JPS6369118A - Electron emission element - Google Patents
Electron emission elementInfo
- Publication number
- JPS6369118A JPS6369118A JP61212821A JP21282186A JPS6369118A JP S6369118 A JPS6369118 A JP S6369118A JP 61212821 A JP61212821 A JP 61212821A JP 21282186 A JP21282186 A JP 21282186A JP S6369118 A JPS6369118 A JP S6369118A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- light
- type semiconductor
- electron
- emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 239000004065 semiconductor Substances 0.000 claims abstract description 23
- 230000005284 excitation Effects 0.000 claims abstract 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 239000002184 metal Substances 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 5
- 230000005684 electric field Effects 0.000 abstract description 2
- 230000005855 radiation Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 2
- 229910052792 caesium Inorganic materials 0.000 description 1
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
Landscapes
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Cold Cathode And The Manufacture (AREA)
- Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は光励起された電子を放出する電子放出素子に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electron-emitting device that emits photo-excited electrons.
[従来技術およびその問題点]
電子放出素子としては、従来よりPN接合のなだれ降伏
を用いたもの、PM接合に順バイアスをかけてP層に電
子を注入する方式のもの、薄い絶縁層を金属で挟んだ構
造を有するもの(MI)l型)、その他に電界放出型や
表面伝導型の素子等が提案されている。[Prior art and its problems] Conventional electron-emitting devices include those that use avalanche breakdown of a PN junction, those that apply a forward bias to a PM junction and inject electrons into the P layer, and those that use a thin insulating layer made of metal. Elements having a sandwiched structure (MI type), field emission type, surface conduction type, etc. have been proposed.
しかしながら、これら従来の電子放出素子は、高いエネ
ルギの電子を゛I′rf、気的に発生させて放出させる
方式であるために、電子放出の制御は電気的に行うこと
しかできず、そのために光と電子放出とを関係付けるこ
とができなかった。However, since these conventional electron-emitting devices use a system that generates and emits high-energy electrons in a gaseous manner, electron emission can only be controlled electrically. It was not possible to make a connection between light and electron emission.
[問題点を解決するための手段]
本発明の目的は、簡単な構成を有し、光による電子放出
制御を可俺とする電子放出素子を提供することにある。[Means for Solving the Problems] An object of the present invention is to provide an electron-emitting device that has a simple configuration and can easily control electron emission using light.
本発明による電子放出素子は、P型半導体基体の両端に
各々電極を接合させ、該電極間に電圧を印加するととも
に、前記P型半導体基体に光を照射することで、光励起
によって前記P型半導体基体内に発生した電子を該P型
半導体基体の一端の゛電子放出面から放出することを特
徴とする。In the electron-emitting device according to the present invention, electrodes are bonded to both ends of a P-type semiconductor substrate, a voltage is applied between the electrodes, and the P-type semiconductor substrate is irradiated with light, whereby the P-type semiconductor is excited by light. It is characterized in that electrons generated within the substrate are emitted from an electron emitting surface at one end of the P-type semiconductor substrate.
[作用]
このように光によって電子放出を制御でき、しかもP型
半導体と電極だけの極めて簡単な構成であるために、容
易に製造することができる。[Function] In this way, electron emission can be controlled by light, and since it has an extremely simple configuration consisting of only a P-type semiconductor and an electrode, it can be easily manufactured.
[実施例]
以下、本発明の実施例を図面に基づいて詳細に説明する
。[Example] Hereinafter, an example of the present invention will be described in detail based on the drawings.
第1図は5本発明による電子放出素子の第一実施例の構
成を示す模式的断面図である。FIG. 1 is a schematic cross-sectional view showing the structure of a first embodiment of an electron-emitting device according to the present invention.
同図において、P型半導体基体lの両端には金属電極2
および3が接合されており、金属電極2には、電子放出
口が形成されている。また、電子放出口のP型半導体基
体1表面には、セシウムCs又はCsO等の仕事関数低
下材料層4が形成されている。In the figure, metal electrodes 2 are provided at both ends of the P-type semiconductor substrate l.
and 3 are joined to each other, and the metal electrode 2 has an electron emitting opening formed therein. Further, a work function reducing material layer 4 such as cesium Cs or CsO is formed on the surface of the P-type semiconductor substrate 1 at the electron emission port.
このような構成において、電極2および3間に電極2を
高電位とする駆動電圧を印加し、この状態でP型半導体
基体1に光hυを照射する。この時、hυ≧Eg(Eg
は半導体のバンドギャップ)であれば、電子は光によっ
て伝導帯に励起され、電界によって加速されて仕11
[!]数低下材料層4表面から放出される。ただし、仕
事関数低下材料層4によって、実質的な仕事関数を半導
体1の伝導帯レベルより低い状態、すなわち負の電子親
和力(NEA)状態としておけば、高い電子放出効率を
達成できる。In such a configuration, a driving voltage is applied between the electrodes 2 and 3 to make the electrode 2 a high potential, and in this state, the P-type semiconductor substrate 1 is irradiated with light hυ. At this time, hυ≧Eg(Eg
is the bandgap of a semiconductor), then electrons are excited by light into the conduction band and accelerated by the electric field, resulting in
[! ] Released from the surface of the number-reducing material layer 4. However, high electron emission efficiency can be achieved by setting the work function lowering material layer 4 in a state in which the substantial work function is lower than the conduction band level of the semiconductor 1, that is, in a negative electron affinity (NEA) state.
また、光が照射されないと電子放出は行われないために
、光をON/ OFFすることで電子の放出をON/
OFFさせる高速光スイッチング動作を得ることができ
る。Also, since electron emission does not occur unless light is irradiated, electron emission can be turned on/off by turning the light on/off.
A high-speed optical switching operation can be obtained.
第2図は1本発明の第二実施例の構成を示す模式的断面
図である。FIG. 2 is a schematic sectional view showing the configuration of a second embodiment of the present invention.
同図に示すように、P型半導体基体lに接合した一方の
電極をITO等の透明電極5とし、透明電極5側から光
を入射させる。これによって、上述したように半導体基
体l内に電子を励起させ、電極2側へ加速させて仕事関
数低下材料層4の表面から電子を放出させる。As shown in the figure, one electrode bonded to the P-type semiconductor substrate 1 is a transparent electrode 5 made of ITO or the like, and light is incident from the transparent electrode 5 side. As a result, as described above, electrons are excited in the semiconductor substrate l, accelerated toward the electrode 2 side, and emitted from the surface of the work function-lowering material layer 4.
なお、本実施例では一個の電子放出素子だけを示したが
、勿論これに限定されるものではない。Note that although only one electron-emitting device is shown in this embodiment, the invention is of course not limited to this.
例えばガラス基板上に透明電極5を形成し、その」二に
P型半導体基体1を島状に又は絶縁分離して複数形成し
た後、各々の半導体基体lに対応した電子放出口を有す
る電極2および仕事関数低下材料層4を形成することで
、電子放出素子が複数個配列された電子放出装置を極め
て簡単に製造することができる。For example, a transparent electrode 5 is formed on a glass substrate, a plurality of P-type semiconductor substrates 1 are formed on the transparent electrode 5 in an island shape or insulated and separated, and then an electrode 2 having an electron emitting hole corresponding to each semiconductor substrate 1 is formed. By forming the work function lowering material layer 4, an electron emitting device in which a plurality of electron emitting elements are arranged can be manufactured extremely easily.
第3図は、本発明の第三実施例の概略的構成図である。FIG. 3 is a schematic diagram of a third embodiment of the present invention.
同図において、第2図に示す電子放出素子が透明基板t
に形成され、各々絶縁性の光不透過材料層6で隔離され
ている。したがって1個々の電子放出素子に入射する光
をON10 F Fすることで、各電子放出素子を独立
駆動できる。また、電子放出効率も入射光のエネルギを
調節することで制御できる。In the same figure, the electron-emitting device shown in FIG. 2 is connected to a transparent substrate t.
and are separated by an insulating, light-opaque material layer 6. Therefore, by turning ON10 FF the light incident on each electron-emitting element, each electron-emitting element can be driven independently. Further, electron emission efficiency can also be controlled by adjusting the energy of incident light.
[発明の効果]
以上詳細に説明したように、本発明による電子放出素子
は、光スイツチ動作等の光による電子放出制御が容易に
達成できる。また、P型半導体と電極だけの極めて簡単
な構成であるために、複数個配列した構成であっても製
造が極めて容易となる。[Effects of the Invention] As described above in detail, the electron-emitting device according to the present invention can easily achieve electron emission control using light such as optical switch operation. Furthermore, since the structure is extremely simple, consisting only of a P-type semiconductor and an electrode, manufacturing is extremely easy even if a plurality of devices are arranged.
第1図は、本発明による電子放出素子の第一実施例の構
成を示す模式的断面図、
第2図は、未発Illによる電子放出素子の第二実施例
の構成を示す模式的断面図、
第3図は、本発明の第三実施例の概略的構成図である。
1◆・・P型半導体基体 2.3瞭争・金属電極4・・
・仕事関数低下材料層 5−・・透明電極
代理人 弁理士 山 下 穣 平
褒 1 図
第 2図
’nvFIG. 1 is a schematic cross-sectional view showing the structure of a first embodiment of an electron-emitting device according to the present invention, and FIG. , FIG. 3 is a schematic configuration diagram of a third embodiment of the present invention. 1◆...P-type semiconductor substrate 2.3 Clarity/Metal electrode 4...
・Work function lowering material layer 5-... Transparent electrode agent Patent attorney Minoru Yamashita Tairaho 1 Figure 2 Figure 'nv
Claims (1)
電極間に電圧を印加するとともに、前記P型半導体基体
に光を照射することで、光励起によって前記P型半導体
基体内に発生した電子を該P型半導体基体の一端の電子
放出面から放出することを特徴とする電子放出素子。(1) By bonding electrodes to both ends of a P-type semiconductor substrate, applying a voltage between the electrodes, and irradiating the P-type semiconductor substrate with light, light excitation occurs within the P-type semiconductor substrate. An electron-emitting device characterized in that electrons are emitted from an electron-emitting surface at one end of the P-type semiconductor substrate.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61212821A JPS6369118A (en) | 1986-09-11 | 1986-09-11 | Electron emission element |
EP87113260A EP0259878B1 (en) | 1986-09-11 | 1987-09-10 | Electron emission element |
DE19873752064 DE3752064T2 (en) | 1986-09-11 | 1987-09-10 | Electron emitting element |
US08/094,404 US5304815A (en) | 1986-09-11 | 1993-07-21 | Electron emission elements |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61212821A JPS6369118A (en) | 1986-09-11 | 1986-09-11 | Electron emission element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6369118A true JPS6369118A (en) | 1988-03-29 |
Family
ID=16628912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61212821A Pending JPS6369118A (en) | 1986-09-11 | 1986-09-11 | Electron emission element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6369118A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005149865A (en) * | 2003-11-14 | 2005-06-09 | Nippon Hoso Kyokai <Nhk> | Field emission device, field emission substrate, drive device, and display |
-
1986
- 1986-09-11 JP JP61212821A patent/JPS6369118A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005149865A (en) * | 2003-11-14 | 2005-06-09 | Nippon Hoso Kyokai <Nhk> | Field emission device, field emission substrate, drive device, and display |
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