JPS6359363B2 - - Google Patents

Info

Publication number
JPS6359363B2
JPS6359363B2 JP58061479A JP6147983A JPS6359363B2 JP S6359363 B2 JPS6359363 B2 JP S6359363B2 JP 58061479 A JP58061479 A JP 58061479A JP 6147983 A JP6147983 A JP 6147983A JP S6359363 B2 JPS6359363 B2 JP S6359363B2
Authority
JP
Japan
Prior art keywords
substrate
film
blade
solution
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58061479A
Other languages
Japanese (ja)
Other versions
JPS59185628A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP6147983A priority Critical patent/JPS59185628A/en
Publication of JPS59185628A publication Critical patent/JPS59185628A/en
Publication of JPS6359363B2 publication Critical patent/JPS6359363B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C41/00Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor
    • B29C41/02Shaping by coating a mould, core or other substrate, i.e. by depositing material and stripping-off the shaped article; Apparatus therefor for making articles of definite length, i.e. discrete articles
    • B29C41/12Spreading-out the material on a substrate, e.g. on the surface of a liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29KINDEXING SCHEME ASSOCIATED WITH SUBCLASSES B29B, B29C OR B29D, RELATING TO MOULDING MATERIALS OR TO MATERIALS FOR MOULDS, REINFORCEMENTS, FILLERS OR PREFORMED PARTS, e.g. INSERTS
    • B29K2105/00Condition, form or state of moulded material or of the material to be shaped
    • B29K2105/0058Liquid or visquous
    • B29K2105/0073Solution
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29LINDEXING SCHEME ASSOCIATED WITH SUBCLASS B29C, RELATING TO PARTICULAR ARTICLES
    • B29L2007/00Flat articles, e.g. films or sheets
    • B29L2007/008Wide strips, e.g. films, webs

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Moulding By Coating Moulds (AREA)
  • Extrusion Moulding Of Plastics Or The Like (AREA)
  • Casting Or Compression Moulding Of Plastics Or The Like (AREA)

Description

【発明の詳細な説明】 この発明は製膜装置、より詳しくは溶液キヤス
ト法によつて、均一な高分子膜を再現性よく製造
するための装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a film forming apparatus, and more particularly to an apparatus for producing a uniform polymer film with good reproducibility by a solution casting method.

高分子膜は、物質分離・包装・情報の変換や記
録など種々の目的のために使用される。高分子材
料を膜状に成形することは、高分子やそこに混在
した低分子の光学的・電気的・機械的・熱的性質
を調べるための試料づくりの手段としても重要で
ある。
Polymer membranes are used for various purposes such as substance separation, packaging, information conversion and recording. Forming polymeric materials into membranes is also important as a means of preparing samples for investigating the optical, electrical, mechanical, and thermal properties of polymers and the small molecules mixed therein.

高分子膜を製造するための方法のうち、高分子
を適当な溶媒に溶解してからその溶液を基板の上
に塗布し、溶媒を蒸発させて膜を作るいわゆる溶
液キヤスト法は、常温・常圧で製膜できること、
大がかりな装置を要しないこと、製膜途中の高分
子溶液に対して、例えば水中浸漬などの処理を加
えやすいこと、無駄になる高分子試料が少なくて
済むこと、スピンナーによる塗布よりはできる膜
厚が予測しやすいことなどの理由で、特に数十セ
ンチメートル角以下の膜を作るために広く用いら
れている方法である。
Among the methods for manufacturing polymer films, the so-called solution casting method, in which a polymer is dissolved in a suitable solvent, the solution is applied onto a substrate, and the solvent is evaporated to form a film, is used at room temperature. Being able to form a film using pressure;
It does not require large-scale equipment, it is easy to process the polymer solution during film formation, such as immersion in water, there is less wasted polymer sample, and the film thickness can be thicker than when applied using a spinner. It is a method that is widely used, especially for making films with dimensions of several tens of centimeters square or less, because it is easy to predict.

従来、このキヤスト法によつて高分子膜を製造
するためには、予め調製した高分子溶液を平らな
ガラス板などの基板の一部に注ぎ、次いで適当な
道具を用いてその溶液を基板の上に広げる方法が
用いられていた。〔例えば日本化学会編「新実験
化学講座、第19−2巻」(丸善、1978)第974ペー
ジ参照〕溶液を広げる道具としては、ドクターブ
レードと呼ばれる刃や、両端に所要の太さの針金
を巻いて、針金の太さの分だけ基板とのあいだに
隙間を作ることのできる金属の丸棒が知られてい
る。また、基板の両端にテープを貼つて高くして
おき、ガラス棒を両端のテープにまたがるように
すべらせる方法も使われている。これらの道具は
手で動かすことによつて、塗布が行われてきた。
薄層クロマトグラフイー用の基板を作るためのい
わゆるアプリケーターを、キヤスト法によつて膜
を作る道具として記載した文献もあるが、この場
合には高分子溶液をアプリケーターの中央部に注
ぎ、基板を手で押してその下を通過させることに
よつて、ある厚みの高分子溶液を基板上に展開し
ていた。
Conventionally, in order to manufacture a polymer film by this casting method, a pre-prepared polymer solution is poured onto a part of a substrate such as a flat glass plate, and then the solution is poured onto the substrate using an appropriate tool. An upward spread method was used. [For example, see "New Experimental Chemistry Course, Vol. 19-2" (Maruzen, 1978), page 974, edited by the Chemical Society of Japan.] Tools for spreading the solution include a blade called a doctor blade, and a wire of the required thickness on both ends. There is a known metal round rod that can be rolled up to create a gap between it and the board equal to the thickness of the wire. Another method is to attach tape to both ends of the board to raise it higher, and then slide a glass rod across the tape at both ends. Application has been performed by moving these tools by hand.
Some literature describes a so-called applicator for making a substrate for thin layer chromatography as a tool for making a film by the casting method, but in this case, a polymer solution is poured into the center of the applicator and the substrate is A polymer solution of a certain thickness was spread on the substrate by pushing it by hand and passing it under it.

これらの方法で作製される膜の膜厚を、単位面
積当りの重量や、気体・液体の透過速度を用いて
精密に測定すると、±10〜20%の変動やばらつき
が、作製の度毎に、または同一時に作製した膜中
の場所によつて存在することが普通であつた。
When the thickness of the membrane produced by these methods is precisely measured using the weight per unit area and the permeation rate of gas/liquid, there is a fluctuation or dispersion of ±10 to 20% every time it is produced. , or depending on the location in the film prepared at the same time.

以上の方法は、いずれも溶液の塗布を手を用い
て行うので、塗布の速度や塗布を行うための道具
の高分子溶液に対する位置関係が厳密にいつも一
定ではない。後述するように、一定で可変のいく
つかの塗布速度を用いて実際に膜をキヤストし、
できる膜の厚さを測つてみると、膜厚は塗布速度
とともに変動する傾向を有している。また、例え
ば膜透過率が膜厚に反比例して変化することはよ
く知られている。すなわち均一でいつも同じ厚み
や性質をもつ膜を製造するためには、一定の速度
で、製膜用溶液の塗布を行わなければならず、ま
た塗布用具と溶液とが接触する部分の形状、角
度、相互の相対的位置なども、終始一定でなけれ
ばならない。
In all of the above methods, the solution is applied manually, so the application speed and the positional relationship of the tool for application with respect to the polymer solution are not always strictly constant. As described below, we actually cast the film using several constant and variable coating speeds.
When measuring the thickness of the resulting film, the film thickness tends to vary with the coating speed. Furthermore, it is well known that, for example, membrane transmittance changes in inverse proportion to membrane thickness. In other words, in order to produce a film that is uniform and always has the same thickness and properties, the film-forming solution must be applied at a constant speed, and the shape and angle of the part where the application tool and the solution come into contact must be adjusted. , mutual relative positions, etc. must also remain constant throughout.

さらに、製膜用溶液を塗布したあとの溶媒蒸発
速度は、できる膜の性質に大きな関係をもつ。高
分子の良溶媒と貧溶媒との混合溶媒を用いて、良
溶媒をより急速に蒸発させることによつて製膜途
上で高分子の析出を起こさせる、いわゆる相転換
法は、多孔性膜の製法として広く用いられてい
る。例えばこの方法で膜を作るときに、析出の起
こる溶媒組成への近づき方が、塗布面全体ででき
るだけ一定でなければならないことは当然であ
る。基板上のすべての点で一定の速度で蒸発を起
こさせるには、基板が平滑で一定の厚みと温度を
有し、また蒸気が拡散する周囲の雰囲気の温度・
蒸気圧・風速などが一定であるばかりでなく、基
板を保持する面の温度や熱的条件が均質であるこ
とが重要である。なぜなら、溶媒蒸発は必然的に
製膜液から蒸発熱を奪い、その温度を低下させる
が、一般に固体の熱伝導は、液体や気体の熱伝導
よりかなり大きいので、温度低下を補償する熱
は、主として基板と接しているその真下の面から
供給されることになるからである。しかし、従来
製膜に使われた方法では、高分子溶液塗布後に基
板を載せるための面の平滑さやその面内の各点の
熱的環境の均質さに対する配慮が不充分であつ
た。例えば、基板とそれを載せる台とが吸付くこ
とを防止しようとして基板に凹凸をつければ、基
板の一部は台に接し、他の部分は空気に接するこ
とになつて、基板への熱伝導が異なつてしまう。
後述するように、このような台の上で作つた膜
は、台の凹凸に対応する不均質さを実際に有して
いる。また、基板を載せる面の端部に、基板にす
ぐ接近するような枠があれば、その部分の熱的環
境は中央部とは異なつてしまう。基板を載せる台
の下方の、それを支えるための構造についても同
様である。均質な膜を製造するためには、溶液層
のうち、同時に基板の上に形成された刃と平行な
線上の各点で、同等の熱伝導と溶媒分子の移動の
起こることが特に重要である。
Furthermore, the rate of solvent evaporation after the film-forming solution is applied has a large relationship to the properties of the resulting film. The so-called phase conversion method uses a mixed solvent of a good polymer solvent and a poor solvent to cause polymer precipitation during film formation by evaporating the good solvent more rapidly. It is widely used as a manufacturing method. For example, when making a film using this method, it is natural that the approach to the solvent composition in which precipitation occurs must be as constant as possible over the entire coated surface. For evaporation to occur at a constant rate at all points on the substrate, the substrate must be smooth and have a constant thickness and temperature, and the temperature and temperature of the surrounding atmosphere through which the vapor will diffuse is required.
It is important that not only the vapor pressure and wind speed be constant, but also that the temperature and thermal conditions of the surface holding the substrate be homogeneous. This is because solvent evaporation inevitably removes evaporation heat from the film-forming solution and lowers its temperature, but since the heat conduction of solids is generally much greater than that of liquids and gases, the heat that compensates for the temperature drop is This is because it is mainly supplied from the surface directly below that is in contact with the substrate. However, in the conventional method used for film formation, insufficient consideration was given to the smoothness of the surface on which the substrate is placed after coating the polymer solution and the homogeneity of the thermal environment at each point within the surface. For example, if the board is made uneven to prevent it from sticking to the stand on which it is placed, part of the board will be in contact with the stand and other parts will be in contact with the air, which will reduce heat conduction to the board. becomes different.
As will be described later, a film produced on such a table actually has non-uniformity corresponding to the unevenness of the table. Furthermore, if there is a frame that comes close to the substrate at the end of the surface on which the substrate is placed, the thermal environment of that portion will be different from that of the center. The same applies to the structure below the table on which the board is placed to support it. In order to produce homogeneous films, it is particularly important that equal heat conduction and movement of solvent molecules occur at each point in the solution layer on a line parallel to the blades simultaneously formed on the substrate. .

本発明者らは、均質で製膜の操作を行う度毎に
性質の変わらない高分子膜を、キヤスト法で作る
方法について研究したが、従来の方法を使うかぎ
り均質な膜を再現性よく製造することは困難で、
その理由は上述のとおりであることを見出し、そ
の知見に基づいてこの発明を完成するに至つた。
The present inventors have researched a method of using a casting method to create a polymer film that is homogeneous and whose properties do not change each time the film forming operation is performed.However, as long as conventional methods are used, homogeneous films can be produced with good reproducibility. It is difficult to
We discovered that the reason for this is as described above, and based on that knowledge, we completed this invention.

すなわち、この発明は、中央部に所定の長さ及
び幅の切欠部を設けた高分子溶液を基板上に塗布
するための刃と、該基板を押して前記刃の下を一
定の速度で通過させるためのモータで駆動される
押し金具と、前記刃によつて基板上に形成された
溶液層が、少なくとも刃に対し平行なすべての線
において均一な熱伝導を受けるように設計された
基板乾燥部とを有することを特徴とする製膜装置
である。
That is, the present invention includes a blade for applying a polymer solution onto a substrate, the blade having a notch of a predetermined length and width in the center, and a blade for pushing the substrate to pass under the blade at a constant speed. and a substrate drying section designed so that the solution layer formed on the substrate by the blade receives uniform heat conduction at least in all lines parallel to the blade. This is a film forming apparatus characterized by having the following.

上記均一な熱伝導の実現のために、該基板乾燥
部には、充分に平滑な表面を有し、継目がなく、
基板と比較して幅・長さとも充分に大きく、かつ
充分な厚みをもつ台を用い、基板上に塗布された
溶液層の乾燥をその上で行うこととする。さらに
この台を支えるための構造も、台表面への熱の伝
わり方が場所的に不均一にならないように設計す
る。上記の台には、さらに覆いをつけて、乾燥中
に風による熱伝導の不均一が起こらないようにし
たり、水や溶媒の蒸気圧を制御できるようにした
りすることもできる。
In order to achieve the above-mentioned uniform heat conduction, the substrate drying section has a sufficiently smooth surface and is seamless.
A table having a sufficiently large width and length and a sufficient thickness compared to the substrate is used, and the solution layer coated on the substrate is dried on the table. Furthermore, the structure to support the table is designed to prevent uneven distribution of heat to the table surface. The platform may also be covered to prevent uneven heat transfer due to wind during drying and to control the vapor pressure of the water or solvent.

以下図面に基づいて、この発明の実施例につき
説明する。第1図と第2図は、この発明の実施例
を示す平面図と立面図である。製膜装置本体1
は、高分子溶液を均一な厚さで基板2上に塗布す
るための刃3を備えている。刃3は、第3図に示
すように、塗布を行いたい厚みdだけの幅の切欠
部を、中央部に長さbにわたつて刻成することに
よつて作製する。また寸法aは、製膜用に用いる
基板2の差し渡しより小さく、刃の両端12,1
2がいずれも基板の上に載るように、また長さb
は、作りたい膜の幅に一致するように決めるもの
とする。幅dとしては、例えば50,100,150,
200,250,300,400,500,600,800,1000ミク
ロンなどを選ぶことができる。刃3は、幅dを正
確に加工することができ、寸法の変動が少なく、
また洗浄や保管が容易な材料、例えばステンレス
鋼で作るのがよい。また、刃3の両端12,12
は刃3自身の重さで基板2に押しつけられ、丁度
dだけの厚さに溶液を塗布する役目をもつので、
刃3はある程度の自重をもつことが望ましい。
Embodiments of the present invention will be described below based on the drawings. 1 and 2 are a plan view and an elevation view showing an embodiment of the invention. Film forming device main body 1
is equipped with a blade 3 for applying a polymer solution onto a substrate 2 in a uniform thickness. As shown in FIG. 3, the blade 3 is made by carving a notch with a width equal to the desired coating thickness d and a length b in the center. In addition, the dimension a is smaller than the width of the substrate 2 used for film formation, and both ends 12 and 1 of the blade are
2 so that they both rest on the board, and the length b
shall be determined to match the width of the desired film. For example, the width d is 50, 100, 150,
You can choose from 200, 250, 300, 400, 500, 600, 800, 1000 microns, etc. The blade 3 can process the width d accurately, has little variation in dimensions,
It is also best to make it from a material that is easy to clean and store, such as stainless steel. Also, both ends 12, 12 of the blade 3
is pressed against the substrate 2 by the weight of the blade 3 itself, and has the role of applying the solution to a thickness of exactly d, so
It is desirable that the blade 3 has a certain degree of self-weight.

製膜用に調製した高分子溶液は、装置本体の水
平面4の上に置かれた基板2の上に刃3に接する
ように注ぐものとするが、この実施例では溶液が
不必要に広がるのを防ぎ、また塗布終了後の処理
がしやすいように、刃3に近接した別の押え板5
を溶液塗布時に基板が進むのと反対の方向に設
け、それと刃3とのあいだに溶液を注入するよう
に設計してある。刃3と押え板5とを固定するた
めに、製膜装置本体1にクランプ6,6を設け、
そこに第4図に示す形状の固定具7,7を差し込
み、次いで固定具7,7に刃3と押え板5とを差
し込む構造である。刃3、押え板5、固定具7,
7および基板2によつて区切られた部分(溶液だ
めと呼ぶ)に、製膜の途中でなくならないような
量の製膜溶液を注ぐ。固定具7,7はこのように
高分子溶液で汚れるので、容易に洗浄ができるよ
うに取外し可能に設計したものである。
The polymer solution prepared for film formation is poured onto the substrate 2 placed on the horizontal surface 4 of the apparatus main body so as to be in contact with the blade 3, but in this example, the solution is prevented from spreading unnecessarily. , and another holding plate 5 close to the blade 3 to facilitate processing after coating is completed.
is provided in the direction opposite to the direction in which the substrate advances during solution application, and the solution is injected between it and the blade 3. In order to fix the blade 3 and the holding plate 5, clamps 6, 6 are provided on the film forming apparatus main body 1,
The structure is such that fixtures 7, 7 having the shape shown in FIG. 4 are inserted therein, and then the blade 3 and presser plate 5 are inserted into the fixtures 7, 7. Blade 3, holding plate 5, fixture 7,
7 and the substrate 2 (referred to as a solution reservoir), a film forming solution is poured in an amount that will not run out during film forming. Since the fixtures 7, 7 become dirty with the polymer solution in this way, they are designed to be removable so that they can be easily cleaned.

製膜装置本体には、さらに基板2を押して刃3
の下を一定の速度で通過させ、製膜溶液を基板上
に均一に塗布するための押し金具8が設けてあ
り、押し金具8はモータの回転軸に接続したベル
ト(いずれも図示せず)と一体になつて前後に移
動する。基板2は装置本体1の水平面4の上に乗
りつつ、押し金具8に押されてその上を滑り、基
板乾燥部9に移される。製膜を行うには、まず前
記溶液だめに高分子溶液を注ぎ、直ちに押し金具
8を第1図において右から左の方向に動かして、
基板上に均一に溶液を塗布する。モータの回転を
ベルトに伝える歯車の直径や、モータに給電する
電圧などを変化させることにより、押し金具8の
移動速度、すなわち高分子溶液の塗布速度は、あ
る範囲内で任意に設定できるようにすることがで
きる。移動速度の範囲としては、例えば毎秒2〜
30cmの速度を選べばよい。水平面の長さCは、作
りたい膜の最大の長さをもつ基板が充分に載せら
れるように選ばれる。
In the main body of the film forming apparatus, push the substrate 2 further and insert the blade 3.
A push metal fitting 8 is provided to uniformly apply the film-forming solution onto the substrate by passing it under the film at a constant speed, and the push metal fitting 8 is a belt (both not shown) connected to the rotating shaft of a motor. move back and forth as one. While riding on the horizontal surface 4 of the apparatus main body 1, the substrate 2 is pushed by the pusher 8, slides thereon, and is transferred to the substrate drying section 9. To form a film, first pour the polymer solution into the solution reservoir, immediately move the pusher 8 from right to left in FIG.
Apply the solution evenly on the substrate. By changing the diameter of the gear that transmits the rotation of the motor to the belt, the voltage supplied to the motor, etc., the moving speed of the pusher 8, that is, the coating speed of the polymer solution, can be set arbitrarily within a certain range. can do. The range of movement speed is, for example, 2 to 2 per second.
Just choose a speed of 30cm. The length C of the horizontal plane is selected so that a substrate having the maximum length of the desired film can be sufficiently mounted thereon.

塗布された溶液から溶媒を蒸発させるために、
基板を静置しておくための基板乾燥部9には、基
板を載せるための台10を設けてある。台10
は、溶液を塗布するための刃3のすぐ近傍から、
台10の上面と面4とが同一水平面上にあるよう
に配置される。台10は平滑な表面をもち、また
充分な厚みのある継目のない板で構成し、さらに
基板2より充分広い面積をもつものとする。すな
わち、台10としては、例えば平滑な表面を有す
る厚さ3cm以上のステンレスの一枚板を用い、か
つその大きさは、基板2を載せたとき、長さ及び
幅のいずれの方向にも、基板2に比較して10cm以
上の余裕を有するように定める。台10を支える
構造も、台10の表面への熱の伝わり方が場所的
に不均一にならず、刃によつて基板上に形成され
た溶液層が、少なくとも刃に対し平行なすべての
線において均一な熱伝導を受けるように構成す
る。この目的のために台10を支持する構造とし
ては、台10の四隅を四本の支柱で支持する、
台10の左右の対向側面を掴持する、台10
の厚さを厚くして装置の下面から始まるようにす
るなどの構造をもたせることができる。いずれの
場合も、台10への伝熱を場所的に変化させるよ
うな附属構造体を他に取り付けてはならないこと
は言うまでもない。こうすることによつて、該溶
液層に、刃に対し平行なすべての線上の各点にお
いて常に均一な温度分布をもたせることができ
る。なお、刃に対し垂直方向の熱伝導も均一であ
ることが望ましいが、この方向は溶液塗布時に基
板の動く方向であるため、この方向の線上の各点
においては、塗布後の経過時間の違いが存在し、
厳密に一定の温度分布を期待することはできな
い。台10の材質として、熱的に均質な種々の材
料、例えば断熱材や厚い鉄板を用いることができ
る。
To evaporate the solvent from the applied solution,
A substrate drying section 9 for keeping the substrate stationary is provided with a stand 10 for placing the substrate on it. 10 units
is from the immediate vicinity of the blade 3 for applying the solution,
The top surface of the stand 10 and the surface 4 are arranged on the same horizontal plane. The stand 10 has a smooth surface, is made of a seamless plate of sufficient thickness, and has a sufficiently larger area than the substrate 2. That is, as the stand 10, for example, a single plate of stainless steel with a thickness of 3 cm or more and having a smooth surface is used, and its size is such that when the substrate 2 is placed on it, it can be used in both the length and width directions. It is determined that there is a margin of 10 cm or more compared to the board 2. The structure that supports the table 10 also prevents the heat from being transmitted unevenly to the surface of the table 10, and ensures that the solution layer formed on the substrate by the blade is spread over at least all lines parallel to the blade. The structure is configured to receive uniform heat conduction. For this purpose, the structure for supporting the stand 10 is to support the four corners of the stand 10 with four pillars.
A stand 10 that grips and holds the left and right opposing sides of the stand 10
The thickness can be increased to begin at the bottom of the device. In any case, it goes without saying that no other auxiliary structure that would locally change the heat transfer to the platform 10 should be attached. By doing so, the solution layer can always have a uniform temperature distribution at each point on all lines parallel to the blade. It is desirable that the heat conduction in the direction perpendicular to the blade is also uniform, but since this direction is the direction in which the substrate moves during solution application, differences in the elapsed time after application at each point on the line in this direction exists,
A strictly constant temperature distribution cannot be expected. As the material of the stand 10, various thermally homogeneous materials can be used, such as a heat insulating material or a thick iron plate.

基板乾燥部には、さらに覆い11をつけて、乾
燥中風が当らないようにしたり、水蒸気圧や溶媒
蒸気圧を制御することもできる。この場合、刃3
の下を通つた基板が入る部分だけは基板と塗布さ
れた溶液の厚さの分だけ開けておくか、適当な機
構を使つて開閉自在の蓋を設けておく。また乾燥
後の基板取出し口を、やはり開閉自在の機構で作
るのも便利である。基板乾燥部には、さらに温度
を制御して、加熱または冷却を行う機構を取付け
ることもできる。
The substrate drying section may be further provided with a cover 11 to prevent air from blowing during drying and to control water vapor pressure and solvent vapor pressure. In this case, blade 3
The part into which the substrate passes under is left open by the thickness of the substrate and the applied solution, or a lid that can be opened and closed is provided using an appropriate mechanism. It is also convenient to make the opening for taking out the substrate after drying with a mechanism that can be opened and closed freely. The substrate drying section can also be equipped with a mechanism that further controls the temperature and performs heating or cooling.

なお、塗布開始後、終了部における末端効果を
除去し、均一な長方形の膜を作るには、所望の長
さの基板の前後に同じ厚みをもつ短い長方形の板
を並べておき、前の板の上にまず製膜溶液を注
ぎ、3枚の板を同時に移動させて中央の基板上に
一様な塗布を行い、後の板の上に余つた製膜溶液
を載せて始末するのがよい。
In addition, in order to remove the end effect at the end after coating starts and to create a uniform rectangular film, line up short rectangular plates with the same thickness in front and behind the substrate of the desired length, and It is best to first pour the film-forming solution onto the top, move the three plates at the same time to uniformly coat the central substrate, and then dispose of the remaining film-forming solution by placing it on the latter plate.

また、刃3の切欠部の長さb(第3図参照)の
異なる刃を作つておけば、種々の幅をもつ膜を作
製することができる。長さbが寸法aに比べかな
り小さい場合、製膜溶液は前記溶液だめの全体に
注がれる必要はなく、製膜時に基板が移動したと
きに、少なくとも長さbの範囲だけが、高分子溶
液に触れればよい。そこで製膜溶液の消費量が最
小で済むように、適当な形状の金具で前記溶液だ
めを区切ることができる。
Furthermore, by making blades with different lengths b (see FIG. 3) of the cutout portions of the blades 3, films with various widths can be made. When the length b is considerably smaller than the dimension a, the film-forming solution does not need to be poured into the entire solution reservoir, and when the substrate is moved during film-forming, at least the area of the length b is filled with the polymer. Just touch the solution. Therefore, the solution reservoir can be partitioned with appropriately shaped metal fittings so that the amount of consumption of the film-forming solution can be minimized.

第5図には、以上の実施例で述べた装置を使つ
て、セルロース・アセテートのアセトン溶液(重
量比で1.0:3.0)を10×20×0.2cm3のガラス板上
に、3種類の速度で300ミクロンの厚さに塗布し
たとき、単位面積当りに形成された膜の重量を示
す。
Figure 5 shows that using the apparatus described in the above example, a solution of cellulose acetate in acetone (weight ratio 1.0:3.0) was applied onto a 10 x 20 x 0.2 cm 3 glass plate at three different speeds. It shows the weight of the film formed per unit area when applied to a thickness of 300 microns.

この図によれば、膜重量、すなわち膜厚は、塗
布速度とともに変化しており、試験に用いた速度
の最大と最小とでは、10%以上の差が生じてい
る。この結果から、一定の厚さの膜を製造する上
で、塗布を一定速度で行うことの必要性と重要性
を知ることができる。
According to this figure, the film weight, that is, the film thickness, changes with the coating speed, and there is a difference of more than 10% between the maximum and minimum speeds used in the test. This result shows the necessity and importance of coating at a constant speed in producing a film with a constant thickness.

第6図は、同じ装置を使い、毎秒2.4cmの速度
で5種類の厚さに同じ溶液を塗布し、単位面積当
りに形成された膜の重量を示す。刃に刻成した幅
にほぼ比例して、膜厚が増加したことが分かる。
Figure 6 shows the weight of the film formed per unit area when the same solution was applied to five different thicknesses using the same equipment at a speed of 2.4 cm per second. It can be seen that the film thickness increased almost in proportion to the width engraved on the blade.

すなわち、膜厚は、刃に刻成した幅のみによつ
て決定・制御されており、従来の製膜法では普通
であつたような前述の膜厚の変動やばらつきが見
られない。この第6図から、本発明の装置を用い
た場合に得られる膜厚の再現性の高さを知ること
ができる。
In other words, the film thickness is determined and controlled only by the width engraved on the blade, and the above-mentioned variations and variations in film thickness that are common in conventional film forming methods are not observed. From FIG. 6, it can be seen that the reproducibility of the film thickness obtained when using the apparatus of the present invention is high.

また第7図は、セルロース・アセテート、アセ
トン、および水(重量比1.0:5.6:1.2)の混合溶
液を100ミクロンの厚さに塗布し、30秒間溶媒を
蒸発させてから水中に浸漬する実験で、刃に対し
て平行な面内に0.5mmの段差を刻成した台を使う
従来型の装置を用いて蒸発を凹凸のある面で行わ
せたときと、熱的に均質な面で行わせたときの膜
の光学密度の違いである。
Figure 7 shows an experiment in which a mixed solution of cellulose acetate, acetone, and water (weight ratio 1.0:5.6:1.2) was applied to a thickness of 100 microns, the solvent was evaporated for 30 seconds, and then immersed in water. Using a conventional device that uses a table with a 0.5 mm step in a plane parallel to the blade, evaporation was performed on an uneven surface and when it was performed on a thermally homogeneous surface. This is the difference in the optical density of the film.

光学密度の不均一は、膜の構造の不均一の反映
であり、本装置のごとく、基板上に形成された溶
液層が少なくとも刃に対し平行なすべての線にお
いて均一な熱伝導を受ける構成を有しない装置を
用いた場合に、場所による蒸発速度の違いに由来
して発生する膜構造の不均一を例示している。一
方、本発明の装置を使つた場合には、第7図から
分かるごとく、構造の均一な膜を作ることができ
る。この構造の均一性が、基板を介しての製膜溶
液への熱伝導の均一性の実現に特に注意を払つた
本発明のもたらす一つの効果である。膜内で構造
が均一であるということは、異なる時点に製造し
た膜の性質の再現性の向上にも寄与することは言
うまでもない。さらに、再現性の向上には、上述
した固定された一定形状の刃と、一定速度で基板
を動かすことのできる機構の存在の寄与も大き
い。高い再現性が、本発明のもたらす別の効果で
ある。
The non-uniformity of the optical density is a reflection of the non-uniformity of the film structure, and as in this device, the solution layer formed on the substrate has a configuration in which heat conduction is uniform at least in all lines parallel to the blade. This example illustrates the non-uniformity of the film structure that occurs due to differences in evaporation rate depending on location when using a device that does not have this. On the other hand, when the apparatus of the present invention is used, as can be seen from FIG. 7, a film with a uniform structure can be produced. This uniformity of structure is one advantage of the present invention, which pays particular attention to achieving uniformity of heat conduction through the substrate to the coating solution. It goes without saying that the uniformity of the structure within the film also contributes to improving the reproducibility of the properties of films produced at different times. Furthermore, the presence of the above-mentioned fixed blade with a constant shape and a mechanism that can move the substrate at a constant speed also greatly contributes to improved reproducibility. High reproducibility is another advantage of the present invention.

この発明は、以上のように構成した装置であ
り、それを用いることによつて、所期の目的どお
り厚みや性質が場所によつて変らない膜を、いつ
でも同じように作製することができる。
The present invention is an apparatus configured as described above, and by using the apparatus, a film whose thickness and properties do not change depending on the location can be produced in the same manner at any time as intended.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の実施例を示す平面図、第2
図はその立面図を示し、第3図は刃の部分の斜視
図、第4図は固定具の部分の斜視図を示す。また
第5図は、本発明装置を用いて作製された膜の塗
布速度と膜重量の関係を示すグラフ、第6図は刃
の幅と膜重量の関係を示すグラフ、第7図は、基
板乾燥部に凹凸構造を有する装置と有しない装置
によつて得られた膜の光学密度分布図である。 図中、符号1……製膜装置本体、2……基板、
3……刃、4……水平面、5……押え板、6……
クランプ、7……固定具、8……押し金具、9…
…基板乾燥部、10……台、11……覆い、12
……刃の両端、a……刃の寸法、b……刃の切欠
部の長さ、c……水平面の長さ、d……刃の切欠
部の幅を、示す。
FIG. 1 is a plan view showing an embodiment of the present invention, and FIG.
The figure shows an elevational view thereof, FIG. 3 a perspective view of the blade section, and FIG. 4 a perspective view of the fixture section. Furthermore, FIG. 5 is a graph showing the relationship between the coating speed and film weight of the film produced using the apparatus of the present invention, FIG. 6 is a graph showing the relationship between the width of the blade and the film weight, and FIG. FIG. 4 is an optical density distribution diagram of films obtained by an apparatus having and not having an uneven structure in the drying section. In the figure, reference numerals 1...film forming apparatus main body, 2...substrate,
3...blade, 4...horizontal surface, 5...presser plate, 6...
Clamp, 7... Fixture, 8... Push metal fitting, 9...
...Substrate drying section, 10...stand, 11...cover, 12
...Both ends of the blade, a...Dimensions of the blade, b...Length of the cutout of the blade, c...Length of the horizontal surface, d...Width of the cutout of the blade.

Claims (1)

【特許請求の範囲】[Claims] 1 (イ)中央部に所定の長さおよび幅の切欠部を設
けた高分子溶液を基板上に塗布するための刃と、
(ロ)該基板を押して前記刃の下を一定の速度で通過
させるためのモータで駆動される押し金具と、(ハ)
前記刃によつて基板上に形成された溶液層が、少
なくとも刃に対し平行なすべての線において均一
な熱伝導を受けるように設計された基板乾燥部と
を有することを特徴とする製膜装置。
1 (a) A blade with a notch of a predetermined length and width in the center for applying a polymer solution onto the substrate;
(b) a pusher driven by a motor for pushing the board to pass under the blade at a constant speed; and (c)
and a substrate drying section designed so that the solution layer formed on the substrate by the blade receives uniform heat conduction at least in all lines parallel to the blade. .
JP6147983A 1983-04-06 1983-04-06 Film manufacturing device Granted JPS59185628A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6147983A JPS59185628A (en) 1983-04-06 1983-04-06 Film manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6147983A JPS59185628A (en) 1983-04-06 1983-04-06 Film manufacturing device

Publications (2)

Publication Number Publication Date
JPS59185628A JPS59185628A (en) 1984-10-22
JPS6359363B2 true JPS6359363B2 (en) 1988-11-18

Family

ID=13172245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6147983A Granted JPS59185628A (en) 1983-04-06 1983-04-06 Film manufacturing device

Country Status (1)

Country Link
JP (1) JPS59185628A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS496826U (en) * 1972-04-19 1974-01-21
JPS5514201A (en) * 1977-12-28 1980-01-31 Konishiroku Photo Ind Co Ltd Method of manufacturing cellulose triacetate film
JPS55139863A (en) * 1979-04-20 1980-11-01 Nippon Sheet Glass Co Ltd Painting tool

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS496826U (en) * 1972-04-19 1974-01-21
JPS5514201A (en) * 1977-12-28 1980-01-31 Konishiroku Photo Ind Co Ltd Method of manufacturing cellulose triacetate film
JPS55139863A (en) * 1979-04-20 1980-11-01 Nippon Sheet Glass Co Ltd Painting tool

Also Published As

Publication number Publication date
JPS59185628A (en) 1984-10-22

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