
の製造法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel fluorine-containing ribofuranoside derivative and a method for producing the same.
フッ素原子を有する糖は、医薬品の重要な構成単位とし
て、また糖自身の高い生理活性に注目して多方面に応用
されている。たとえば、含フッ素糖を有するヌクレオシ
ド類は抗ウィルス剤や抗腫四則として知られている。具
体的には、2−チオキシ−2,2−ジフルオロリボフラ
ノシド誘導体(特開昭59−175498号公報参照)
や3−チオキシ−3−フルオロ−α−D−キシロフラノ
シド誘導体(J、A、Wright他、 Carboh
ydrateResearch、18.345−347
(1971)、およびY、Fouron他、 lorg
、che+*、、 39.1564−1570(197
4)参照)、5゛−デオキシ−5−フルオロシチジンま
たは一ウリジン(特開昭53−95982号公報参照)
などが知られている。Sugars containing fluorine atoms are used in a wide variety of fields as important constituent units of pharmaceuticals, and due to their high physiological activity. For example, nucleosides containing fluorine-containing sugars are known as antiviral agents and antitumor agents. Specifically, 2-thioxy-2,2-difluororibofuranoside derivatives (see JP-A-59-175498)
and 3-thioxy-3-fluoro-α-D-xylofuranoside derivatives (J. A. Wright et al., Carboh
ydrateResearch, 18.345-347
(1971), and Y., Fouron et al., rog.
,che+*,, 39.1564-1570 (197
4)), 5'-deoxy-5-fluorocytidine or monouridine (see JP-A-53-95982)
etc. are known.
フッ素原子は水酸基に比較して炭素原子に対する結合力
が極めて大きく、不活性で、かつ疎水性であり、しかも
水酸基に近似した原子サイズを有する。従って、糖の水
酸基をフッ素原子に置換すると代謝拮抗作用などの面で
優れた効果を期待しうる。一方、糖としては、ヌクレオ
シドの構成単位であるリポースや2−デオキシリポース
が応用範囲が広い。しかし、上記公知の含フッ素糖は、
リポースや2−デオキシリポースの水酸基の立体的位置
のみにフッ素原子が置換されていない、たとえば、2−
デオキシ−2,2−ジフルオロリボフラノシド誘導体に
あっては本来水酸基の存在しなかった位置にもフッ素原
子が存在し、3−チオキシ−3−フルオロ−β−D−キ
シロフラノシド誘導体にあっては、リポースの水酸基の
存在する位置にフッ素原子が存在していない、また上記
デオキシヌクレオシドにおいては糖部分にフッ素原子を
有していない。Fluorine atoms have an extremely strong binding force to carbon atoms compared to hydroxyl groups, are inert and hydrophobic, and have an atomic size similar to that of hydroxyl groups. Therefore, replacing the hydroxyl group of sugar with a fluorine atom can be expected to have excellent effects in terms of antimetabolism and the like. On the other hand, as sugars, lipose and 2-deoxy lipose, which are constituent units of nucleosides, have a wide range of applications. However, the above-mentioned known fluorinated sugars are
The fluorine atom is not substituted only at the steric position of the hydroxyl group of lipose or 2-deoxy lipose, for example, 2-deoxy lipose.
In deoxy-2,2-difluororibofuranoside derivatives, fluorine atoms are present even in positions where hydroxyl groups were not originally present, and in 3-thioxy-3-fluoro-β-D-xylofuranoside derivatives, A fluorine atom is not present in the position of a hydroxyl group in lipoose, and the sugar moiety of the above deoxynucleoside does not have a fluorine atom.
本発明者は、リポースの3位の水酸基の立体的位置にフ
ッ素原子を導入すべく、かつ5位水酸基の除去を研究検
討した結果、新規な3,5−ジデオキシ−3−フルオロ
−D−リボフラノシド誘導体を見出すに至った0本発明
は以下のこの新規なフッ素原子を宥するリボフラノシド
誘導体とその製造法である。As a result of research and study on the removal of the 5-position hydroxyl group in order to introduce a fluorine atom into the steric position of the 3-position hydroxyl group of Ripose, the present inventor discovered a novel 3,5-dideoxy-3-fluoro-D-ribofuranoside. The present invention, which has led to the discovery of the derivative, is the following new ribofuranoside derivative that accommodates the fluorine atom and a method for producing the same.
下記式 [I] で表わされる3、5−ジデオキシ−3
−フルオロ−D−リボフラノシド誘導体。3,5-dideoxy-3 represented by the following formula [I]
-Fluoro-D-ribofuranoside derivative.
ただし、R:ハロゲン原子、−0X(Xは水素原子、ア
ルキル基、あるいは
保護基)、あるいは核酸塩基
類の残基。However, R: a halogen atom, -0X (X is a hydrogen atom, an alkyl group, or a protective group), or a residue of a nucleobase.
R1:水素原子、あるいは保護基。R1: hydrogen atom or protective group.
下記式[11] で表わされるフラノシド誘導体の5位
の水酸基を還元して5−デオキシ体に銹導すること、次
いで必要により脱葆護、核酸塩基類の導入などを行うこ
とを特徴とする上記式[I] で表わされる3、5−ジ
デオキシ−3−フルオロ−D−リボフラノシド誘導体の
製造法。The above method is characterized in that the hydroxyl group at the 5-position of the furanoside derivative represented by the following formula [11] is reduced to form a 5-deoxy compound, and then, if necessary, deprotection, introduction of a nucleic acid base, etc. A method for producing a 3,5-dideoxy-3-fluoro-D-ribofuranoside derivative represented by formula [I].
ただし、R2:アルコキシ基、保護基で保護された水酸
基、あるいは
ハロゲン原子。However, R2: an alkoxy group, a hydroxyl group protected with a protective group, or a halogen atom.
R3:保護基。R3: Protecting group.
上記式[I] で表わされる化合物は、含フツ素ヌクレ
オシド1類とその合成中間体として有用な含フツ素リボ
フラノシド類の両者を含む、後者は、Rが核酸塩基類を
除く基である化合物である。この場合、Rは塩素原子、
臭素原子、あるいはヨウ素原子であるか、上記−Oxが
アルコキシ基であることが好ましく、特に臭素原子であ
るか低級アルコキシ基(炭素数4以下のものをいう)、
特にメトキシ基が好ましい、Rの位置はβ位(前記式[
11において図上方)が適当であるが、反応経路の途中
ではα位あるいはβ位とα位の混合物となってもよい、
含フツ素ヌクレオシド類においてはRはβ位である。The compound represented by the above formula [I] includes both fluorine-containing nucleosides of type 1 and fluorine-containing ribofuranosides useful as synthetic intermediates thereof, and the latter is a compound in which R is a group excluding nucleobases. be. In this case, R is a chlorine atom,
It is preferably a bromine atom or an iodine atom, or the above -Ox is an alkoxy group, particularly a bromine atom or a lower alkoxy group (referring to one having 4 or less carbon atoms),
A methoxy group is particularly preferred, and the R position is at the β position (the above formula [
11) is appropriate, but in the middle of the reaction route it may be at the α position or a mixture of the β and α positions.
In fluorine-containing nucleosides, R is at the β position.
RIJ2、およびXが水酸基の保護基である場合、それ
らは公知の水酸基の保護基が適当である。When RIJ2 and X are hydroxyl-protecting groups, known hydroxyl-protecting groups are suitable.
たとえば、トリ(アルキル、アリール、あるいはアルア
ルキル)シリル基、アシル基、アルアルキル基などがあ
る。アリール基やアルアルキル基の芳香核はアルキル基
やアルコキシ基などの置換基を有していてもよい、また
、ケイ素原子に結合する3個の上記有機基は同一でも互
いに異なっていてもよい、具体的には、たとえば、トリ
メチルシリル基、トリエチルシリル基、t−ブチルジメ
チルシリル基、フェニルジメチルシリル基、アセチル基
、ベンゾイル基、ベンジル基、トリチル基、トリス(P
−メトキシフェニル)メチル基などの保護基がある。さ
らに、ある場合1こは、アルキル基を保護基として使用
しうる。このアルキル基としては低級アルキル基、特に
メチル基が適当である。Examples include tri(alkyl, aryl, or aralkyl)silyl groups, acyl groups, and aralkyl groups. The aromatic nucleus of the aryl group or aralkyl group may have a substituent such as an alkyl group or an alkoxy group, and the three organic groups bonded to the silicon atom may be the same or different from each other. Specifically, for example, trimethylsilyl group, triethylsilyl group, t-butyldimethylsilyl group, phenyldimethylsilyl group, acetyl group, benzoyl group, benzyl group, trityl group, tris(P
-methoxyphenyl)methyl group. Furthermore, in some cases an alkyl group may be used as a protecting group. Suitable examples of this alkyl group include lower alkyl groups, particularly methyl groups.
Rが核酸塩基類である場合、それらはプリン残基、ピリ
ミジン残基、およびハロゲン原子、ハロアルキル基、ア
ルキル基、その他の置換基を有するプリン残基あるいは
ピリミジン残基からなる。たとえば、アデニン、グアニ
ン、シトシン、チミン、ウラシル、5−フルオロウラシ
ル、5−フルオロシトシン、2−フルオロアデニン、5
−トリフルオロメチルウラシル、5−ヨードウラシルな
どの化合物から環の窒素原子に結合した水素原子を除い
た残基である。好ましくは、A換基を有しない上記5種
の核酸塩基あるいは5−フルオロウラシル、5−フルオ
ロシトシンの残基である。When R is a nucleobase, it consists of purine residues, pyrimidine residues, and purine or pyrimidine residues having halogen atoms, haloalkyl groups, alkyl groups, or other substituents. For example, adenine, guanine, cytosine, thymine, uracil, 5-fluorouracil, 5-fluorocytosine, 2-fluoroadenine, 5
- It is a residue obtained by removing the hydrogen atom bonded to the nitrogen atom of the ring from a compound such as trifluoromethyluracil or 5-iodouracil. Preferably, the above-mentioned five types of nucleobases having no A substituent or residues of 5-fluorouracil and 5-fluorocytosine are preferable.
前記式[I] で表わされる含フッ素糖は、前記式[I
I] で表わされるフラノシド誘導体よりその5位の水
酸基を還元して製造されることが望ましい、5位水酸基
の還元には、この水酸基をアセチル化した後、トリフェ
ニルシランで還元する方法、チオカーバメートとした後
トリブチルスズハイドライドやトリフェニルスズハイド
ライドで還元する方法、トリフェニルホスファイトメチ
オダイトや、トリフェニルホスフィン−ヨウ素でヨウ素
化体とした後、パラジウム−炭素などの貴金属触媒を用
いてアルコール中トリエチルアミンなどの有機塩基を加
えて接触水添したリラネーニッケルを用いたりして還元
する方法などの還元方法の採用が望ましい、好ましくは
、トリフェニルホスファイトメチオダイトや、トリフェ
ニルホスフィン−ヨウ素でヨウ素化体とした後、パラジ
ウム−炭素を用いてトリエチルアミン存在下接触水添す
る方法が採用される。前記式[R1で表わされる化合物
としては、R2が還元作用し対し不活性である必要があ
る。従って、前記式[I]のRの内保護されていない水
酸基や核酸塩基類の残基はR2として採用できない、R
がこれらの基である式[I]で表わされる化合物は、式
[11]で表わされる化合物の還元後にこれらの基に変
換あるいは導入される。好ましいR2は低級アルコキシ
基とハロゲン原子であり、特にメトキシ基が最も好まし
い、また、その位置はβ位であることが好ましい、同様
に2位の水酸基も還元作用を受けないように保護基R3
で保護されている必要がある R3としては特にベンジ
ル基が好ましいが、これに限られず前記のようなそれ以
外の保護基であってもよい、 R3がベンジル基である
場合、上記還元反応時にこのベンジル基が脱保護され、
生成物は2位の水酸基が保護されていない化合物となる
。しかし、5位の水酸基の還元と2位の水酸基の脱保護
は別の工程で行ってもよい、2位の水酸基の保護基R3
の脱離は水素添加などによって行われる。たとえばR3
がベンジル基の場合、パラジウム−炭素などを触媒とし
て水素添加により脱離される。Rが核酸塩基の残基でな
い式[I]で表わされる化合物に核酸塩基の残基を導入
する場合は、2位の水酸基を再び保護することが通常必
要である。この保護基としては、アセチル基やベンゾイ
ル基などのアシル基を採用しうる。The fluorine-containing sugar represented by the above formula [I] is the fluorine-containing sugar represented by the above formula [I]
Desirably, the hydroxyl group at the 5-position is produced by reducing the hydroxyl group at the 5-position from a furanoside derivative represented by I]. For the reduction of the hydroxyl group at the 5-position, the hydroxyl group is acetylated and then reduced with triphenylsilane. After that, it is reduced with tributyltin hydride or triphenyltin hydride, or it is iodinated with triphenylphosphite methiodite or triphenylphosphine-iodine, and then triethylamine is reduced in alcohol using a noble metal catalyst such as palladium-carbon. It is desirable to adopt a reduction method such as a reduction method using Liraney nickel which is catalytically hydrogenated by adding an organic base such as A method of catalytic hydrogenation using palladium-carbon in the presence of triethylamine is adopted. In the compound represented by the above formula [R1, R2 must be inactive against reducing action. Therefore, unprotected hydroxyl groups and nucleobase residues of R in formula [I] cannot be used as R2.
A compound represented by formula [I] in which is one of these groups is converted or introduced into one of these groups after reduction of a compound represented by formula [11]. Preferred R2 is a lower alkoxy group and a halogen atom, most preferably a methoxy group, and its position is preferably at the β position.Similarly, the hydroxyl group at the 2nd position is also protected by a protective group R3
R3 is particularly preferably a benzyl group, but is not limited to this and may be any other protecting group as mentioned above. If R3 is a benzyl group, this is protected during the above reduction reaction. The benzyl group is deprotected,
The product becomes a compound in which the 2-position hydroxyl group is not protected. However, the reduction of the 5-position hydroxyl group and the deprotection of the 2-position hydroxyl group may be carried out in separate steps. Protecting group R3 of the 2-position hydroxyl group
Desorption is performed by hydrogenation or the like. For example R3
When is a benzyl group, it is eliminated by hydrogenation using palladium-carbon or the like as a catalyst. When a nucleobase residue is introduced into a compound represented by formula [I] in which R is not a nucleobase residue, it is usually necessary to protect the 2-position hydroxyl group again. As this protecting group, an acyl group such as an acetyl group or a benzoyl group can be employed.
核酸塩基類の残基の導入は種々の方法で行いうる。たと
えば、文献(Wright、Carbohydrate
Research、 18.345(1971)記載の
方法などを採用しうる。この方法は、1位の水酸基やそ
の誘4基を臭素原子に置換し、この臭素原子を核酸塩基
類の残基に置換する方法である。具体的には、Rがアル
コキシ基である前記式[I]で表わされる化合物(ただ
し、R1は保護基)を臭化水素酸−酢酸溶液でそのアル
コキシ基を臭素原子に変換し、次いで、このプロミドと
6−ベンズアミノプリンなどの反応性プリン誘導体とを
シアン化第二水銀存在下ニトロメタン中で反応させて臭
素原子をプリン残基に置換する。同様にピリミジン残基
の導入を行うことができる。@後に保護記を外すことに
より、3位にフッ素原子を含有するヌクレオシドが得ら
れる。Introduction of nucleobase residues can be carried out in various ways. For example, in the literature (Wright, Carbohydrate
Research, 18.345 (1971), etc. may be employed. This method is a method in which the hydroxyl group at the 1-position or its 4-group is substituted with a bromine atom, and the bromine atom is substituted with a residue of a nucleic acid base. Specifically, the alkoxy group of a compound represented by the above formula [I] in which R is an alkoxy group (wherein R1 is a protecting group) is converted to a bromine atom with a hydrobromic acid-acetic acid solution, and then the alkoxy group is converted to a bromine atom. Bromide and a reactive purine derivative such as 6-benzaminopurine are reacted in nitromethane in the presence of mercuric cyanide to replace the bromine atom with a purine residue. Introduction of pyrimidine residues can be carried out in a similar manner. By removing the protective symbol after @, a nucleoside containing a fluorine atom at the 3-position can be obtained.
前記式[1] で表わされるフラノシド誘導体は新規な
化′合物である。この化合物およびその製造法は、本発
明者らの発明に係る先願(特願昭80−220188号
)に記載されている。以下、その概要を説明する。The furanoside derivative represented by the above formula [1] is a novel chemical compound. This compound and its manufacturing method are described in a previous application (Japanese Patent Application No. 80-220188) related to the invention by the present inventors. The outline will be explained below.
式[fl] で表わされるフラノシド誘導体は、下記式
[ml で表わされる化合物をフッ素化剤でフッ素化す
ることにより製造される。The furanoside derivative represented by the formula [fl] is produced by fluorinating a compound represented by the following formula [ml] with a fluorinating agent.
ただし、l12a、アルコキシ基、保護された水酸基、
あるいはハロゲン原子、
R5,R6:同一あるいは異る保護基
Y:水素原子あるいは脱離基
特に、R4は前記R2と同じ基であり、R5は前記R工
と同じ基でおることが好ましい、しかし、必ずしもこれ
に限られず、異る基を採用し還元前にそれぞれR2とR
3に変換してもよい R4は低級アルコキシ基、特にメ
トキシ基が好ましい。However, l12a, alkoxy group, protected hydroxyl group,
or a halogen atom; R5, R6: the same or different protecting group; Y: a hydrogen atom or a leaving group. In particular, R4 is preferably the same group as the above R2, and R5 is preferably the same group as the above R group; however, The invention is not necessarily limited to this, and different groups may be employed to form R2 and R, respectively, before reduction.
3. R4 is preferably a lower alkoxy group, particularly a methoxy group.
R4はハロゲン原子であってもよいが、フッ素化時では
アルコキシ基であることが好ましい、また、その位置は
β位であることが好ましい 1li4とR5はいずれも
前記と同様の水酸基の保護基であり、両者は同一であっ
ても異っていてもよい、その内R5はアルキル基やアル
アルキル基が好ましく、特にベンジル基などのフルフル
キル基が好ましい R6はアルキル基以外の保護基。R4 may be a halogen atom, but it is preferably an alkoxy group during fluorination, and its position is preferably at the β position. 1li4 and R5 are both hydroxyl protecting groups as described above. R5 is preferably an alkyl group or an aralkyl group, particularly a furfurkyl group such as a benzyl group. R6 is a protective group other than an alkyl group.
たとえばトリアルキルシリル基やアルアルキル基が好ま
しく、特にt−ブチルジメチルシリル基か好ましい、Y
は水素原子であってもよいが、3位に結合した水酸基の
フッ素化は必ずしも容易ではなく、好ましくは脱離基(
Y’で表わす)を導入した後フッ素化が行われる。この
脱離基は3位の水酸基を活性化した後フッ素化を容易に
する基であり、たとえば、メタンスルホニル基、トリフ
ルオロメタンスルホニル基、p−トルエンスルホニル基
、イミダゾイルスルホニル基、アセチル基、トリメチル
シリル基などがある。特にトリフルオロメタンスルホニ
ル基が活性化作用が高く、好ましい脱離基として使用さ
れる。For example, a trialkylsilyl group or an aralkyl group is preferable, and a t-butyldimethylsilyl group is particularly preferable.
may be a hydrogen atom, but fluorination of the hydroxyl group bonded to the 3-position is not necessarily easy, and it is preferable to use a leaving group (
After the introduction of Y'), fluorination is carried out. This leaving group is a group that facilitates fluorination after activating the 3-position hydroxyl group, and examples include methanesulfonyl group, trifluoromethanesulfonyl group, p-toluenesulfonyl group, imidazoylsulfonyl group, acetyl group, and trimethylsilyl group. There are bases etc. In particular, a trifluoromethanesulfonyl group has a high activation effect and is preferably used as a leaving group.
フッ素化剤としては、公知のフッ素化剤を使用しうるが
、特にフッ化テトラアルキル(あるいはアルアルキル)
アンモニウムが適当である。アルキル基としては低級ア
ルキル基、アルアルキル基としてはベンジル基が適当で
あり、4個のアルキル基やアルアルキル基は異っていて
もよく、アルキル基とフルアルキル基の両者からなって
いてもよい、好ましくは、フッ化テトラブチルアンモニ
ウムが使用される。これらフッ素化剤は通常テトラヒド
ロフランなどの不活性溶媒に溶解して使用される。フッ
素化反応は通常不活性溶媒中数十度以下の温度で行われ
、特に約0 ’C〜室温下で行われることが好ましい。As the fluorinating agent, known fluorinating agents can be used, but in particular tetraalkyl fluoride (or aralkyl fluoride)
Ammonium is suitable. As the alkyl group, a lower alkyl group is suitable, and as the aralkyl group, a benzyl group is suitable, and the four alkyl groups and aralkyl groups may be different, or may consist of both an alkyl group and a full alkyl group. Preferably, tetrabutylammonium fluoride is used. These fluorinating agents are usually used dissolved in an inert solvent such as tetrahydrofuran. The fluorination reaction is usually carried out in an inert solvent at a temperature of several tens of degrees Celsius or less, and preferably at about 0'C to room temperature.
前記式[mlで表わされる化合物は立体特異的に合成さ
れる必要がある。また、3位の水酸基を除く他の水酸基
はフッ素化反応を受けないように選択的に保護されてい
なくてはならない、これらの理由により、式[mlで表
わされる化合物は下記の経路で合成されることが好まし
い、なお、R4はアルコキシ基であるとする。The compound represented by the formula [ml needs to be stereospecifically synthesized. In addition, the hydroxyl groups other than the 3-position hydroxyl group must be selectively protected so as not to undergo the fluorination reaction.For these reasons, the compound represented by the formula [ml] was synthesized by the following route. It is preferable that R4 is an alkoxy group.
R7はアルキリデン基を表わし、炭素数7以下のアルキ
リデン基が好ましく、特にインプロピリデン基が好まし
い0式(1)の化合物は3位と5位の水酸基がこのアル
キリデン基で保護されたβ−D−キシロフラノシド誘導
体であり、この化合物の2位の水酸基を前記R5、特に
ベンジル基、で保護して式(2)で表わされるキシロフ
ラノシド誘導体とする0次にR7を外して、3位と5位
の水酸基を脱保護する。この脱保護は酸触媒存在下で容
易に行いうる。酸触媒としては硫酸や塩酸などの無機酸
や酢酸などの有機酸を使用しうるが、fi=酸を用いる
のが簡便である。このとき、R5は脱離してはならず、
従って前記のような保護基が採用される。得られた式(
3)で表わされる化合物の5位の水酸基を選択的に保護
基R6、特にt−ブチルジメチルシリル基で保護するこ
とにより1式(4)で表わされる化合物が得られる0次
に、3位の水酸基に脱離基Y′を導入して、目的とする
式(5)で表わされる化合物を得る。しかし、前記のよ
うに式(4)で表わされる化合物を直接フッ素化するこ
ともできるので、必ずしも式(5)で表される化合物の
合成は必要ではない。R7 represents an alkylidene group, preferably an alkylidene group having 7 or less carbon atoms, and particularly preferably an impropylidene group. The compound of formula (1) is a β-D compound in which the hydroxyl groups at the 3- and 5-positions are protected by this alkylidene group. -A xylofuranoside derivative represented by the formula (2) by protecting the hydroxyl group at the 2-position of this compound with the above-mentioned R5, especially a benzyl group. Next, R7 is removed and the 3- and 5-position Deprotect the hydroxyl group. This deprotection can be easily carried out in the presence of an acid catalyst. As the acid catalyst, an inorganic acid such as sulfuric acid or hydrochloric acid or an organic acid such as acetic acid can be used, but it is convenient to use fi=acid. At this time, R5 must not be desorbed,
Therefore, protecting groups as described above are employed. The resulting formula (
By selectively protecting the hydroxyl group at the 5-position of the compound represented by 3) with a protecting group R6, particularly a t-butyldimethylsilyl group, a compound represented by the formula 1 (4) can be obtained. A leaving group Y' is introduced into the hydroxyl group to obtain the desired compound represented by formula (5). However, since the compound represented by formula (4) can be directly fluorinated as described above, it is not necessarily necessary to synthesize the compound represented by formula (5).
このような反応経路を採用する理由は、2位と3位の水
酸基の反応性が近似しているため、2位の水酸基のみに
保護基を導入する必要があることと、3位の水酸基の立
体位置を保持させる必要があることによる。The reason for adopting this reaction route is that the reactivity of the 2- and 3-position hydroxyl groups is similar, so it is necessary to introduce a protecting group only to the 2-position hydroxyl group, and the 3-position hydroxyl group This is due to the need to maintain the three-dimensional position.
前記式[mlで表わされる化合物、即ち上記式(4)あ
るいは(5)で表わされる化合物をフッ素化することに
より、フッ素原子がOY基の立体的に反対の側に結合し
、OYが脱離する6通常、このフッ素化と同時に、5位
の水酸基の保護基が外れ、前記式[II]で表わされる
フラノシド誘導体が得られる。By fluorinating the compound represented by the above formula [ml, that is, the compound represented by the above formula (4) or (5), the fluorine atom is bonded to the sterically opposite side of the OY group, and OY is eliminated. 6 Usually, at the same time as this fluorination, the protecting group for the 5-position hydroxyl group is removed, yielding a furanoside derivative represented by the above formula [II].
[実施例]
以下、本発明は実施例等により具体的の説明するが、本
発明はこれら実施例に限られるものではない。なお、合
成例は、前記式[11]で表わされる化合物の合成例で
ある。[Examples] Hereinafter, the present invention will be specifically explained with reference to Examples, but the present invention is not limited to these Examples. Note that the synthesis example is a synthesis example of a compound represented by the above formula [11].
合成例
■ メチル 2−0−ベンジル−3,5−0−インプロ
ピリデン−β−D−キシロフラノシド[式(2)におい
て、R4がメトキン基、R5がベンジル基、R7がイン
プロピリデン基である化合物]の合成。Synthesis example ■ Methyl 2-0-benzyl-3,5-0-impropylidene-β-D-xylofuranoside [In formula (2), R4 is a metquin group, R5 is a benzyl group, and R7 is an impropylidene group synthesis of compounds].
メチル 3.5−0−インプロピリデン−β−D−キシ
ロフラノシド25g(0,23mol)と、酸化銀(3
0g)のN、N−ジメチルホルムアミド懸濁液にベンジ
ルプロミド(42g)を加え、室温で36時間攪拌した
6反応液を濾過し、水を加え、クロロホルム抽出した。Methyl 3.5-0-Impropylidene-β-D-xylofuranoside 25 g (0.23 mol) and silver oxide (3
Benzyl bromide (42 g) was added to a suspension of N,N-dimethylformamide (0 g) in N,N-dimethylformamide, and the reaction solution was stirred at room temperature for 36 hours. The reaction solution was filtered, water was added, and extracted with chloroform.
カラムクロマト精製し、ベンジルエーテル25g(収率
70%)を得た。The product was purified by column chromatography to obtain 25 g (yield: 70%) of benzyl ether.
’ H−N)IR(C:DC13) :δ1.3B(s
、6H) 、3.41(s、3H) 。'H-N)IR(C:DC13) :δ1.3B(s
, 6H), 3.41(s, 3H).
3.84.5(m、5H)、 4.59(s、2H)、
4.98(s、IH)。3.84.5 (m, 5H), 4.59 (s, 2H),
4.98 (s, IH).
7.32(g、5H)。7.32 (g, 5H).
(Φ メチル 2−0−ベンジル−β−D−キシロフラ
ノシド[式(3)において、R4がメトキシ基、R5が
ベンジル基である化合物〕の合成。(Synthesis of Φ methyl 2-0-benzyl-β-D-xylofuranoside [a compound in which R4 is a methoxy group and R5 is a benzyl group in formula (3)]).
メチル 2−0−ベンジル−3,5−0−インプロピリ
デン−β−D−キシロフラノシドBog(0,2mat
)を酢酸(120m12)−水(50a+I2)に溶か
し、50℃の湯浴上で1時間反応させた。温浴を50℃
に保ったまま低沸点物を留去した。カラムクロマト精製
しジオール42g(収率80%)を得た。Methyl 2-0-benzyl-3,5-0-inpropylidene-β-D-xylofuranoside Bog (0,2mat
) was dissolved in acetic acid (120m12)-water (50a+I2) and reacted for 1 hour on a 50°C water bath. Warm bath at 50℃
The low boiling point substances were distilled off while maintaining the temperature. The diol was purified by column chromatography to obtain 42 g (yield: 80%) of the diol.
Rr O,40(ベンゼン−酢酸エチル=l:1)。Rr O, 40 (benzene-ethyl acetate = l:1).
■ メチル 2−0−ベンジル−5−0−t−ブチルジ
メチル−β−D−キシロフラノシド[式(4)において
、R4がメトキシ基 R5がベンジル基、R6がt−ブ
チルジメチルシリル基である化合物〕の合成。■ Methyl 2-0-benzyl-5-0-t-butyldimethyl-β-D-xylofuranoside [Compound in which R4 is a methoxy group, R5 is a benzyl group, and R6 is a t-butyldimethylsilyl group] synthesis of.
ジオール42g(0,18mol)を、N、N−ジメチ
ルホルムアミド(180mQ)に溶解し、イミダゾール
(13g)を加えた。この溶液に、塩化t−ブチルジメ
チルシラン25gのN、N−ジメチルホルムアミド(1
20+a12)を0°Cで30分かけて滴下した。42 g (0.18 mol) of diol was dissolved in N,N-dimethylformamide (180 mQ), and imidazole (13 g) was added. To this solution was added 25 g of t-butyldimethylsilane chloride in N,N-dimethylformamide (1
20+a12) was added dropwise over 30 minutes at 0°C.
3時間攪拌の後、常法に従い後処理した。After stirring for 3 hours, post-treatment was carried out according to a conventional method.
カラムクロマト精製して、シリルエーテル80g(収率
100%)を得た。The product was purified by column chromatography to obtain 80 g of silyl ether (yield: 100%).
l H−N)IR(CDCh ) :δ0.10(s、
8H)、 0.91(s、9H)。lH-N)IR(CDCh): δ0.10(s,
8H), 0.91 (s, 9H).
3.37(s、3H)、 3.9−4.1(m、3H)
、 4.2−4.4(+w、3)1)、 4.81(s
、2H)、 4.93(s、IH)、 7.32(s、
5B)。3.37 (s, 3H), 3.9-4.1 (m, 3H)
, 4.2-4.4(+w,3)1), 4.81(s
, 2H), 4.93 (s, IH), 7.32 (s,
5B).
■ メチル 2−0−ベンジル−3−デオキシ−3−フ
ルオロ−β−D−リボフラノシド[式[R1において、
R2がメトキシl、R3がベンジル基である化合物]の
合成。■ Methyl 2-0-benzyl-3-deoxy-3-fluoro-β-D-ribofuranoside [formula [in R1,
Synthesis of a compound in which R2 is methoxyl and R3 is a benzyl group].
前記で合成したメチル 2−0−ベンジル−5−〇−t
−ブチルジメチルシリルーβ−D−キシロフラノシド2
8g(0,07mol)のジクロロメタン(18001
12)溶液に2.6−ルチジン23gを加え0℃に冷却
した。ここへ無水トリフルオロメタンスルホン酸(40
g)を15分かけて滴下し、さらに30分反応させた。Methyl 2-0-benzyl-5-〇-t synthesized above
-butyldimethylsilyl β-D-xylofuranoside 2
8 g (0.07 mol) of dichloromethane (18001
12) 23 g of 2.6-lutidine was added to the solution and cooled to 0°C. Here, trifluoromethanesulfonic anhydride (40
g) was added dropwise over 15 minutes, and the reaction was continued for an additional 30 minutes.
氷を加え後処理し。Add ice and post-process.
ショートカラム精製して粗生成物を33gを取り出した
。Short column purification was performed to obtain 33 g of a crude product.
このものをテトラヒドロフラン(120mQ)に溶解し
、フッ化テトラブチルアンモニウムのテトラヒドロフラ
ン溶液(f=1.0)180mQを0°Cで30分かけ
て滴下した。室温で12時間攪拌の後、テトラヒドロフ
ランを留去し、カラムクロマト精製をし、標記のフッ素
化体を11g得た。This material was dissolved in tetrahydrofuran (120 mQ), and 180 mQ of a solution of tetrabutylammonium fluoride in tetrahydrofuran (f=1.0) was added dropwise at 0°C over 30 minutes. After stirring at room temperature for 12 hours, tetrahydrofuran was distilled off and the mixture was purified by column chromatography to obtain 11 g of the title fluorinated product.
19F−NMR(CDCh): (IL:ChF基準)
−207,1(ddd。19F-NMR (CDCh): (IL:ChF standard)
-207,1(ddd.
Jl153.7.22.0. 13.4 Hz)。Jl153.7.22.0. 13.4 Hz).
l H−NMR(C:DCh ) :δ3.47(sJ
H)、4.0−4.2(+、2H)。lH-NMR (C:DCh): δ3.47 (sJ
H), 4.0-4.2 (+, 2H).
4.55(s、2H)、 4.8−5.2(m、5H)
、 7.33(s、5)1)。4.55 (s, 2H), 4.8-5.2 (m, 5H)
, 7.33 (s, 5) 1).
I R(CuCl2) 3300c11−1 。IR (CuCl2) 3300c11-1.
実施例1
メチル 3.5−ジデオキシ−3−フルオロ−2−0−
ベンゾイル−β−D−リボフラノシド[式[工]におい
て、Rがβ位に結合したメトキシ基、R1がベンゾイル
基である化合物]の合成。Example 1 Methyl 3,5-dideoxy-3-fluoro-2-0-
Synthesis of benzoyl-β-D-ribofuranoside [a compound in which R is a methoxy group bonded to the β-position and R1 is a benzoyl group].
合成例■で合成したアルコール1.5g (5,9mm
ol)をN、N−ジメチルホルムアミド10mQに溶解
し、室温でトリフェニルホスファイトメチオダイト2.
7gを加え、 20分間さらに攪拌した0反応混合物に
メタノール5m12を加え、水でN、N−ジメチルホル
ムアミドを除去し、粗生成物を得た。このものをメタノ
ール10+Qに溶解し、トリエチルアミン2+w(!加
え、パラジウム−炭素(5%) 2.0g存在下、室温
、常圧で水素添加した。生成物をカラムクロマト分取し
5位デオキシ体0.58gを得た。 ゛
このデオキシ体をエタノール5IIIQに溶解し、5%
パラジウム−炭素存在下、室温、常圧で水素添加した。1.5 g of alcohol synthesized in Synthesis Example ■ (5.9 mm
Dissolve triphenylphosphitemethiodite 2.ol) in 10 mQ of N,N-dimethylformamide at room temperature.
To the reaction mixture, 5 ml of methanol was added and N,N-dimethylformamide was removed with water to obtain a crude product. This product was dissolved in methanol 10+Q and hydrogenated at room temperature and normal pressure in the presence of triethylamine 2+w (!) and 2.0 g of palladium-carbon (5%).The product was fractionated by column chromatography and the 5-deoxy form was 0. .58g was obtained. ゛This deoxy form was dissolved in ethanol 5IIIQ, and 5%
Hydrogenation was carried out at room temperature and normal pressure in the presence of palladium-carbon.
48時間後セライト545を用いて濾過した。After 48 hours, it was filtered using Celite 545.
粗生成物をピリジン3mQに溶解し、0℃でベンゾイル
クロリド0.33gを加え、0℃で18時間攪拌の後、
ピリジンを留去してカラムクロマト精製をして、メチル
3,5−ジデオキシ−3−フルオロ−2−〇−ベンゾイ
ルーβ−D−リボフラノシド0.64gを得た。The crude product was dissolved in 3 mQ of pyridine, 0.33 g of benzoyl chloride was added at 0°C, and after stirring at 0°C for 18 hours,
Pyridine was distilled off and the residue was purified by column chromatography to obtain 0.64 g of methyl 3,5-dideoxy-3-fluoro-2-0-benzoyl-β-D-ribofuranoside.
19F−NMR(C:DC13) :(CCI3F基準
) −207,4(dddd。19F-NMR (C:DC13): (CCI3F standard) -207,4 (dddd.
j1152.3.20.0.9.3.1.2Hz)。j1152.3.20.0.9.3.1.2Hz).
IH−NMR(CDCh ): δ1.41(d、J
−13,8Hz、3H)。IH-NMR (CDCh): δ1.41 (d, J
-13.8Hz, 3H).
3.44(s、3H)、 4.2−4.8(+a、2H
)、 5.10(brs。3.44 (s, 3H), 4.2-4.8 (+a, 2H
), 5.10 (brs.
IH)、 5.3−5.5(+a、1)I)、 7.4
−7.8(m、3H)。IH), 5.3-5.5 (+a, 1) I), 7.4
-7.8 (m, 3H).
8.00−113(,2H)。8.00-113(,2H).
実施例2
9−(3,5−デオキシ−3−フルオロ−β−D−リボ
フラノシル)アデニン[弐目暑において、Rがβ位に結
合したアデニン残基であり、R1が水素原子である化合
物]の合成。Example 2 9-(3,5-deoxy-3-fluoro-β-D-ribofuranosyl)adenine [Compound in which R is an adenine residue bonded to the β-position and R1 is a hydrogen atom in Nimehat] synthesis of.
実施例1で合成した、メチルグリコシド0.20g(0
,8111mol)を酢酸(1,4m(り一無水酢酸(
0,04m12)に溶解する。ここに30%臭化水素−
酢酸溶液(4,5mQ)を加えて、室温で24時間攪拌
する。酢酸、無水酢酸などを完全に留去後、トル二ン(
15m12)に溶解し、アデニンモノベンゾエート 0
.22gのニトロメタン溶液(20m(2)に加え、さ
らにシアン化第二水銀0.33gを加え、1時間加熱還
流した。ニトロメタン、トルエンを留去後、30%ヨウ
化カリウム水溶液を加え攪拌した。ショートカラムで粗
分離し、次の反応に用いた。Methyl glycoside synthesized in Example 1, 0.20 g (0
, 8111 mol) and acetic acid (1.4 m (monoacetic anhydride (
0.04m12). 30% hydrogen bromide here-
Add acetic acid solution (4.5 mQ) and stir at room temperature for 24 hours. After completely distilling off acetic acid, acetic anhydride, etc., tolunine (
Adenine monobenzoate 0
.. In addition to 22 g of nitromethane solution (20 m(2)), 0.33 g of mercuric cyanide was added and heated under reflux for 1 hour. After distilling off nitromethane and toluene, 30% aqueous potassium iodide solution was added and stirred. It was crudely separated using a column and used in the next reaction.
N−グリコジル化体0.20gをメタノール(5m(2
)に溶解し、ここにIM−ナトリウムメトキシド−メタ
ノール溶液(0,87m(2)を加え、1時間加熱還流
した。メタノールを留去後、水(20mQ)を加え、2
N=酢酸水溶液で中和した。水層をクロロホルム抽出し
、イオン交換カラムを通し、最終生成物である標記のフ
ルオロアデノシン0. IQgを得た。0.20 g of N-glycosylated product was added with methanol (5 m (2
), IM-sodium methoxide-methanol solution (0.87m(2)) was added thereto, and the mixture was heated under reflux for 1 hour. After distilling off the methanol, water (20mQ) was added,
N = Neutralized with aqueous acetic acid solution. The aqueous layer was extracted with chloroform and passed through an ion exchange column to produce the final product, the title fluoroadenosine. IQg was obtained.
19F−NMR(CDCh) :(CG13F基準)−
195,4(ddd。19F-NMR (CDCh): (CG13F standard) -
195,4 (ddd.
j=53.7.24.7.23.0Hz)。j=53.7.24.7.23.0Hz).
’ H−NMR(CD300) : δ1.45(d
、J寓8.8H2,3H)。'H-NMR (CD300): δ1.45(d
, Jeg. 8.8H2, 3H).
3.2−5.5(m、8H)、 8.00(d、J=8
.2Hz、IH)。3.2-5.5 (m, 8H), 8.00 (d, J=8
.. 2Hz, IH).
8.21(s、IH)、 8.29(s、1)1)。8.21 (s, IH), 8.29 (s, 1) 1).
I R3300,1fi50 cm−1。I R3300, 1fi50 cm-1.
融点 230 ’0 (分解)
実施例3
l−(3,5−デオキシ−3−フルオロ−β−D−リボ
フラノシル)−5−フルオロシトシン[式[I]におい
て、Rがβ位に結合した5−フルオロシトシン残基であ
り、R1が水素原子である化合物]の合成。Melting point 230'0 (decomposition) Example 3 l-(3,5-deoxy-3-fluoro-β-D-ribofuranosyl)-5-fluorocytosine [5-fluorocytosine in which R is bonded to the β position in formula [I] Synthesis of a compound which is a fluorocytosine residue and R1 is a hydrogen atom].
実施例2と同様にメチルグリコシド0.20g(0,8
0mmol)をグリコジルプロミドに変換した後、この
ものをN4−p−トルオイル−5−フルオロシトシン(
0,23g) 、塩化第二水銀(0,28g)のニトロ
メタン溶液に加え、1時間加熱還流させた。30%ヨウ
化カリウム水溶液を加え後処理した後、クロロホルム抽
出した。ショートカラム(シリカゲル)で粗分離した後
、IN−ナトリウムメトキシド−メタノール溶液を加え
、メタノール中室温で4時間反応させた。2N−酪酸で
中和し、目的生成物0.08gを得た。Similarly to Example 2, 0.20 g of methyl glycoside (0.8
After converting 0 mmol) into glycodylbromide, this was converted into N4-p-toluoyl-5-fluorocytosine (
0.23 g) and mercuric chloride (0.28 g) in nitromethane, and the mixture was heated under reflux for 1 hour. After post-treatment by adding a 30% aqueous potassium iodide solution, the mixture was extracted with chloroform. After rough separation using a short column (silica gel), IN-sodium methoxide-methanol solution was added, and the mixture was reacted in methanol at room temperature for 4 hours. Neutralization was performed with 2N-butyric acid to obtain 0.08 g of the desired product.
19F−NllIR(CD30D):(CChF基準)
−182,5(ddd。19F-NllIR (CD30D): (CChF standard)
-182,5 (ddd.
j−52,2,19,0,12,0Hz)I R330
0,1620cm−1。j-52,2,19,0,12,0Hz) I R330
0,1620 cm-1.
Claims (1)
3−フルオロ−D−リボフラノシド誘導体。 ▲数式、化学式、表等があります▼・・・[ I ] ただし、R:ハロゲン原子、−OX(Xは水素原子、ア
ルキル基、ある いは保護基)、あるいは核 酸塩基類の残基。 R^1:水素原子、あるいは保護基。 2、下記式[II]で表わされるフラノシド誘導体の5位
の水酸基を還元して5−デオキシ体に誘導すること、次
いで必要により脱保護、核酸塩基類の導入などを行うこ
とを特徴とする下記式[ I ]で表わされる3,5−ジ
デオキシ−3−フルオロ−D−リボフラノシド誘導体の
製造法。 ▲数式、化学式、表等があります▼・・・[ I ] ただし、R:ハロゲン原子、−OX(Xは水素原子、ア
ルキル基、ある いは保護基)、あるいは核 酸塩基類の残基。 R^1:水素原子、あるいは保護基。 ▲数式、化学式、表等があります▼・・・[II] ただし、R^2:アルコキシ基、保護基で保護された水
酸基、あるいは ハロゲン原子。 R^3:保護基。[Claims] 1. 3,5-dideoxy- represented by the following formula [I]
3-Fluoro-D-ribofuranoside derivative. ▲There are mathematical formulas, chemical formulas, tables, etc.▼...[I] However, R: halogen atom, -OX (X is a hydrogen atom, an alkyl group, or a protecting group), or a residue of a nucleobase. R^1: Hydrogen atom or protective group. 2. The following, which is characterized by reducing the hydroxyl group at the 5-position of the furanoside derivative represented by the following formula [II] to derive a 5-deoxy form, and then performing deprotection, introduction of a nucleic acid base, etc. as necessary. A method for producing a 3,5-dideoxy-3-fluoro-D-ribofuranoside derivative represented by formula [I]. ▲There are mathematical formulas, chemical formulas, tables, etc.▼...[I] However, R: halogen atom, -OX (X is a hydrogen atom, an alkyl group, or a protecting group), or a residue of a nucleobase. R^1: Hydrogen atom or protective group. ▲There are mathematical formulas, chemical formulas, tables, etc.▼... [II] However, R^2: an alkoxy group, a hydroxyl group protected with a protective group, or a halogen atom. R^3: Protecting group.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61149684A JPS638394A (en) | 1986-06-27 | 1986-06-27 | Fluorine-containing ribofuranoside derivative and production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61149684A JPS638394A (en) | 1986-06-27 | 1986-06-27 | Fluorine-containing ribofuranoside derivative and production thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS638394A true JPS638394A (en) | 1988-01-14 |
Family
ID=15480553
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61149684A Pending JPS638394A (en) | 1986-06-27 | 1986-06-27 | Fluorine-containing ribofuranoside derivative and production thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS638394A (en) |
-
1986
- 1986-06-27 JP JP61149684A patent/JPS638394A/en active Pending
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