JPS6369118A - Electron emission element - Google Patents

Electron emission element

Info

Publication number
JPS6369118A
JPS6369118A JP61212821A JP21282186A JPS6369118A JP S6369118 A JPS6369118 A JP S6369118A JP 61212821 A JP61212821 A JP 61212821A JP 21282186 A JP21282186 A JP 21282186A JP S6369118 A JPS6369118 A JP S6369118A
Authority
JP
Japan
Prior art keywords
substrate
light
type semiconductor
electron
emission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61212821A
Other languages
Japanese (ja)
Inventor
Akira Suzuki
彰 鈴木
Takeo Tsukamoto
健夫 塚本
Akira Shimizu
明 清水
Masao Sugata
菅田 正夫
Isamu Shimoda
下田 勇
Masahiko Okunuki
昌彦 奥貫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP61212821A priority Critical patent/JPS6369118A/en
Priority to EP87113260A priority patent/EP0259878B1/en
Priority to DE19873752064 priority patent/DE3752064T2/en
Publication of JPS6369118A publication Critical patent/JPS6369118A/en
Priority to US08/094,404 priority patent/US5304815A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
  • Cold Cathode And The Manufacture (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)

Abstract

PURPOSE:To obtain with ease an element that functions as an optical switch by attaching electrodes to both ends of a P-type semiconductor substrate, and radiating light to the substrate while impressing voltage between the electrodes so as to emit electrons generated in the substrate by optical excitation from the electron emission surface on one end of the substrate. CONSTITUTION:A metal electrode 2 having an electron emission exit is attached to one end surface of a P-type semiconductor substrate 1, and a work function reducing material layer 4 made of Cs or CsO and the like is deposited to the end surface of the substrate 1 exposed in the emission exit. Then, a plane metal electrode 3 is fixed to the other end surface, and driving voltage to make the electrode 2 into higher potential is impressed between the electrodes 2 and 3. In this state, subsequently, light hv with relation between the light hv and bandgap Eg of the semiconductor made into hv >= Eg is radiated on the surface of the substrate 1. In this way, electrons in the substrate 1 and excited on a conduction band, and accelerated with electric field to cause their emission from the layer 4 surface. To stop the emission, light radiation is stopped to cause high-speed optical switching.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は光励起された電子を放出する電子放出素子に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electron-emitting device that emits photo-excited electrons.

[従来技術およびその問題点] 電子放出素子としては、従来よりPN接合のなだれ降伏
を用いたもの、PM接合に順バイアスをかけてP層に電
子を注入する方式のもの、薄い絶縁層を金属で挟んだ構
造を有するもの(MI)l型)、その他に電界放出型や
表面伝導型の素子等が提案されている。
[Prior art and its problems] Conventional electron-emitting devices include those that use avalanche breakdown of a PN junction, those that apply a forward bias to a PM junction and inject electrons into the P layer, and those that use a thin insulating layer made of metal. Elements having a sandwiched structure (MI type), field emission type, surface conduction type, etc. have been proposed.

しかしながら、これら従来の電子放出素子は、高いエネ
ルギの電子を゛I′rf、気的に発生させて放出させる
方式であるために、電子放出の制御は電気的に行うこと
しかできず、そのために光と電子放出とを関係付けるこ
とができなかった。
However, since these conventional electron-emitting devices use a system that generates and emits high-energy electrons in a gaseous manner, electron emission can only be controlled electrically. It was not possible to make a connection between light and electron emission.

[問題点を解決するための手段] 本発明の目的は、簡単な構成を有し、光による電子放出
制御を可俺とする電子放出素子を提供することにある。
[Means for Solving the Problems] An object of the present invention is to provide an electron-emitting device that has a simple configuration and can easily control electron emission using light.

本発明による電子放出素子は、P型半導体基体の両端に
各々電極を接合させ、該電極間に電圧を印加するととも
に、前記P型半導体基体に光を照射することで、光励起
によって前記P型半導体基体内に発生した電子を該P型
半導体基体の一端の゛電子放出面から放出することを特
徴とする。
In the electron-emitting device according to the present invention, electrodes are bonded to both ends of a P-type semiconductor substrate, a voltage is applied between the electrodes, and the P-type semiconductor substrate is irradiated with light, whereby the P-type semiconductor is excited by light. It is characterized in that electrons generated within the substrate are emitted from an electron emitting surface at one end of the P-type semiconductor substrate.

[作用] このように光によって電子放出を制御でき、しかもP型
半導体と電極だけの極めて簡単な構成であるために、容
易に製造することができる。
[Function] In this way, electron emission can be controlled by light, and since it has an extremely simple configuration consisting of only a P-type semiconductor and an electrode, it can be easily manufactured.

[実施例] 以下、本発明の実施例を図面に基づいて詳細に説明する
[Example] Hereinafter, an example of the present invention will be described in detail based on the drawings.

第1図は5本発明による電子放出素子の第一実施例の構
成を示す模式的断面図である。
FIG. 1 is a schematic cross-sectional view showing the structure of a first embodiment of an electron-emitting device according to the present invention.

同図において、P型半導体基体lの両端には金属電極2
および3が接合されており、金属電極2には、電子放出
口が形成されている。また、電子放出口のP型半導体基
体1表面には、セシウムCs又はCsO等の仕事関数低
下材料層4が形成されている。
In the figure, metal electrodes 2 are provided at both ends of the P-type semiconductor substrate l.
and 3 are joined to each other, and the metal electrode 2 has an electron emitting opening formed therein. Further, a work function reducing material layer 4 such as cesium Cs or CsO is formed on the surface of the P-type semiconductor substrate 1 at the electron emission port.

このような構成において、電極2および3間に電極2を
高電位とする駆動電圧を印加し、この状態でP型半導体
基体1に光hυを照射する。この時、hυ≧Eg(Eg
は半導体のバンドギャップ)であれば、電子は光によっ
て伝導帯に励起され、電界によって加速されて仕11 
[!]数低下材料層4表面から放出される。ただし、仕
事関数低下材料層4によって、実質的な仕事関数を半導
体1の伝導帯レベルより低い状態、すなわち負の電子親
和力(NEA)状態としておけば、高い電子放出効率を
達成できる。
In such a configuration, a driving voltage is applied between the electrodes 2 and 3 to make the electrode 2 a high potential, and in this state, the P-type semiconductor substrate 1 is irradiated with light hυ. At this time, hυ≧Eg(Eg
is the bandgap of a semiconductor), then electrons are excited by light into the conduction band and accelerated by the electric field, resulting in
[! ] Released from the surface of the number-reducing material layer 4. However, high electron emission efficiency can be achieved by setting the work function lowering material layer 4 in a state in which the substantial work function is lower than the conduction band level of the semiconductor 1, that is, in a negative electron affinity (NEA) state.

また、光が照射されないと電子放出は行われないために
、光をON/ OFFすることで電子の放出をON/ 
OFFさせる高速光スイッチング動作を得ることができ
る。
Also, since electron emission does not occur unless light is irradiated, electron emission can be turned on/off by turning the light on/off.
A high-speed optical switching operation can be obtained.

第2図は1本発明の第二実施例の構成を示す模式的断面
図である。
FIG. 2 is a schematic sectional view showing the configuration of a second embodiment of the present invention.

同図に示すように、P型半導体基体lに接合した一方の
電極をITO等の透明電極5とし、透明電極5側から光
を入射させる。これによって、上述したように半導体基
体l内に電子を励起させ、電極2側へ加速させて仕事関
数低下材料層4の表面から電子を放出させる。
As shown in the figure, one electrode bonded to the P-type semiconductor substrate 1 is a transparent electrode 5 made of ITO or the like, and light is incident from the transparent electrode 5 side. As a result, as described above, electrons are excited in the semiconductor substrate l, accelerated toward the electrode 2 side, and emitted from the surface of the work function-lowering material layer 4.

なお、本実施例では一個の電子放出素子だけを示したが
、勿論これに限定されるものではない。
Note that although only one electron-emitting device is shown in this embodiment, the invention is of course not limited to this.

例えばガラス基板上に透明電極5を形成し、その」二に
P型半導体基体1を島状に又は絶縁分離して複数形成し
た後、各々の半導体基体lに対応した電子放出口を有す
る電極2および仕事関数低下材料層4を形成することで
、電子放出素子が複数個配列された電子放出装置を極め
て簡単に製造することができる。
For example, a transparent electrode 5 is formed on a glass substrate, a plurality of P-type semiconductor substrates 1 are formed on the transparent electrode 5 in an island shape or insulated and separated, and then an electrode 2 having an electron emitting hole corresponding to each semiconductor substrate 1 is formed. By forming the work function lowering material layer 4, an electron emitting device in which a plurality of electron emitting elements are arranged can be manufactured extremely easily.

第3図は、本発明の第三実施例の概略的構成図である。FIG. 3 is a schematic diagram of a third embodiment of the present invention.

同図において、第2図に示す電子放出素子が透明基板t
に形成され、各々絶縁性の光不透過材料層6で隔離され
ている。したがって1個々の電子放出素子に入射する光
をON10 F Fすることで、各電子放出素子を独立
駆動できる。また、電子放出効率も入射光のエネルギを
調節することで制御できる。
In the same figure, the electron-emitting device shown in FIG. 2 is connected to a transparent substrate t.
and are separated by an insulating, light-opaque material layer 6. Therefore, by turning ON10 FF the light incident on each electron-emitting element, each electron-emitting element can be driven independently. Further, electron emission efficiency can also be controlled by adjusting the energy of incident light.

[発明の効果] 以上詳細に説明したように、本発明による電子放出素子
は、光スイツチ動作等の光による電子放出制御が容易に
達成できる。また、P型半導体と電極だけの極めて簡単
な構成であるために、複数個配列した構成であっても製
造が極めて容易となる。
[Effects of the Invention] As described above in detail, the electron-emitting device according to the present invention can easily achieve electron emission control using light such as optical switch operation. Furthermore, since the structure is extremely simple, consisting only of a P-type semiconductor and an electrode, manufacturing is extremely easy even if a plurality of devices are arranged.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明による電子放出素子の第一実施例の構
成を示す模式的断面図、 第2図は、未発Illによる電子放出素子の第二実施例
の構成を示す模式的断面図、 第3図は、本発明の第三実施例の概略的構成図である。 1◆・・P型半導体基体 2.3瞭争・金属電極4・・
・仕事関数低下材料層 5−・・透明電極 代理人  弁理士 山 下 穣 平 褒 1 図 第 2図 ’nv
FIG. 1 is a schematic cross-sectional view showing the structure of a first embodiment of an electron-emitting device according to the present invention, and FIG. , FIG. 3 is a schematic configuration diagram of a third embodiment of the present invention. 1◆...P-type semiconductor substrate 2.3 Clarity/Metal electrode 4...
・Work function lowering material layer 5-... Transparent electrode agent Patent attorney Minoru Yamashita Tairaho 1 Figure 2 Figure 'nv

Claims (1)

【特許請求の範囲】[Claims] (1)P型半導体基体の両端に各々電極を接合させ、該
電極間に電圧を印加するとともに、前記P型半導体基体
に光を照射することで、光励起によって前記P型半導体
基体内に発生した電子を該P型半導体基体の一端の電子
放出面から放出することを特徴とする電子放出素子。
(1) By bonding electrodes to both ends of a P-type semiconductor substrate, applying a voltage between the electrodes, and irradiating the P-type semiconductor substrate with light, light excitation occurs within the P-type semiconductor substrate. An electron-emitting device characterized in that electrons are emitted from an electron-emitting surface at one end of the P-type semiconductor substrate.
JP61212821A 1986-09-11 1986-09-11 Electron emission element Pending JPS6369118A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP61212821A JPS6369118A (en) 1986-09-11 1986-09-11 Electron emission element
EP87113260A EP0259878B1 (en) 1986-09-11 1987-09-10 Electron emission element
DE19873752064 DE3752064T2 (en) 1986-09-11 1987-09-10 Electron emitting element
US08/094,404 US5304815A (en) 1986-09-11 1993-07-21 Electron emission elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61212821A JPS6369118A (en) 1986-09-11 1986-09-11 Electron emission element

Publications (1)

Publication Number Publication Date
JPS6369118A true JPS6369118A (en) 1988-03-29

Family

ID=16628912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61212821A Pending JPS6369118A (en) 1986-09-11 1986-09-11 Electron emission element

Country Status (1)

Country Link
JP (1) JPS6369118A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005149865A (en) * 2003-11-14 2005-06-09 Nippon Hoso Kyokai <Nhk> Field emission device, field emission substrate, drive device, and display

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005149865A (en) * 2003-11-14 2005-06-09 Nippon Hoso Kyokai <Nhk> Field emission device, field emission substrate, drive device, and display

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