JPS6372866A - Decorative coating method with titanium nitride - Google Patents
Decorative coating method with titanium nitrideInfo
- Publication number
- JPS6372866A JPS6372866A JP21593686A JP21593686A JPS6372866A JP S6372866 A JPS6372866 A JP S6372866A JP 21593686 A JP21593686 A JP 21593686A JP 21593686 A JP21593686 A JP 21593686A JP S6372866 A JPS6372866 A JP S6372866A
- Authority
- JP
- Japan
- Prior art keywords
- tin
- sputtering
- titanium nitride
- target
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 15
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 title claims description 23
- 238000004544 sputter deposition Methods 0.000 claims abstract description 13
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 4
- 239000007789 gas Substances 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 8
- 239000010931 gold Substances 0.000 abstract description 8
- 229910052737 gold Inorganic materials 0.000 abstract description 8
- 238000005260 corrosion Methods 0.000 abstract description 7
- 230000007797 corrosion Effects 0.000 abstract description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 5
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 230000002542 deteriorative effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 9
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 5
- 229940097275 indigo Drugs 0.000 description 5
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 5
- 150000002500 ions Chemical class 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は基板となる材料に窒化チタンのコーティングを
行なって耐腐食性を増すとともに装飾性をもたせる、窒
化チタンの装飾性コーティング方法に関するものである
。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a method for decorative coating of titanium nitride, in which a substrate material is coated with titanium nitride to increase corrosion resistance and provide decorative properties.
従来の技術
近年、真空蒸着法、スパッタリング法、イオンブレーテ
ィング法、プラズマＣＶＤ法などのドライコーティング
プロセス技術が進歩し、任意の基板の上に、半導体 金
属、絶縁体などの皮膜をコーティングして装飾性、耐腐
食性、耐摩耗性などの新しい機能を付加する研究がさか
んになされてきている。Conventional technology In recent years, dry coating process technologies such as vacuum evaporation, sputtering, ion blating, and plasma CVD have advanced, and it is now possible to decorate any substrate by coating it with a film of semiconductor, metal, insulator, etc. Research is being actively conducted to add new functions such as durability, corrosion resistance, and wear resistance.
ドライコーティングプロセスのうちでもスパッタリング
法は、所望の皮膜と同じ成分構成のスパッタリングター
ゲットを用意することによってすべての固体物質の皮膜
が作成できる最も普遍的な方法である。Among the dry coating processes, the sputtering method is the most universal method that allows coatings of all solid substances to be created by preparing a sputtering target with the same composition as the desired coating.
一方、ＴｉＮ （窒化チタン）は金色の物質であり、か
つ硬度も高いことからメガネフレームなどの装飾、ドリ
ルの刃など切削工具の表面処理に用いられている物質で
ある。従来、ＴｉＮのコーティングはイオンブレーティ
ング法あるいはスパッタリング法によって行なわれるの
が普通であり、そのうちでも操作上の筒快さ、再現性の
良さという点ではスパッタリング法が有利である。On the other hand, TiN (titanium nitride) is a gold-colored substance and has high hardness, so it is used for decoration of eyeglass frames and for surface treatment of cutting tools such as drill bits. Conventionally, TiN coating has been generally carried out by ion blasting or sputtering, and among these, sputtering is advantageous in terms of ease of operation and good reproducibility.
しかしながら、従来のスパッタリング方法ではターゲッ
トとしてＴｉ板を用い、これにＡｒと隅の混合ガスを流
してスパッターし、金色以外の外観をもつ皮膜を得るこ
とは容易ではなかった。However, in the conventional sputtering method, it was not easy to obtain a film having an appearance other than gold by using a Ti plate as a target and sputtering the Ti plate by flowing a mixed gas of Ar and a corner gas.
発明が解決しようとする問題点
本発明は基板上にコーティングされたＴｉＮ皮膜が金色
の外観をもつものに限られるという上記の欠点を解消し
、金色のものと同程度の耐腐食性、耐摩耗性を保ちなが
らも、金色をはじめ赤色、紫色、藍色等、多様な色相の
外観をもつ皮膜を得る方法に関するものである。Problems to be Solved by the Invention The present invention solves the above-mentioned drawback that the TiN film coated on the substrate is limited to those with a golden appearance, and provides corrosion resistance and wear resistance equivalent to that of the golden one. The present invention relates to a method for obtaining a film having a variety of hues including gold, red, purple, and indigo, while maintaining its properties.
問題点を解決するための手段
本発明は、スパッタリング法によって基板上に赤色、紫
色、藍色、金色等種々の色相の外観をもつ皮膜を得る方
法に関するものである。Means for Solving the Problems The present invention relates to a method for obtaining coatings on a substrate with appearances of various hues such as red, purple, indigo, and gold by sputtering.
本発明によるＴＡＮコーティング作製作製下体下記おり
である。The fabrication of the TAN coating according to the present invention is shown below.
すなわち、スパッタリングターゲットとしてＴｉＮ （
窒化チタン）粉末焼結体を用意し、ターゲットおよび基
板をスパッタリング装置にセットする。真空槽内を十分
に排気したのちＡｒガスおよびＮガスを槽内に導入し、
真空槽内の圧力をｔｏ−’〜１０−”Ｔｏｒｒに２！８
Ｉｔｉする。この状態で槽内に高周波プラズマを発生さ
せると、Ａｒ＋イオンがＴｉＮターゲットの表面原子を
たたき出し、励起された為分子あるいはＮｒＸ子と反応
して基板上にＴｉＮ皮膜が生成する。ここではＴｉＮと
総称して書いたが、この場合のＴｉとＮの原子数比はＡ
ｒガスと為ガスの分圧によって微妙に異なり、従って外
観の色相も異なってくる。ＴｉＮの場合、組成比がわず
かに異なるだけでもその色相は赤色、紫色、藍色、金色
などと大きく変化するのが特徴である。That is, TiN (
Prepare a sintered body of titanium nitride (titanium nitride) powder, and set the target and substrate in a sputtering device. After sufficiently evacuating the vacuum chamber, Ar gas and N gas were introduced into the chamber.
Reduce the pressure in the vacuum chamber to to-' to 10-'' Torr by 2!8
I will do it. When high-frequency plasma is generated in the tank in this state, Ar+ ions knock out surface atoms of the TiN target and are excited to react with molecules or NrX molecules to form a TiN film on the substrate. Although it is written here as TiN, the atomic ratio of Ti and N in this case is A.
It differs slightly depending on the partial pressure of r gas and fore gas, and therefore the hue of the appearance also differs. In the case of TiN, a feature is that even if the composition ratio differs even slightly, its hue changes greatly from red, purple, indigo, gold, etc.
為ガスを流さずにＡｒガスのみによってスパッタリング
を行なうと、ターゲットと同様の色相である金色の皮膜
ができる。Ｎ２ガスをＡｒと同時に導入した場合にはそ
の量によって赤、紫、藍、金などの多様な色の皮膜がで
きる。Therefore, if sputtering is performed using only Ar gas without flowing gas, a gold film having the same hue as the target will be produced. When N2 gas is introduced at the same time as Ar, films with various colors such as red, purple, indigo, and gold can be formed depending on the amount.
実施例
ＴｉＮ粉末（９９％）を高圧下で焼結した。厚さ６■、
直径 １５２．４ｍｍの円板をターゲットとして用い、
Ａｒと鳥の混合ガスを流すことによってＴｉＮ薄膜をコ
ーティングした。基板には５ＯＳ４３０ステンレス板の
ＢＡ（光輝焼鈍）処理した板で、厚さ０．７ｍｍ、８０
ｍｍ角のものを用いた。 Ａｒと為を流量比２二ｌで真
空槽内に導入し、全圧を５Ｘ １Ｏ−３Ｔｏｒｒにコン
トロールして、ＲＦプラズマを発生させ、スパッタリン
グを行ない、膜厚約５００ｎ層のＴｉＮ被膜をステンレ
ス板上にコーティングした。生成した皮膜は赤紫色で耐
食性は良好であった。Example TiN powder (99%) was sintered under high pressure. Thickness 6■,
Using a disk with a diameter of 152.4 mm as a target,
The TiN thin film was coated by flowing a mixture of Ar and bird gas. The substrate is a BA (bright annealing) 5OS430 stainless steel plate, 0.7 mm thick, 80 mm thick.
A mm square piece was used. Ar and nitrogen were introduced into the vacuum chamber at a flow rate ratio of 22 L, the total pressure was controlled to 5X 1O-3 Torr, RF plasma was generated, sputtering was performed, and a TiN coating with a thickness of approximately 500 nm was applied to a stainless steel plate. Coated on top. The resulting film was reddish-purple and had good corrosion resistance.
またＡｒとＮ２の流量比をｌ対ｌにして他の条件は同じ
コーティングをすると、赤色の皮膜が得られた。Further, when coating was performed with the flow rate ratio of Ar and N2 being 1:1 and other conditions being the same, a red film was obtained.
発明の効果
本発明によってＴｉＮ （窒化チタン）の高い硬度と耐
食性を保持しながら、赤色、紫色、藍色など、本来のＴ
ｉＮの色である金色以外の色の外観をもつ材料が作成で
き、厳しい環境条件下での屋根材、壁材などの装飾性材
料として用いることができる。Effects of the Invention The present invention maintains the high hardness and corrosion resistance of TiN (titanium nitride) while maintaining its original T color, such as red, purple, and indigo.
Materials with an external appearance other than gold, which is the color of iN, can be created and can be used as decorative materials such as roofing materials and wall materials under harsh environmental conditions.
Claims (1)
ン）のコーティングを行なう際、スパッターターゲット
として、ＴｉＮを用い、スパッターガスとしてＡｒとＮ
＿２の混合気体を流し、このＡｒ／Ｎ＿２分圧比を変化
させることにより、ＴｉＮに特徴的な色の外観をもつ材
料を作ることを特徴とする窒化チタンの装飾性コーティ
ング方法。When coating TiN (titanium nitride) on a substrate by sputtering, TiN is used as a sputter target and Ar and N are used as sputter gases.
A method for decorative coating of titanium nitride, characterized in that a material having a color appearance characteristic of TiN is produced by flowing a mixed gas of _2 and changing the partial pressure ratio of Ar/N_2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21593686A JPS6372866A (en) | 1986-09-16 | 1986-09-16 | Decorative coating method with titanium nitride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21593686A JPS6372866A (en) | 1986-09-16 | 1986-09-16 | Decorative coating method with titanium nitride |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6372866A true JPS6372866A (en) | 1988-04-02 |
Family
ID=16680710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21593686A Pending JPS6372866A (en) | 1986-09-16 | 1986-09-16 | Decorative coating method with titanium nitride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6372866A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH024955A (en) * | 1988-06-23 | 1990-01-09 | Morimichi Fujiyoshi | Manufacture of colored metallic sheet, colored metallic sheet, and fine pieces of colored metal |
| JPH0364448A (en) * | 1989-08-02 | 1991-03-19 | Sumitomo Metal Mining Co Ltd | Chromatic hard film and its formation |
| JPH03197662A (en) * | 1989-12-26 | 1991-08-29 | Sumitomo Metal Mining Co Ltd | Surface coated sintered hard alloy and its production and surface coated steel products and its production |
| EP0534441A2 (en) * | 1991-09-27 | 1993-03-31 | Hitachi Metals, Ltd. | Target for reactive sputtering and film-forming method using the target |
| CN108505004A (en) * | 2018-05-04 | 2018-09-07 | 武汉理工大学 | Stainless steel knife preparation method with chromatic colour TiN coatings |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5067733A (en) * | 1973-10-23 | 1975-06-06 | ||
| JPS5333759A (en) * | 1976-09-10 | 1978-03-29 | Tanishiyoo Kk | Chair |
-
1986
- 1986-09-16 JP JP21593686A patent/JPS6372866A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5067733A (en) * | 1973-10-23 | 1975-06-06 | ||
| JPS5333759A (en) * | 1976-09-10 | 1978-03-29 | Tanishiyoo Kk | Chair |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH024955A (en) * | 1988-06-23 | 1990-01-09 | Morimichi Fujiyoshi | Manufacture of colored metallic sheet, colored metallic sheet, and fine pieces of colored metal |
| JPH0364448A (en) * | 1989-08-02 | 1991-03-19 | Sumitomo Metal Mining Co Ltd | Chromatic hard film and its formation |
| JPH03197662A (en) * | 1989-12-26 | 1991-08-29 | Sumitomo Metal Mining Co Ltd | Surface coated sintered hard alloy and its production and surface coated steel products and its production |
| EP0534441A2 (en) * | 1991-09-27 | 1993-03-31 | Hitachi Metals, Ltd. | Target for reactive sputtering and film-forming method using the target |
| US5489367A (en) * | 1991-09-27 | 1996-02-06 | Hitachi Metals, Ltd. | Target for reactive sputtering and film-forming method using the target |
| CN108505004A (en) * | 2018-05-04 | 2018-09-07 | 武汉理工大学 | Stainless steel knife preparation method with chromatic colour TiN coatings |
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