JPS6362140A - Electron beam irradiation device - Google Patents
Electron beam irradiation deviceInfo
- Publication number
- JPS6362140A JPS6362140A JP20441686A JP20441686A JPS6362140A JP S6362140 A JPS6362140 A JP S6362140A JP 20441686 A JP20441686 A JP 20441686A JP 20441686 A JP20441686 A JP 20441686A JP S6362140 A JPS6362140 A JP S6362140A
- Authority
- JP
- Japan
- Prior art keywords
- periphery
- plate member
- electron beam
- pipes
- opening part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 18
- 239000002826 coolant Substances 0.000 claims abstract description 7
- 239000004020 conductor Substances 0.000 claims abstract description 4
- 238000001816 cooling Methods 0.000 abstract description 5
- 239000000498 cooling water Substances 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 238000005219 brazing Methods 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 239000010949 copper Substances 0.000 abstract description 2
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 238000003466 welding Methods 0.000 abstract description 2
- 230000005855 radiation Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 12
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
- Particle Accelerators (AREA)
Abstract
Description
【発明の詳細な説明】 （産業上の利用分野） この発明は電子線照射装置に関するものである。[Detailed description of the invention] (Industrial application field) The present invention relates to an electron beam irradiation device.
（従来の技術）
電子線照射装置において、真空容器の内部に負の高電圧
に維持される電極を配置し、その内部に電子線を照射す
るフィラメントを配置するとともに、前記電極と向い合
う真空容器の壁面に開口部分を設け、ここに電子線が透
過する照射窓を設置したものは既によく知られている。(Prior art) In an electron beam irradiation device, an electrode maintained at a negative high voltage is arranged inside a vacuum container, a filament for irradiating an electron beam is arranged inside the electrode, and a vacuum container facing the electrode is arranged. It is already well known that an opening is provided in the wall of the chamber, and an irradiation window through which the electron beam passes is installed.
第３図は従来のこの種装置を示し、１は真空容器、２は
電極、３はその内部に配置されであるフィラメント、４
は真空容器１の、電極２と向い合う壁面に設けられた開
口部で、ここに真空を維持するとともに、電子線の透過
を許容する金属製の箔５を備えた照射窓６が設置される
。FIG. 3 shows a conventional device of this kind, in which 1 is a vacuum vessel, 2 is an electrode, 3 is a filament arranged inside the vacuum vessel, and 4 is a filament disposed inside the vacuum vessel.
is an opening provided in the wall surface of the vacuum container 1 facing the electrode 2, in which an irradiation window 6 equipped with a metal foil 5 that maintains the vacuum and allows transmission of the electron beam is installed. .
ところでこの種装置においては、真空容器１は通常ステ
ンレスのような金属によって構成されているため、その
熱伝導性はあまり良くない。そしてその壁面特に開口部
４の周縁４Ａは、電子線が多く衝突するため高温となる
。このように高温化されると、その内部の吸蔵ガスが真
空空間に放出されるようになる。However, in this type of device, the vacuum vessel 1 is usually made of metal such as stainless steel, and therefore its thermal conductivity is not very good. The wall surface, particularly the periphery 4A of the opening 4, becomes high temperature because many electron beams collide with it. When the temperature is increased in this way, the gas stored therein will be released into the vacuum space.
このようなガスが放出されると、これに加熱電子が衝突
するなどしてイオン化されて放電し、そのためこの種装
置の運転が極めて不安定となることがある。このような
現象の発生を回避するためには、高温化部分特に開口部
周縁を充分に冷却すればよい。When such a gas is emitted, it is ionized and discharged due to collision with heated electrons, and as a result, the operation of this type of device may become extremely unstable. In order to avoid the occurrence of such a phenomenon, it is sufficient to sufficiently cool the high temperature portion, especially the periphery of the opening.
そこで従来では第３図に示すように、開口部４の周縁４
Ａに、真空容器１の軸心方向に延びる深い孔７を加工成
形し、この孔７に冷却水を流通させることによって冷却
している。Therefore, in the past, as shown in FIG.
A deep hole 7 extending in the axial direction of the vacuum vessel 1 is formed by processing, and cooling is performed by flowing cooling water through this hole 7.
しかしこのような孔７の加工は、極めて面倒であり加工
費が高くつくばかりでなく、前記したように真空容器１
はステンレスなどによって構成されていて、熱伝導性は
あまり良くないため、孔７に冷却水を流すことによって
行う冷却の効率は極めて低い。However, machining such a hole 7 is extremely troublesome and not only increases the machining cost, but also makes the vacuum vessel 1
are made of stainless steel or the like and have poor thermal conductivity, so the efficiency of cooling performed by flowing cooling water through the holes 7 is extremely low.
（発明が解決しようとする問題点）
この発明は電子線照射に際し、開口部における冷却の簡
易化を図ることを目的とする。(Problems to be Solved by the Invention) An object of the present invention is to simplify cooling at the opening during electron beam irradiation.
（問題点を解決するための手段）
この発明は熱伝導性材料からなる板材を、真空容器の壁
面に設けた開口部分の周縁を覆うように設け、この板材
の端縁に、内部に冷却媒体が流通されるパイプを設置し
たことを特徴とする。(Means for Solving the Problems) This invention provides a plate made of a thermally conductive material so as to cover the periphery of an opening provided in the wall of a vacuum container, and a cooling medium is placed inside the edge of the plate. It is characterized by the installation of a pipe through which water is distributed.
（実施例） この発明を第１図、第２図によって説明する。(Example) This invention will be explained with reference to FIGS. 1 and 2.
なお第３図と同じ符号を付した部分は、同一または対応
する部分を示す。この発明にしたがい開口部４の周縁を
覆うように板材８を配置する。この板材８はたとえば銅
のような熱伝導性の良い材料によって形成されである。Note that parts given the same reference numerals as in FIG. 3 indicate the same or corresponding parts. According to this invention, the plate material 8 is arranged so as to cover the periphery of the opening 4. This plate material 8 is made of a material with good thermal conductivity, such as copper.
そしてこの板材８の周縁に、溶接またはロー付けなどに
よってパイプ９を固定する。このパイプ９には冷却水そ
の他の冷却媒体を流通させるようにしである。A pipe 9 is then fixed to the periphery of this plate material 8 by welding, brazing, or the like. This pipe 9 is designed to allow cooling water or other cooling medium to flow therethrough.
以上の構成によれば、開口部４の周縁４Ａに電極２から
の電子線が向かうようなことがあっても、その電子線は
板材８に衝突するようになり、周縁４Ａには衝突するよ
うなことはない。そのため周、ｔ４Ａは高温度化するこ
とはなく、シたがって吸蔵ガスの放出による運転の不安
定化も起らない。According to the above configuration, even if the electron beam from the electrode 2 is directed toward the periphery 4A of the opening 4, the electron beam will collide with the plate 8 and will not collide with the periphery 4A. Nothing happens. Therefore, the temperature at t4A does not become high, and therefore, the operation becomes unstable due to release of stored gas.
一方電子線が板材８に衝突することによって、これが高
温度化しようとするが、これには内部に冷却媒体が流通
しているパイプ９が固定されているため、これによって
板材８は速やかに冷却されるようになる。したがってこ
れが高温度となることはない。On the other hand, when the electron beam collides with the plate material 8, the temperature of the plate material 8 increases, but since a pipe 9 through which a cooling medium flows is fixed to the plate material 8, the plate material 8 is quickly cooled down. will be done. Therefore, this does not lead to high temperatures.
そしてこのような冷却のために単に板材８およびパイプ
９によって構成すればよく、従来のような加工費の高い
孔７を形成する必要は全くないため、極めて安価にかつ
構成することができるようになる。そしてこの板材８を
円弧状に成形しておけば、この板材８によって周縁４Ａ
のエツジ部分を覆うことにより、電界緩和のためにこの
エツジ部分を特に円弧状に加工する必要もなくなる。For such cooling, it is sufficient to simply construct the plate material 8 and the pipe 9, and there is no need to form holes 7, which are expensive to process, as in the past, so that the construction can be made at extremely low cost. Become. If this plate material 8 is formed into an arc shape, the peripheral edge 4A can be formed by this plate material 8.
By covering the edge portion, there is no need to particularly process this edge portion into an arcuate shape for electric field relaxation.
（発明の効果）
以上詳述したようにこの発明によれば、真空容器品開口
部における温度上昇の抑制のための構成を、従来構成に
比較して簡単にかつ安価に構成できるとともに、電界緩
和のための構成も簡単とすることができるといった効果
を奏する。(Effects of the Invention) As described in detail above, according to the present invention, the structure for suppressing the temperature rise at the opening of the vacuum container can be constructed more easily and inexpensively than the conventional structure, and the electric field can be relaxed. This has the effect of simplifying the configuration.
第１図はこの発明の一実施例を示す斜視図、第２図は一
部の拡大断面図、第３図は従来例を示す斜視図である。
１・・・真空容器、２・・・電極、３・・・フィラメン
ト、４・・・開口部、４Ａ・・・周縁、６・・・照射窓
、８・・・板材。
９・・・パイプ、
特許出願人 日新ハイボルテージ株式会社−’７１．−
ｊ乙資、；Ｈ１・、彩訣−５′
代 理 人 弁理士 中 沢 謹 之 助１ 、”・′
四
Ｓ
ＣトFIG. 1 is a perspective view showing an embodiment of the present invention, FIG. 2 is a partially enlarged sectional view, and FIG. 3 is a perspective view showing a conventional example. DESCRIPTION OF SYMBOLS 1... Vacuum container, 2... Electrode, 3... Filament, 4... Opening, 4A... Periphery, 6... Irradiation window, 8... Board material. 9...Pipe, Patent applicant Nissin High Voltage Co., Ltd.-'71. −
j Otsushi;H1・、Aishi-5' Agent Patent Attorney Kinnosuke Nakazawa 1、"・'
Four S C
Claims (1)
の内部に設置するとともに、前記電極と向い合う前記真
空容器の壁面に、照射窓を設置するための開口部分を設
けてなる電子線照射装置において、熱伝導性材料からな
る板材を、前記開口部分の周縁を覆うように設け、前記
板材の端縁に、内部に冷却媒体が流通されるパイプを設
置してなる電子線照射装置。In an electron beam irradiation device, an electrode having a filament that emits an electron beam is installed inside a vacuum container, and an opening for installing an irradiation window is provided on a wall surface of the vacuum container facing the electrode. An electron beam irradiation device comprising a plate made of a thermally conductive material so as to cover the periphery of the opening, and a pipe through which a cooling medium flows inside the plate provided at the edge of the plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61204416A JPH0616382B2 (en) | 1986-08-29 | 1986-08-29 | Electron beam irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61204416A JPH0616382B2 (en) | 1986-08-29 | 1986-08-29 | Electron beam irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6362140A true JPS6362140A (en) | 1988-03-18 |
| JPH0616382B2 JPH0616382B2 (en) | 1994-03-02 |
Family
ID=16490179
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61204416A Expired - Lifetime JPH0616382B2 (en) | 1986-08-29 | 1986-08-29 | Electron beam irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0616382B2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6119800U (en) * | 1984-07-10 | 1986-02-05 | 日新ハイボルテ−ジ株式会社 | Charged particle beam irradiation device |
-
1986
- 1986-08-29 JP JP61204416A patent/JPH0616382B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6119800U (en) * | 1984-07-10 | 1986-02-05 | 日新ハイボルテ−ジ株式会社 | Charged particle beam irradiation device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0616382B2 (en) | 1994-03-02 |
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