JPS6362861A - Golden sheathing parts - Google Patents
Golden sheathing partsInfo
- Publication number
- JPS6362861A JPS6362861A JP20600986A JP20600986A JPS6362861A JP S6362861 A JPS6362861 A JP S6362861A JP 20600986 A JP20600986 A JP 20600986A JP 20600986 A JP20600986 A JP 20600986A JP S6362861 A JPS6362861 A JP S6362861A
- Authority
- JP
- Japan
- Prior art keywords
- golden
- gold
- layer
- lower layer
- intermediate layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 239000010931 gold Substances 0.000 claims abstract description 21
- 229910052737 gold Inorganic materials 0.000 claims abstract description 21
- 238000007747 plating Methods 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 4
- 229910001020 Au alloy Inorganic materials 0.000 claims abstract description 3
- 239000003353 gold alloy Substances 0.000 claims abstract description 3
- 229910003437 indium oxide Inorganic materials 0.000 claims abstract description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims abstract description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910001887 tin oxide Inorganic materials 0.000 claims abstract description 3
- 150000002736 metal compounds Chemical class 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 abstract description 3
- 229910052735 hafnium Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- 229910052726 zirconium Inorganic materials 0.000 abstract description 2
- 238000007733 ion plating Methods 0.000 abstract 2
- 238000000034 method Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
この発明は、時計バンド、時計ケース、ネックレス、メ
ガネフレーム、その池の装身具などに使用する金色外装
部品に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application This invention relates to golden exterior parts used for watch bands, watch cases, necklaces, eyeglass frames, accessories, etc.
従来の技術
上層に金メッキを施すととも番で、下層に窒化チら選ば
れる硬質で金色の金属化合物にて構成された金色外装部
品は、特公昭59−26664号公報にて知られている
。A conventional golden exterior component is known from Japanese Patent Publication No. 59-26664, in which the upper layer is plated with gold and the lower layer is made of a hard, golden metal compound selected from nitride.
発明が解決しようとする問題点
上記した従来の金色外装部品は、上層の金メッキの一部
が摩耗してはげた場合でも、下層の金色が表出されて、
金色の外観が維持され、更に、下層の硬質金属化合物は
、耐摩耗性と耐食性にすぐれた特性があるが、上記の窒
化チタンなどの金属化合物は、電導性が悪いために、上
層の金メッキの電着が悪く、金メッキが付きにぐい問題
がある。Problems to be Solved by the Invention In the conventional gold-colored exterior parts described above, even if part of the upper layer gold plating wears off and peels off, the lower layer gold is exposed.
The golden appearance is maintained, and the hard metal compound in the lower layer has excellent wear resistance and corrosion resistance, but metal compounds such as titanium nitride have poor electrical conductivity, so the upper layer gold plating is difficult to maintain. Electrodeposition is poor and gold plating is difficult to adhere to.
問題点を解決するだめの手段
この発明は上記の問題点に鑑みてなしたものであり、図
面に基づいて説明すると、従来のものの電導性を補うた
めに、基材(1)上に形成させた硬質で金色の金属化合
物からなる下層(21と、金または金合金メッキ(以下
単に金メッキという)からなる上層(4)間に、導電性
の透明層からなる中間層13)を介在させたものである
。Means for Solving the Problems This invention has been made in view of the above problems, and will be explained based on the drawings. An intermediate layer 13 made of a conductive transparent layer is interposed between the lower layer (21) made of a hard, golden metal compound and the upper layer (4) made of gold or gold alloy plating (hereinafter simply referred to as gold plating). It is.
せ丑口+ Iy +、−) Q T丁q9凸A好 )
の柄の産箇イ用いられる。下層(2)には、イオンブレ
ーティング法などにて形成されるチタン、タンタル、ハ
フニウム、ジルコニウムなどの、窒化物あるいは炭窒化
物、塘たけ炭化物からなる硬質で金色の金属化合物が用
いられる。中間層(3)には、イオンブレーティング法
などにて形成される酸化インジュウム、または酸化スズ
にてなる導電性の透明層を用いる。Setushiguchi + Iy +, -) Q Tchoq9 convex A good)
It is used for the production of the handle. The lower layer (2) is made of a hard, golden-colored metal compound made of nitride, carbonitride, or totake carbide of titanium, tantalum, hafnium, zirconium, or the like, which is formed by an ion-blating method or the like. For the intermediate layer (3), a conductive transparent layer made of indium oxide or tin oxide, which is formed by an ion-blating method or the like, is used.
作 用
この発明は、中間層(3)を設けてあり、その中間層は
、先ず導電性であるため、上層1,4)の金メッキの電
着を密にでき、密着性にすぐれた金メッキを施すことが
できる。更に、中間層(3)は透明のため、長期の使用
にて、上層(4)の金メッキの一部が摩耗してはげた場
合でも、下層(2)の金色が透視できて、良好な金色の
外観を維持することができる。Function This invention is provided with an intermediate layer (3), and since the intermediate layer is electrically conductive, the gold plating of the upper layers 1 and 4) can be electrodeposited closely, and the gold plating with excellent adhesion can be formed. can be administered. Furthermore, since the middle layer (3) is transparent, even if part of the gold plating on the upper layer (4) wears off and peels off after long-term use, the gold color on the lower layer (2) can be seen through, maintaining a good gold color. can maintain its appearance.
実施例
一実施例として、下記の条件にて、HCD法によるイオ
ンブレーティングにより、TLNを1μ蒸着して下層(
2)を形成させた後に、工ngo8を、0.1μ蒸着し
て中間層(3)を形成させ、その後に、酸性金メッキ浴
にて0.5μの金メッキを施した。Example 1 As an example, 1 μm of TLN was deposited by ion blating using the HCD method under the following conditions to form the lower layer (
After forming 2), an intermediate layer (3) was formed by vapor-depositing 0.1μ of NGO8, and then gold plating of 0.5μ was performed in an acidic gold plating bath.
TiN蒸着の条件
真空度 7X10 ’
HODパワー 40V 400A
基板温度 250℃
Arガス流t 40CC/mjn (STD)N
2ガス流量 5 Q OCC/ min (STD )
■n20B蒸着の条件
真空度 4X10 ’
HCDパワー 35v 300A
基板@度 300℃
Arガス流31 30r、C/mjn (STD)0
2ガス流量 150CC/ min (STD)発明の
効果
上記したように、この発明は、密着性の良好な金メッキ
を得ることができるとともに、良好な外観を長期間維持
できる金色外装部品を提供できる。Conditions for TiN deposition Vacuum degree 7X10' HOD power 40V 400A Substrate temperature 250℃ Ar gas flow t 40CC/mjn (STD)N
2 Gas flow rate 5 Q OCC/min (STD)
■N20B evaporation conditions Vacuum degree 4X10' HCD power 35v 300A Substrate @ degree 300℃ Ar gas flow 31 30r, C/mjn (STD) 0
2 Gas Flow Rate 150 CC/min (STD) Effects of the Invention As described above, the present invention can provide gold plating with good adhesion and can provide a gold exterior component that can maintain a good appearance for a long period of time.
図面は、この発明の金色外装部品の一部断面図。
(1)は基材、(2)は下層、13)は中間層、(4)
は上層。The drawing is a partial cross-sectional view of a golden exterior component of the present invention. (1) is the base material, (2) is the lower layer, 13) is the intermediate layer, (4)
is the upper layer.
Claims (2)
なる下層と、金または金合金メッキからなる上層にて構
成された金色外装部品において、導電性の透明層からな
る中間層を介在させたことを、特徴とする金色外装部品
。(1) In a golden exterior component composed of a lower layer made of a hard, golden metal compound formed on a base material and an upper layer made of gold or gold alloy plating, an intermediate layer made of a conductive transparent layer is interposed. The golden exterior parts are unique.
ウムまたは酸化スズにてなることを特徴とした、特許請
求の範囲第1項記載の金色外装部品。(2) The golden exterior component according to claim 1, wherein the intermediate layer consisting of a conductive transparent layer is made of indium oxide or tin oxide.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20600986A JPS6362861A (en) | 1986-09-03 | 1986-09-03 | Golden sheathing parts |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20600986A JPS6362861A (en) | 1986-09-03 | 1986-09-03 | Golden sheathing parts |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6362861A true JPS6362861A (en) | 1988-03-19 |
Family
ID=16516397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20600986A Pending JPS6362861A (en) | 1986-09-03 | 1986-09-03 | Golden sheathing parts |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6362861A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5485259A (en) * | 1993-07-19 | 1996-01-16 | Fuji Xerox Co., Ltd. | Fusing device |
US5619315A (en) * | 1993-12-29 | 1997-04-08 | Fuji Xerox Co., Ltd. | Fixing apparatus using a coated elastic member for use in an image forming apparatus |
-
1986
- 1986-09-03 JP JP20600986A patent/JPS6362861A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5485259A (en) * | 1993-07-19 | 1996-01-16 | Fuji Xerox Co., Ltd. | Fusing device |
US5619315A (en) * | 1993-12-29 | 1997-04-08 | Fuji Xerox Co., Ltd. | Fixing apparatus using a coated elastic member for use in an image forming apparatus |
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