JPS6363035A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPS6363035A JPS6363035A JP20729586A JP20729586A JPS6363035A JP S6363035 A JPS6363035 A JP S6363035A JP 20729586 A JP20729586 A JP 20729586A JP 20729586 A JP20729586 A JP 20729586A JP S6363035 A JPS6363035 A JP S6363035A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- silver halide
- photographic
- sensitive material
- binder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 title claims abstract description 49
- -1 Silver halide Chemical class 0.000 title claims abstract description 33
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 25
- 239000004332 silver Substances 0.000 title claims abstract description 25
- 239000010410 layer Substances 0.000 claims abstract description 85
- 239000000839 emulsion Substances 0.000 claims abstract description 27
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 26
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 26
- 239000011230 binding agent Substances 0.000 claims abstract description 21
- 239000011241 protective layer Substances 0.000 claims abstract description 14
- 229910052738 indium Inorganic materials 0.000 claims abstract description 6
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 5
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 4
- 229910052782 aluminium Inorganic materials 0.000 claims abstract 4
- 229910052718 tin Inorganic materials 0.000 claims abstract 4
- 229910052719 titanium Inorganic materials 0.000 claims abstract 4
- 229910052749 magnesium Inorganic materials 0.000 claims abstract 3
- 229910052720 vanadium Inorganic materials 0.000 claims abstract 3
- 229910052725 zinc Inorganic materials 0.000 claims abstract 3
- 150000001875 compounds Chemical class 0.000 claims description 12
- 229920001940 conductive polymer Chemical class 0.000 claims description 8
- 239000000126 substance Substances 0.000 abstract description 7
- 239000000470 constituent Substances 0.000 abstract description 5
- 230000002542 deteriorative effect Effects 0.000 abstract description 2
- 239000010419 fine particle Substances 0.000 abstract description 2
- 238000000227 grinding Methods 0.000 abstract 1
- 108010010803 Gelatin Proteins 0.000 description 15
- 229920000159 gelatin Polymers 0.000 description 15
- 239000008273 gelatin Substances 0.000 description 15
- 235000019322 gelatine Nutrition 0.000 description 15
- 235000011852 gelatine desserts Nutrition 0.000 description 15
- 230000003068 static effect Effects 0.000 description 15
- 239000000203 mixture Substances 0.000 description 11
- 239000004094 surface-active agent Substances 0.000 description 10
- 239000002245 particle Substances 0.000 description 9
- 150000003839 salts Chemical class 0.000 description 7
- 239000000084 colloidal system Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 238000002834 transmittance Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 230000035945 sensitivity Effects 0.000 description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 210000003127 knee Anatomy 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000002216 antistatic agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical class C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 229920002125 Sokalan® Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000975 dye Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000004584 polyacrylic acid Substances 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ASFFINXMVZLDKE-UHFFFAOYSA-N 1-(1,3,5-triazinan-1-yl)prop-2-en-1-one Chemical compound C=CC(=O)N1CNCNC1 ASFFINXMVZLDKE-UHFFFAOYSA-N 0.000 description 1
- KAMCBFNNGGVPPW-UHFFFAOYSA-N 1-(ethenylsulfonylmethoxymethylsulfonyl)ethene Chemical compound C=CS(=O)(=O)COCS(=O)(=O)C=C KAMCBFNNGGVPPW-UHFFFAOYSA-N 0.000 description 1
- TZNOQWZRUXSMSN-UHFFFAOYSA-N 2-ethenylsulfonyl-n-[1-[(2-ethenylsulfonylacetyl)amino]ethyl]acetamide Chemical compound C=CS(=O)(=O)CC(=O)NC(C)NC(=O)CS(=O)(=O)C=C TZNOQWZRUXSMSN-UHFFFAOYSA-N 0.000 description 1
- KOAWAWHSMVKCON-UHFFFAOYSA-N 6-[difluoro-(6-pyridin-4-yl-[1,2,4]triazolo[4,3-b]pyridazin-3-yl)methyl]quinoline Chemical compound C=1C=C2N=CC=CC2=CC=1C(F)(F)C(N1N=2)=NN=C1C=CC=2C1=CC=NC=C1 KOAWAWHSMVKCON-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical class C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 1
- 229920000881 Modified starch Polymers 0.000 description 1
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 1
- 229910003192 Nb–Ta Inorganic materials 0.000 description 1
- 241000238413 Octopus Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 235000002595 Solanum tuberosum Nutrition 0.000 description 1
- 244000061456 Solanum tuberosum Species 0.000 description 1
- PCSMJKASWLYICJ-UHFFFAOYSA-N Succinic aldehyde Chemical compound O=CCCC=O PCSMJKASWLYICJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000001414 amino alcohols Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229940101006 anhydrous sodium sulfite Drugs 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000005018 casein Substances 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010410 dusting Methods 0.000 description 1
- 238000004945 emulsification Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 235000019256 formaldehyde Nutrition 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 125000003010 ionic group Chemical group 0.000 description 1
- 239000002563 ionic surfactant Substances 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229940117841 methacrylic acid copolymer Drugs 0.000 description 1
- 229920003145 methacrylic acid copolymer Polymers 0.000 description 1
- IWVKTOUOPHGZRX-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;2-methylprop-2-enoic acid Chemical compound CC(=C)C(O)=O.COC(=O)C(C)=C IWVKTOUOPHGZRX-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 235000019426 modified starch Nutrition 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- YXJYBPXSEKMEEJ-UHFFFAOYSA-N phosphoric acid;sulfuric acid Chemical class OP(O)(O)=O.OS(O)(=O)=O YXJYBPXSEKMEEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Chemical group 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000191 poly(N-vinyl pyrrolidone) Polymers 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N pyridine Substances C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 1
- AUPJTDWZPFFCCP-GMFCBQQYSA-M sodium;2-[methyl-[(z)-octadec-9-enyl]amino]ethanesulfonate Chemical compound [Na+].CCCCCCCC\C=C/CCCCCCCCN(C)CCS([O-])(=O)=O AUPJTDWZPFFCCP-GMFCBQQYSA-M 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- HMNUYYJYMOXWTN-UHFFFAOYSA-J strontium;barium(2+);disulfate Chemical compound [Sr+2].[Ba+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O HMNUYYJYMOXWTN-UHFFFAOYSA-J 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/7614—Cover layers; Backing layers; Base or auxiliary layers characterised by means for lubricating, for rendering anti-abrasive or for preventing adhesion
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
C産業上の利用分野)
本発明は帯電防止性を改良したハロゲン化銀写真感光材
料C以下、写真感光材料と称す)に関するものであり、
特に透明性と粉落ち全悪化することなしに帯電防止性を
改良した写真感光材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a silver halide photographic material (hereinafter referred to as photographic material) having improved antistatic properties.
In particular, the present invention relates to a photographic material that has improved antistatic properties without deteriorating transparency or powder removal.
(従来の技術)
写真感光材料は一般に電気絶縁性を有する支持体および
写真層から成っているので写真感光材料の製造工程中な
らびに使用時に同種または異種物質の表面との間の接触
摩擦または剥離をうけることによって静1!電荷が蓄積
されることが多い。この蓄積された静電電荷は多くの障
害を引起すが一最も重大な障害は現像処理前に蓄積され
た静1!電荷が放電することによって感光性乳剤層が感
光し写真フィルムを現像処理した際に点状スポット又は
樹枝状や羽毛状の線斑を生ずることである。これがいわ
ゆるスタチックマークと呼ばれているもので写真フィル
ムの商品価値を著しく損ね場合によっては全く失なわし
める。例えば医療用又は工業用X−レイフィルム等に現
われた場合には非常に地検な判断につながることは容易
に認識されるであろう。この現象は現像してみて初めて
明らかになるもので非常に厄介な問題の一つである。ま
たこれらの蓄積された静電電荷はフィルム表面へゴミが
付着したり、塗布が均一に行なえないなどの第2次的な
故障を誘起せしめる原因にもなる。(Prior Art) Photographic materials generally consist of an electrically insulating support and a photographic layer, so contact friction or peeling between surfaces of the same or different materials is avoided during the manufacturing process and during use of the photographic materials. By receiving it, Shizuka 1! Electric charge is often accumulated. This accumulated electrostatic charge causes many problems, but the most serious one is the electrostatic charge accumulated before processing! The photosensitive emulsion layer is exposed to light due to the discharge of electric charges, resulting in dot-like spots or dendritic or feather-like streaks when the photographic film is developed. This is what is called a static mark, and it significantly reduces the commercial value of the photographic film, or in some cases completely destroys it. For example, if it appears on medical or industrial X-ray film, it will be easily recognized that it will lead to very difficult judgments at the district attorney's office. This phenomenon becomes apparent only after development, and is one of the most troublesome problems. Furthermore, these accumulated electrostatic charges may cause secondary failures such as dust adhering to the film surface or inability to apply uniformly.
かかる静電電荷は前述したように写真感光材料の製造お
よび使用時にしばしば蓄積されるのであるが例えば製造
工程に於ては写真フィルムとローラーとの接触摩擦ある
いは写真フィルムの巻取り。As mentioned above, such electrostatic charges are often accumulated during the production and use of photographic materials.For example, during the production process, electrostatic charges are accumulated due to contact friction between a photographic film and a roller or when the photographic film is wound up.
巻戻し工程中での支持体面と乳剤面の分離等によって発
生する。また仕上り製品に於ては写真フィルムを巻取り
切換えを行なった場合のベース面と乳剤面との分離によ
って−またはX−レイフィルムの自動撮影機中での機械
部分あるいは螢光増感紙との間の接触分離等が原因とな
って発生する。This occurs due to separation of the support surface and emulsion surface during the unwinding process. In finished products, the separation of the base surface and emulsion surface when the photographic film is wound and changed, or the separation of the X-ray film from mechanical parts in an automatic camera or from a fluorescent screen. This occurs due to contact separation between the parts.
その梱包装材料との接触などでも発生する。かかる靜を
電荷の蓄積によって誘起される写真感光材料のスタチッ
クマークは写真感光材料の感度の上昇および処理速度の
増加によって顕著となる。特に最近においては、写真、
感光材料の高感度化および高速塗布、高速撮影−高速自
動処理化等の苛酷な取り扱いを受ける機会が多くなった
ことによって一層スタチツクマークの発生が出易くなっ
ている。It also occurs when there is contact with the packaging material. Static marks in photographic light-sensitive materials induced by the accumulation of charges become more noticeable as the sensitivity of photographic light-sensitive materials increases and the processing speed increases. Especially recently, photography,
Static marks are more likely to occur as photosensitive materials have become more sensitive and are subjected to harsh handling such as high-speed coating, high-speed photography and high-speed automatic processing.
これらの静電気による障害をなくすのに最も良い方法は
物質の電気伝導性を上げて蓄積道荷が放電する前に静1
!電荷を短時間に逸散せしめるようにすることである。The best way to eliminate these static electricity disturbances is to increase the electrical conductivity of the material so that the static electricity can be removed before the accumulated charges are discharged.
! The purpose is to dissipate the charge in a short time.
したがって、従来から写真感光材料の支持体や各種塗布
表面層の導電性を向上させる方法が考えられ権々の吸湿
性物質や水溶性無機塩−ある種の界面活性剤、ポリマー
等の利用が試みられてきた。Therefore, methods have been considered to improve the conductivity of supports and various coated surface layers of photographic materials, and attempts have been made to use hygroscopic substances, water-soluble inorganic salts, certain surfactants, polymers, etc. I've been exposed to it.
例えば米国特許第2,112./J−7号−同コ。For example, U.S. Patent No. 2,112. /J-7-Same.
972、jJjt号−同3.Ot2.71!r号、同3
.262,107号−同3.!/≠、λ9/号−同3.
t/!、よ31号、同3.7!3.71t号−同3,2
3に、り9ヂ号等に記載されているようなポリマー、例
えば、米国特許第λ、9♂λ。972, jJjt No. 3. Ot2.71! r number, same 3
.. No. 262,107 - 3. ! /≠, λ9/ issue - same 3.
T/! , Yo 31, 3.7! 3.71t - 3,2
No. 3, No. 9, etc., such as those described in US Pat. Nos. λ, 9♂λ.
JJ−/号−同3.弘λざ、4(、tA号−閂)3.≠
!7.076号−同3.≠よ≠、tコ!号、同3゜!!
コ、972号−同J、t!!、317号等に記載されて
いるような界面活性剤及び例えば米国特許第3.!12
!、t、2/号に記載されているようなコロイダルシリ
カ等が知られている。JJ-/issue-same 3. Hiroλza, 4 (, tA-bar) 3. ≠
! No. 7.076 - 3. ≠Yo≠, t-ko! No. 3゜! !
Ko, No. 972 - Same J, t! ! , 317, and surfactants such as those described in U.S. Pat. ! 12
! Colloidal silica as described in , t, No. 2/, etc. are known.
しかしながらこれら多くの物質はフィルム支持体の穏類
や写真組成物の違いによって特異性を示し、ある特定の
フィルム支持体および写真乳剤やその他の写真構成要素
には良い結果全厚えるが他の異なったフィルム支持体お
よび写真構成要素では帯電防止に全く役に立たないばか
りでなく、写真性にも悪撮影、を及ぼす場合がある。そ
して更に重要な事には、これら多くの物質はその導電性
に湿度依存性があり、低湿度下では導電層としての機能
を失なうという大きな欠点があった。However, many of these materials exhibit specificity due to differences in film support properties and photographic compositions, with good results for certain film supports and photographic emulsions and other photographic components, but for other differences. Film supports and photographic components not only are of no use in preventing static electricity, but may also cause poor photographic properties. More importantly, the electrical conductivity of many of these substances is dependent on humidity, and they have a major drawback in that they lose their function as electrically conductive layers under low humidity conditions.
又−特公昭33−jA/A号にVi酸化第二錫を帯電防
止処理剤として用いる技術について記載されているが、
かかる技術は無定形の酸化第二錫コロイドを用いるもの
であって−その導電性に湿度依存性があり一低湿度下で
は導電層としての機能を失なう材料であって本質的には
前述の種々の物質とは何ら変わるものではない。In addition, Japanese Patent Publication No. 33-jA/A describes the technique of using Vi stannic oxide as an antistatic treatment agent.
This technology uses an amorphous tin oxide colloid - a material whose conductivity is humidity dependent and which loses its function as a conductive layer at low humidity, and is essentially the same as described above. It is no different from the various substances.
一方一例えば米国特許第J、Otλ、700号−特開昭
71−/≠3≠37号等において一五真感光材料あるい
は静電記録体の導電性支持体用る導電性素材としてその
導電性が湿度にほとんど依存しない結晶性の酸化亜鉛、
酸化第二錫及び醸化インジウム等の金属酸化物を用いる
事が知られている。しかしながら、これら結晶性の金属
酸化物粒子を写真感光材料に用い良好な帯電防止を得る
ためにはその構成層のバインダーに対し多量の金属酸化
物を使用する必要がある。その結果、写真感光材料の透
明性が極端に低下し写真材料として使用できなかったり
、該金属酸化物が粉となって脱離してしまうという欠点
を有している。On the other hand, for example, in U.S. Pat. Crystalline zinc oxide, which has almost no dependence on humidity.
It is known to use metal oxides such as stannic oxide and indium oxide. However, in order to obtain good antistatic properties using these crystalline metal oxide particles in photographic light-sensitive materials, it is necessary to use a large amount of metal oxide in the binder of the constituent layers. As a result, the transparency of the photographic light-sensitive material is extremely reduced, making it unusable as a photographic material, and the metal oxide is separated into powder.
(発明の目的)
本発明の第1の目的は良好に帯電防止された写真感光材
料を提供することにある。本発明の第一の目的は透明性
を損うことなく帯電防止された写真感光材料全提供する
ことにある。本発明の第3の目的は、帯電防止剤の粉落
ちを生することなく帯電防止された写真感光材料全提供
することにある。(Objective of the Invention) The first object of the present invention is to provide a photographic material that is well prevented from charging. The first object of the present invention is to provide a photographic material that is antistatic without impairing its transparency. A third object of the present invention is to provide a photographic material that is antistatic without causing dusting of the antistatic agent.
(発明の開示)
本発明のこれらの目的は、鎖意研究の結果、支持体上に
少なくとも1層のノ・ロゲン化銀層を有するハロゲン化
銀写真感光材料に於いて一該乳剤層側の保護層が2層以
上からなりかつ保護層を構成する最外層が膜厚/μmで
−Zn−Ti−5n−At、I n−S i、Mg−B
a−Mo−W−V’を主成分とする金属の酸化物及び導
電性高分子化合物からなる群から選ばれる少なくとも1
種を含有し、かつ最外層に隣接する下層がZn−Ti、
Sn−At−I n、S i−Mg−Ba−Mo、W−
V’t−主成分とする金属の酸化物の少なくとも1種を
核層中のバインダーに対し≠oo1its以上含有する
ことを特徴とするハロゲン化銀写真感光材料によって達
成できた。(Disclosure of the Invention) These objects of the present invention, as a result of chain research, have revealed that in a silver halide photographic light-sensitive material having at least one silver halide layer on a support, one emulsion layer side The protective layer consists of two or more layers, and the outermost layer constituting the protective layer has a film thickness/μm of -Zn-Ti-5n-At, In-Si, Mg-B
At least one selected from the group consisting of a metal oxide and a conductive polymer compound whose main component is a-Mo-W-V'
The lower layer containing the seeds and adjacent to the outermost layer is Zn-Ti,
Sn-At-In, Si-Mg-Ba-Mo, W-
This was achieved by a silver halide photographic material characterized by containing at least one metal oxide having V't as a main component in an amount of ≠oo1its or more relative to the binder in the core layer.
本発明に用いられる最外層の金属酸化物として好ましい
のは結晶性の金属酸化物粒子であるが、酸素欠陥を含む
もの及び用いられる金属酸化物に対してドナーを形成す
る異種原子を少量含むもの等は一般的に言って導電性が
高いので特に好ましく、特に後者はノ・ロゲン化銀乳剤
にカブリを与えないので特に好ましい。金属酸化物の例
としてはZn(l Ti02−5n02、At203、
In2O3、S i O2+ M g O,B a O
,M o 03. V 205等。Preferred metal oxide particles for the outermost layer used in the present invention are crystalline metal oxide particles, but those containing oxygen defects and small amounts of foreign atoms that form donors for the metal oxide used Generally speaking, these are particularly preferred because they have high conductivity, and the latter are especially preferred because they do not cause fog to the silver halide emulsion. Examples of metal oxides include Zn(l Ti02-5n02, At203,
In2O3, S i O2+ M g O, B a O
, M o 03. V 205 etc.
あるいはこれらの複合酸化物が良く、特にZn(ITi
02及び5n02が好寸しい。異種原子を含む例として
は、例えばZnOに対してはAt、In等の添加、5n
02に対してはSb−Nb−〕・ロゲン元索等の添加、
またT i O2に対してはNb−Ta等の添加が効果
的である。これら異種原子の添加量は0.0層moL4
〜JOmo1%の範囲が好ましいが−0,/mold〜
/ Omo1%であれが特に好ましい。Alternatively, these composite oxides are good, especially Zn(ITi
02 and 5n02 are suitable sizes. Examples of materials containing different atoms include addition of At, In, etc. to ZnO, and addition of 5n
For 02, addition of Sb-Nb-], Rogen base, etc.
Furthermore, addition of Nb-Ta or the like is effective for T i O2. The amount of these different atoms added is 0.0 layer moL4
〜JOmo1% range is preferable, but −0,/mold〜
/Omo1% is particularly preferable.
本発明の金属酸化物微粒子は導電性を有しており、その
体積抵抗率は107Ω−σ以下−特に105Ω−α以下
であることが好ましい。The metal oxide fine particles of the present invention have electrical conductivity, and their volume resistivity is preferably 10 7 Ω-σ or less, particularly 10 5 Ω-α or less.
これらの酸化物については特開昭jt−/≠31A31
号、同jA−/201/9号−同5r−x26μ7号な
どに記載されている。Regarding these oxides, see JP-A-Shojt-/≠31A31.
No. JA-/201/9-No. 5r-x26μ7, etc.
更に又−特公昭!ターt 2 J、 j号に記載のごと
く一他の結晶性金属酸化物粒子あるいは繊維状物(例え
ば酸化チタン)に上記の金属酸化物を付着させた導電性
素材を使用してもよい。Yet again - Tokko Akira! A conductive material in which the above metal oxide is attached to another crystalline metal oxide particle or fibrous material (for example, titanium oxide) may also be used as described in No. 2J, J.
利用できる粒子サイズは10μ以下が好ましいが、2μ
以下であると分散後の安定性が良く使用し易い。また光
散乱性をできるだけ小さくする為に、O1!μ以下の導
電性粒子を利用すると透明感光材料を形成することが可
能となり大変好ましい。The particle size that can be used is preferably 10μ or less, but 2μ
If it is below, the stability after dispersion will be good and it will be easy to use. In addition, in order to minimize light scattering, O1! It is very preferable to use conductive particles of μ or less in size because it is possible to form a transparent photosensitive material.
又、導電性材料が針状あるいは繊維状の場合はその長さ
は30μm以下で直径が一μ以下が好ましく、特に好ま
しいのは長さが2よμm以下で直径O1jμ以下であり
長さ/直径比が3以上である。Further, when the conductive material is acicular or fibrous, the length is preferably 30 μm or less and the diameter is 1 μm or less, and particularly preferably the length is 2 μm or less and the diameter is O1jμ or less, and the length/diameter is The ratio is 3 or more.
父1本発明の最外層には導電性高分子化合物全含有でき
るが、これらの化合物は例えば−ポリビニルベンゼンス
ルホンekMfA、ポリビニルベンジルトリメチルアン
モニウムクロリド−米国特許第≠、ior、toλ号、
同μ、i/r、r3i号、同弘、/uA、≠t7号−同
≠、/37,277号に記載の≠級塩ポリマー類−米国
特許第≠、070.119号、0L12,130,76
7号等に記載のポリマーラテックス等が好ましい。Father 1 The outermost layer of the present invention can contain all conductive polymer compounds, such as polyvinylbenzenesulfone ekMfA, polyvinylbenzyltrimethylammonium chloride, U.S. Patent No.≠, ior, toλ,
≠ salt polymers described in μ, i/r, r3i, Dohiro, /uA, ≠t7 - ≠, /37,277 - U.S. Patent No. ≠, 070.119, 0L12,130 ,76
Polymer latexes described in No. 7 and the like are preferred.
最外層に含有される本発明の金属酸化物又は導電性高分
子化合物は、バインダー中に分散あるいは含有させて用
いられる。The metal oxide or conductive polymer compound of the present invention contained in the outermost layer is used by being dispersed or contained in a binder.
バインダーとしては1例えば親水性コロイドとしてゼラ
チン、コロイド状アルブミンーカセインなどの蛋白質;
カルホキジメチルセルロース、ヒドロキシエチルセルロ
ース等のセルロース化合物;寒天−アルギン酸ソーダ、
でんぷん誘導体等の糖誘導体;合成親水性コロイド例え
ばポリビニルアk ’j −ル+ポリーN−ビニルピロ
リドン、ポリアクリル酸共重合体、ポリアクリルアミド
またはこれらの誘導体および部分加水分散物、デキスト
ランーポ+1 酢酸ビニル、ポリアクリル酷エステルー
ロジン等が挙げられる。必要に応じてこれらのコロイド
の二つ以上の混合物を使用してもよい。Examples of binders include proteins such as gelatin and colloidal albumin-casein as hydrophilic colloids;
Cellulose compounds such as carboxydimethylcellulose and hydroxyethylcellulose; agar-sodium alginate,
Sugar derivatives such as starch derivatives; synthetic hydrophilic colloids such as polyvinyl k'j -l+poly N-vinylpyrrolidone, polyacrylic acid copolymers, polyacrylamide or derivatives thereof and partially hydrolyzed dispersions, dextranpo+1 vinyl acetate, Examples include polyacrylic hard ester-rosin. Mixtures of two or more of these colloids may be used if necessary.
この中で最も用いられるのはゼラチンであるがここに言
うゼラチンはいわゆる石灰処理ゼラチン。Among these, gelatin is the most used, and the gelatin mentioned here is so-called lime-processed gelatin.
酸処理ゼラチンおよび酵素処理ゼラチンを指す。Refers to acid-treated gelatin and enzyme-treated gelatin.
ゼラチンの一部または全部を合成高分子物質で置きかえ
ることができるほか、いわゆるゼラチン誘導体すなわち
分子中に含まれる官能基としてのアミノ基、イミノ基−
ヒドロキシ基またはカルボキシル基をそれらと反応しう
る基を1個持った試薬で処理、改質したもの、あるいは
高分子物質の分子鎖を結合させたグラフトポリマーで置
きかえて使用してもよい。In addition to being able to replace part or all of gelatin with synthetic polymeric substances, so-called gelatin derivatives, i.e., amino groups and imino groups as functional groups contained in the molecule, can be used.
A hydroxy group or a carboxyl group treated or modified with a reagent having one group capable of reacting with them, or a graft polymer in which molecular chains of a polymeric substance are bonded may be used in place of the hydroxy group or carboxyl group.
最外層に使用される金属酸化物あるいは導電性高分子化
合物とバインダーの体積比は!:9j〜uo:toが好
ましい。又−金属醇化物あるいは導電性高分子化合物は
該層のバインダーに対して22〜.27θ重f4である
ことが好ましい。その場合−最外層の膜厚は1μm金越
えることはない。What is the volume ratio of the metal oxide or conductive polymer compound used in the outermost layer and the binder? :9j to uo:to are preferred. Also, the metal moltenide or conductive polymer compound has a ratio of 22 to 22% to the binder of the layer. A 27θ weight f4 is preferable. In that case - the thickness of the outermost layer does not exceed 1 μm gold.
特に好ましいのは金属酸化合と/あるいは導電性高分子
化合物とバインダーの体積比がsr : 7J−〜70
:30で一最外層の膜厚が0.0j〜/μmである。It is particularly preferable that the volume ratio of the metal acid compound and/or the conductive polymer compound to the binder is sr: 7J- to 70
:30, and the film thickness of the outermost layer is 0.0j~/μm.
次に保護層を形成し前記最外層に隣接するノ゛−(隣接
層と称す)について記述すると、使用される金属酸化物
については前記の最外層に使用したものと全く同じであ
る。、隣接層に使用されるバインダーについても最外層
と同様なバインダーが使用できるばかりでなく一最外層
に使用できる導電性高分子化合物でそのバインダーの一
部あるいは全部と置き換えてもよい、、@接層中に使用
される金属酸化物は隣接層中のバインダーに対し≠00
重i係以上必要である。Next, the protective layer formed adjacent to the outermost layer (referred to as the adjacent layer) will be described. The metal oxide used is exactly the same as that used for the outermost layer. As for the binder used in the adjacent layer, not only can the same binder as the outermost layer be used, but also a part or all of the binder may be replaced with a conductive polymer compound that can be used in the outermost layer. The metal oxide used in a layer has a ≠00
Required for rank I or above.
好ましい隣接層の形体としては一金属酸化物がバインダ
ーに対し≠00〜/λ00重量%であり隣接層の膜厚は
0./〜!μmである。特に好ましいのは金属酸化物が
バインダーに対しUOO〜/ 000重!壬であり、隣
接層の膜厚がOo−〜1μmである。A preferred form of the adjacent layer is that the monometal oxide is present in an amount of ≠00 to /λ00% by weight based on the binder, and the thickness of the adjacent layer is 0.00% by weight. /~! It is μm. It is particularly preferable that the metal oxide has a weight of UOO~/000 weight relative to the binder! The film thickness of the adjacent layer is Oo-~1 μm.
本発明による前述の保護層を乳剤層側に付与することに
よシー透明性を損うことなく又金属酸化物の粉落ちを全
く生じることなく良好な帯電防止性をもった写真感光材
料金得ることができる。By applying the above-mentioned protective layer according to the present invention to the emulsion layer side, a photographic light-sensitive material having good antistatic properties can be obtained without impairing transparency or causing any metal oxide powder to fall off. be able to.
本発明に於いては又含フツ素界面活性剤を併用すること
によって更に良好な帯電防止性を得ることができる。こ
の場合に使用される含フツ素界面活性剤の添加層は、写
真感光材料の構成層のいづれにあってもよいが、好まし
いのは保護層であり特に好ましくは最外層である。In the present invention, even better antistatic properties can be obtained by using a fluorine-containing surfactant in combination. The layer containing the fluorine-containing surfactant used in this case may be present in any of the constituent layers of the photographic light-sensitive material, but the protective layer is preferred, and the outermost layer is particularly preferred.
本発明に併用される好ましい含弗素界面活性剤としては
、炭素数μ以上のフルオロ−アルキル基。Preferred fluorine-containing surfactants used in combination with the present invention include fluoro-alkyl groups having a carbon number of μ or more.
アルケニル基、又はアリール基を有しJイオン性基とし
1アニオン基(スルホン酸(塩)、硫酸(塩)、カルボ
ン酸(塩)、リン酸(塩))、カチオン基(アミン塩、
アンモニウム塩、芳香族アミン塩、スルホニウム塩、ホ
スホニウム塩)−ヘタイン基(カルボキシアミン塩、カ
ルボキシアンモニウム塩、スルホアミン塩、スルホアン
モニウム塩、ホスホアンモニウム塩)又はノニオン基(
1tJL無置換のポリオキシアルキレン基、ポリグリセ
リル基またはンルビタン残基)′81−有する活性剤が
挙げられる。J ionic group with alkenyl group or aryl group, 1 anionic group (sulfonic acid (salt), sulfuric acid (salt), carboxylic acid (salt), phosphoric acid (salt)), cationic group (amine salt,
ammonium salt, aromatic amine salt, sulfonium salt, phosphonium salt) - hetaine group (carboxyamine salt, carboxyammonium salt, sulfoamine salt, sulfoammonium salt, phosphoammonium salt) or nonionic group (
Examples include activators having an unsubstituted polyoxyalkylene group, polyglyceryl group, or rubitan residue)'81-.
これらの含弗素界面活性剤は特開昭弘?−107−−号
、英国特許第1,330.33を号、特開昭3.3−4
≠7/2号、同!弘−/!、22弘号。Are these fluorine-containing surfactants developed by Akihiro? -107--, British Patent No. 1,330.33, JP-A-3-4
≠7/2 issue, same! Hiro-/! , No. 22 Hiro.
同!0−113221号、米国特許第11−.33よ。same! No. 0-113221, U.S. Patent No. 11-. 33.
、207号、同44,3417.301号、英国特許第
1、(t/7.り73号、特公昭32−21,417号
、同37−2t7/り号、同!9〜31673号−特開
昭jj−/≠ヂ937号、同よ≠−7♂、120号、同
!It−/1l−2211号−同tr−、:z。, No. 207, No. 44,3417.301, British Patent No. 1, (t/7.ri No. 73, Japanese Patent Publication No. 32-21,417, No. 37-2t7/ri, No. 9-31673- JP-A No. 937, 7♂, 120, 121, tr-, :z.
023!r号−fA!71’A6λ+、r号、同!?−
/りAよ弘≠号、英国特許第1,4t39,110λ号
、などに記載されている。023! r-fA! 71'A6λ+, r issue, same! ? −
It is described in /ri A Yohiro≠, British Patent No. 1,4t39,110λ, etc.
これらの好寸しい具体例を以下に記す。Preferred specific examples of these are described below.
I −/ C3F17SO3に
■−2C7F 15 C00N a
I 3 CBF17CH2CH20SO3Na■
−弘 C3H7
■
CsF 175O2N−CH2COOK−t
1−+
I −7C3H7
■
Ca F 17 So 2 N4−CH2CH20+r
+C)(2qsOa N aC8F17SO2NCH2
CH20P−ONaNa
l−9′ CxoFt7COOCHzCHCHzS
O3NaH
■−10H(CF2−)TCH200C−CH2H(C
F2icH200cmCHSO3Naニー// Cg
F17CH2CH200C−CH2C4Hg00C−C
HSO3Na
CH3
CH3
C1(3
CH3
さH
CH3
2H5
■−26
C7F 15COO+CH2CH2O力了■(I−27
’
Cl0F21COO−1−CH2CH20+Ti5TT
H■、zq CH3
C3F17SO2N−f−CH2CH20)9Hニー3
o Cl0H21C8F17SO2N
−4−CH2CH20tHn+m=/ /、 j
I−Jコ C3H7
C3F17SO2NJCH2CH20墳HI−33C2
H5
C8F、7802N−1−CH−CH2−0ガ→CH2
CH2O拍HC1(a
ニー3t C3H7
C3F17SO2N−CH2COO−4−CH2CH2
0−)T、−H■−3り
CH3
■−47
HfCF2+TcH2O−CH2CF2H20−CH2
CH2CF2H0+cH2cH2018H
■−μ2
3H7
H
本発明の保獲層あるいは他の層に別の帯電防止剤を併用
することもでき、こうすることによって更に好ましい帯
電防止効果を得ることもできる。I − / C3F17SO3■-2C7F 15 C00N a I 3 CBF17CH2CH20SO3Na■
-Hiro C3H7 ■ CsF 175O2N-CH2COOK-t 1-+ I -7C3H7 ■ Ca F 17 So 2 N4-CH2CH20+r
+C) (2qsOa N aC8F17SO2NCH2
CH20P-ONaNa l-9' CxoFt7COOCHzCHCHzS
O3NaH ■-10H(CF2-)TCH200C-CH2H(C
F2icH200cmCHSO3Na knee//Cg
F17CH2CH200C-CH2C4Hg00C-C
HSO3Na CH3 CH3 C1 (3 CH3 SAH CH3 2H5 ■-26 C7F 15COO+CH2CH2O power completion ■(I-27
'Cl0F21COO-1-CH2CH20+Ti5TT
H ■, zz CH3 C3F17SO2N-f-CH2CH20) 9H knee 3
o Cl0H21C8F17SO2N
-4-CH2CH20tHn+m=/ /, j I-J co C3H7 C3F17SO2NJCH2CH20 tomb HI-33C2
H5 C8F, 7802N-1-CH-CH2-0ga → CH2
CH2O beat HC1 (a knee 3t C3H7 C3F17SO2N-CH2COO-4-CH2CH2
0-)T, -H ■-3 CH3 ■-47 HfCF2+TcH2O-CH2CF2H20-CH2
CH2CF2H0+cH2cH2018H ■-μ2 3H7 H It is also possible to use another antistatic agent in the retention layer of the present invention or other layers, and by doing so, a more preferable antistatic effect can be obtained.
このような帯電防止剤には−例えば米国特許第一。Such antistatic agents include - for example, U.S. Pat.
772.137号、同2,972.13j号、同J、O
t2,7.!r!号、同3.2A2,107号、同3,
31弘、λり/号−同J、AI!、 j3/号、同3,
7j3,71A号、同3,931,999号−同弘、0
70./19号−同μ、 /IIL7゜!!O号、独
国特許第−、too、≠JJ号、特開昭グ♂−タ/、/
1!号、同≠♂−94L、≠33号−同’49−’、’
t、733号、同60−144゜372号−同タO−タ
≠、O第3号、目1!ニー/λり、120号等に記載さ
れているような重合体、例えば米国特許第一、9!λ、
tri号、同3゜It21,4116号、同3.!77
.074号、同J、’、’jμ、ぶ一!号、同j、j!
、2.り72号、(司j、666、J♂7号−特開昭!
μm/!9コ+23号−同j7−10タデ77月−+同
よ!−4ti<041号−同74−/jθ6.2j号、
同!ター!723/号、同!ニー33!2/号、同!?
−203413!r号−同rl−2017413号−同
!デー/ 9/ 031A号、同/、/91.It!0
号、英国特許第7744.106号、特願昭&/−/l
O!を号等に記載されているような界面活性剤1例えば
米国特許第J、OA、2,700号−同3.−14t3
.r、33号、同j、12j、jj/号等に記載されて
いるような金属酸化物−コロイドシリカ等や硫酸バリウ
ムストロンチウム、ポリメタクリル酸メチル、メタクリ
ル酸メチル−メタクリル酸共重合体、コロイドシリカ又
は粉末シリカ等からなるいわゆるマット剤を挙げること
ができる。772.137, 2,972.13j, J, O
t2,7. ! r! No. 3.2A2, 107, No. 3,
31 Hiroshi, λri/issue-same J, AI! , j3/issue, same 3,
7j3,71A, 3,931,999-Dohiro, 0
70. /No.19-sameμ, /IIL7゜! ! No. O, German Patent No. -, too, ≠ JJ No., Japanese Patent Application Publication No. 2003-19919 /, /
1! No. ≠♂-94L, ≠33-'49-','
t, No. 733, No. 60-144゜372 - Ta O-ta≠, O No. 3, item 1! Polymers such as those described in US Pat. No. 1, 9! λ,
tri issue, same 3゜It21,4116, same 3. ! 77
.. No. 074, same J,','jμ,buichi! No., same j, j!
, 2. ri No. 72, (Tsukasa J, 666, J♂ No. 7 - Tokkai Sho!
μm/! 9 + No. 23 - Same j7 - 10 Tade 7 July - + Same! -4ti<041-74-/jθ6.2j,
same! Tha! 723/issue, same! Knee 33!2/issue, same! ?
-203413! r issue-same rl-2017413-same! Day/9/031A, same/, /91. It! 0
No., British Patent No. 7744.106, Patent Application Sho&/-/l
O! Surfactants 1, such as those described in US Pat. No. J, OA, 2,700-3. -14t3
.. Metal oxide-colloidal silica, etc., barium strontium sulfate, polymethyl methacrylate, methyl methacrylate-methacrylic acid copolymer, colloidal silica as described in No. r, No. 33, No. j, 12j, jj/, etc. Alternatively, a so-called matting agent made of powdered silica or the like can be mentioned.
又、エチレングリコール、フロピレンゲリコール、’+
’t’ )’Jメチロールプロパン等特開昭!≠−t
?≦2を号に示されるようなポリオール化合物を本発明
の保@層あるいは他の層に添加することが出来、こうす
ることによっても更に好ましい帯電防止効果を得ること
ができる。Also, ethylene glycol, phlopylene gelicol, '+
't' ) 'J Methylolpropane, etc. JP-A-Sho! ≠−t
? A polyol compound as shown in No. ≦2 can be added to the retention layer or other layer of the present invention, and by doing so, a more preferable antistatic effect can be obtained.
本発明に係る感光材料としては、通常の巳黒ハロゲン化
銀感光材料(例えば、撮影用白黒感材。The light-sensitive material according to the present invention is a conventional silver halide light-sensitive material (for example, a black-and-white light-sensitive material for photography).
X−ray用白黒感材、印刷用白黒感材、等)−通常の
多層カラー感光材料(例えば−カラーリバーサルフイル
ム、カラーネガティブフィルム−カラーポジティブフィ
ルム−等)1種々の感光材料を挙げることができる。と
くに、高温迅速処理用ハロゲン化銀感光材料−高感度ハ
ロゲン化銀感光材料に効果が大きい。(Black-and-white sensitive materials for X-ray, black-and-white sensitive materials for printing, etc.) - Ordinary multilayer color photosensitive materials (For example - Color reversal film, Color negative film - Color positive film, etc.) 1 Various photosensitive materials can be mentioned. . It is particularly effective for silver halide photosensitive materials for high-temperature, rapid processing - high-sensitivity silver halide photosensitive materials.
以下に一本発明に係わるハロゲン化銀感光材料について
簡単に記載する。A silver halide photosensitive material according to the present invention will be briefly described below.
写真層のバインダー、表面保護層のバインダーと同様な
親水性コロイドが用いられる。A hydrophilic colloid similar to the binder for the photographic layer and the binder for the surface protective layer is used.
本発明の写X構成層には他の公知の界面活性剤を単独ま
たは混合して添加してもよい。それらは塗布助剤として
用いられるものであるが1時としてその他の目的、例え
ば乳化分散、増感その他の写真特性の改良等のためにも
】A用される。Other known surfactants may be added alone or in combination to the X component layer of the present invention. Although they are used as coating aids, they are also occasionally used for other purposes, such as emulsification and dispersion, sensitization, and other improvements in photographic properties.
これらの界面活性剤はサポニン等の天然界面活性剤、ア
ルキレンオキシド系、グリセリン系−グリシドール系な
どのノニオン界面活性剤、高級アルキルアミン類、第7
級アンモニウム塩類−ピリジンその他の複素環類−ホス
ホニウムまたはスルホニウム類等のカチオン界面活性剤
:カルボン酸−スルホン酢、リンe−amエステル、リ
ン酸エステル等の酸性基を含むアニオン界面活性剤、ア
ミノ酸類−アミノスルホン酸類−アミノアルコールの硫
酸着たけリン酸エステル類等の両性界面活性剤にわけら
れる。These surfactants include natural surfactants such as saponin, nonionic surfactants such as alkylene oxide type, glycerin type-glycidol type, higher alkylamines, and
Ammonium salts - Pyridine and other heterocycles - Cationic surfactants such as phosphonium or sulfoniums: Carboxylic acids - Anionic surfactants containing acidic groups such as sulfonic acid, phosphorus e-am esters, phosphate esters, amino acids - Aminosulfonic acids - Ampholytic surfactants such as sulfuric acid phosphoric acid esters of amino alcohols.
又1本発明に於ては一滑性化組成物、例えば米国特許第
J、079.に37号−同$3.01rO。The present invention also includes a smoothening composition, such as U.S. Pat. No. J, 079. 37-$3.01rO.
3ノア号、同第J、j≠夕、り70号、同第3゜29≠
、337号及び日本公開特許第!12−/2り、120
号に示されるような変性シリコーン等ヲ写真病成層中に
含むことができる。3 Noah, same No. J, j≠Yu, Ri No. 70, same No. 3゜29≠
, No. 337 and Japanese Published Patent No.! 12-/2ri, 120
Modified silicones such as those shown in No.
本発明の写真感光材料は写真構成層中に米国特許第3.
’A//、9//号、同3.≠//、9/λ号、特公昭
≠t−よJJ/号等に記載のポリマーラテックスを含む
ことができる。The photographic light-sensitive material of the present invention has a photographic constituent layer as described in US Patent No. 3.
'A//, 9// issue, same 3. ≠//, 9/λ, Tokuko Sho≠t-yo JJ/, etc. may be included.
又一本発明の写真感光材料には、写真構成層中に米国7
%許第3.≠ii、 タ//号、同3.弘l/、 ?
/−号−特公昭!J’−!33/号等に記載のアルキル
アクリレート系ラテックスを含むことが出来る。In addition, the photographic material of the present invention contains U.S. 7 in the photographic constituent layer.
% allowance 3rd. ≠ii, ta// issue, same 3. Hiroshi/, ?
/-No.-Tokuko Akira! J'-! The alkyl acrylate latex described in No. 33/ etc. can be included.
乳剤中のハロゲン化銀粒子は立方体、八面体のような規
則的(regularIな結晶形を有するものでもよく
、また球状、板状、じゃがいも状などのような変則的(
irregular )な結晶形を有するものでも或い
はこれらの結晶形の複合形を有するものでもよい2種々
の結晶形の粒子の混合から成ってもよい。また粒子径が
粒子厚みの1倍以上の平板状粒子は、本発明に対し好ま
しく用いられる(詳しくは、RESEARCHDISC
LO3URE22j巻工tem #22! J II
P、 20−P、 J♂、1月号、/り23年、及
び特開昭j1−/λ7り2/号、同5r−iiJqxt
号公報に記載されている)。The silver halide grains in the emulsion may have a regular crystal shape such as a cube or octahedron, or may have an irregular crystal shape such as a spherical shape, a plate shape, a potato shape, etc.
It may consist of a mixture of particles of two different crystal forms, which may have irregular crystal forms or may have a composite form of these crystal forms. Further, tabular grains having a particle diameter of one or more times the particle thickness are preferably used for the present invention (for details, refer to RESEARCHDISC
LO3URE22j winding tem #22! J II
P, 20-P, J♂, January issue, /23, and JP-A-1-/λ7-2/ issue, 5r-ii Jqxt
(described in the publication).
本発明において、感光性ノ・ロゲン化銀乳剤は一2種類
以上のハロゲン化銀乳剤を混合して用いてもよい。混合
する乳剤の粒子サイズ・ハロゲン組成・感度・等が異っ
ていてもよい。感光性乳剤に実質的に非感光性の乳剤(
表面あるいは内部がかぶっていてもいいしいなくてもい
い)を混合して用いてもいいし別の層に分けてもいい。In the present invention, the photosensitive silver halide emulsion may be a mixture of 12 or more types of silver halide emulsions. The emulsions to be mixed may differ in grain size, halogen composition, sensitivity, etc. Substantially non-light sensitive emulsion (
(The surface or interior may or may not be covered) may be used in a mixture or may be separated into separate layers.
例えば−球状もしくはじゃがいも状の感光性乳剤と粒子
径が粒子厚みの5倍以上の平板状粒子からなる感光性ハ
ロゲン化銀乳剤と同一層もしくは特開昭j!−/λ7タ
コ/号公報に記載の如く異なった層に用いてもよい。異
なった層に用いる時、平板状粒子からなる感光性ハロゲ
ン化銀乳剤は支持体に近い側にあってもよいし、逆に遠
い側にあってもよい。For example, in the same layer as a spherical or potato-shaped photosensitive emulsion and a photosensitive silver halide emulsion consisting of tabular grains with a grain size of 5 times or more the grain thickness, or in JP-A-Shoj! -/λ7 Octopus/ may be used in different layers as described in the publication. When used in different layers, the light-sensitive silver halide emulsion consisting of tabular grains may be on the side closer to the support or, conversely, on the side farther away.
本発明の写真感光材料におけるハロゲン化銀乳剤層およ
びその他の親水性コロイド層は各種の有機または無機の
硬化剤(単独ま之は組合せて)により硬化されうる。代
表的な例としてはムコクロル酸−ホルムアルデヒド−ト
リメチロールメラミン、グリオキザールーー、3−ジヒ
ドロキシ−/。The silver halide emulsion layer and other hydrophilic colloid layers in the photographic light-sensitive material of the present invention can be hardened with various organic or inorganic hardening agents (either singly or in combination). Typical examples include mucochloric acid-formaldehyde-trimethylolmelamine, glyoxalu, 3-dihydroxy-/.
グージオキサン−2,3−ジヒドロキシ=よ一メチルー
/、4cmジオキサン、サクシンアルデヒド。Gudioxane-2,3-dihydroxy=yo-1 methyl/, 4cm dioxane, succinic aldehyde.
グルタルアルデヒドの如きアルデヒド系化合物ニジビニ
ルスルホン−メチレンビスマレイミド−/lJ、j−)
IJアクリロイル−へキサヒドロ−S −トリアジン−
/、 J、 z−トリビニルスルホニル−へキサヒドロ
−5−)リアジンビス(ビニルスルホニルメチル)エー
テル、/、J−ビス(ビニルスルホニルメチル)フロパ
ノール−2、ビス(α−ビニルスルホニルアセトアミド
)エタンの如き活性ビニル系化合物;、!、Il−ジク
ロロ−を一ヒドロキシー5−)リアジン・ナトリウム塩
−コ、≠−ジクロロ−6−メドキシーS−)リアジンの
如き活性ハロゲン化合物;コ、≠、6−ドリエチレンイ
ミノーS−トリアジンの如きエチレンイミン系化合物;
などを挙げることが出来る。Aldehyde compounds such as glutaraldehyde Nidivinyl sulfone-methylene bismaleimide/lJ, j-)
IJ acryloyl-hexahydro-S-triazine-
/, J, z-trivinylsulfonyl-hexahydro-5-)riazine bis(vinylsulfonylmethyl)ether, /, J-bis(vinylsulfonylmethyl)furopanol-2, bis(α-vinylsulfonylacetamido)ethane. Vinyl compounds;,! , Il-dichloro-monohydroxy-5-)riazine sodium salt-co,≠-dichloro-6-medoxyS-)riazine; Ethyleneimine compounds;
etc. can be mentioned.
本発明の写真感光材料のハロゲン化銀乳剤層。Silver halide emulsion layer of the photographic light-sensitive material of the present invention.
表面保護層々どに用いられるハロゲン化銀の種類−製法
、化学増感法、カブリ防止剤−安定剤−硬膜剤、可塑剤
、潤滑剤、塗布助剤−マット剤、増白剤−分光増感色素
、染料、カラーカップラー等については特に制限はなく
、例えばリサーチ・ディスクロージャーK(Resea
rch Disclosure )/76巻22〜3ノ
頁(/97Ir年12月)の記載を参考にすることが出
来る。Types of silver halides used in surface protective layers - Manufacturing methods, chemical sensitization methods, antifoggants - Stabilizers - Hardeners, plasticizers, lubricants, coating aids - Matting agents, brighteners - Spectral enhancement There are no particular restrictions on dyes, dyes, color couplers, etc.; for example, Research Disclosure K (Resea
Reference may be made to the description in ``Rch Disclosure''/Volume 76, pages 22-3 (December 1997Ir).
以下に実施例を挙げて本発明を例証するが本発明はこれ
に限定されるものではない。The present invention will be illustrated below with reference to Examples, but the present invention is not limited thereto.
実施例1
約/7jμのポリエチレンテレフタレートフィルム支持
体の片側に乳剤層、保護層(@接層、最外層からなる)
の順に重ね(乳剤層側)もう一方の側にバック保護層C
バック層側)で構成された試料/ −/〜/−10を常
法に従って塗布、乾燥してつくった。°各層の組成は下
記の通υである。Example 1 An emulsion layer and a protective layer (consisting of the contact layer and the outermost layer) on one side of a polyethylene terephthalate film support of approximately /7 μm
(emulsion layer side) and back protective layer C on the other side.
Samples /-/ to /-10 consisting of back layer side) were coated and dried according to a conventional method. °The composition of each layer is as follows.
A)乳剤層側
(イ)乳剤層(3μm)
バインダー;ゼラチン2.j?/m2
塗布銀量:jf/m2
ハロゲン化銀組成; AgI / 、 r mat c
irおよびAgBr 9 r 、 j mol 4カブ
リ抑制剤;l−フェニル−よ−メルカプトテラシール0
.3 f/Ag / 00り硬g(剤;/、j−ビス(
ビニルスルホニル)−プロパノール2 /、コf/1
009ゼラチン
ζ口) 隣接層1/ μm)
バインダー;ゼラチン
硬ILHII;/、J−ヒス(ビニルスルホニル)−プ
ロノでノール−2/、λf/1009ゼラチン
(ハ)最外層(0,1μm)
バインダー;ゼラチン
塗布剤;p−t−オクチルフェノキシエトキシエトキシ
エタンスルホン酸ナトリウム塩20m97m2
B)バック層(約/、3μm)
バインダー;ゼラチン1.フf/m2
塗布剤:N−オレイル−N−メチルタウリンナトリウム
塩7〜/m2
Nm剤;/、J−ビス(ビニルスルホニル)−プロパノ
−ルー2 /、λq7’1ootゼラチン
各試料はその最外層、隣接層として表/の組成を有する
層を設けた。A) Emulsion layer side (a) Emulsion layer (3 μm) Binder; Gelatin 2. j? /m2 Coated silver amount: jf/m2 Silver halide composition; AgI /, r mat c
ir and AgBr 9 r , j mol 4 antifoggant; l-phenyl-yo-mercaptoterrasil 0
.. 3 f/Ag/00 hardness g(agent;/, j-bis(
vinylsulfonyl)-propanol 2/, cof/1
009 gelatin ζ mouth) Adjacent layer 1/μm) Binder; gelatin hard ILHII; /, J-his(vinylsulfonyl)-prono-nor-2/, λf/1009 gelatin (c) outermost layer (0.1 μm) binder; Gelatin coating agent; pt-octylphenoxyethoxyethoxyethanesulfonic acid sodium salt 20m97m2 B) Back layer (approximately 3 μm) Binder; gelatin 1. f/m2 Coating agent: N-oleyl-N-methyltaurine sodium salt 7 ~/m2 Nm agent: /, J-bis(vinylsulfonyl)-propanol-2 /, λq7'1oot gelatin Each sample has its outermost layer , a layer having the composition shown in Table 1 was provided as an adjacent layer.
(1)スタチックマークテスト
これらの未露光の試料を2夕’(、104RHで2時間
調湿した後−同一空調条件の暗室中において一試料を各
種素材に対してそのスタチックマークがどのようになる
かを調べるべくゴムローラー及びウレタンローラーで肇
擦した後、下記の現像液で現像し一定着一水洗全行なっ
てスタチックマークの発生度を調べた。(1) Static mark test These unexposed samples were conditioned for 2 hours at 104 RH for 2 hours, and the static marks of each sample on various materials were measured in a dark room under the same air conditioning conditions. After rubbing with a rubber roller and a urethane roller to determine whether the static marks were formed or not, the film was developed with the following developer and washed with water for a certain period of time to determine the degree of static mark formation.
(現体液組成)
温水 rooml
テトラポリリン酸ナトリウム 2.07無水亜硫
酸ナトリウム よ09ハイドロキノン
109炭酸ナトリウムC/水塩
) 弘O?/−フェニルー3−ピラゾリドン
0.37臭化カリウム 2
.02水を加えて toooml
(pH10,2)
これらの試料の帯電防止性の結果を第1表に示す。(Current liquid composition) Hot water room Sodium tetrapolyphosphate 2.07 Anhydrous sodium sulfite Yo09 Hydroquinone
109 Sodium carbonate C/water salt) Hiro O? /-Phenyl-3-pyrazolidone 0.37 Potassium Bromide 2
.. 02 Add water tooml
(pH 10, 2) The antistatic properties of these samples are shown in Table 1.
第7表中、スタチックマーク発生度の評価は以下のμ段
階に分けて行った。In Table 7, the evaluation of the degree of static mark occurrence was divided into the following μ stages.
A:スタチックマークの発生が全く認められずB:
少し認められるC:
か々り認められる
D= はぼ全面に認められる
(2)透過率テスト
未露光の試料を(1)で記載したごとく現像・定着処理
したサンプルを用いて、その全光線透過率を測定した。A: No static marks were observed at all B:
Slightly recognized C:
(2) Transmittance test Using an unexposed sample that was developed and fixed as described in (1), the total light transmittance was measured.
試料l−/(コントロール)を基準に100とし、それ
に対する相対値を相対透過率として第1表に示した。な
お全光線透過率はASTMl)−1003に準じて測定
した。Sample 1-/(control) was set as 100, and the relative values relative to that were shown in Table 1 as relative transmittance. Note that the total light transmittance was measured according to ASTM I)-1003.
(3)粉落ちテスト 試料3.3cmx3ocmに裁断し2!0C1t。(3) Powder removal test The sample was cut into 3.3cm x 3ocm and weighed 2!0C1t.
壬相対湿度で3時間調湿した。試料の乳剤層側を。Humidity was controlled for 3 hours at the relative humidity. The emulsion layer side of the sample.
j Kqの荷重をのせた白い画用紙J crnx J
c1nkt青き3回往復させてこすった。画用紙に付着
した付着物を以下の≠段階で評価した。j A white drawing paper with a load of Kq J crnx J
I rubbed the c1nkt blue color by going back and forth 3 times. The deposits on the drawing paper were evaluated using the following ≠ scale.
A:付着物が全く認められ々い。A: No deposits were observed at all.
B: I 少し認められる。B: I Slightly recognized.
C: l かなり認められる。C: Quite acceptable.
D= 1 はぼ全面に認められる。。D = 1 is observed almost entirely. .
(4)相対感度
試料を富士フィルム社製フィルターSP−/≠全通した
タンゲステンランプ光で露光したのち。(4) Relative Sensitivity After exposing the sample to tungsten lamp light completely passed through Fuji Film's filter SP-/≠.
前述の現像処理方法に従って処理した。試料l−/(コ
ントロニル)の感度5(iooとして他の試料を評価し
た。It was processed according to the development method described above. Other samples were evaluated as sensitivity 5 (ioo) of sample l-/(contronil).
化合物Ta)
ポリアクリル酸ナトリウム塩(分子量10万)第1表か
ら明らかなように一本発明の試料(l−一〜/−A)V
i−相対湿度10%といった湿度条件下において帯電別
上異なる2種の素材からなるローラー(ゴム、ウレタン
)に対して共にスタチックマークの発生が殆んど認めら
れないすぐれた帯電防止効果を有するだけでなく透過率
−粉落ち一感度共に良いものである。これに対して一コ
ントロールでは帯電防止性が著るしく劣り一比較に用い
た試料/−7〜ノー?では最外層又は隣接層に本発明の
化合物を含有していないためゴムとウレタンの両方の素
材に対し7てスタチックマークをよくすることは不可能
である。又−試料/−タでは隣接層中の金属酸化物がバ
インダーに対して少ないために十分な帯電防止性を得る
ことができない。又−比較試料/−IOは帯電防止性は
改良されるものの透過率、粉落ちが悪く本発明に比べ大
きく劣る。これは比較試料/−10は最外層がなく隣接
層が直接最外J8となるためである。Compound Ta) Polyacrylic acid sodium salt (molecular weight 100,000) As is clear from Table 1, one sample of the present invention (l-1~/-A) V
i-It has an excellent antistatic effect with almost no static marks on rollers made of two different materials (rubber and urethane) based on their static charge under humidity conditions such as 10% relative humidity. In addition, it has good transmittance, powder drop, and sensitivity. On the other hand, the antistatic property of one control was significantly inferior, and the sample used for comparison / -7 ~ No? Since the outermost layer or the adjacent layer does not contain the compound of the present invention, it is impossible to improve the static mark on both rubber and urethane materials. In addition, in the case of sample/-ta, sufficient antistatic properties could not be obtained because the amount of metal oxide in the adjacent layer was smaller than that of the binder. Although the comparative sample/-IO has improved antistatic properties, it is significantly inferior to the present invention in terms of transmittance and poor powder removal. This is because the comparative sample /-10 does not have an outermost layer and the adjacent layer directly becomes the outermost layer J8.
本実施例で述べたように、本発明は従来の帯電防止技術
を大幅に改良したものであり、これによって良好な写真
感光材料を得ることができた。As described in this example, the present invention is a significant improvement over the conventional antistatic technology, and as a result, a good photographic material could be obtained.
Claims (1)
ハロゲン化銀写真感光材料に於いて、該乳剤層側の保護
層が2層以上からなり、かつ保護層を構成する最外層が
膜厚1μm以下でZn、Ti、Sn、Al、In、Si
、Mg、Ba、Mo、W、Vを主成分とする金属の酸化
物及び導電性高分子化合物からなる群から選ばれる少な
くとも1種を含有し、かつ最外層に隣接する下層がZn
、Ti、Sn、Al、In、Si、Mg、Ba、Mo、
W、Vを主成分とする金属の酸化物から選ばれる少なく
とも1種を該層中のバインダーに対し400重量%以上
含有することを特徴とするハロゲン化銀写真感光材料。In a silver halide photographic light-sensitive material having at least one silver halide emulsion layer on a support, the protective layer on the side of the emulsion layer consists of two or more layers, and the outermost layer constituting the protective layer has a thickness of 1 μm. Below, Zn, Ti, Sn, Al, In, Si
, Mg, Ba, Mo, W, contains at least one selected from the group consisting of metal oxides and conductive polymer compounds whose main components are V, and the lower layer adjacent to the outermost layer is Zn.
, Ti, Sn, Al, In, Si, Mg, Ba, Mo,
1. A silver halide photographic material, characterized in that the layer contains at least 400% by weight of at least one metal oxide selected from metal oxides containing W and V as main components, based on the binder in the layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20729586A JPS6363035A (en) | 1986-09-03 | 1986-09-03 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20729586A JPS6363035A (en) | 1986-09-03 | 1986-09-03 | Silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6363035A true JPS6363035A (en) | 1988-03-19 |
Family
ID=16537417
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20729586A Pending JPS6363035A (en) | 1986-09-03 | 1986-09-03 | Silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6363035A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH027038A (en) * | 1988-06-27 | 1990-01-11 | Konica Corp | Silver halide photographic sensitive material for engraving nearly free from pinholes |
JPH04194843A (en) * | 1990-11-22 | 1992-07-14 | Fuji Photo Film Co Ltd | Manufacture of silver halide photosensitive material |
US5888712A (en) * | 1997-12-16 | 1999-03-30 | Eastman Kodak Company | Electrically-conductive overcoat for photographic elements |
-
1986
- 1986-09-03 JP JP20729586A patent/JPS6363035A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH027038A (en) * | 1988-06-27 | 1990-01-11 | Konica Corp | Silver halide photographic sensitive material for engraving nearly free from pinholes |
JPH04194843A (en) * | 1990-11-22 | 1992-07-14 | Fuji Photo Film Co Ltd | Manufacture of silver halide photosensitive material |
US5888712A (en) * | 1997-12-16 | 1999-03-30 | Eastman Kodak Company | Electrically-conductive overcoat for photographic elements |
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